JP2003178416A - 磁気記録媒体及び磁気記録装置 - Google Patents
磁気記録媒体及び磁気記録装置Info
- Publication number
- JP2003178416A JP2003178416A JP2001378879A JP2001378879A JP2003178416A JP 2003178416 A JP2003178416 A JP 2003178416A JP 2001378879 A JP2001378879 A JP 2001378879A JP 2001378879 A JP2001378879 A JP 2001378879A JP 2003178416 A JP2003178416 A JP 2003178416A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- magnetic recording
- soft magnetic
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 251
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 75
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 36
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 10
- 230000005415 magnetization Effects 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 156
- 239000010408 film Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 16
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 14
- 238000004544 sputter deposition Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 239000011241 protective layer Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 230000008878 coupling Effects 0.000 description 6
- 238000010168 coupling process Methods 0.000 description 6
- 238000005859 coupling reaction Methods 0.000 description 6
- 239000013078 crystal Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000000314 lubricant Substances 0.000 description 6
- 230000005381 magnetic domain Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000001228 spectrum Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 230000001050 lubricating effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- 239000010952 cobalt-chrome Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000005546 reactive sputtering Methods 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910019586 CoZrTa Inorganic materials 0.000 description 1
- 229910002555 FeNi Inorganic materials 0.000 description 1
- 229910002836 PtFe Inorganic materials 0.000 description 1
- -1 S i Inorganic materials 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002902 ferrimagnetic material Substances 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Landscapes
- Thin Magnetic Films (AREA)
- Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001378879A JP2003178416A (ja) | 2001-12-12 | 2001-12-12 | 磁気記録媒体及び磁気記録装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001378879A JP2003178416A (ja) | 2001-12-12 | 2001-12-12 | 磁気記録媒体及び磁気記録装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003178416A true JP2003178416A (ja) | 2003-06-27 |
| JP2003178416A5 JP2003178416A5 (https=) | 2005-07-07 |
Family
ID=19186474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001378879A Pending JP2003178416A (ja) | 2001-12-12 | 2001-12-12 | 磁気記録媒体及び磁気記録装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003178416A (https=) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8034470B2 (en) | 2007-03-16 | 2011-10-11 | Fuji Electric Co., Ltd. | Perpendicular magnetic recording medium and method of manufacturing the medium |
| US8691402B2 (en) | 2004-01-09 | 2014-04-08 | Fuji Electric Co., Ltd. | Perpendicular magnetic recording medium |
-
2001
- 2001-12-12 JP JP2001378879A patent/JP2003178416A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8691402B2 (en) | 2004-01-09 | 2014-04-08 | Fuji Electric Co., Ltd. | Perpendicular magnetic recording medium |
| US8034470B2 (en) | 2007-03-16 | 2011-10-11 | Fuji Electric Co., Ltd. | Perpendicular magnetic recording medium and method of manufacturing the medium |
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Legal Events
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