JP2004078209A - 保持装置、露光装置及びデバイス製造方法 - Google Patents

保持装置、露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP2004078209A
JP2004078209A JP2003284530A JP2003284530A JP2004078209A JP 2004078209 A JP2004078209 A JP 2004078209A JP 2003284530 A JP2003284530 A JP 2003284530A JP 2003284530 A JP2003284530 A JP 2003284530A JP 2004078209 A JP2004078209 A JP 2004078209A
Authority
JP
Japan
Prior art keywords
holding device
groove
optical member
holding
grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003284530A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004078209A5 (enrdf_load_stackoverflow
Inventor
Yukio Takabayashi
高林　幸夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003284530A priority Critical patent/JP2004078209A/ja
Publication of JP2004078209A publication Critical patent/JP2004078209A/ja
Publication of JP2004078209A5 publication Critical patent/JP2004078209A5/ja
Withdrawn legal-status Critical Current

Links

Images

Landscapes

  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003284530A 2002-07-31 2003-07-31 保持装置、露光装置及びデバイス製造方法 Withdrawn JP2004078209A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003284530A JP2004078209A (ja) 2002-07-31 2003-07-31 保持装置、露光装置及びデバイス製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002224082 2002-07-31
JP2003284530A JP2004078209A (ja) 2002-07-31 2003-07-31 保持装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2004078209A true JP2004078209A (ja) 2004-03-11
JP2004078209A5 JP2004078209A5 (enrdf_load_stackoverflow) 2006-09-14

Family

ID=32032797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003284530A Withdrawn JP2004078209A (ja) 2002-07-31 2003-07-31 保持装置、露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2004078209A (enrdf_load_stackoverflow)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004343101A (ja) * 2003-04-25 2004-12-02 Canon Inc 駆動機構、それを有する露光装置、デバイスの製造方法
JP2007200958A (ja) * 2006-01-24 2007-08-09 Canon Inc 保持装置およびそれを用いた露光装置
JP2007532961A (ja) * 2004-04-13 2007-11-15 カール ツァイス エスエムテー アクチェンゲゼルシャフト 光学素子
EP1962124A1 (en) 2007-02-23 2008-08-27 Canon Kabushiki Kaisha Holding apparatus for holding object, exposure apparatus including the holding apparatus, and device manufacturing method using the exposure apparatus
JP2009021340A (ja) * 2007-07-11 2009-01-29 Canon Inc 露光装置
JP2011191436A (ja) * 2010-03-12 2011-09-29 Canon Inc 保持装置及び望遠鏡
JP2011242770A (ja) * 2010-05-12 2011-12-01 Carl Zeiss Smt Gmbh 光学構成体用の装置及び光学構成体の光学素子を位置決めする方法
JP2012186432A (ja) * 2011-02-18 2012-09-27 Gigaphoton Inc ミラー装置
JP2016009051A (ja) * 2014-06-24 2016-01-18 大学共同利用機関法人自然科学研究機構 キネマティック支持機構
JP2017194338A (ja) * 2016-04-20 2017-10-26 株式会社ミツトヨ 直線変位測定装置のスケール保持構造
KR20190124645A (ko) * 2018-04-26 2019-11-05 캐논 가부시끼가이샤 보유 지지 장치 및 광학 장치

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004343101A (ja) * 2003-04-25 2004-12-02 Canon Inc 駆動機構、それを有する露光装置、デバイスの製造方法
JP2007532961A (ja) * 2004-04-13 2007-11-15 カール ツァイス エスエムテー アクチェンゲゼルシャフト 光学素子
JP2007200958A (ja) * 2006-01-24 2007-08-09 Canon Inc 保持装置およびそれを用いた露光装置
US7352520B2 (en) 2006-01-24 2008-04-01 Canon Kabushiki Kaisha Holding device and exposure apparatus using the same
EP1962124A1 (en) 2007-02-23 2008-08-27 Canon Kabushiki Kaisha Holding apparatus for holding object, exposure apparatus including the holding apparatus, and device manufacturing method using the exposure apparatus
US7878665B2 (en) 2007-02-23 2011-02-01 Canon Kabushiki Kaisha Holding apparatus for holding optical element above a base, exposure apparatus including the holding apparatus, and device manufacturing method using the exposure apparatus
JP2009021340A (ja) * 2007-07-11 2009-01-29 Canon Inc 露光装置
US7626683B2 (en) 2007-07-11 2009-12-01 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP2011191436A (ja) * 2010-03-12 2011-09-29 Canon Inc 保持装置及び望遠鏡
JP2011242770A (ja) * 2010-05-12 2011-12-01 Carl Zeiss Smt Gmbh 光学構成体用の装置及び光学構成体の光学素子を位置決めする方法
US8665419B2 (en) 2010-05-12 2014-03-04 Carl Zeiss Smt Gmbh Device for an optical arrangement and method for positioning an optical element of an optical arrangement
JP2012186432A (ja) * 2011-02-18 2012-09-27 Gigaphoton Inc ミラー装置
US9046651B2 (en) 2011-02-18 2015-06-02 Gigaphoton Inc. Mirror device
US9229192B2 (en) 2011-02-18 2016-01-05 Gigaphoton Inc. Mirror device
JP2016009051A (ja) * 2014-06-24 2016-01-18 大学共同利用機関法人自然科学研究機構 キネマティック支持機構
JP2017194338A (ja) * 2016-04-20 2017-10-26 株式会社ミツトヨ 直線変位測定装置のスケール保持構造
KR20190124645A (ko) * 2018-04-26 2019-11-05 캐논 가부시끼가이샤 보유 지지 장치 및 광학 장치
KR102493919B1 (ko) 2018-04-26 2023-02-01 캐논 가부시끼가이샤 보유 지지 장치 및 광학 장치

Similar Documents

Publication Publication Date Title
US7253975B2 (en) Retainer, exposure apparatus, and device fabrication method
US7352520B2 (en) Holding device and exposure apparatus using the same
US7365826B2 (en) Projection optical system, exposure apparatus and method using the same
US20060164622A1 (en) Illumination apparatus, projection exposure apparatus, and device fabricating method
JP2005109158A (ja) 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
US6825998B2 (en) Retainer
JP2004252363A (ja) 反射型投影光学系
JP2004062091A (ja) 保持装置、露光装置及びデバイス製造方法
US6982841B2 (en) Mirror holding mechanism in exposure apparatus, and device manufacturing method
JP2004078209A (ja) 保持装置、露光装置及びデバイス製造方法
US20070188870A1 (en) Multilayer mirror manufacturing method, optical system manufacturing method, exposure apparatus, and device manufacturing method
JP2008112756A (ja) 光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
JP2002329655A (ja) 反射型縮小投影光学系、露光装置及びデバイス製造方法
US6909493B2 (en) Correction member, retainer, exposure apparatus, and device fabrication method
JP2003347193A (ja) 光学絞り装置、露光装置、デバイス製造方法、並びに、デバイス
JP3958261B2 (ja) 光学系の調整方法
JP4393227B2 (ja) 露光装置、デバイスの製造方法、露光装置の製造方法
JP4537087B2 (ja) 露光装置、デバイスの製造方法
JP2003021769A (ja) 光学素子保持装置、露光装置、デバイス製造方法及びデバイス
JP4393226B2 (ja) 光学系及びそれを用いた露光装置、デバイスの製造方法
US20250130504A1 (en) Optical element and projection exposure apparatus for semiconductor lithography
JP4438060B2 (ja) 投影光学系、露光装置及びデバイスの製造方法
JP4819419B2 (ja) 結像光学系、露光装置及びデバイス製造方法
US20100165313A1 (en) Mirror substrate, mirror, exposure apparatus, device manufacturing method, and mirror manufacturing method
KR20040103396A (ko) 노광장치 및 디바이스의 제조방법

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060727

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060727

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20081210