JP2004083932A5 - - Google Patents

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Publication number
JP2004083932A5
JP2004083932A5 JP2002242726A JP2002242726A JP2004083932A5 JP 2004083932 A5 JP2004083932 A5 JP 2004083932A5 JP 2002242726 A JP2002242726 A JP 2002242726A JP 2002242726 A JP2002242726 A JP 2002242726A JP 2004083932 A5 JP2004083932 A5 JP 2004083932A5
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JP
Japan
Prior art keywords
substrate
substrate holder
electrolytic
contact
counter electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002242726A
Other languages
English (en)
Japanese (ja)
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JP2004083932A (ja
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Publication date
Application filed filed Critical
Priority to JP2002242726A priority Critical patent/JP2004083932A/ja
Priority claimed from JP2002242726A external-priority patent/JP2004083932A/ja
Publication of JP2004083932A publication Critical patent/JP2004083932A/ja
Publication of JP2004083932A5 publication Critical patent/JP2004083932A5/ja
Withdrawn legal-status Critical Current

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JP2002242726A 2002-08-22 2002-08-22 電解処理装置 Withdrawn JP2004083932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002242726A JP2004083932A (ja) 2002-08-22 2002-08-22 電解処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002242726A JP2004083932A (ja) 2002-08-22 2002-08-22 電解処理装置

Publications (2)

Publication Number Publication Date
JP2004083932A JP2004083932A (ja) 2004-03-18
JP2004083932A5 true JP2004083932A5 (de) 2005-08-25

Family

ID=32051681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002242726A Withdrawn JP2004083932A (ja) 2002-08-22 2002-08-22 電解処理装置

Country Status (1)

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JP (1) JP2004083932A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008121062A (ja) * 2006-11-10 2008-05-29 Ebara Corp めっき装置及びめっき方法
US9221081B1 (en) 2011-08-01 2015-12-29 Novellus Systems, Inc. Automated cleaning of wafer plating assembly
US10066311B2 (en) 2011-08-15 2018-09-04 Lam Research Corporation Multi-contact lipseals and associated electroplating methods
US9228270B2 (en) 2011-08-15 2016-01-05 Novellus Systems, Inc. Lipseals and contact elements for semiconductor electroplating apparatuses
US9988734B2 (en) 2011-08-15 2018-06-05 Lam Research Corporation Lipseals and contact elements for semiconductor electroplating apparatuses
KR102112881B1 (ko) 2012-03-28 2020-05-19 노벨러스 시스템즈, 인코포레이티드 전자도금 기판 홀더들을 세정하기 위한 방법들 및 장치들
TWI609100B (zh) 2012-03-30 2017-12-21 諾發系統有限公司 使用反向電流除鍍以清洗電鍍基板夾持具
US10416092B2 (en) 2013-02-15 2019-09-17 Lam Research Corporation Remote detection of plating on wafer holding apparatus
US9746427B2 (en) 2013-02-15 2017-08-29 Novellus Systems, Inc. Detection of plating on wafer holding apparatus
US10211056B2 (en) 2014-04-25 2019-02-19 Mitsubishi Electric Corporation Semiconductor device manufacturing method
US10053793B2 (en) 2015-07-09 2018-08-21 Lam Research Corporation Integrated elastomeric lipseal and cup bottom for reducing wafer sticking
JP7059172B2 (ja) * 2018-12-21 2022-04-25 株式会社荏原製作所 基板ホルダのシールから液体を除去するための方法
JP7074937B1 (ja) * 2021-06-04 2022-05-24 株式会社荏原製作所 めっき装置
CN114308527B (zh) * 2021-11-09 2023-06-02 天芯互联科技有限公司 一种填胶装置及其填胶方法

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