JP2003233191A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003233191A5 JP2003233191A5 JP2002376468A JP2002376468A JP2003233191A5 JP 2003233191 A5 JP2003233191 A5 JP 2003233191A5 JP 2002376468 A JP2002376468 A JP 2002376468A JP 2002376468 A JP2002376468 A JP 2002376468A JP 2003233191 A5 JP2003233191 A5 JP 2003233191A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34382401P | 2001-12-28 | 2001-12-28 | |
| US60/343824 | 2001-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003233191A JP2003233191A (ja) | 2003-08-22 |
| JP2003233191A5 true JP2003233191A5 (enExample) | 2006-01-26 |
Family
ID=29735980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002376468A Pending JP2003233191A (ja) | 2001-12-28 | 2002-12-26 | フォト酸レイビルポリマー及びそれを含むフォトレジスト |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7022455B2 (enExample) |
| JP (1) | JP2003233191A (enExample) |
| KR (1) | KR100944727B1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030235777A1 (en) * | 2001-12-31 | 2003-12-25 | Shipley Company, L.L.C. | Phenolic polymers, methods for synthesis thereof and photoresist compositions comprising same |
| TW200506516A (en) * | 2003-04-09 | 2005-02-16 | Rohm & Haas Elect Mat | Photoresists and methods for use thereof |
| KR100944227B1 (ko) * | 2007-12-17 | 2010-02-24 | 제일모직주식회사 | 방향족 산 분해성 기를 갖는 (메타)아크릴레이트 화합물 및감광성 고분자 및 레지스트 조성물 |
| US9182662B2 (en) | 2012-02-15 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Photosensitive copolymer, photoresist comprising the copolymer, and articles formed therefrom |
| TWI523872B (zh) | 2013-02-25 | 2016-03-01 | 羅門哈斯電子材料有限公司 | 光敏共聚物，包括該共聚物之光阻，及形成電子裝置之方法 |
| US9182669B2 (en) | 2013-12-19 | 2015-11-10 | Rohm And Haas Electronic Materials Llc | Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device |
| US12134690B2 (en) * | 2019-12-31 | 2024-11-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist composition and method of manufacturing a semiconductor device |
| US12276910B2 (en) | 2020-07-15 | 2025-04-15 | Dupont Electronic Materials International, Llc | Photoresist compositions and pattern formation methods |
| CN117941029A (zh) * | 2021-08-25 | 2024-04-26 | 杰米纳蒂奥公司 | 基于反间隔件的自对准高阶图案化 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2632066B2 (ja) * | 1990-04-06 | 1997-07-16 | 富士写真フイルム株式会社 | ポジ画像の形成方法 |
| US5071730A (en) | 1990-04-24 | 1991-12-10 | International Business Machines Corporation | Liquid apply, aqueous processable photoresist compositions |
| US5506088A (en) * | 1991-09-17 | 1996-04-09 | Fujitsu Limited | Chemically amplified resist composition and process for forming resist pattern using same |
| JP3114166B2 (ja) * | 1992-10-22 | 2000-12-04 | ジェイエスアール株式会社 | マイクロレンズ用感放射線性樹脂組成物 |
| US5352564A (en) | 1993-01-19 | 1994-10-04 | Shin-Etsu Chemical Co., Ltd. | Resist compositions |
| JPH06324494A (ja) * | 1993-05-12 | 1994-11-25 | Fujitsu Ltd | パターン形成材料およびパターン形成方法 |
| US5688628A (en) * | 1993-11-11 | 1997-11-18 | Nippon Zeon Co., Ltd. | Resist composition |
| JP3116751B2 (ja) | 1993-12-03 | 2000-12-11 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
| US5866304A (en) | 1993-12-28 | 1999-02-02 | Nec Corporation | Photosensitive resin and method for patterning by use of the same |
| US5580694A (en) | 1994-06-27 | 1996-12-03 | International Business Machines Corporation | Photoresist composition with androstane and process for its use |
| US5558971A (en) | 1994-09-02 | 1996-09-24 | Wako Pure Chemical Industries, Ltd. | Resist material |
| US5861231A (en) | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
| US6136501A (en) | 1998-08-28 | 2000-10-24 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising same |
| JP2000235264A (ja) * | 1998-12-14 | 2000-08-29 | Fuji Photo Film Co Ltd | ポジ型シリコーン含有感光性組成物 |
| TWI289238B (en) * | 2000-01-13 | 2007-11-01 | Fujifilm Corp | Negative resist compositions using for electronic irradiation |
| US6379861B1 (en) | 2000-02-22 | 2002-04-30 | Shipley Company, L.L.C. | Polymers and photoresist compositions comprising same |
| EP1143300A1 (en) * | 2000-04-03 | 2001-10-10 | Shipley Company LLC | Photoresist compositions and use of same |
-
2002
- 2002-12-20 US US10/327,450 patent/US7022455B2/en not_active Expired - Lifetime
- 2002-12-26 JP JP2002376468A patent/JP2003233191A/ja active Pending
- 2002-12-27 KR KR1020020084759A patent/KR100944727B1/ko not_active Expired - Lifetime