JP2004079649A5 - - Google Patents

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Publication number
JP2004079649A5
JP2004079649A5 JP2002235425A JP2002235425A JP2004079649A5 JP 2004079649 A5 JP2004079649 A5 JP 2004079649A5 JP 2002235425 A JP2002235425 A JP 2002235425A JP 2002235425 A JP2002235425 A JP 2002235425A JP 2004079649 A5 JP2004079649 A5 JP 2004079649A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2002235425A
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JP2004079649A (ja
JP4039662B2 (ja
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Application filed filed Critical
Priority claimed from JP2002235425A external-priority patent/JP4039662B2/ja
Priority to JP2002235425A priority Critical patent/JP4039662B2/ja
Priority to KR1020057002149A priority patent/KR100737877B1/ko
Priority to DE60321015T priority patent/DE60321015D1/de
Priority to PCT/JP2003/010254 priority patent/WO2004016723A1/ja
Priority to AT03788086T priority patent/ATE395406T1/de
Priority to US10/522,717 priority patent/US7678200B2/en
Priority to EP03788086A priority patent/EP1541667B1/en
Priority to TW092122070A priority patent/TWI224526B/zh
Publication of JP2004079649A publication Critical patent/JP2004079649A/ja
Publication of JP2004079649A5 publication Critical patent/JP2004079649A5/ja
Publication of JP4039662B2 publication Critical patent/JP4039662B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002235425A 2002-08-13 2002-08-13 半導体基板又は素子の洗浄方法 Expired - Lifetime JP4039662B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2002235425A JP4039662B2 (ja) 2002-08-13 2002-08-13 半導体基板又は素子の洗浄方法
EP03788086A EP1541667B1 (en) 2002-08-13 2003-08-11 Technique on ozone water for use in cleaning semiconductor substrate
DE60321015T DE60321015D1 (de) 2002-08-13 2003-08-11 Verwendung von ozonwasser beim reinigen von halbleitersubstrat
PCT/JP2003/010254 WO2004016723A1 (ja) 2002-08-13 2003-08-11 半導体基板洗浄用オゾン水技術
AT03788086T ATE395406T1 (de) 2002-08-13 2003-08-11 Verwendung von ozonwasser beim reinigen von halbleitersubstrat
US10/522,717 US7678200B2 (en) 2002-08-13 2003-08-11 Technique on ozone water for use in cleaning semiconductor substrate
KR1020057002149A KR100737877B1 (ko) 2002-08-13 2003-08-11 반도체기판 세정용 오존수 기술
TW092122070A TWI224526B (en) 2002-08-13 2003-08-12 Technique on ozone water for use in cleaning semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002235425A JP4039662B2 (ja) 2002-08-13 2002-08-13 半導体基板又は素子の洗浄方法

Publications (3)

Publication Number Publication Date
JP2004079649A JP2004079649A (ja) 2004-03-11
JP2004079649A5 true JP2004079649A5 (ja) 2005-09-29
JP4039662B2 JP4039662B2 (ja) 2008-01-30

Family

ID=31884377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002235425A Expired - Lifetime JP4039662B2 (ja) 2002-08-13 2002-08-13 半導体基板又は素子の洗浄方法

Country Status (8)

Country Link
US (1) US7678200B2 (ja)
EP (1) EP1541667B1 (ja)
JP (1) JP4039662B2 (ja)
KR (1) KR100737877B1 (ja)
AT (1) ATE395406T1 (ja)
DE (1) DE60321015D1 (ja)
TW (1) TWI224526B (ja)
WO (1) WO2004016723A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100349266C (zh) * 2004-07-23 2007-11-14 王文 高效能臭氧水清洗半导体晶圆的系统及其方法
JP2006073747A (ja) 2004-09-01 2006-03-16 Sumco Corp 半導体ウェーハの処理方法およびその装置
JP5638193B2 (ja) * 2007-11-09 2014-12-10 倉敷紡績株式会社 洗浄方法および洗浄装置
CN101875048A (zh) * 2010-06-30 2010-11-03 国电光伏(江苏)有限公司 一种去除硅片表面杂质的方法
KR101824785B1 (ko) 2013-04-30 2018-02-01 오르가노 코포레이션 구리 노출 기판의 세정 방법 및 세정 시스템
JP6177381B2 (ja) * 2016-05-10 2017-08-09 ヤンマー産業株式会社 ノズル
SG11202011443TA (en) * 2018-05-30 2020-12-30 Mitsubishi Electric Corp Membrane cleaning device and membrane cleaning method
TW202112452A (zh) * 2019-05-21 2021-04-01 日商東京威力科創股份有限公司 基板處理裝置及基板處理方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS645702A (en) * 1987-06-29 1989-01-10 Kobe Steel Ltd Turning tool
JPS6463685A (en) * 1987-09-04 1989-03-09 Toshiba Corp Scroll compressor
JPH0997440A (ja) * 1995-09-29 1997-04-08 Victor Co Of Japan Ltd 光学情報記録再生装置
JPH10116809A (ja) * 1996-10-11 1998-05-06 Tadahiro Omi 洗浄方法及び洗浄システム
JPH1129795A (ja) * 1997-07-08 1999-02-02 Kurita Water Ind Ltd 電子材料用洗浄水、その製造方法及び電子材料の洗浄方法
JPH11340182A (ja) * 1998-05-25 1999-12-10 Wako Pure Chem Ind Ltd 半導体表面洗浄剤及び洗浄方法
DE19825063A1 (de) * 1998-06-04 1999-12-09 Astex Sorbios Gmbh Verfahren zur Unterdrückung der Zerfallsgeschwindigkeit von Ozon in ultrareinem Wasser
JP2000037671A (ja) * 1998-07-24 2000-02-08 Mitsubishi Electric Corp 基板表面処理方法および装置
US6129849A (en) 1998-10-23 2000-10-10 Kansai Electric Power Co., Inc. Process for accelerating reaction of ozone with AM catalyst
JP2000147793A (ja) * 1998-11-12 2000-05-26 Mitsubishi Electric Corp フォトレジスト膜除去方法およびそのための装置
JP3509091B2 (ja) * 1998-12-10 2004-03-22 栗田工業株式会社 オゾン含有超純水の供給装置
JP2000331977A (ja) * 1999-05-20 2000-11-30 Kurita Water Ind Ltd 電子材料の洗浄方法
JP4354575B2 (ja) * 1999-06-15 2009-10-28 クロリンエンジニアズ株式会社 オゾン含有浄化液及びレジスト除去方法
JP2001035827A (ja) * 1999-07-16 2001-02-09 Memc Kk 高濃度オゾン水、同オゾン水の調製方法、および同オゾン水を使用した洗浄方法
JP3535820B2 (ja) * 2000-10-06 2004-06-07 エム・エフエスアイ株式会社 基板処理方法および基板処理装置
JP2002001243A (ja) * 2000-06-23 2002-01-08 Kurita Water Ind Ltd 電子材料の洗浄方法

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