JP2003257846A - 光源ユニット、照明装置、露光装置及び露光方法 - Google Patents

光源ユニット、照明装置、露光装置及び露光方法

Info

Publication number
JP2003257846A
JP2003257846A JP2002061589A JP2002061589A JP2003257846A JP 2003257846 A JP2003257846 A JP 2003257846A JP 2002061589 A JP2002061589 A JP 2002061589A JP 2002061589 A JP2002061589 A JP 2002061589A JP 2003257846 A JP2003257846 A JP 2003257846A
Authority
JP
Japan
Prior art keywords
light
light source
illumination
wavelength
leaked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002061589A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003257846A5 (zh
Inventor
Motoo Koyama
元夫 小山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2002061589A priority Critical patent/JP2003257846A/ja
Priority to TW092101775A priority patent/TW200303970A/zh
Priority to KR10-2003-0013970A priority patent/KR20030074264A/ko
Priority to CN03107145A priority patent/CN1444099A/zh
Publication of JP2003257846A publication Critical patent/JP2003257846A/ja
Publication of JP2003257846A5 publication Critical patent/JP2003257846A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002061589A 2002-03-07 2002-03-07 光源ユニット、照明装置、露光装置及び露光方法 Pending JP2003257846A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002061589A JP2003257846A (ja) 2002-03-07 2002-03-07 光源ユニット、照明装置、露光装置及び露光方法
TW092101775A TW200303970A (en) 2002-03-07 2003-01-28 Light source unit, lighting device, exposure device and exposure method
KR10-2003-0013970A KR20030074264A (ko) 2002-03-07 2003-03-06 광원 유닛, 조명 장치, 노광 장치 및 노광 방법
CN03107145A CN1444099A (zh) 2002-03-07 2003-03-07 光源元件、照明装置、曝光装置及曝光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002061589A JP2003257846A (ja) 2002-03-07 2002-03-07 光源ユニット、照明装置、露光装置及び露光方法

Publications (2)

Publication Number Publication Date
JP2003257846A true JP2003257846A (ja) 2003-09-12
JP2003257846A5 JP2003257846A5 (zh) 2006-06-29

Family

ID=28034835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002061589A Pending JP2003257846A (ja) 2002-03-07 2002-03-07 光源ユニット、照明装置、露光装置及び露光方法

Country Status (4)

Country Link
JP (1) JP2003257846A (zh)
KR (1) KR20030074264A (zh)
CN (1) CN1444099A (zh)
TW (1) TW200303970A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208351A (ja) * 2011-03-30 2012-10-25 Orc Manufacturing Co Ltd 測光装置および露光装置
JPWO2019146448A1 (ja) * 2018-01-24 2021-01-07 株式会社ニコン 露光装置及び露光方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7573019B2 (en) * 2004-06-18 2009-08-11 Nikon Corporation Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method
NL2009020A (en) * 2011-07-22 2013-01-24 Asml Netherlands Bv Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device.
KR101946830B1 (ko) 2017-10-19 2019-02-12 주식회사 한진엔지니어링 발전소 바텀애쉬와 질석을 포함하는 건축 내장재 보드의 제조방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208351A (ja) * 2011-03-30 2012-10-25 Orc Manufacturing Co Ltd 測光装置および露光装置
JPWO2019146448A1 (ja) * 2018-01-24 2021-01-07 株式会社ニコン 露光装置及び露光方法
JP2022051810A (ja) * 2018-01-24 2022-04-01 株式会社ニコン 露光装置および露光方法

Also Published As

Publication number Publication date
TW200303970A (en) 2003-09-16
CN1444099A (zh) 2003-09-24
KR20030074264A (ko) 2003-09-19

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