JP2003234207A - 磁気装置製造方法 - Google Patents

磁気装置製造方法

Info

Publication number
JP2003234207A
JP2003234207A JP2002034468A JP2002034468A JP2003234207A JP 2003234207 A JP2003234207 A JP 2003234207A JP 2002034468 A JP2002034468 A JP 2002034468A JP 2002034468 A JP2002034468 A JP 2002034468A JP 2003234207 A JP2003234207 A JP 2003234207A
Authority
JP
Japan
Prior art keywords
magnet unit
magnet
magnetic
stage
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002034468A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003234207A5 (enrdf_load_stackoverflow
Inventor
Tadahiro Kominami
忠弘 小南
Eiji Kumagai
英治 熊谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Sendai Nikon Corp
Original Assignee
Nikon Corp
Sendai Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Sendai Nikon Corp filed Critical Nikon Corp
Priority to JP2002034468A priority Critical patent/JP2003234207A/ja
Publication of JP2003234207A publication Critical patent/JP2003234207A/ja
Publication of JP2003234207A5 publication Critical patent/JP2003234207A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2002034468A 2002-02-12 2002-02-12 磁気装置製造方法 Pending JP2003234207A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002034468A JP2003234207A (ja) 2002-02-12 2002-02-12 磁気装置製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002034468A JP2003234207A (ja) 2002-02-12 2002-02-12 磁気装置製造方法

Publications (2)

Publication Number Publication Date
JP2003234207A true JP2003234207A (ja) 2003-08-22
JP2003234207A5 JP2003234207A5 (enrdf_load_stackoverflow) 2005-08-18

Family

ID=27776961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002034468A Pending JP2003234207A (ja) 2002-02-12 2002-02-12 磁気装置製造方法

Country Status (1)

Country Link
JP (1) JP2003234207A (enrdf_load_stackoverflow)

Similar Documents

Publication Publication Date Title
JP3554186B2 (ja) 露光装置、デバイス製造方法および反力受け方法
US6417914B1 (en) Stage device and exposure apparatus
JP5761435B2 (ja) 液浸リソグラフィ用ウェハテーブル
US8598538B2 (en) Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
JP4362862B2 (ja) ステージ装置及び露光装置
KR100861136B1 (ko) 위치결정장치, 노광장치 및 디바이스의 제조방법
US6885430B2 (en) System and method for resetting a reaction mass assembly of a stage assembly
US20080013060A1 (en) Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
JPWO2003015139A1 (ja) ステージシステム及び露光装置、並びにデバイス製造方法
TW201838075A (zh) 搬送系統、曝光裝置及元件製造方法
JPWO2006006730A1 (ja) 平面モータ装置、ステージ装置、露光装置及びデバイスの製造方法
JP2008515219A (ja) 投影光学装置及び露光装置
US6958808B2 (en) System and method for resetting a reaction mass assembly of a stage assembly
US6937319B2 (en) Exposure method and apparatus with vibration-preventative control
WO2009084199A1 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JP2002323584A (ja) アクチュエータ、ステージ、露光装置、デバイスの製造方法、及び免震装置
JP2004193425A (ja) 移動制御方法及び装置、露光装置、並びにデバイス製造方法
JP2004165416A (ja) 露光装置及び建屋
JPWO2004105105A1 (ja) ステージ装置及び露光装置、並びにデバイス製造方法
TWI435180B (zh) Stage device and exposure device
JP2006040927A (ja) 支持装置、ステージ装置、露光装置、及びデバイスの製造方法
JP2014204634A (ja) モータ、移動体装置、及び露光装置
JPH09320955A (ja) 駆動装置及びステージ装置
JP2003234207A (ja) 磁気装置製造方法
JP2000312465A (ja) モータ装置及びモータ装置の組み立て方法、並びに露光装置

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050121

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050204

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080117

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080304

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080708