JP2004026426A - Printed circuit board supporting structure, its loading device and robot hand - Google Patents

Printed circuit board supporting structure, its loading device and robot hand Download PDF

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Publication number
JP2004026426A
JP2004026426A JP2002186225A JP2002186225A JP2004026426A JP 2004026426 A JP2004026426 A JP 2004026426A JP 2002186225 A JP2002186225 A JP 2002186225A JP 2002186225 A JP2002186225 A JP 2002186225A JP 2004026426 A JP2004026426 A JP 2004026426A
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substrate
support
robot hand
supporting
vertical direction
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JP3929364B2 (en
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Hideki Tanaka
田中 秀樹
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Espec Corp
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Espec Corp
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Priority to KR1020030013907A priority patent/KR100570477B1/en
Priority to TW092105120A priority patent/TWI224575B/en
Priority to CNB031092292A priority patent/CN100436083C/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/062Easels, stands or shelves, e.g. castor-shelves, supporting means on vehicles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
  • Liquid Crystal (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide printed circuit board supporting structure, its loading device and a robot hand, which reduces the deflection during heat treatment substantially for improving the quality after the heat treatment. <P>SOLUTION: The printed circuit board supporting structure comprises a gondola 2, printed circuit board receivers 1 which are provided in multi stages in the gondola 2 and each of which supports a printed circuit board W at two points, and the robot hand 3, which is provided with a body section, which when inserted into the space between the board W, extends to the center section Wc between the board receivers 1 in the insertion direction, and an overhanging section, which is located in a space section between the boards W and extends to the position of the board receiver 1 in a lateral direction X so that the robot hand 3 does not interfere with the board receiver 1 in the insertion direction. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造とその積載装置及びロボットハンドに関し、特に、フラットパネルディスプレイ(FPD)や薄膜トランジスタ(TFT)等の液晶ガラス基板(LCD)の製造工程中の熱処理装置の基板支持技術として好都合に利用される。
【0002】
【従来の技術】
例えば、LCDの製造工程の一部分を構成するベークオーブン等の熱処理装置では、LCDガラス基板をゴンドラ等の積載容器に多段に積載し、積載容器を昇降可能にし、特定の一箇所からロボットハンドの進退動作と上下動の組み合わせで基板を出し入れしたり、積載容器を一定位置にして、ロボットハンドを昇降させて出し入れすべき基板位置に合わせ、その位置でロボットハンドを進退及び上下動させて基板の出し入れを行うようにしていた。
【0003】
この場合、従来では、通常、基板Wはロボットハンドの進退方向の複数箇所においてこれに直角な横方向の両端位置で支持されていた。又、基板の大型化に対応して、両端位置からある程度横方向の中心よりに入った位置を支持することもあった。なお、基板支持装置として工夫されたものとして、基板の各種大きさに対応できるように支持間隔を可変にした装置も知られているが(実開平7−23710号、特開平09−250885号公報参照)、この装置でも、基板の横の両端を支持する点では上記のものと同じであった。
【0004】
一方、このような基板支持装置に対応して、これを積載容器から出し入れするロボットのハンドは、基板の横幅に対応して安定して支持できるように、横方向の中心から両側の離れた位置に縦方向に二股に延ばした構造のものであった(例えば特開平9−234686号公報参照)。
【0005】
【発明が解決しようとする課題】しかしながら、このような基板支持装置では、例えば幅1mで長さ1.2m又はそれ以上にもなるような基板の大型化により、基板のたわみが大きくなってそれらが熱処理後の基板の品質に重大な影響を及ぼすおそれがあることが分かった。
【0006】
即ち、例えばTFT等では、電子回路の形成された基板とカラーフィルタの形成された基板とが分散された微小スペーサーを介在させて通常4μmの微小隙間δをもって仮貼り合わせされた状態で熱処理装置に搬入され、熱処理中の昇温により、両基板間の側端部分に予め付着されている溶剤が溶融した後固形化するように相変化をすることによって固着されているが、基板のたわみが大きくなると、上記δが全体的に精度良く形成されないという問題が生ずるおそれがある。
【0007】
例えば、上記δの許容値は通常4μm±0.1μmであるが、両基板のたわみが大きくなると、スペーサーの存在する所とこれから離れた所では局部的に隙間が変化し、0.1μm程度の値を容易に越えて、基板の固着・熱処理後に永久歪みとして残存する。又、相当程度たわんだ基板がそのまま貼り合わされて固着されると、これを平坦にしたときにも、局部的に間隔がばらついてくる。そして、上記基準を満たせないことになる。
【0008】
そのようなときには、製品化されたときに基板に形成される画像がひずんで見えることになる。更に、基板に大きなたわみがあると、一般的にも残留応力が生ずるような好ましくない現象が生ずることになる。
【0009】
そこで本発明は、従来技術における上記問題を解決し、熱処理時のたわみが大幅に低減され、熱処理後の品質を良くすることができる基板支持構造とその積載容器及びロボットハンドを提供することを課題とする。
【0010】
【課題を解決するための手段】本発明は上記課題を解決するために、請求項1の発明は、平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造において、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二箇所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする。
【0011】
請求項2の発明は、平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造の前記積載装置において、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二カ所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする。
【0012】
請求項3の発明は、平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造の前記ロボットハンドにおいて、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二カ所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする。
【0013】
【発明の実施の形態】図1乃至図5は本発明の基板支持構造を構成する積載装置の一例であるゴンドラとその基板受け及びロボットハンドの構造例を示し、図6は基板受けとロボットハンドとを組み合わせた状態を示す。これらの図に基づいて本発明を適用した基板支持構造を説明する。
【0014】
基板支持構造は、平板状の基板であるフラットパネルディスプレイ(FPD)や薄膜トランジスタ(TFT)等の液晶ガラス基板(LCD)(以下単に「基板W」という)の横方向Xの両側Wsを縦方向Yの複数位置として本例では4位置で支持可能な複数の支持部材として両側Wsの外側からそれぞれ4本の基板受け1を一定のピッチpで多段として本例では28段備えていて基板Wを支持可能な積載装置としてのゴンドラ2と、ピッチpの間で上下方向Zに昇降して基板Wを支持して縦方向Yに移動してゴンドラ2に出し入れ可能にするロボットハンド3とを有する。なお図1では、中間の基板受け1の図示を省略している。
【0015】
それぞれの基板受け1は、基板Wの両側Ws(図3では片側だけを図示)から中央の一部分の範囲である中央部分Wcまでの間である側部Wmで基板Wの二カ所以上の位置として本例では二カ所の位置P1 及びP2 を支持可能な支持部である受け座11、12を備えている。
【0016】
位置P1 、P2 は、側部Wmの中で両側Wsからそれぞれx1 、x2 の距離にあり、基板Wのたわみが十分小さくなるように適当な位置に定められる。この場合、複数の寸法の基板Wを取り扱う装置では、そのうちの最大寸法のもので定められる。例えば幅1000mmの基板では、x1 =100mm、x2 =350mm程度の寸法にされる。その場合には、Wc は300mmになる。なお、二箇所以上の位置として、P1 、P2 だけでなく三箇所以上又は連続支持にすることも可能である。
【0017】
このような基板受け1は、ゴンドラ2に立設された柱21にピン13a 等で固定され基板Wの中心方向に伸びた支持板13、これに取り付けられた受け板14及び15、それぞれの受け板の先端位置であり前記P1 、P2 位置に突設された前記受け座11、12、等によって形成されている。支持板13は通常ステンレス鋼でできていて、強度が高く基板Wの重量を支持しているときにも実質的に変形しないような寸法にされている。受け座11、12は基板Wを傷つけない材料として耐熱樹脂等でできている。なお、図3(c)に示す如く、基板受け1を多数組の一体構造にしてもよい。そのようにすれば、基板受けの生産性が上がると共に、柱21への取付状態をより安定させることができる。
【0018】
ゴンドラ2は、通常の枠組み構造のもので、8本設けられている前記柱21、これらが固定されている天板22及び底板23、四隅の枠材24、等によって構成されていて、図示しないブラケットや筋交い状部材等によって適当に補強されている。
【0019】
ロボットハンド3は、図4及び図5にそれぞれ構造例を示すように、縦部材としての本体板31及び横部材としての張出板32を有する。本体板31は、基板Wを出し入れするように図6にも示す如くゴンドラ2の基板受け1のピッチpの間に入れられたときに、中央の一部分の範囲内である前記中央部分Wcに縦方向Yに延設されていて、横方向Xの中心位置の近傍の範囲として本例では中心位置を支持可能な複数の中心支持部として本例では3個の中心受け座33を備えている。
【0020】
張出板32は、本体板31から横方向Xの両側に延設され先端部分に先端支持部としてY方向の前後端の吸着パッド34及び中間の受け座35を備えていて、4本の基板受け1の間の位置である縦間隔部分Dを含み基板受け1から縦方向Y及び昇降方向である前記上下方向Zに離れた位置に複数として本例ではそれぞれの縦間隔部分D内に3本設けられている。
【0021】
本体板31及び張出板32には、それぞれの吸着パッド34の空気吸引用の穴36が形成されている。ロボットハンド3はこれを三次元に動かす図示しないロボットに結合されていて、穴36はロボットを介して図示しない真空装置に結合されている。
【0022】
基板受け1とロボットハンド3とは、ピッチ間にハンドが挿入されたときには上記のような関係になるが、その状態は図6及び図5に部分的に示されている。上下方向Zでは、それぞれの寸法として、ピッチをp、基板受け1の厚みを含み基板支持位置までの必要な上下間寸法をt1 、ロボットハンド3の本体板31の厚みに中心受け座の高さを加えた本体板の必要厚み及びこれと同じである張出板32の吸着パッド34までの上下間寸法をt2 、吸着パッド34と基板受け1の下端位置との間の上寸法余裕をh1 、ロボットハンド3の下端位置とその下の基板Wとの間の下寸法余裕をh2 とすると、これらの寸法の関係式は、
1 +t2 +h1 +h2 =p−−−−−−−−−−(1)
にされる。これらの数値例については後述する。
【0023】
幅X方向では、基板Wの幅Bに対して、その両側Wsから基板受け1の支持点までの距離を前記の如くx1 、x2 、両側Wsから吸着パッド34又は受け座35までの距離をx3 とすれば、これらの距離は前記の如く基板Wのたわみを小さくするように定められる。又、ほぼ両側のx2 の間に相当する中央部分Wc の間隔をWc 、ロボットハンド3の本体板31の幅をBrとすれば、Brの寸法をWc の範囲まで大きくすることが可能である。
【0024】
縦Y方向では、基板Wの長さLに対して、基板受け1及びロボットハンド3の支持位置はそれぞれ図示のようなL1 、y、L2 、y、の寸法にされる。なお、基板受け1及びロボットハンド3の長さL方向の本数及び支持位置はある程度自由に決められるので、その方向のたわみが十分小さくなるように加減される。例えばY方向に基板受け1を5本にしてロボットハンドの張出部32を4本にすることも可能である。
【0025】
図7は以上のような基板支持構造が使用される装置の一つである熱処理装置の概略構成の一例を示す。
熱処理装置200は、断熱壁201、この中で図1等に示すゴンドラ2が昇降可能に入れられる熱処理室202、その下方に形成された機械スペース203、ゴンドラ2に取り付けられ機械スペース203に延設された昇降軸204、その昇降機構205、図示を省略している加熱器、循環送風機、高性能フィルタ、等を備えた通常の構造のものである。熱風は図において紙面に直角のX方向に流される。
【0026】
ゴンドラ1は前記の如く上下板と柱を基本構造としていて熱風がX方向を含み吹き抜けられるようになっている。断熱壁201には、一箇所又は図示のように左右二箇所或いはこれらを上下方向に位置を変えてもう二箇所追加装備されることがある出入口206が形成されていて、ロボットハンド3はこの出入口から基板Wを出し入れする。
【0027】
以上のような基板支持構造は通常次のように使用されてその作用効果を発揮する。
熱処理装置200のゴンドラ2にはロボットハンド3によって基板Wが図1では28段の基板受け1の全段に搭載され、その中を通常250℃程度の熱風が循環し、基板Wは熱風で加熱されて1タクトに1枚づつ熱処理を完了し、ロボットハンド3によって熱処理室202から搬出され、代わりに次に熱処理すべき基板Wが同じ出入口206又は図7のように対向する側の出入口206から搬入される。このような熱処理において、基板Wがソリッドなものでなく仮貼り合わせされた二層式基板である場合には、それらの二層の間に付着されている接着剤が溶融後固形化することにより、基板Wは完全に貼り合わされた完成状態になる。
【0028】
このような熱処理において、本発明を適用した基板受け1による基板Wの支持によれば、図6(b)に示すような16箇所の支持点配置により、幅1mを超えるような大型の基板であっても、最大たわみを従来の装置の場合よりも格段に小さい値である1mm以下にすることができる。又、本発明を適用したX方向に3点支持にするロボットハンド3においても、最大たわみを従来の二股式のハンドのそれに較べて十分小さい値である1.3mm程度以下にすることができる。
【0029】
これらについては、コンピュータのFEM計算プログラムによる計算結果によって以下のように確認された:
基板寸法     ;1250mm×1100mm×0.5 mm(長さL×幅B×厚み)
基板1枚の質量  ;18.6N
基板のヤング率  ;0.715MPa
基板受けの支持点 ;x=40mm   x=360mm   y= 145mm   L=310mm
基板受けで支持したときの基板のたわみ
たわみ量;最大 0.22mm
最大たわみ及びこれに近いたわみの発生した位置;
図6(b)に示すA点やロボットハンドの33〜35 の支持位置など、受け座11及び12の何れからも遠く離れた位置
ロボットハンドの支持点;
図6(b)においてx=120mm 、x=中心=550mm、y =225mm 、L=400mmの寸法位置になっている中心受け座33、吸着パッド34及び中間の受け座35の合計6点
ロボットハンドで支持したときの基板のたわみ
たわみ量;最大1.33mm
最大たわみの発生位置;四隅位置
上記において、基板Wの厚みは実際には1mmであるが、二層式基板を熱処理装置によって貼り合わせるときには、基板が昇温して接着材が溶けて、基板強度が二層合体時の1mm厚さの強度にならない状態があるため、上記計算では安全性を考慮して基板厚みを1枚分の0.5mmとしている。
【0030】
以上の計算結果により、基板受けで支持したときの基板Wのたわみは十分小さい値になることが確認された。基板の熱処理中に基板にたわみがあると、その状態で二層のガラスが固着されて一体化されるため、上記の如く基板のたわみが極めて小さい値に最小化することにより、熱処理時の安全性の確保と共に、製品としての基板の品質を良くすることができた。
【0031】
なお、支持点の位置をいろいろ変更すれば当然たわみも変わってくるが、ある程度バランス良く支持点を配置すれば、たわみが問題になるということは全くない。又、必要に応じてY方向に基板受け1の数を加減することも可能である。
【0032】
上記において、基板受けで支持したときに較べてロボットハンドで支持したときのたわみが大きくなっているが、図5(b)にロボットハンドの上下の間隔寸法の一例を示す如く、上記の1.3mm程度のたわみがあっても、ロボットハンドの基板間への挿抜時の安全性は確保される。
【0033】
なお、ロボットハンドによる基板搬送時には、二層式基板の上下間が接着剤で固着された状態になっていて、基板は一体化された強度に近い強度を有するため、実際にはたわみが上記の数分の1になる。従って、ロボットハンドの基板間への挿抜時の安全性は全く問題にならない。更に、ロボットハンドによる基板の取り扱い時には、そのたわみが基板の品質に直接影響しないため、この点からも、上記程度のたわみは問題にならない。
【0034】
これに対して従来の基板支持構造では、図8に示す如く、極めて大きなたわみが発生していた。即ち、長さL=1200mmで幅1100mm(図では中心線Oから半分の550mmを示している)の基板Wにおいて、図6のx1 の支持点P1 に対応する基板受け1´のx1 ´=170mmの位置の支持点P1 ´だけを支持しているが、そのときのX方向の中心位置O上のたわみは14.68mmであった。そして、支持点P1 ´に発生する大きなたわみ角により、基板の端Wsでは上向きのマイナスたわみが9.46mm出ていた。
【0035】
このように従来の基板受けでは、ロボットハンド3´は二股形状になっていて(図では左側のものだけを図示)、それぞれ基板Wの端Wsから210mmの位置に挿入されていていた。そして、このハンドの寸法は、この例の如く通常幅50mmで厚み16mmにされていて、基板支持ピッチp=40mmに対して、挿入されたときの基板Wとの上下間隔は、基板Wのたわみの影響があって9.14mmになっていた。又、ロボットハンドで基板Wを支持したときの中心Oの位置及び端のたわみはそれぞれ4.15mm及び3.16mmであった。
【0036】
このような従来の基板支持構造に対して、本発明を適用した基板支持構造では、前記の如く基板受け1による基板支持において基板のたわみがほとんど問題にならない小さい値になるので、基板の出し入れ時にロボットハンド3を基板ピッチ内に挿入したときに、図6(a)に示すようにハンドの張出板32と基板受け1とがピッチ内で上下Z方向に重なった状態になるにもかかわらず、図5(b)にも示す如く、従来の基板支持構造のときと同じピッチ40mmを維持することができる。
【0037】
即ち、前式(1)において、基板受けの厚みに基づく寸法t1 は、基板受けの長さがx2 −x1 ’=190mm程度長さが長くなるが、基板受けの支持板13が通常強度的に十分余裕のあるステンレス鋼等でできているため、従来と同じ10mm以下の寸法で9mmもあれば十分であり、t2 は従来の本体板31の厚み16mmに対して12mmとして中心受け座の高さを1mmとして合計13mmとすることにより、同じピッチ=40mmにして上下の寸法余裕h1 及びh2 を共に9mmにすることができる。
【0038】
上記において、本体板31を12mmにすれば、従来のものより厚みが薄くなり、応力及びたわみがそれぞれ厚みの2乗及び3乗に比例して大きくなるため、たわみは約2.37倍になるが、本例のものでは幅Brが150mmになっていて、従来の二股ハンドの2本分の幅100mmよりも1.5培に大きくなっていてそれに比例してたわみが小さくなると共に、本体板31に部分的に張出板32が固定されていてこれがこの部分でX方向の断面二次モーメントを大幅に増大させていると共に補強効果を持つので、結局従来の二股ハンドと同程度の強度条件を備えることになる。なお、本体板31をもう1mm厚くしてh1 及びh2 をそれぞれ8.5mmにしても、後述するように何ら問題ない。
【0039】
又、本体板31が入ることになる基板Wの下の中央部分Wcは、幅1000mm程度の基板であれば通常300mm位の寸法になるので、本例の本体板の幅150mmを必要に応じて少なくとも250mm程度まで安全に大きくすることができ、それに比例して本体板の強度を上げたわみを小さくすることができる。
【0040】
本例では、前記の如くピッチ40mmでロボットハンド挿入時に上下にh1 =h2 =9mmづつ余裕が得られたが、この余裕は従来のものの9.14mmの余裕よりも確実性や信頼性の高い値である。即ち、従来の装置では基板が大きくたわむために、ゴンドラやロボットハンドの振動や挙動に対する余裕を大きく見る必要があるのに対して、本例の構造では、基板がたわまないため、寸法余裕が機械的な寸法関係によって定められる確実性の高いものであり、信頼できる値である。又、ロボットハンド3で基板を支持するときにも、たわみ1.2mm以下で従来の4.15mmの1/3以下になっていて、この点でも寸法余裕においてプラスになっている。
【0041】
その結果、前記の如く基板受け1とハンドの張出板31とを上下方向にラップさせて基板のたわみを実質的に最小化した効果により、結局ピッチ寸法を従来通りに維持することができた。
【0042】
全ての基板Wがゴンドラ2に搭載されて1枚の基板Wの熱処理時間が経過すると、熱処理の完了したその基板Wが取り出され、新たに熱処理されるべき基板Wが搬入される。このときには、図5及び図6に示す如く、基板W1 とW2 との間隔部分であるピッチp内にこれらの基板に平行に縦方向YのY1 方向にロボットハンド3が挿入されて図示の状態になる。このとき、上記の如く例えばピッチが40mmの装置においてロボットハンド3の上下寸法余裕h1 、h2 がそれぞれ9mmあるので、ハンド挿入時の安全性が確保される。
【0043】
この状態から、ロボットハンド3が図において矢印で示すように上方Z1 に1ピッチ上昇し、その途中でその本体板31の中心受け座33及び張出板32の吸着パッド34及び受け座35が熱処理の終了した基板W1 に接触してこれを乗せ、支持及び吸着支持して1ピッチ上の基板間隔位置まで持ち上げる。
【0044】
このとき、本体板31はX方向において基板受け1の間隔部分になっている中央部分Wc の位置にあるので、基板受け1と干渉することなくそのまま上昇することができる。又、張出板32は縦間隔部分Dの位置に来ているので、同様に基板受け1と干渉することなくこれらの間をそのまま上昇することができる。
【0045】
この状態から、基板W1 を支持したロボットハンド3がY2 方向に退避し、基板W1 を熱処理装置200から搬出し、次の製造工程に送り出す。このとき、ロボットハンド3に支持された基板W1 のたわみが、従来のハンドで支持されたときの1/3以下の小さい値になっているので、搬出時の安全性が一層向上している。
【0046】
基板W1 が搬出されると、次に熱処理されるべき基板Wが搬入され、基板W1 の載っていた基板受け1に搭載される。このときには、搬出時と対称的な動作になる。そして、搬出時と同様に動作の安全性が確保される。
【0047】
以上のような熱処理において、本発明を適用した本例の基板支持構造によれば、基板Wは、搬入、搬出時にロボットハンドで支持されているとき、及び熱処理中に基板受け1に支持されているときの全てのときにおいて、ほとんどたわみのない良好な形状になっているので、例えば微小隙間δ=4μm±0.1μmという許容範囲を持つ二層式構造の基板であっても、δが許容範囲に入る精度で熱処理することができる。
【0048】
これに対して従来の基板支持構造では、基板Wのたわみが大きいので、基板Wは、仮貼り付け時の平坦な状態から、熱処理後には、隙間部分が部分的に固着されて最終的にたわんだ状態で完成され、熱処理後の他の処理や製品として使用されるときに再びフラットパネルにされるため、隙間部分にスペーサーが介装されていても、スペーサーの間隔部分では微小な不等変形が生じ、微小隙間δが上記の許容範囲に入らなくなる。本発明を適用した本例の基板支持構造では、熱処理の全過程において基板Wに殆どたわみが生じないので、この問題が確実に解決される。
【0049】
以上の如く本発明は二層構造の基板に特に好都合に適用されるが、通常の基板Wであっても、寸法が大きく従来の基板支持構造ではたわみが大きくなるものに対しても効果的に使用される。即ち、たわみのない状態で熱処理を終了できるので、これをフラットパネル製品として使用するときに、何ら外力を加えることなくそのまま平面度が得られること、従って、曲がった基板を平面状に変形させる必要がなく材料に残留応力やひずみが残らないこと、又表面の平面精度が良くなること、熱処理時やその他の操作において取扱性が良く安全性が高くなること、等の諸作用効果を得ることができる。
【0050】
なお以上では、積載装置がゴンドラである場合について説明したが、積載装置はこのように昇降されるものに限られず,熱処理装置内の一定位置に置かれる可搬式基板支持ラックや、熱処理装置に組み付けられたラック装置等であってもよいことは勿論である。
【0051】
【発明の効果】以上の如く本発明によれば、請求項1の発明においては、所定の構成を備えた積載装置とロボットハンドとを有する基板支持構造において、積載装置の支持部材が、基板の両側から中央の一部分の範囲までの間で基板の二カ所以上の位置を支持可能な支持部を備えているので、基板の横方向を少なくとも4点支持することにより、支持間隔を十分短くすると共に支持点からのオーバーハング量を短くし、基板の横方向のたわみを十分小さい値にすることができる。又、縦方向では必要に応じて支持部材の数を自由に増減できるので、縦方向のたわみを問題のない値にすることは当然に可能である。従って、全体としての基板のたわみを十分小さい値にすることができる。
【0052】
その結果、二層貼り合わせ構造の基板であっても、熱処理後にフラットパネルとして使用されるときの二層間の微小隙間を許容範囲内に維持し、欠陥のない良好なフラットパネル製品にすることができる。又、通常のソリッドな大サイズの基板であっても、そのたわみを十分小さくすることにより、フラットパネル製品としての平面度や表面状態を良くし、又熱処理時やその他の操作における取扱性を良くして安全性を高めることができる。
【0053】
又、ロボットハンドが縦部材を備えていて、この部材を、基板を出し入れするときにそのピッチの間に入れられたときに、基板の中央の一部分の範囲内に縦方向に延設されていて横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた構造にするので、ロボットハンドが基板の搬出・搬入時に基板間隔内に入れられたときに、そのまま上下方向に昇降でき、上昇時には中心支持部によって基板の中心位置を支持することができる。
【0054】
更に、ロボットハンドが横部材を備えていて、この部材を、縦部材から横方向の両側に延設され先端部分に先端支持部を備えていて複数の支持部材の間の位置を含み支持部材から縦方向及び昇降方向に離れた位置に複数設けるので、先端支持部により、横方向で支持部材とオーバーラップする位置であっても中心から必要なだけ離れた両側の二点で基板を受けることができる。従って、縦部材と共に、横方向に基板を3点支持することができる。その結果、従来の二股式の二点支持のハンドに較べて、横方向の支持状態を良くしたわみを大幅に小さくすることができる。その結果、ロボットハンドで支持する基板の搬入・搬出の一時期であってもたわみを十分小さくし、前記作用効果を確保することができる。
【0055】
又、横部材が支持部材から縦方向に離れた位置に複数設けられているので、横方向で支持部材とオーバーラップしていても、ロボットハンドの昇降時に支持部材と干渉することなく昇降することができる。従って、ロボットハンドは、昇降と縦方向への進退とにより、基板を搬入及び搬出することができる。
【0056】
この場合、横部材と支持部材とは横方向でオーバーラップするため、ロボットハンドを縦方向に基板間隔部分に挿入するときには、両者を上下方向にずらせる必要があるが、基板にたわみがないと共に縦部材が中央の一部分にあって一部分が通常適当に広い寸法にされるため、縦部材の幅を広くして厚みを小さくすることにより、上下方向に占める高さ距離を小さくすることができる。又、縦部材に対して横部材が補強材になるため、この点でも縦部材の厚みを薄くすることができる。更に、たわみがないために、ロボットハンドが基板間隔内に入れられたときに、支持部材及び基板との間隔寸法が確実に得られると共に動的な余裕をそれ程考慮する必要がないことから、結局従来採用されている基板間隔を広げることなく、積載装置を構成することができる。
【0057】
その結果、請求項1の発明の基板支持構造によれば、熱処理能力を従来と同等に維持して、熱処理後の基板の製品性能を格段に向上させることができる。
【0058】
請求項2又は3の発明においては、上記のような作用効果を備えた基板支持構造を構成する積載装置又はロボットハンドを提供することができる。
【図面の簡単な説明】
【図1】本発明の基板支持構造が適用された積載装置の一例であるゴンドラの正面図である。
【図2】上記装置の平面図である。
【図3】上記装置の基板受けの構成例を示し、(a)は平面図、(b)は側面図、(c)は多数組にしたときの側面図である。
【図4】上記基板支持構造を構成するロボットハンドの構造例を示し、(a)乃至(d)はそれぞれ、平面図、側面図、吸着パッドの側面図、及び受け座の側面図である。
【図5】ロボットハンドの他の例を示し、(a)は斜視図で(b)は基板間隔に入れられた状態を示す一部分の側面図である。
【図6】基板受けとロボットハンドとを組合せた状態を示し、(a)は側面図で(b)は平面図である。
【図7】前記装置が設けられる熱処理装置の概略構成例を示す説明図である。
【図8】従来の基板支持構造における基板のたわみ状態を示す説明図である。
【符号の説明】
1       基板受け(支持部材)
2       ゴンドラ(積載装置)
3       ロボットハンド
11、12   受け座(支持部)
31      本体板(縦部材)
32      張出板(横部材)
33      中心受け座(中心支持部)
34      吸着パッド(先端支持部)
35      受け座(先端支持部)
D       縦間隔部分(支持部材の間の位置)
p       ピッチ(一定のピッチ)
1 ,P2    二カ所の位置(二箇所以上の位置)
W       基板
Wc      中央部分(中央の一部分の範囲)
Wm      側部(中央の一部分の範囲までの間)
Ws      両側
X       横方向
Y       縦方向
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention includes a plurality of support members capable of supporting both sides in a horizontal direction of a flat substrate at a plurality of positions in a vertical direction at a constant pitch in a multi-stage manner, between a loading device capable of supporting the substrate and the pitch. More particularly, the present invention relates to a substrate supporting structure having a robot hand which supports the substrate by moving up and down and moves in the vertical direction to be able to move in and out of the loading device, and the loading device and the robot hand, and in particular, a flat panel display (FPD) It is conveniently used as a substrate support technology of a heat treatment apparatus during a manufacturing process of a liquid crystal glass substrate (LCD) such as a thin film transistor (TFT) or the like.
[0002]
[Prior art]
For example, in a heat treatment apparatus such as a bake oven which constitutes a part of an LCD manufacturing process, an LCD glass substrate is stacked on a loading container such as a gondola in multiple stages, the loading container can be moved up and down, and the robot hand moves forward and backward from a specific location. Move the robot in and out of the board by moving the robot hand up and down to the position of the board to be loaded and unloaded, and moving the robot hand up and down and up and down at that position. Had to do.
[0003]
In this case, in the related art, the substrate W is usually supported at a plurality of positions in the advancing / retreating direction of the robot hand at both end positions in the horizontal direction perpendicular to the plurality of positions. In addition, in order to cope with an increase in the size of the substrate, a position which is located at a certain distance from the center in the lateral direction from both ends may be supported. As a device devised as a substrate supporting device, there is also known a device in which a supporting interval is variable so as to be able to correspond to various sizes of a substrate (Japanese Utility Model Laid-Open No. 7-23710 and Japanese Patent Application Laid-Open No. 09-250885). This device was also the same as the above device in that both lateral sides of the substrate were supported.
[0004]
On the other hand, in response to such a substrate supporting apparatus, the hand of the robot which takes it in and out of the loading container is positioned at both sides away from the center in the lateral direction so that it can be stably supported according to the lateral width of the substrate. (See, for example, JP-A-9-234686).
[0005]
However, in such a substrate supporting apparatus, the size of the substrate is increased to, for example, 1 m in width and 1.2 m or more in length, so that the deflection of the substrate is increased. Has a significant influence on the quality of the substrate after the heat treatment.
[0006]
That is, for example, in the case of a TFT or the like, a substrate on which an electronic circuit is formed and a substrate on which a color filter is formed are temporarily bonded to each other with a minute gap δ of 4 μm therebetween through a minute spacer dispersed in a heat treatment apparatus. It is carried in and is fixed by a phase change such that the solvent previously attached to the side edge portion between the two substrates is melted and then solidified due to the temperature rise during the heat treatment, but the deflection of the substrate is large. Then, there is a possibility that the problem that the above δ is not formed with high accuracy as a whole may occur.
[0007]
For example, the allowable value of the above δ is usually 4 μm ± 0.1 μm, but when the deflection of both substrates becomes large, the gap locally changes between the place where the spacer exists and the place away from the spacer, and is about 0.1 μm. It easily exceeds the value and remains as permanent strain after fixing and heat treatment of the substrate. Further, if a substrate that has been deflected to a considerable extent is stuck and fixed as it is, even when the substrate is flattened, the distance locally varies. Then, the above criteria cannot be satisfied.
[0008]
In such a case, an image formed on the substrate when the product is manufactured is distorted. In addition, large deflections in the substrate generally lead to undesirable phenomena, such as residual stresses.
[0009]
Therefore, the present invention has been made to solve the above-mentioned problems in the prior art, and to provide a substrate support structure, a loading container and a robot hand, which can greatly reduce the deflection during heat treatment and improve the quality after heat treatment. And
[0010]
In order to solve the above-mentioned problems, the present invention is directed to a support member for supporting a flat plate-shaped substrate at a plurality of vertical positions on both lateral sides at a plurality of vertical positions. A loading device that is provided in multiple stages at a fixed pitch and that can move up and down between the pitch to support the substrate and move in the vertical direction while supporting the substrate so as to be able to move in and out of the loading device And a substrate support structure having
The support member includes a support portion that can support two or more positions of the substrate from the both sides to a range of a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
It is characterized by the following.
[0011]
The invention according to claim 2 is a stacking device capable of supporting the substrate by providing a plurality of support members capable of supporting both sides in the horizontal direction of the flat substrate at a plurality of positions in the vertical direction at a constant pitch in multiple stages. A robot hand that moves up and down between pitches to support the substrate and move in the vertical direction so as to be able to be taken in and out of the loading device.
The support member includes a support portion capable of supporting two or more positions of the substrate from the both sides to a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
It is characterized by the following.
[0012]
The invention according to claim 3 is a stacking device capable of supporting the substrate by providing a plurality of supporting members capable of supporting both lateral sides of the flat substrate at a plurality of vertical positions at a constant pitch in multiple stages. A robot hand that moves up and down between pitches to support the substrate and move in the vertical direction to be able to move in and out of the loading device.
The support member includes a support portion capable of supporting two or more positions of the substrate from the both sides to a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
It is characterized by the following.
[0013]
1 to 5 show an example of the structure of a gondola as an example of a loading device constituting a substrate supporting structure of the present invention, its substrate receiver and a robot hand, and FIG. 6 shows the substrate receiver and a robot hand. This shows a state in which is combined with. The substrate support structure to which the present invention is applied will be described based on these drawings.
[0014]
The substrate supporting structure is configured such that both sides Ws in a horizontal direction X of a liquid crystal glass substrate (LCD) such as a flat panel display (FPD) or a thin film transistor (TFT) which is a flat substrate are referred to as a vertical direction Y In the present example, the substrate W is provided as a plurality of support members that can be supported at four positions in the present example, and is provided with 28 stages in the present example as four stages of four substrate receivers 1 each having a fixed pitch p from the outside of both sides Ws. It has a gondola 2 as a possible loading device, and a robot hand 3 that moves up and down in the vertical direction Z between pitches p to support the substrate W and move in the vertical direction Y so that it can be put in and out of the gondola 2. In FIG. 1, the illustration of the intermediate substrate receiver 1 is omitted.
[0015]
Each of the substrate receivers 1 has two or more positions of the substrate W at a side portion Wm between both sides Ws of the substrate W (only one side is shown in FIG. 3) and a central portion Wc which is a part of the center. In this example, two positions P 1 And P 2 Are provided as receiving portions 11 and 12 which are support portions capable of supporting the supporting member.
[0016]
Position P 1 , P 2 Is x from both sides Ws in side Wm respectively. 1 , X 2 And is set at an appropriate position so that the deflection of the substrate W is sufficiently small. In this case, in an apparatus that handles substrates W of a plurality of sizes, the size of the device is determined by the largest one of the sizes. For example, for a substrate having a width of 1000 mm, x 1 = 100mm, x 2 = 350 mm. In that case, Wc is 300 mm. In addition, as two or more positions, P 1 , P 2 However, it is also possible to provide three or more or continuous supports.
[0017]
Such a substrate receiver 1 is composed of a support plate 13 fixed to a pillar 21 erected on a gondola 2 with pins 13a or the like and extending in the center direction of the substrate W, receiving plates 14 and 15 attached thereto, The position of the tip of the plate 1 , P 2 It is formed by the receiving seats 11, 12, etc. protruding at positions. The support plate 13 is usually made of stainless steel, and has such a high strength that it is not substantially deformed even when supporting the weight of the substrate W. The receiving seats 11 and 12 are made of a heat-resistant resin or the like as a material that does not damage the substrate W. As shown in FIG. 3 (c), the substrate receiver 1 may have a multi-piece integrated structure. By doing so, the productivity of the substrate receiver can be increased, and the state of attachment to the column 21 can be further stabilized.
[0018]
The gondola 2 has a normal frame structure, and is composed of eight columns 21, a top plate 22 and a bottom plate 23 to which these columns 21 are fixed, frame members 24 at four corners, and the like, which are not shown. It is appropriately reinforced by brackets, bracing members, and the like.
[0019]
The robot hand 3 includes a main body plate 31 as a vertical member and an overhang plate 32 as a horizontal member, as shown in structural examples in FIGS. When the main body plate 31 is inserted between the pitches p of the substrate receivers 1 of the gondola 2 as shown in FIG. In the present embodiment, three center receiving seats 33 are provided as a plurality of center support portions extending in the direction Y and capable of supporting the center position as a range near the center position in the lateral direction X.
[0020]
The overhang plate 32 extends from the main body plate 31 on both sides in the lateral direction X, and has a suction pad 34 at the front and rear ends in the Y direction as a front end support portion and an intermediate receiving seat 35 as a front end support portion. In the present example, a plurality of three vertically spaced portions D are included in the longitudinally spaced portions D including the vertically spaced portions D between the receivers 1 in the vertical direction Y and the vertical direction Z as the vertically moving direction. Is provided.
[0021]
The main body plate 31 and the overhanging plate 32 are formed with air suction holes 36 of the respective suction pads 34. The robot hand 3 is connected to a robot (not shown) that moves the robot hand three-dimensionally, and the holes 36 are connected to a vacuum device (not shown) via the robot.
[0022]
The substrate receiver 1 and the robot hand 3 have the above-described relationship when the hand is inserted between the pitches, and this state is partially shown in FIGS. In the up-down direction Z, the pitch is p, and the required vertical dimension up to the substrate supporting position including the thickness of the substrate receiver 1 is t. 1 The required thickness of the main body plate obtained by adding the height of the center seat to the thickness of the main body plate 31 of the robot hand 3 and the same vertical dimension between the overhang plate 32 and the suction pad 34 as t 2 The upper dimension margin between the suction pad 34 and the lower end position of the substrate receiver 1 is given by h. 1 The lower dimension margin between the lower end position of the robot hand 3 and the substrate W thereunder is represented by h. 2 Then, the relational expression of these dimensions is
t 1 + T 2 + H 1 + H 2 = P-------------(-)
To be. Examples of these numerical values will be described later.
[0023]
In the width X direction, for the width B of the substrate W, the distance from both sides Ws to the support point of the substrate receiver 1 is defined as x as described above. 1 , X 2 And the distance from both sides Ws to suction pad 34 or receiving seat 35 is x 3 If so, these distances are determined so as to reduce the deflection of the substrate W as described above. Also, x on both sides 2 If the interval of the central portion Wc between them is Wc and the width of the main body plate 31 of the robot hand 3 is Br, it is possible to increase the dimension of Br to the range of Wc.
[0024]
In the vertical Y direction, the supporting positions of the substrate receiver 1 and the robot hand 3 are as shown in FIG. 1 , Y 1 , L 2 , Y 2 , The dimensions of Since the number and the supporting positions of the substrate receiver 1 and the robot hand 3 in the length L direction are freely determined to some extent, the deflection in that direction is adjusted so as to be sufficiently small. For example, it is possible to use five substrate receivers 1 in the Y direction and four overhang portions 32 of the robot hand.
[0025]
FIG. 7 shows an example of a schematic configuration of a heat treatment apparatus which is one of the apparatuses using the above-described substrate support structure.
The heat treatment apparatus 200 includes a heat insulation wall 201, a heat treatment chamber 202 in which the gondola 2 shown in FIG. 1 and the like can be moved up and down, a machine space 203 formed thereunder, and a machine space 203 attached to the gondola 2 and extending to the machine space 203. It has a normal structure including a lift shaft 204, a lift mechanism 205 thereof, a heater (not shown), a circulating blower, a high-performance filter, and the like. Hot air is flowed in the X direction perpendicular to the plane of the drawing.
[0026]
The gondola 1 has a basic structure of the upper and lower plates and columns as described above, so that hot air can be blown through including the X direction. The heat insulating wall 201 is formed with an entrance 206 which may be additionally provided at one location or at two locations on the left and right as shown in the figure or two locations at different locations in the vertical direction. The substrate W is taken in and out of the substrate.
[0027]
The above-described substrate support structure is generally used as follows and exerts its operational effects.
Substrates W are mounted on the gondola 2 of the heat treatment apparatus 200 by the robot hand 3 on all stages of the 28-stage substrate receiver 1 in FIG. Then, the heat treatment is completed one by one in one tact, and the substrate W to be subjected to the next heat treatment is carried out from the same entrance 206 or the entrance 206 on the opposite side as shown in FIG. It is carried in. In such a heat treatment, when the substrate W is not a solid substrate but a temporarily bonded two-layer substrate, the adhesive adhered between the two layers is solidified after melting. Then, the substrate W is in a completed state of being completely bonded.
[0028]
In such a heat treatment, according to the support of the substrate W by the substrate receiver 1 to which the present invention is applied, the arrangement of the 16 support points as shown in FIG. Even so, the maximum deflection can be made 1 mm or less, which is a value much smaller than that of the conventional device. Also, in the robot hand 3 to which the present invention is applied to support three points in the X direction, the maximum deflection can be reduced to about 1.3 mm or less, which is a value sufficiently smaller than that of the conventional bifurcated hand.
[0029]
These were confirmed as follows by the calculation results by the computer FEM calculation program:
Substrate dimensions: 1250 mm x 1100 mm x 0.5 mm (length L x width B x thickness)
Mass of one substrate; 18.6N
Substrate Young's modulus; 0.715 MPa
Support point of substrate receiver; x 1 = 40mm x 2 = 360mm y 1 = 145mm L 1 = 310mm
Deflection of board when supported by board receiver
Deflection: up to 0.22mm
The location of the maximum deflection and its close deflection;
A position far away from any of the receiving seats 11 and 12, such as a point A shown in FIG.
Robot hand support point;
In FIG. 6B, x 3 = 120mm, x 4 = Center = 550mm, y 2 = 225mm, L 2 = A total of 6 points of the center seat 33, the suction pad 34, and the middle seat 35 at the dimension position of 400mm
Deflection of board when supported by robot hand
Deflection: up to 1.33mm
Location of maximum deflection; Four corner positions
In the above description, the thickness of the substrate W is actually 1 mm. However, when a two-layer substrate is bonded by a heat treatment apparatus, the substrate is heated to melt the adhesive, and the substrate strength is 1 mm thickness when the two layers are combined. Since there is a state where the strength is not high, the thickness of the substrate is set to 0.5 mm for one substrate in consideration of safety in the above calculation.
[0030]
From the above calculation results, it was confirmed that the deflection of the substrate W when supported by the substrate receiver had a sufficiently small value. If the substrate bends during the heat treatment of the substrate, the two layers of glass are fixed and integrated in that state, so that the deflection of the substrate is minimized to an extremely small value as described above, thereby ensuring safety during the heat treatment. As a result, the quality of the substrate as a product could be improved.
[0031]
It is to be noted that, if the positions of the support points are variously changed, the deflection naturally changes, but if the support points are arranged in a well-balanced manner to some extent, the deflection does not become a problem at all. It is also possible to increase or decrease the number of substrate receivers 1 in the Y direction as needed.
[0032]
In the above description, the deflection when supported by the robot hand is larger than that when supported by the substrate receiver. As shown in FIG. Even if there is a deflection of about 3 mm, the safety at the time of inserting and removing the robot hand between the substrates is ensured.
[0033]
When the substrate is transported by the robot hand, the upper and lower portions of the two-layer substrate are fixed with an adhesive, and the substrate has a strength close to the integrated strength. That's a fraction. Therefore, safety at the time of inserting and removing the robot hand between the boards does not matter at all. Further, when the substrate is handled by the robot hand, the deflection does not directly affect the quality of the substrate, so that the above-described deflection is not a problem from this point.
[0034]
On the other hand, in the conventional substrate support structure, as shown in FIG. 8, an extremely large deflection occurred. That is, in a substrate W having a length L of 1200 mm and a width of 1100 mm (half of the center line O is shown as 550 mm in the drawing), x in FIG. 1 Support point P 1 X of the substrate receiver 1 'corresponding to 1 Support point P at the position of '= 170 mm 1 ', But the deflection at the center position O in the X direction at that time was 14.68 mm. And the support point P 1 Due to the large deflection angle occurring at the position '′, an upward negative deflection was 9.46 mm at the end Ws of the substrate.
[0035]
As described above, in the conventional substrate receiver, the robot hand 3 ′ has a bifurcated shape (only the left hand is shown in the figure) and is inserted at a position 210 mm from the end Ws of the substrate W. The dimensions of the hand are usually 50 mm in width and 16 mm in thickness, as in this example. For a substrate support pitch p = 40 mm, the vertical distance between the hand and the substrate W when inserted is the deflection of the substrate W. And 9.14 mm. In addition, when the substrate W was supported by the robot hand, the position of the center O and the deflection of the end were 4.15 mm and 3.16 mm, respectively.
[0036]
In contrast to such a conventional substrate supporting structure, in the substrate supporting structure to which the present invention is applied, the bending of the substrate in the substrate supporting by the substrate receiver 1 becomes a small value that hardly causes a problem as described above. When the robot hand 3 is inserted into the board pitch, the overhanging plate 32 of the hand and the board receiver 1 are overlapped in the vertical Z direction in the pitch as shown in FIG. As shown in FIG. 5B, the same pitch of 40 mm as that of the conventional substrate supporting structure can be maintained.
[0037]
That is, in the above equation (1), the dimension t based on the thickness of the substrate receiver 1 Is the length of the substrate receiver x 2 -X 1 '= 190 mm, but the length is about 190 mm longer. However, since the support plate 13 of the substrate receiver is usually made of stainless steel or the like with sufficient strength, it is sufficient if the dimensions are 10 mm or less and 9 mm as in the conventional case. , T 2 Is set to 12 mm with respect to the thickness 16 mm of the conventional main body plate 31 and the height of the center receiving seat is set to 1 mm to make a total of 13 mm. 1 And h 2 Can be both 9 mm.
[0038]
In the above, if the main body plate 31 is made 12 mm, the thickness becomes thinner than the conventional one, and the stress and the deflection increase in proportion to the square and the cube of the thickness, respectively, so that the deflection becomes about 2.37 times. However, in the present example, the width Br is 150 mm, which is 1.5 times larger than the width of 100 mm for two conventional forked hands, and the deflection is reduced in proportion thereto, and the body plate is also reduced. The overhanging plate 32 is partially fixed to the base 31, which greatly increases the second moment of area in the X direction and has a reinforcing effect, so that the strength condition is almost the same as that of the conventional bifurcated hand. Will be provided. The main body plate 31 is made 1 mm thicker and h 1 And h 2 Is 8.5 mm, there is no problem as described later.
[0039]
In addition, the central portion Wc under the substrate W into which the main body plate 31 enters is usually about 300 mm in the case of a substrate having a width of about 1000 mm. The height can be increased safely to at least about 250 mm, and the strength of the main body plate can be increased in proportion thereto, and the deflection can be reduced.
[0040]
In this example, when the robot hand is inserted at a pitch of 40 mm as described above, 1 = H 2 A margin of 9 mm was obtained, but this margin is a value with higher reliability and reliability than the conventional 9.14 mm margin. That is, in the conventional apparatus, the substrate is largely bent, so that it is necessary to take a large margin for the vibration and the behavior of the gondola and the robot hand. Is highly reliable determined by the mechanical dimensional relationship, and is a reliable value. Also, when the substrate is supported by the robot hand 3, the deflection is 1.2 mm or less, which is 1/3 or less of the conventional 4.15 mm, and this point is also a plus in the dimensional margin.
[0041]
As a result, the pitch dimension can be maintained as before by the effect of substantially minimizing the deflection of the substrate by lapping the substrate receiver 1 and the overhanging plate 31 of the hand in the vertical direction as described above. .
[0042]
When all the substrates W have been mounted on the gondola 2 and the heat treatment time of one substrate W has elapsed, the substrate W which has been subjected to the heat treatment is taken out, and a new substrate W to be heat treated is carried in. At this time, as shown in FIG. 5 and FIG. 1 And W 2 Within the pitch p, which is the interval between 1 The robot hand 3 is inserted in the direction as shown in FIG. At this time, as described above, for example, in a device having a pitch of 40 mm, a vertical dimension margin h of the robot hand 3 is given. 1 , H 2 Are 9 mm each, so that safety at the time of hand insertion is ensured.
[0043]
From this state, the robot hand 3 moves upward Z as indicated by the arrow in the figure. 1 In the course of this, the center receiving seat 33 of the main body plate 31 and the suction pad 34 and the receiving seat 35 of the overhanging plate 32 move the substrate W after the heat treatment. 1 , And is lifted up to a substrate pitch one pitch higher by supporting and sucking.
[0044]
At this time, since the main body plate 31 is located at the position of the central portion Wc which is the space between the substrate receivers 1 in the X direction, the main body plate 31 can be lifted without interfering with the substrate receiver 1. Further, since the overhang plate 32 is located at the position of the vertical interval portion D, it is possible to ascend the space therebetween without interfering with the substrate receiver 1.
[0045]
From this state, the substrate W 1 Robot hand 3 supporting Y 2 Retreat in the direction 1 From the heat treatment apparatus 200 and sent out to the next manufacturing process. At this time, the substrate W supported by the robot hand 3 1 Has a smaller value of 1/3 or less of that of a conventional hand, so that the safety at the time of unloading is further improved.
[0046]
Substrate W 1 Is carried out, the next substrate W to be heat-treated is carried in, and the substrate W 1 Is mounted on the substrate receiver 1 on which the. At this time, the operation is symmetrical to that at the time of unloading. Then, the safety of the operation is ensured as in the case of carrying out.
[0047]
In the heat treatment as described above, according to the substrate support structure of the present example to which the present invention is applied, the substrate W is supported by the substrate receiver 1 when being carried in and out by the robot hand and during the heat treatment. In all cases, the substrate has a good shape with almost no deflection. Therefore, even if the substrate has a two-layer structure having an allowable range of, for example, a minute gap δ = 4 μm ± 0.1 μm, δ is allowable. Heat treatment can be performed with an accuracy within the range.
[0048]
On the other hand, in the conventional substrate supporting structure, since the substrate W has a large deflection, the substrate W is deformed from the flat state at the time of the temporary bonding to the final clearance after the heat treatment because the gap is partially fixed. Since it is completed in a flat state and is flattened again when it is used as another process or product after heat treatment, even if spacers are interposed in gaps, minute unequal deformation at spacers Occurs, and the minute gap δ does not fall within the above allowable range. In the substrate supporting structure of the present example to which the present invention is applied, the substrate W hardly bends in the entire process of the heat treatment, so that this problem is surely solved.
[0049]
As described above, the present invention is particularly advantageously applied to a substrate having a two-layer structure. However, even for a normal substrate W, it can be effectively applied to a substrate having a large size and a large deflection in a conventional substrate supporting structure. used. That is, since the heat treatment can be completed in a state without bending, when this is used as a flat panel product, flatness can be obtained without applying any external force, and therefore, it is necessary to deform a bent substrate into a flat shape. There are no residual stresses or strains on the material due to the absence of heat, and the various effects can be obtained, such as improved surface flatness, better handling during heat treatment and other operations, and higher safety. it can.
[0050]
In the above description, the case where the loading device is a gondola has been described. However, the loading device is not limited to the one that is lifted and lowered in this way, and is mounted on a portable substrate support rack that is placed at a fixed position in the heat treatment device or mounted on the heat treatment device. It goes without saying that a rack device or the like may be used.
[0051]
As described above, according to the present invention, in the first aspect of the present invention, in a substrate supporting structure having a loading device having a predetermined configuration and a robot hand, a support member of the loading device is provided with a substrate. Since it has a supporting portion capable of supporting two or more positions of the substrate from both sides to a part of the center, by supporting at least four points in the lateral direction of the substrate, the supporting interval can be sufficiently shortened. The amount of overhang from the support point can be reduced, and the lateral deflection of the substrate can be set to a sufficiently small value. In the vertical direction, the number of support members can be freely increased or decreased as necessary, so that it is naturally possible to set the vertical deflection to a value that does not cause any problem. Therefore, the deflection of the substrate as a whole can be set to a sufficiently small value.
[0052]
As a result, even if the substrate has a two-layer bonding structure, it is possible to maintain a fine gap between the two layers within an allowable range when used as a flat panel after heat treatment, and to provide a good flat panel product without defects. it can. In addition, even for a normal solid large-sized substrate, by reducing the deflection sufficiently, the flatness and surface condition of a flat panel product are improved, and the handleability during heat treatment and other operations is improved. Safety can be improved.
[0053]
Also, the robot hand includes a vertical member, and when the member is inserted between the pitches when the substrate is taken in and out, the member extends vertically within a part of the center of the substrate. With a structure with multiple center supports that can support the area near the center position in the horizontal direction, when the robot hand is placed within the board interval when loading and unloading the board, it moves up and down as it is It is possible to support the center position of the substrate by the center supporting portion during the ascent.
[0054]
Further, the robot hand has a horizontal member, and this member is provided on both ends in the horizontal direction from the vertical member and has a tip support portion at a tip portion, and includes a position between the plurality of support members, and Since a plurality of members are provided at positions separated in the vertical direction and the elevating direction, the tip support portion can receive the substrate at two points on both sides which are required to be away from the center even at a position overlapping the support member in the horizontal direction. it can. Therefore, the substrate can be supported at three points in the horizontal direction together with the vertical members. As a result, as compared with the conventional two-pronged two-point support hand, the deflection in which the lateral support is improved can be greatly reduced. As a result, the deflection can be made sufficiently small even at the time of loading / unloading the substrate supported by the robot hand, and the above-mentioned effects can be secured.
[0055]
In addition, since a plurality of horizontal members are provided at positions vertically separated from the support member, even if they overlap with the support member in the horizontal direction, they can move up and down without interfering with the support member when the robot hand moves up and down. Can be. Therefore, the robot hand can carry in and carry out the substrate by moving up and down and moving in the vertical direction.
[0056]
In this case, since the horizontal member and the support member overlap in the horizontal direction, when the robot hand is inserted into the space between the substrates in the vertical direction, it is necessary to shift the two in the vertical direction. Since the vertical member is located at a central portion and the portion is usually appropriately widened, it is possible to reduce the vertical distance occupied by increasing the width and reducing the thickness of the vertical member. In addition, since the horizontal member becomes a reinforcing member with respect to the vertical member, the thickness of the vertical member can be reduced also in this regard. Further, since there is no bending, when the robot hand is put in the space between the substrates, the distance between the support member and the substrate is reliably obtained, and it is not necessary to consider the dynamic allowance so much. The loading device can be configured without increasing the distance between the substrates conventionally used.
[0057]
As a result, according to the substrate supporting structure of the first aspect of the present invention, the heat treatment capability can be maintained at the same level as the conventional one, and the product performance of the substrate after the heat treatment can be remarkably improved.
[0058]
According to the second or third aspect of the present invention, it is possible to provide a loading device or a robot hand that constitutes a substrate support structure having the above-described functions and effects.
[Brief description of the drawings]
FIG. 1 is a front view of a gondola as an example of a loading device to which a substrate supporting structure of the present invention is applied.
FIG. 2 is a plan view of the device.
3A and 3B show a configuration example of a substrate receiver of the above-described apparatus, in which FIG. 3A is a plan view, FIG. 3B is a side view, and FIG.
FIGS. 4A to 4D are a plan view, a side view, a side view of a suction pad, and a side view of a receiving seat, respectively, showing a structural example of a robot hand constituting the substrate supporting structure.
5A and 5B show another example of the robot hand, in which FIG. 5A is a perspective view and FIG. 5B is a partial side view showing a state in which a substrate is inserted between the substrates.
6A and 6B show a state in which the substrate receiver and the robot hand are combined, wherein FIG. 6A is a side view and FIG. 6B is a plan view.
FIG. 7 is an explanatory diagram illustrating a schematic configuration example of a heat treatment apparatus provided with the apparatus.
FIG. 8 is an explanatory view showing a bent state of a substrate in a conventional substrate supporting structure.
[Explanation of symbols]
1 Substrate receiver (supporting member)
2 Gondola (loading device)
3 Robot hand
11, 12 Receiving seat (supporting part)
31 Body plate (vertical member)
32 Overhang plate (horizontal member)
33 center seat (center support)
34 Suction pad (tip support)
35 Receiving seat (tip support)
D Vertically spaced part (position between support members)
p pitch (constant pitch)
P 1 , P 2 Two locations (two or more locations)
W substrate
Wc Central part (part of central part)
Wm side (between partial area of center)
Ws both sides
X horizontal direction
Y vertical direction

Claims (3)

平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造において、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二箇所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする基板支持構造。
A plurality of supporting members capable of supporting both sides in the horizontal direction of the plate-shaped substrate at a plurality of positions in the vertical direction are provided in multiple stages at a fixed pitch, and the loading device capable of supporting the substrate and ascending and descending between the pitches A substrate supporting structure having a robot hand that supports the substrate and moves in the vertical direction to be able to be taken in and out of the loading device;
The support member includes a support portion that can support two or more positions of the substrate from the both sides to a range of a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
A substrate support structure characterized by the above-mentioned.
平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造の前記積載装置において、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二カ所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする基板支持構造の積載装置。
A plurality of supporting members capable of supporting both sides in the horizontal direction of the plate-shaped substrate at a plurality of positions in the vertical direction are provided in multiple stages at a fixed pitch, and the loading device capable of supporting the substrate and ascending and descending between the pitches A robot hand that supports the substrate and moves in the vertical direction to be able to be taken in and out of the loading device.
The support member includes a support portion capable of supporting two or more positions of the substrate from the both sides to a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
A loading device for a substrate supporting structure, characterized in that:
平板状の基板の横方向の両側を縦方向の複数位置で支持可能な複数の支持部材を一定のピッチで多段に備えていて前記基板を支持可能な積載装置と前記ピッチの間で昇降して前記基板を支持して前記縦方向に移動して前記積載装置に出し入れ可能にするロボットハンドとを有する基板支持構造の前記ロボットハンドにおいて、
前記支持部材は、前記両側から中央の一部分の範囲までの間で前記基板の二カ所以上の位置を支持可能な支持部を備えていて、
前記ロボットハンドは、前記基板を出し入れするときに前記ピッチの間に入れられたときに前記一部分の範囲内に前記縦方向に延設されていて前記横方向の中心位置の近傍の範囲を支持可能な複数の中心支持部を備えた縦部材と、該縦部材から前記横方向の両側に延設され先端部分に先端支持部を備えていて前記複数の支持部材の間の位置を含み前記支持部材から前記縦方向及び前記昇降方向に離れた位置に設けられた複数の横部材と、を有する、
ことを特徴とする基板支持構造のロボットハンド。
A plurality of supporting members capable of supporting both sides in the horizontal direction of the plate-shaped substrate at a plurality of positions in the vertical direction are provided in multiple stages at a fixed pitch, and the loading device capable of supporting the substrate and ascending and descending between the pitches A robot hand that supports the substrate and moves in the vertical direction to be able to be taken in and out of the loading device.
The support member includes a support portion capable of supporting two or more positions of the substrate from the both sides to a part of the center,
The robot hand extends in the vertical direction within the partial area when the substrate is inserted between the pitches when the substrate is taken in and out, and can support the area near the horizontal center position. A vertical member provided with a plurality of central support portions, and extending from the vertical member to both sides in the horizontal direction, including a tip support portion at a tip portion, and including a position between the plurality of support members. A plurality of horizontal members provided at positions separated from each other in the vertical direction and the elevating direction,
A robot hand having a substrate support structure, characterized in that:
JP2002186225A 2002-06-26 2002-06-26 Substrate support and loading / unloading device Expired - Fee Related JP3929364B2 (en)

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KR1020030013907A KR100570477B1 (en) 2002-06-26 2003-03-06 Supporting construction and loading equipment of substrate and robot hand
TW092105120A TWI224575B (en) 2002-06-26 2003-03-10 Supporting construction and loading equipment of substrate and robot hand
CNB031092292A CN100436083C (en) 2002-06-26 2003-04-03 Base plate supporting structure and loading device and mechanical arm

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