JP2003502845A5 - - Google Patents

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Publication number
JP2003502845A5
JP2003502845A5 JP2001503713A JP2001503713A JP2003502845A5 JP 2003502845 A5 JP2003502845 A5 JP 2003502845A5 JP 2001503713 A JP2001503713 A JP 2001503713A JP 2001503713 A JP2001503713 A JP 2001503713A JP 2003502845 A5 JP2003502845 A5 JP 2003502845A5
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JP
Japan
Prior art keywords
dielectric layer
electron beam
vapor deposition
chemical vapor
beam irradiation
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JP2001503713A
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English (en)
Japanese (ja)
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JP2003502845A (ja
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Priority claimed from US09/330,709 external-priority patent/US6204201B1/en
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Publication of JP2003502845A publication Critical patent/JP2003502845A/ja
Publication of JP2003502845A5 publication Critical patent/JP2003502845A5/ja
Pending legal-status Critical Current

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JP2001503713A 1999-06-11 2000-06-09 化学気相成長前に電子線処理を用いて薄膜を処理する方法 Pending JP2003502845A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/330,709 1999-06-11
US09/330,709 US6204201B1 (en) 1999-06-11 1999-06-11 Method of processing films prior to chemical vapor deposition using electron beam processing
PCT/US2000/015928 WO2000077275A1 (en) 1999-06-11 2000-06-09 Method of processing films prior to chemical vapor deposition using electron beam processing

Publications (2)

Publication Number Publication Date
JP2003502845A JP2003502845A (ja) 2003-01-21
JP2003502845A5 true JP2003502845A5 (https=) 2007-07-26

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JP2001503713A Pending JP2003502845A (ja) 1999-06-11 2000-06-09 化学気相成長前に電子線処理を用いて薄膜を処理する方法

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Country Link
US (2) US6204201B1 (https=)
JP (1) JP2003502845A (https=)
AU (1) AU5331700A (https=)
WO (1) WO2000077275A1 (https=)

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