JP2004061884A - フォトマスク - Google Patents

フォトマスク Download PDF

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Publication number
JP2004061884A
JP2004061884A JP2002220420A JP2002220420A JP2004061884A JP 2004061884 A JP2004061884 A JP 2004061884A JP 2002220420 A JP2002220420 A JP 2002220420A JP 2002220420 A JP2002220420 A JP 2002220420A JP 2004061884 A JP2004061884 A JP 2004061884A
Authority
JP
Japan
Prior art keywords
photomask
mask pattern
conductive film
foreign matter
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002220420A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004061884A5 (enExample
Inventor
Youji Hata
端　庸児
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UMC Japan Co Ltd
Original Assignee
UMC Japan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UMC Japan Co Ltd filed Critical UMC Japan Co Ltd
Priority to JP2002220420A priority Critical patent/JP2004061884A/ja
Priority to US10/456,667 priority patent/US7074526B2/en
Priority to TW092115189A priority patent/TW200407662A/zh
Publication of JP2004061884A publication Critical patent/JP2004061884A/ja
Publication of JP2004061884A5 publication Critical patent/JP2004061884A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002220420A 2002-07-29 2002-07-29 フォトマスク Pending JP2004061884A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002220420A JP2004061884A (ja) 2002-07-29 2002-07-29 フォトマスク
US10/456,667 US7074526B2 (en) 2002-07-29 2003-06-05 Photomask covered with light-transmissive and electrically-conductive polymer material
TW092115189A TW200407662A (en) 2002-07-29 2003-06-05 Photomask covered with light-transmissive and electrically-conductive polymer material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002220420A JP2004061884A (ja) 2002-07-29 2002-07-29 フォトマスク

Publications (2)

Publication Number Publication Date
JP2004061884A true JP2004061884A (ja) 2004-02-26
JP2004061884A5 JP2004061884A5 (enExample) 2005-09-29

Family

ID=30768017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002220420A Pending JP2004061884A (ja) 2002-07-29 2002-07-29 フォトマスク

Country Status (3)

Country Link
US (1) US7074526B2 (enExample)
JP (1) JP2004061884A (enExample)
TW (1) TW200407662A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7691547B2 (en) 2006-03-16 2010-04-06 Microtome Precision, Inc. Reticle containing structures for sensing electric field exposure and a method for its use
JP6767601B1 (ja) * 2019-04-10 2020-10-14 Dic株式会社 フォトマスク

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7446661B2 (en) * 2006-06-28 2008-11-04 International Business Machines Corporation System and method for measuring RFID signal strength within shielded locations
US7723704B2 (en) * 2006-11-10 2010-05-25 Globalfoundries Inc. EUV pellicle with increased EUV light transmittance
CN112835266B (zh) * 2019-11-25 2022-12-02 夏泰鑫半导体(青岛)有限公司 一种光罩载台以及曝光装置
US12087605B2 (en) * 2020-09-30 2024-09-10 Gudeng Precision Industrial Co., Ltd. Reticle pod with antistatic capability
CN112650019A (zh) * 2021-01-23 2021-04-13 烟台正海科技股份有限公司 一种防静电铬版及其制备工艺

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3949131A (en) * 1974-06-19 1976-04-06 Bell Telephone Laboratories, Incorporated Photomasks with antistatic control
JPH08101497A (ja) * 1994-09-30 1996-04-16 Shin Etsu Chem Co Ltd ペリクル
JP2000012428A (ja) * 1998-06-19 2000-01-14 Canon Inc Ｘ線マスク構造体、該ｘ線マスク構造体を用いたｘ線露光方法、前記ｘ線マスク構造体を用いたｘ線露光装置、前記ｘ線マスク構造体を用いた半導体デバイスの製造方法、および該製造方法によって製造された半導体デバイス
US6635393B2 (en) * 2001-03-23 2003-10-21 Numerical Technologies, Inc. Blank for alternating PSM photomask with charge dissipation layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7691547B2 (en) 2006-03-16 2010-04-06 Microtome Precision, Inc. Reticle containing structures for sensing electric field exposure and a method for its use
JP6767601B1 (ja) * 2019-04-10 2020-10-14 Dic株式会社 フォトマスク

Also Published As

Publication number Publication date
US7074526B2 (en) 2006-07-11
TW200407662A (en) 2004-05-16
US20040018437A1 (en) 2004-01-29

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