AU4511501A - Variable load switchable impedance matching system - Google Patents

Variable load switchable impedance matching system

Info

Publication number
AU4511501A
AU4511501A AU45115/01A AU4511501A AU4511501A AU 4511501 A AU4511501 A AU 4511501A AU 45115/01 A AU45115/01 A AU 45115/01A AU 4511501 A AU4511501 A AU 4511501A AU 4511501 A AU4511501 A AU 4511501A
Authority
AU
Australia
Prior art keywords
impedance matching
matching system
variable load
switchable impedance
load switchable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU45115/01A
Other languages
English (en)
Inventor
Tomislav Lozic
Anton Mavretic
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energys Voorhees Operations
Original Assignee
Advanced Energys Voorhees Operations
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energys Voorhees Operations filed Critical Advanced Energys Voorhees Operations
Publication of AU4511501A publication Critical patent/AU4511501A/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks
    • H03H7/40—Automatic matching of load impedance to source impedance

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
AU45115/01A 1999-11-30 2000-11-30 Variable load switchable impedance matching system Abandoned AU4511501A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09451512 1999-11-30
US09/451,512 US6424232B1 (en) 1999-11-30 1999-11-30 Method and apparatus for matching a variable load impedance with an RF power generator impedance
PCT/US2000/042460 WO2001043282A1 (en) 1999-11-30 2000-11-30 Variable load switchable impedance matching system

Publications (1)

Publication Number Publication Date
AU4511501A true AU4511501A (en) 2001-06-18

Family

ID=23792528

Family Applications (1)

Application Number Title Priority Date Filing Date
AU45115/01A Abandoned AU4511501A (en) 1999-11-30 2000-11-30 Variable load switchable impedance matching system

Country Status (6)

Country Link
US (1) US6424232B1 (enExample)
EP (1) EP1236275B1 (enExample)
JP (1) JP2003516691A (enExample)
AU (1) AU4511501A (enExample)
DE (1) DE60044612D1 (enExample)
WO (1) WO2001043282A1 (enExample)

Families Citing this family (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6150628A (en) * 1997-06-26 2000-11-21 Applied Science And Technology, Inc. Toroidal low-field reactive gas source
US6924455B1 (en) 1997-06-26 2005-08-02 Applied Science & Technology, Inc. Integrated plasma chamber and inductively-coupled toroidal plasma source
US7569790B2 (en) 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US7166816B1 (en) * 1997-06-26 2007-01-23 Mks Instruments, Inc. Inductively-coupled torodial plasma source
US8779322B2 (en) 1997-06-26 2014-07-15 Mks Instruments Inc. Method and apparatus for processing metal bearing gases
US6516742B1 (en) * 1998-02-26 2003-02-11 Micron Technology, Inc. Apparatus for improved low pressure inductively coupled high density plasma reactor
JP2000322023A (ja) * 1999-04-17 2000-11-24 Lg Electronics Inc 高周波プラズマディスプレーパネルの駆動回路
US20020185067A1 (en) * 2001-06-07 2002-12-12 International Business Machines Corporation Apparatus and method for in-situ cleaning of a throttle valve in a CVD system
US6758612B1 (en) * 2002-01-16 2004-07-06 Advanced Micro Devices, Inc. System and method for developer endpoint detection by reflectometry or scatterometry
US7298091B2 (en) * 2002-02-01 2007-11-20 The Regents Of The University Of California Matching network for RF plasma source
US6946847B2 (en) * 2002-02-08 2005-09-20 Daihen Corporation Impedance matching device provided with reactance-impedance table
US6794951B2 (en) * 2002-08-05 2004-09-21 Veeco Instruments, Inc. Solid state RF power switching network
US7212078B2 (en) * 2003-02-25 2007-05-01 Tokyo Electron Limited Method and assembly for providing impedance matching network and network assembly
US7910013B2 (en) * 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7795153B2 (en) * 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7470626B2 (en) * 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7452824B2 (en) * 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7247218B2 (en) * 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7901952B2 (en) 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7042311B1 (en) * 2003-10-10 2006-05-09 Novellus Systems, Inc. RF delivery configuration in a plasma processing system
JP3768999B2 (ja) * 2003-10-29 2006-04-19 澄英 池之内 プラズマ処理装置とその制御方法
JP2006139949A (ja) * 2004-11-10 2006-06-01 Sumihide Ikenouchi インピーダンス整合器及びこれを用いたプラズマ処理装置
KR20070108229A (ko) * 2005-03-05 2007-11-08 이노베이션 엔지니어링, 엘엘씨 전자적 가변 커패시터 어레이
US7794615B2 (en) * 2005-03-31 2010-09-14 Tokyo Electron Limited Plasma processing method and apparatus, and autorunning program for variable matching unit
TWI425767B (zh) 2005-10-31 2014-02-01 Mks Instr Inc 無線電頻率電力傳送系統
US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
WO2007053569A1 (en) * 2005-10-31 2007-05-10 Mks Instruments, Inc. Radio frequency power delivery system
US7555276B2 (en) * 2005-12-19 2009-06-30 Sony Ericsson Mobile Communications Ab Devices, methods, and computer program products for controlling power transfer to an antenna in a wireless mobile terminal
US7212934B1 (en) * 2006-03-06 2007-05-01 United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration String resistance detector
US20080061901A1 (en) * 2006-09-13 2008-03-13 Jack Arthur Gilmore Apparatus and Method for Switching Between Matching Impedances
JP5246836B2 (ja) * 2007-01-24 2013-07-24 東京エレクトロン株式会社 プラズマ処理装置用のプロセス性能検査方法及び装置
US8073646B2 (en) * 2007-03-30 2011-12-06 Tokyo Electron Limited Plasma processing apparatus, radio frequency generator and correction method therefor
FR2919901B1 (fr) * 2007-08-08 2010-02-26 Renault Sas Dispositif de generation de plasma radiofrequence
US8855554B2 (en) 2008-03-05 2014-10-07 Qualcomm Incorporated Packaging and details of a wireless power device
JP2011518540A (ja) 2008-04-21 2011-06-23 クゥアルコム・インコーポレイテッド 短距離の効率的な無線電力伝送
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
JP2011522381A (ja) 2008-05-30 2011-07-28 コロラド ステート ユニバーシティ リサーチ ファンデーション プラズマに基づく化学源装置およびその使用方法
CN102215733B (zh) * 2008-11-18 2014-06-18 奥林巴斯株式会社 胶囊型医疗装置、供电装置以及供电系统
US8497658B2 (en) 2009-01-22 2013-07-30 Qualcomm Incorporated Adaptive power control for wireless charging of devices
DE102009001355B4 (de) * 2009-03-05 2015-01-22 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung und Verfahren zur Impedanzanpassung
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
US8501631B2 (en) * 2009-11-19 2013-08-06 Lam Research Corporation Plasma processing system control based on RF voltage
JP2013529352A (ja) 2010-03-31 2013-07-18 コロラド ステート ユニバーシティー リサーチ ファウンデーション 液体−気体界面プラズマデバイス
CA2794902A1 (en) 2010-03-31 2011-10-06 Colorado State University Research Foundation Liquid-gas interface plasma device
CN102438389B (zh) * 2010-09-29 2013-06-05 中微半导体设备(上海)有限公司 单一匹配网络、其构建方法和该匹配网络射频功率源系统
US8416008B2 (en) * 2011-01-20 2013-04-09 Advanced Energy Industries, Inc. Impedance-matching network using BJT switches in variable-reactance circuits
JP2013098177A (ja) * 2011-10-31 2013-05-20 Semes Co Ltd 基板処理装置及びインピーダンスマッチング方法
KR20130047532A (ko) * 2011-10-31 2013-05-08 세메스 주식회사 기판처리장치 및 임피던스매칭방법
KR20130086825A (ko) * 2012-01-26 2013-08-05 세메스 주식회사 가변커패시터, 임피던스매칭장치 및 기판처리장치
JP5922218B2 (ja) * 2012-02-20 2016-05-24 東京エレクトロン株式会社 電源システム及びプラズマ処理装置
US9620334B2 (en) * 2012-12-17 2017-04-11 Lam Research Corporation Control of etch rate using modeling, feedback and impedance match
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
US10580623B2 (en) * 2013-11-19 2020-03-03 Applied Materials, Inc. Plasma processing using multiple radio frequency power feeds for improved uniformity
US10431428B2 (en) 2014-01-10 2019-10-01 Reno Technologies, Inc. System for providing variable capacitance
US9755641B1 (en) 2014-01-10 2017-09-05 Reno Technologies, Inc. High speed high voltage switching circuit
US9865432B1 (en) 2014-01-10 2018-01-09 Reno Technologies, Inc. RF impedance matching network
US9697991B2 (en) 2014-01-10 2017-07-04 Reno Technologies, Inc. RF impedance matching network
US9496122B1 (en) 2014-01-10 2016-11-15 Reno Technologies, Inc. Electronically variable capacitor and RF matching network incorporating same
US9196459B2 (en) 2014-01-10 2015-11-24 Reno Technologies, Inc. RF impedance matching network
US10455729B2 (en) 2014-01-10 2019-10-22 Reno Technologies, Inc. Enclosure cooling system
US9844127B2 (en) 2014-01-10 2017-12-12 Reno Technologies, Inc. High voltage switching circuit
JP6413261B2 (ja) * 2014-03-03 2018-10-31 株式会社島津製作所 Ｉｃｐ発光分析装置用高周波電源装置
US11017983B2 (en) 2015-02-18 2021-05-25 Reno Technologies, Inc. RF power amplifier
US10340879B2 (en) 2015-02-18 2019-07-02 Reno Technologies, Inc. Switching circuit
US12119206B2 (en) * 2015-02-18 2024-10-15 Asm America, Inc. Switching circuit
US9306533B1 (en) 2015-02-20 2016-04-05 Reno Technologies, Inc. RF impedance matching network
US9729122B2 (en) 2015-02-18 2017-08-08 Reno Technologies, Inc. Switching circuit
US9525412B2 (en) 2015-02-18 2016-12-20 Reno Technologies, Inc. Switching circuit
US11150283B2 (en) 2015-06-29 2021-10-19 Reno Technologies, Inc. Amplitude and phase detection circuit
US11342160B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Filter for impedance matching
US11335540B2 (en) 2015-06-29 2022-05-17 Reno Technologies, Inc. Impedance matching network and method
US10692699B2 (en) 2015-06-29 2020-06-23 Reno Technologies, Inc. Impedance matching with restricted capacitor switching
US11342161B2 (en) 2015-06-29 2022-05-24 Reno Technologies, Inc. Switching circuit with voltage bias
US10984986B2 (en) 2015-06-29 2021-04-20 Reno Technologies, Inc. Impedance matching network and method
US11081316B2 (en) 2015-06-29 2021-08-03 Reno Technologies, Inc. Impedance matching network and method
US20180061984A1 (en) 2016-08-29 2018-03-01 Macom Technology Solutions Holdings, Inc. Self-biasing and self-sequencing of depletion-mode transistors
US10110218B2 (en) * 2016-11-18 2018-10-23 Macom Technology Solutions Holdings, Inc. Integrated biasing for pin diode drivers
US10560062B2 (en) 2016-11-18 2020-02-11 Macom Technology Solutions Holdings, Inc. Programmable biasing for pin diode drivers
US20180358886A1 (en) 2017-06-09 2018-12-13 MACOM Technology Solution Holdings, Inc. Integrated solution for multi-voltage generation with thermal protection
US11398370B2 (en) 2017-07-10 2022-07-26 Reno Technologies, Inc. Semiconductor manufacturing using artificial intelligence
US11476091B2 (en) 2017-07-10 2022-10-18 Reno Technologies, Inc. Impedance matching network for diagnosing plasma chamber
US11521833B2 (en) 2017-07-10 2022-12-06 Reno Technologies, Inc. Combined RF generator and RF solid-state matching network
US12334307B2 (en) 2017-07-10 2025-06-17 Asm Ip Holding B.V. Power control for rf impedance matching network
US11289307B2 (en) 2017-07-10 2022-03-29 Reno Technologies, Inc. Impedance matching network and method
US10483090B2 (en) 2017-07-10 2019-11-19 Reno Technologies, Inc. Restricted capacitor switching
US11315758B2 (en) 2017-07-10 2022-04-26 Reno Technologies, Inc. Impedance matching using electronically variable capacitance and frequency considerations
US11114280B2 (en) 2017-07-10 2021-09-07 Reno Technologies, Inc. Impedance matching with multi-level power setpoint
US11101110B2 (en) 2017-07-10 2021-08-24 Reno Technologies, Inc. Impedance matching network and method
US12272522B2 (en) * 2017-07-10 2025-04-08 Asm America, Inc. Resonant filter for solid state RF impedance matching network
US11393659B2 (en) 2017-07-10 2022-07-19 Reno Technologies, Inc. Impedance matching network and method
US10714314B1 (en) 2017-07-10 2020-07-14 Reno Technologies, Inc. Impedance matching network and method
US10727029B2 (en) 2017-07-10 2020-07-28 Reno Technologies, Inc Impedance matching using independent capacitance and frequency control
DE102017008001A1 (de) 2017-08-25 2019-02-28 Aurion Anlagentechnik Gmbh Hochfrequenz- Impedanz Anpassungsnetzwerk, seine Verwendung sowie ein Verfahren zur Hochfrequenz-lmpedanz - Anpassung
US11099222B2 (en) * 2019-01-20 2021-08-24 Christopher T. Baumgartner Near-field electrostatic communications system
US11538662B2 (en) 2019-05-21 2022-12-27 Reno Technologies, Inc. Impedance matching network and method with reduced memory requirements
US11189464B2 (en) 2019-07-17 2021-11-30 Beijing E-town Semiconductor Technology Co., Ltd. Variable mode plasma chamber utilizing tunable plasma potential
TWI887254B (zh) * 2019-07-17 2025-06-21 美商得昇科技股份有限公司 利用可調式電漿電位的可變模式電漿室
US11049692B2 (en) 2019-07-17 2021-06-29 Mattson Technology, Inc. Methods for tuning plasma potential using variable mode plasma chamber
CN110768643B (zh) * 2019-10-11 2023-08-01 成都挚信电子技术有限责任公司 一种基于射频微机电结构的电控阻抗调配芯片及微波系统
US12155227B2 (en) 2019-10-24 2024-11-26 The Board Of Trustees Of The Leland Stanford Junior University Systems and methods involving wireless power transfer using an amplifier with gain and feedback
CN110909514B (zh) * 2019-11-29 2023-05-30 北京北广科技股份有限公司 一种匹配网络的仿真调试方法和仿真调试平台
US11887820B2 (en) * 2020-01-10 2024-01-30 COMET Technologies USA, Inc. Sector shunts for plasma-based wafer processing systems
DE202020102084U1 (de) 2020-04-15 2020-05-13 TRUMPF Hüttinger GmbH + Co. KG Impedanzanpassungsschaltung und Plasmaversorgungssystem
DE202020103539U1 (de) 2020-06-19 2020-06-29 TRUMPF Hüttinger GmbH + Co. KG Schaltbare-Reaktanz-Einheit, veränderbare Reaktanz, Hochfrequenzgenerator und Impedanzanpassungsanordnung mit einer Schaltbare-Reaktanz- Einheit

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1207566A (fr) 1958-06-26 1960-02-17 Trt Telecom Radio Electr Perfectionnements aux dispositifs d'accord automatique sur une charge largement variable
US4201960A (en) * 1978-05-24 1980-05-06 Motorola, Inc. Method for automatically matching a radio frequency transmitter to an antenna
US4486722A (en) * 1982-02-18 1984-12-04 Rockwell International Corporation Pin diode switched impedance matching network having diode driver circuits transparent to RF potential
JPS61206322A (ja) * 1985-03-11 1986-09-12 Fujitsu Ltd アンテナインピ−ダンス整合回路
US5195045A (en) * 1991-02-27 1993-03-16 Astec America, Inc. Automatic impedance matching apparatus and method
US5815047A (en) * 1993-10-29 1998-09-29 Applied Materials, Inc. Fast transition RF impedance matching network for plasma reactor ignition
US5424691A (en) 1994-02-03 1995-06-13 Sadinsky; Samuel Apparatus and method for electronically controlled admittance matching network
US5689215A (en) * 1996-05-23 1997-11-18 Lam Research Corporation Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor
US5654679A (en) 1996-06-13 1997-08-05 Rf Power Products, Inc. Apparatus for matching a variable load impedance with an RF power generator impedance
JP2929284B2 (ja) * 1997-09-10 1999-08-03 株式会社アドテック 高周波プラズマ処理装置のためのインピーダンス整合及び電力制御システム
US5842154A (en) * 1997-09-15 1998-11-24 Eni Technologies, Inc. Fuzzy logic tuning of RF matching network

Also Published As

Publication number Publication date
DE60044612D1 (de) 2010-08-12
EP1236275B1 (en) 2010-06-30
JP2003516691A (ja) 2003-05-13
EP1236275A4 (en) 2006-09-27
EP1236275A1 (en) 2002-09-04
US6424232B1 (en) 2002-07-23
WO2001043282A1 (en) 2001-06-14

Similar Documents

Publication Publication Date Title
AU4511501A (en) Variable load switchable impedance matching system
AU7048300A (en) Antenna arrangement
AU7979600A (en) Antenna means
AU6829400A (en) Microwave filter
AU4481500A (en) Variable strength stent
AU1317801A (en) Dual-polarised antenna
AU2001247547A1 (en) Multiple antenna impedance optimization
AU3756900A (en) Folder
AU1683701A (en) Electronic system having variable functions
AUPQ141999A0 (en) Communication processing system
AU7656800A (en) Milking arrangement
AU6636700A (en) Low cost broad range loudspeaker and system
AU6331600A (en) Antenna arrangement
AU3802000A (en) Integrable multiband antenna
AU2699000A (en) Continuously variable transmission unit
AU1312801A (en) Telecommunication antenna system
AU5858000A (en) Switched capacitors
AU1728501A (en) Communication system
AUPQ353499A0 (en) Improved transmission system
AU4743500A (en) Transmission system
AUPQ467399A0 (en) Constantly variable reversing transmission (cvrt)
AU2118400A (en) Microwave amplifiers
AU3174900A (en) Antenna
AU2424001A (en) Secure communication system
AU1523601A (en) An antenna system

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase