JP2004079511A5 - - Google Patents

Download PDF

Info

Publication number
JP2004079511A5
JP2004079511A5 JP2003155741A JP2003155741A JP2004079511A5 JP 2004079511 A5 JP2004079511 A5 JP 2004079511A5 JP 2003155741 A JP2003155741 A JP 2003155741A JP 2003155741 A JP2003155741 A JP 2003155741A JP 2004079511 A5 JP2004079511 A5 JP 2004079511A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003155741A
Other languages
Japanese (ja)
Other versions
JP2004079511A (ja
JP5022557B2 (ja
Filing date
Publication date
Priority claimed from US10/159,790 external-priority patent/US6661009B1/en
Application filed filed Critical
Publication of JP2004079511A publication Critical patent/JP2004079511A/ja
Publication of JP2004079511A5 publication Critical patent/JP2004079511A5/ja
Application granted granted Critical
Publication of JP5022557B2 publication Critical patent/JP5022557B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2003155741A 2002-05-31 2003-05-30 ビームシステムのビームカラムを傾動する方法とその装置並びにビームシステム Expired - Fee Related JP5022557B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/159,790 2002-05-31
US10/159,790 US6661009B1 (en) 2002-05-31 2002-05-31 Apparatus for tilting a beam system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011061583A Division JP5485209B2 (ja) 2002-05-31 2011-03-02 ビームシステムのビームカラムを傾動する方法

Publications (3)

Publication Number Publication Date
JP2004079511A JP2004079511A (ja) 2004-03-11
JP2004079511A5 true JP2004079511A5 (zh) 2006-07-13
JP5022557B2 JP5022557B2 (ja) 2012-09-12

Family

ID=29419713

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2003155741A Expired - Fee Related JP5022557B2 (ja) 2002-05-31 2003-05-30 ビームシステムのビームカラムを傾動する方法とその装置並びにビームシステム
JP2011061583A Expired - Fee Related JP5485209B2 (ja) 2002-05-31 2011-03-02 ビームシステムのビームカラムを傾動する方法
JP2013096896A Expired - Fee Related JP5635645B2 (ja) 2002-05-31 2013-05-02 ビームシステムのビームカラムを傾動する装置並びにビームシステム

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2011061583A Expired - Fee Related JP5485209B2 (ja) 2002-05-31 2011-03-02 ビームシステムのビームカラムを傾動する方法
JP2013096896A Expired - Fee Related JP5635645B2 (ja) 2002-05-31 2013-05-02 ビームシステムのビームカラムを傾動する装置並びにビームシステム

Country Status (3)

Country Link
US (1) US6661009B1 (zh)
EP (1) EP1367629A3 (zh)
JP (3) JP5022557B2 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003211027A1 (en) 2002-03-27 2003-10-13 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
US20040051053A1 (en) * 2002-05-22 2004-03-18 Barletta William A. Universal pattern generator with multiplex addressing
US6661009B1 (en) * 2002-05-31 2003-12-09 Fei Company Apparatus for tilting a beam system
KR100664307B1 (ko) * 2004-08-13 2007-01-04 삼성전자주식회사 쉐도우 마스크, 및 이를 이용한 수직 테이퍼링 구조물제작방법
JP5033314B2 (ja) * 2004-09-29 2012-09-26 株式会社日立ハイテクノロジーズ イオンビーム加工装置及び加工方法
DE102005002006A1 (de) * 2005-01-15 2006-07-27 Kuratorium Offis E.V. Vorrichtung zur Herstellung von 3D-Strukturen
US7298495B2 (en) * 2005-06-23 2007-11-20 Lewis George C System and method for positioning an object through use of a rotating laser metrology system
JP2007164992A (ja) * 2005-12-09 2007-06-28 Sii Nanotechnology Inc 複合荷電粒子ビーム装置
JP2008157673A (ja) * 2006-12-21 2008-07-10 Sii Nanotechnology Inc 試料把持体の把持面作製方法
US8524139B2 (en) * 2009-08-10 2013-09-03 FEI Compay Gas-assisted laser ablation
WO2011132396A1 (en) 2010-04-20 2011-10-27 Panasonic Corporation A method for joining a film onto a substrate
JP5564346B2 (ja) * 2010-07-08 2014-07-30 株式会社キーエンス 拡大観察装置
US8766213B2 (en) 2012-09-07 2014-07-01 Fei Company Automated method for coincident alignment of a laser beam and a charged particle beam
KR101615513B1 (ko) 2014-06-17 2016-04-27 한국표준과학연구원 하전입자 빔 정렬 장치 및 이의 이용방법
CN104267288B (zh) * 2014-10-08 2017-08-25 国家电网公司 基于阀电压或阀电流的hvdc换相失败故障诊断方法
CN106783493B (zh) * 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58500134A (ja) * 1979-12-26 1983-01-20 バリアン・アソシエイツ・インコ−ポレイテツド 空気ベアリングを分離させるためのプレ−ナ真空シ−ル
US4465934A (en) 1981-01-23 1984-08-14 Veeco Instruments Inc. Parallel charged particle beam exposure system
JPS57132657A (en) * 1981-02-06 1982-08-17 Akashi Seisakusho Co Ltd Inclined moving body tube type scanning electron microscope and its similar apparatus
JPS57194531A (en) * 1981-05-26 1982-11-30 Toshiba Corp Electron beam transfer device
US4864228A (en) * 1985-03-15 1989-09-05 Fairchild Camera And Instrument Corporation Electron beam test probe for integrated circuit testing
US4706019A (en) * 1985-11-15 1987-11-10 Fairchild Camera And Instrument Corporation Electron beam test probe system for analyzing integrated circuits
JPH084090B2 (ja) 1986-08-27 1996-01-17 株式会社日立製作所 Ｉｃ配線の切断方法及び装置
DE3802598C1 (zh) * 1988-01-29 1989-04-13 Karl Heinz 3057 Neustadt De Stellmann
JPH0235725A (ja) 1988-07-26 1990-02-06 Matsushita Electric Ind Co Ltd ドライエッチング方法およびドライエッチング装置
US4891516A (en) * 1989-02-27 1990-01-02 Huntington Mechanical Laboratories, Inc. Device for axially and angularly positioning a beam or the like in a sealed chamber
KR910016054A (ko) 1990-02-23 1991-09-30 미다 가쓰시게 마이크로 전자 장치용 표면 처리 장치 및 그 방법
US5229607A (en) * 1990-04-19 1993-07-20 Hitachi, Ltd. Combination apparatus having a scanning electron microscope therein
JP2886649B2 (ja) 1990-09-27 1999-04-26 株式会社日立製作所 イオンビーム加工方法及びその装置
JP3113674B2 (ja) 1990-11-21 2000-12-04 株式会社日立製作所 荷電ビーム処理方法およびその装置
JPH0629251A (ja) 1992-07-13 1994-02-04 Matsushita Electron Corp 中性粒子ビームエッチング装置
JP2854466B2 (ja) * 1992-08-28 1999-02-03 株式会社日立製作所 荷電粒子線装置
JPH0778737A (ja) 1993-09-08 1995-03-20 Fujitsu Ltd 荷電粒子ビーム露光方法及び荷電粒子ビーム露光装置
JP3404090B2 (ja) * 1993-11-09 2003-05-06 株式会社日立製作所 電子顕微鏡用試料傾斜装置
US5576542A (en) 1993-12-08 1996-11-19 Kabushiki Kaisha Toshiba Substrate cross-section observing apparatus
DE4425090C1 (de) * 1994-07-15 1996-03-07 Saechsische Elektronenstrahl G Schwenkbare Elektronenkanone
US5541411A (en) 1995-07-06 1996-07-30 Fei Company Image-to-image registration focused ion beam system
JPH0933410A (ja) * 1995-07-25 1997-02-07 Matsushita Electric Ind Co Ltd 透過型電子顕微鏡観察用試料の加工方法およびそれに用いるイオンミリング装置
US5869833A (en) * 1997-01-16 1999-02-09 Kla-Tencor Corporation Electron beam dose control for scanning electron microscopy and critical dimension measurement instruments
US6039000A (en) 1998-02-11 2000-03-21 Micrion Corporation Focused particle beam systems and methods using a tilt column
JP2000208090A (ja) * 1999-01-13 2000-07-28 Sharp Corp 集束イオンビ―ム加工装置およびエッチング加工方法
JP3652912B2 (ja) * 1999-03-08 2005-05-25 日本電子株式会社 欠陥検査装置
JP2000306540A (ja) * 1999-04-16 2000-11-02 Nippon Steel Corp イオン注入装置におけるビーム電流測定装置
JP2001021334A (ja) * 1999-07-05 2001-01-26 Jeol Ltd 試料検査装置
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
JP2002093685A (ja) * 2000-09-19 2002-03-29 Nikon Corp ステージ装置及び露光装置
US6661009B1 (en) * 2002-05-31 2003-12-09 Fei Company Apparatus for tilting a beam system

Similar Documents

Publication Publication Date Title
BE2015C007I2 (zh)
BE2014C055I2 (zh)
BE2014C027I2 (zh)
BE2014C003I2 (zh)
BE2013C075I2 (zh)
BE2013C070I2 (zh)
BE2013C067I2 (zh)
BE2013C038I2 (zh)
BE2013C036I2 (zh)
BE2011C030I2 (zh)
JP2004088722A5 (zh)
JP2003322656A5 (zh)
BE2015C005I2 (zh)
BE2012C053I2 (zh)
JP2004040102A5 (zh)
JP2004148498A5 (zh)
JP2004205489A5 (zh)
JP2004028094A5 (zh)
JP2004065944A5 (zh)
JP2003291308A5 (zh)
JP2004004576A5 (zh)
JP2004212916A5 (zh)
JP2004007615A5 (zh)
JP2003347265A5 (zh)
JP2004118176A5 (zh)