JP2003516691A - 可変負荷切換可能インピーダンス・マッチング・システム - Google Patents

可変負荷切換可能インピーダンス・マッチング・システム

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Publication number
JP2003516691A
JP2003516691A JP2001543853A JP2001543853A JP2003516691A JP 2003516691 A JP2003516691 A JP 2003516691A JP 2001543853 A JP2001543853 A JP 2001543853A JP 2001543853 A JP2001543853 A JP 2001543853A JP 2003516691 A JP2003516691 A JP 2003516691A
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JP
Japan
Prior art keywords
load
impedance
coupled
magnitude
capacitors
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2001543853A
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English (en)
Japanese (ja)
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JP2003516691A5 (enExample
Inventor
マヴレティック，アントン
ロヅィック，トミスラヴ
Original Assignee
アドバンスト・エナジーズ・ヴォアヒーズ・オペレーションズ
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Application filed by アドバンスト・エナジーズ・ヴォアヒーズ・オペレーションズ filed Critical アドバンスト・エナジーズ・ヴォアヒーズ・オペレーションズ
Publication of JP2003516691A publication Critical patent/JP2003516691A/ja
Publication of JP2003516691A5 publication Critical patent/JP2003516691A5/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2001543853A 1999-11-30 2000-11-30 可変負荷切換可能インピーダンス・マッチング・システム Pending JP2003516691A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/451,512 1999-11-30
US09/451,512 US6424232B1 (en) 1999-11-30 1999-11-30 Method and apparatus for matching a variable load impedance with an RF power generator impedance
PCT/US2000/042460 WO2001043282A1 (en) 1999-11-30 2000-11-30 Variable load switchable impedance matching system

Publications (2)

Publication Number Publication Date
JP2003516691A true JP2003516691A (ja) 2003-05-13
JP2003516691A5 JP2003516691A5 (enExample) 2008-01-31

Family

ID=23792528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001543853A Pending JP2003516691A (ja) 1999-11-30 2000-11-30 可変負荷切換可能インピーダンス・マッチング・システム

Country Status (6)

Country Link
US (1) US6424232B1 (enExample)
EP (1) EP1236275B1 (enExample)
JP (1) JP2003516691A (enExample)
AU (1) AU4511501A (enExample)
DE (1) DE60044612D1 (enExample)
WO (1) WO2001043282A1 (enExample)

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JP2009514176A (ja) * 2005-10-31 2009-04-02 エム ケー エス インストルメンツ インコーポレーテッド 無線周波数電力搬送システム
JP2013098177A (ja) * 2011-10-31 2013-05-20 Semes Co Ltd 基板処理装置及びインピーダンスマッチング方法
KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
US20150000842A1 (en) * 2012-02-20 2015-01-01 Tokyo Electron Limited Power supply system, plasma etching apparatus, and plasma etching method
JP2015167070A (ja) * 2014-03-03 2015-09-24 株式会社島津製作所 高周波電源装置
JP2023530361A (ja) * 2020-06-19 2023-07-14 トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト スイッチング可能なリアクタンスユニット、可変リアクタンス、ｈｆ発生器、及び、スイッチング可能なリアクタンスユニットを有するインピーダンス整合装置

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Cited By (11)

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Publication number Priority date Publication date Assignee Title
JP2009514176A (ja) * 2005-10-31 2009-04-02 エム ケー エス インストルメンツ インコーポレーテッド 無線周波数電力搬送システム
JP2013098177A (ja) * 2011-10-31 2013-05-20 Semes Co Ltd 基板処理装置及びインピーダンスマッチング方法
KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
US20150000842A1 (en) * 2012-02-20 2015-01-01 Tokyo Electron Limited Power supply system, plasma etching apparatus, and plasma etching method
US9922802B2 (en) * 2012-02-20 2018-03-20 Tokyo Electron Limited Power supply system, plasma etching apparatus, and plasma etching method
US10755894B2 (en) 2012-02-20 2020-08-25 Tokyo Electron Limited Power supply system
JP2015167070A (ja) * 2014-03-03 2015-09-24 株式会社島津製作所 高周波電源装置
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JP2023530361A (ja) * 2020-06-19 2023-07-14 トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト スイッチング可能なリアクタンスユニット、可変リアクタンス、ｈｆ発生器、及び、スイッチング可能なリアクタンスユニットを有するインピーダンス整合装置
JP7589262B2 (ja) 2020-06-19 2024-11-25 トゥルンプフ ヒュッティンガー ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフト スイッチング可能なリアクタンスユニット、可変リアクタンス、ｈｆ発生器、及び、スイッチング可能なリアクタンスユニットを有するインピーダンス整合装置
KR102887529B1 (ko) 2020-06-19 2025-11-17 트럼프 헛팅거 게엠베하 + 코 카게 스위칭 가능한 리액턴스 유닛, 가변 리액턴스, 고주파 전력 발생기, 및 스위칭 가능한 리액턴스 유닛을 갖는 임피던스 정합 조립체

Also Published As

Publication number Publication date
DE60044612D1 (de) 2010-08-12
EP1236275B1 (en) 2010-06-30
AU4511501A (en) 2001-06-18
EP1236275A4 (en) 2006-09-27
EP1236275A1 (en) 2002-09-04
US6424232B1 (en) 2002-07-23
WO2001043282A1 (en) 2001-06-14

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