JP2003177548A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2003177548A5 JP2003177548A5 JP2001375759A JP2001375759A JP2003177548A5 JP 2003177548 A5 JP2003177548 A5 JP 2003177548A5 JP 2001375759 A JP2001375759 A JP 2001375759A JP 2001375759 A JP2001375759 A JP 2001375759A JP 2003177548 A5 JP2003177548 A5 JP 2003177548A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- reflection
- irradiation apparatus
- light source
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000007261 regionalization Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001375759A JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001375759A JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003177548A JP2003177548A (ja) | 2003-06-27 |
| JP2003177548A5 true JP2003177548A5 (enExample) | 2005-07-21 |
Family
ID=19184072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001375759A Pending JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003177548A (enExample) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07280719A (ja) * | 1994-04-12 | 1995-10-27 | Hitachi Electron Eng Co Ltd | Cvd装置用微粒子検出器 |
| JPH1027751A (ja) * | 1996-07-11 | 1998-01-27 | Nikon Corp | 照明装置及びこれを用いた露光装置 |
| JPH11233423A (ja) * | 1998-02-06 | 1999-08-27 | Canon Inc | 露光用シャッタおよび露光装置ならびにディバイス製造方法 |
| JP3575281B2 (ja) * | 1998-05-27 | 2004-10-13 | ウシオ電機株式会社 | 光照射装置のシャッター機構 |
-
2001
- 2001-12-10 JP JP2001375759A patent/JP2003177548A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2011233781A5 (enExample) | ||
| JP5224341B2 (ja) | 露光装置及びフォトマスク | |
| JPH0659435A (ja) | マスクおよび製造方法 | |
| TW200508811A (en) | Exposure method, exposure device, and device manufacturing method | |
| WO2018000602A1 (zh) | 一种3d玻璃的曝光显影加工方法 | |
| TW201027268A (en) | Exposure apparatus and photomask | |
| JPH11109608A5 (enExample) | ||
| TW200949456A (en) | Exposure apparatus and electronic device manufacturing method | |
| EP0994378A3 (en) | Proximity exposure method by oblique irradiation with light | |
| TWI266959B (en) | Device manufacturing method, device manufactured thereby and a mask for use in the method | |
| JP4308666B2 (ja) | デジタルマイクロミラーハウジングの開口エッジ | |
| EP1553445A3 (en) | Composition for blocking light and method of forming an image using the composition | |
| CN104849966A (zh) | 掩模板及其制备方法、曝光设备 | |
| JPH1041223A5 (enExample) | ||
| JP2009194335A (ja) | 露光装置の基板支持機構 | |
| JP2005109304A5 (enExample) | ||
| JP2013191628A5 (enExample) | ||
| TW200628996A (en) | Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus | |
| US20120212717A1 (en) | Exposure apparatus and photo mask | |
| JP2005236292A5 (enExample) | ||
| TW200741362A (en) | Projection exposure device | |
| CN102466978B (zh) | 光刻曝光机及光刻曝光方法 | |
| JP2003177548A5 (enExample) | ||
| JP2001332473A5 (enExample) | ||
| JP5908297B2 (ja) | 露光装置 |