JP2003257817A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JP2003257817A
JP2003257817A JP2002054162A JP2002054162A JP2003257817A JP 2003257817 A JP2003257817 A JP 2003257817A JP 2002054162 A JP2002054162 A JP 2002054162A JP 2002054162 A JP2002054162 A JP 2002054162A JP 2003257817 A JP2003257817 A JP 2003257817A
Authority
JP
Japan
Prior art keywords
mask
light
pattern
alignment
alignment pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002054162A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003257817A5 (enExample
Inventor
Katsuya Hayano
勝也 早野
Norio Hasegawa
昇雄 長谷川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2002054162A priority Critical patent/JP2003257817A/ja
Publication of JP2003257817A publication Critical patent/JP2003257817A/ja
Publication of JP2003257817A5 publication Critical patent/JP2003257817A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002054162A 2002-02-28 2002-02-28 半導体装置の製造方法 Pending JP2003257817A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002054162A JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002054162A JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2003257817A true JP2003257817A (ja) 2003-09-12
JP2003257817A5 JP2003257817A5 (enExample) 2005-08-18

Family

ID=28665393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002054162A Pending JP2003257817A (ja) 2002-02-28 2002-02-28 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JP2003257817A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008032887A (ja) * 2006-07-27 2008-02-14 Toppan Printing Co Ltd フォトマスク、カラーフィルタ、及び液晶表示装置
JP2008268483A (ja) * 2007-04-19 2008-11-06 Toppan Printing Co Ltd フォトマスク及びそれを用いたカラーフィルタの製造方法、カラーフィルタ及び液晶表示装置
CN103472684B (zh) * 2004-12-22 2016-01-20 Asml荷兰有限公司 衬底处理设备和器件制造方法
CN109901359A (zh) * 2017-12-11 2019-06-18 长鑫存储技术有限公司 用于掩膜的对准图形、掩膜及晶圆

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103472684B (zh) * 2004-12-22 2016-01-20 Asml荷兰有限公司 衬底处理设备和器件制造方法
JP2008032887A (ja) * 2006-07-27 2008-02-14 Toppan Printing Co Ltd フォトマスク、カラーフィルタ、及び液晶表示装置
JP2008268483A (ja) * 2007-04-19 2008-11-06 Toppan Printing Co Ltd フォトマスク及びそれを用いたカラーフィルタの製造方法、カラーフィルタ及び液晶表示装置
CN109901359A (zh) * 2017-12-11 2019-06-18 长鑫存储技术有限公司 用于掩膜的对准图形、掩膜及晶圆

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