JP2003197590A5 - - Google Patents
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- Publication number
- JP2003197590A5 JP2003197590A5 JP2001390135A JP2001390135A JP2003197590A5 JP 2003197590 A5 JP2003197590 A5 JP 2003197590A5 JP 2001390135 A JP2001390135 A JP 2001390135A JP 2001390135 A JP2001390135 A JP 2001390135A JP 2003197590 A5 JP2003197590 A5 JP 2003197590A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- nozzle
- rinse
- rotating
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000758 substrate Substances 0.000 claims description 105
- 239000007788 liquid Substances 0.000 claims description 31
- 239000003960 organic solvent Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 3
- 238000003672 processing method Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 description 4
- 241000824268 Kuma Species 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001390135A JP2003197590A (ja) | 2001-12-21 | 2001-12-21 | 基板処理装置および基板処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001390135A JP2003197590A (ja) | 2001-12-21 | 2001-12-21 | 基板処理装置および基板処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003197590A JP2003197590A (ja) | 2003-07-11 |
| JP2003197590A5 true JP2003197590A5 (cg-RX-API-DMAC7.html) | 2005-05-19 |
Family
ID=27598152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001390135A Abandoned JP2003197590A (ja) | 2001-12-21 | 2001-12-21 | 基板処理装置および基板処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003197590A (cg-RX-API-DMAC7.html) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005086181A (ja) * | 2003-09-11 | 2005-03-31 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
| WO2005050724A1 (ja) | 2003-11-18 | 2005-06-02 | Tokyo Electron Limited | 基板洗浄方法、基板洗浄装置およびコンピュータ読み取り可能な記録媒体 |
| TWI286353B (en) | 2004-10-12 | 2007-09-01 | Tokyo Electron Ltd | Substrate processing method and substrate processing apparatus |
| JP4527660B2 (ja) | 2005-06-23 | 2010-08-18 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
| JP4607755B2 (ja) * | 2005-12-19 | 2011-01-05 | 東京エレクトロン株式会社 | 基板洗浄方法、基板洗浄装置、制御プログラム、およびコンピュータ読取可能な記憶媒体 |
| KR100776282B1 (ko) | 2006-06-22 | 2007-11-13 | 세메스 주식회사 | 매엽식 기판 처리 장치 및 방법 |
| JP5143498B2 (ja) | 2006-10-06 | 2013-02-13 | 東京エレクトロン株式会社 | 基板処理方法、基板処理装置、プログラムならびに記録媒体 |
| JP4927158B2 (ja) * | 2009-12-25 | 2012-05-09 | 東京エレクトロン株式会社 | 基板処理方法、その基板処理方法を実行させるためのプログラムを記録した記録媒体及び基板処理装置 |
| KR101806191B1 (ko) | 2010-06-17 | 2017-12-07 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치 |
| KR101596750B1 (ko) | 2010-06-23 | 2016-02-23 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 방법, 이 기판 처리 방법을 실행하기 위한 컴퓨터 프로그램이 기록된 기록 매체 및 기판 처리 장치 |
| JP5061229B2 (ja) * | 2010-10-18 | 2012-10-31 | 東京エレクトロン株式会社 | 基板洗浄装置及び基板洗浄方法。 |
| JP2012119522A (ja) * | 2010-12-01 | 2012-06-21 | Sumitomo Electric Ind Ltd | 回折格子を有する半導体レーザ素子の製造方法 |
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2001
- 2001-12-21 JP JP2001390135A patent/JP2003197590A/ja not_active Abandoned