JP2003214831A5 - - Google Patents

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Publication number
JP2003214831A5
JP2003214831A5 JP2002009304A JP2002009304A JP2003214831A5 JP 2003214831 A5 JP2003214831 A5 JP 2003214831A5 JP 2002009304 A JP2002009304 A JP 2002009304A JP 2002009304 A JP2002009304 A JP 2002009304A JP 2003214831 A5 JP2003214831 A5 JP 2003214831A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2002009304A
Other versions
JP3953821B2 (ja
JP2003214831A (ja
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Priority to JP2002009304A priority Critical patent/JP3953821B2/ja
Priority claimed from JP2002009304A external-priority patent/JP3953821B2/ja
Priority to TW091138099A priority patent/TW580560B/zh
Priority to US10/336,766 priority patent/US6683308B2/en
Priority to KR10-2003-0001380A priority patent/KR100526668B1/ko
Publication of JP2003214831A publication Critical patent/JP2003214831A/ja
Publication of JP2003214831A5 publication Critical patent/JP2003214831A5/ja
Application granted granted Critical
Publication of JP3953821B2 publication Critical patent/JP3953821B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002009304A 2002-01-17 2002-01-17 膜厚測定方法および膜厚測定装置 Expired - Fee Related JP3953821B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2002009304A JP3953821B2 (ja) 2002-01-17 2002-01-17 膜厚測定方法および膜厚測定装置
TW091138099A TW580560B (en) 2002-01-17 2002-12-31 Method and apparatus for measuring thickness of thin film
US10/336,766 US6683308B2 (en) 2002-01-17 2003-01-06 Method and apparatus for measuring thickness of thin film
KR10-2003-0001380A KR100526668B1 (ko) 2002-01-17 2003-01-09 박막두께측정방법 및 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002009304A JP3953821B2 (ja) 2002-01-17 2002-01-17 膜厚測定方法および膜厚測定装置

Publications (3)

Publication Number Publication Date
JP2003214831A JP2003214831A (ja) 2003-07-30
JP2003214831A5 true JP2003214831A5 (ja) 2005-08-04
JP3953821B2 JP3953821B2 (ja) 2007-08-08

Family

ID=19191506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002009304A Expired - Fee Related JP3953821B2 (ja) 2002-01-17 2002-01-17 膜厚測定方法および膜厚測定装置

Country Status (4)

Country Link
US (1) US6683308B2 (ja)
JP (1) JP3953821B2 (ja)
KR (1) KR100526668B1 (ja)
TW (1) TW580560B (ja)

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* Cited by examiner, † Cited by third party
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JP3913555B2 (ja) * 2002-01-17 2007-05-09 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP3953821B2 (ja) * 2002-01-17 2007-08-08 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP4090303B2 (ja) * 2002-08-08 2008-05-28 株式会社日立ハイテクノロジーズ 電子ビーム計測用センサー及び電子ビーム計測方法
US7459913B2 (en) * 2004-08-13 2008-12-02 International Business Machines Corporation Methods for the determination of film continuity and growth modes in thin dielectric films
US7162133B2 (en) * 2004-08-20 2007-01-09 Agency For Science Technology And Research Method to trim and smooth high index contrast waveguide structures
JP4987486B2 (ja) * 2005-01-07 2012-07-25 エスアイアイ・ナノテクノロジー株式会社 薄膜試料測定方法および装置ならびに薄膜試料作製方法および装置
JP2008034475A (ja) * 2006-07-26 2008-02-14 Renesas Technology Corp 半導体装置の製造方法
KR20120042748A (ko) 2009-05-13 2012-05-03 씨브이 홀딩스 엘엘씨 코팅된 표면 검사를 위한 가스제거 방법
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
JP2011029271A (ja) * 2009-07-22 2011-02-10 Micronics Japan Co Ltd 薄膜特性測定装置及び方法、並びに、薄膜加工装置及び方法
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP5754296B2 (ja) * 2011-08-18 2015-07-29 Ｊｆｅスチール株式会社 膜厚均一性評価方法
JP5754297B2 (ja) * 2011-08-18 2015-07-29 Ｊｆｅスチール株式会社 膜厚均一性評価方法
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
WO2014085346A1 (en) 2012-11-30 2014-06-05 Sio2 Medical Products, Inc. Hollow body with inside coating
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
CA2904611C (en) 2013-03-11 2021-11-23 Sio2 Medical Products, Inc. Coated packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
US10203202B2 (en) * 2014-04-07 2019-02-12 John Weber Schultz Non-contact determination of coating thickness
KR101630798B1 (ko) * 2014-11-05 2016-06-15 한국표준과학연구원 코팅 두께 측정 장치 및 방법
CA2995225C (en) 2015-08-18 2023-08-29 Sio2 Medical Products, Inc. Pharmaceutical and other packaging with low oxygen transmission rate
CN105470162B (zh) * 2016-01-08 2019-07-02 武汉新芯集成电路制造有限公司 一种侦测接触孔缺陷的方法
US11410830B1 (en) 2019-03-23 2022-08-09 Kla Corporation Defect inspection and review using transmissive current image of charged particle beam system

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Publication number Priority date Publication date Assignee Title
JPS639807A (ja) 1986-06-30 1988-01-16 Nec Corp 膜厚測定方法およびその装置
US5162240A (en) * 1989-06-16 1992-11-10 Hitachi, Ltd. Method and apparatus of fabricating electric circuit pattern on thick and thin film hybrid multilayer wiring substrate
JPH0817166B2 (ja) * 1991-04-27 1996-02-21 信越半導体株式会社 超薄膜ｓｏｉ基板の製造方法及び製造装置
JPH06273297A (ja) 1993-03-19 1994-09-30 Casio Comput Co Ltd イオンビームによるエッチング方法
JP3058394B2 (ja) 1994-06-23 2000-07-04 シャープ株式会社 透過電子顕微鏡用断面試料作成方法
JP3075535B2 (ja) * 1998-05-01 2000-08-14 キヤノン株式会社 電子放出素子、電子源及び画像形成装置の製造方法
JP3292159B2 (ja) 1998-12-10 2002-06-17 日本電気株式会社 膜厚測定装置および膜厚測定方法
JP3913555B2 (ja) * 2002-01-17 2007-05-09 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置
JP3953821B2 (ja) * 2002-01-17 2007-08-08 ファブソリューション株式会社 膜厚測定方法および膜厚測定装置

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