JP2003177548A - 反射遮光型のシャッタを備えた光照射装置 - Google Patents
反射遮光型のシャッタを備えた光照射装置Info
- Publication number
- JP2003177548A JP2003177548A JP2001375759A JP2001375759A JP2003177548A JP 2003177548 A JP2003177548 A JP 2003177548A JP 2001375759 A JP2001375759 A JP 2001375759A JP 2001375759 A JP2001375759 A JP 2001375759A JP 2003177548 A JP2003177548 A JP 2003177548A
- Authority
- JP
- Japan
- Prior art keywords
- light
- shutter
- light source
- reflected
- reflective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001375759A JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001375759A JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003177548A true JP2003177548A (ja) | 2003-06-27 |
| JP2003177548A5 JP2003177548A5 (enExample) | 2005-07-21 |
Family
ID=19184072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001375759A Pending JP2003177548A (ja) | 2001-12-10 | 2001-12-10 | 反射遮光型のシャッタを備えた光照射装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003177548A (enExample) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07280719A (ja) * | 1994-04-12 | 1995-10-27 | Hitachi Electron Eng Co Ltd | Cvd装置用微粒子検出器 |
| JPH1027751A (ja) * | 1996-07-11 | 1998-01-27 | Nikon Corp | 照明装置及びこれを用いた露光装置 |
| JPH11233423A (ja) * | 1998-02-06 | 1999-08-27 | Canon Inc | 露光用シャッタおよび露光装置ならびにディバイス製造方法 |
| JPH11338005A (ja) * | 1998-05-27 | 1999-12-10 | Ushio Inc | 光照射装置のシャッター機構 |
-
2001
- 2001-12-10 JP JP2001375759A patent/JP2003177548A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07280719A (ja) * | 1994-04-12 | 1995-10-27 | Hitachi Electron Eng Co Ltd | Cvd装置用微粒子検出器 |
| JPH1027751A (ja) * | 1996-07-11 | 1998-01-27 | Nikon Corp | 照明装置及びこれを用いた露光装置 |
| JPH11233423A (ja) * | 1998-02-06 | 1999-08-27 | Canon Inc | 露光用シャッタおよび露光装置ならびにディバイス製造方法 |
| JPH11338005A (ja) * | 1998-05-27 | 1999-12-10 | Ushio Inc | 光照射装置のシャッター機構 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI474126B (zh) | 曝光設備及電子裝置製造方法 | |
| KR100859400B1 (ko) | 광 조사 장치 | |
| US4864360A (en) | Exposure apparatus | |
| JPH07283132A (ja) | レティクルパターンをターゲット基板上でつなぎ合わせる方法及び装置 | |
| TW495836B (en) | Scanning exposure method and device | |
| TWI408492B (zh) | 感測器的校正方法、曝光方法、曝光裝置、元件製造方法以及反射式罩幕 | |
| JP3363835B2 (ja) | 戻り光除去方法と装置 | |
| US20120212717A1 (en) | Exposure apparatus and photo mask | |
| CN110945627A (zh) | 激光退火装置及激光退火方法 | |
| US8072580B2 (en) | Maskless exposure apparatus and method of manufacturing substrate for display using the same | |
| JP2017053888A (ja) | 露光方法および露光装置、ならびに物品の製造方法 | |
| JP4144059B2 (ja) | 走査型露光装置 | |
| JP2003177548A (ja) | 反射遮光型のシャッタを備えた光照射装置 | |
| JPH1152583A (ja) | プロキシミティ露光装置 | |
| CN101273302B (zh) | 光掩模和使用该光掩模的曝光方法 | |
| CN101799632A (zh) | 光照射装置 | |
| JP4390512B2 (ja) | 露光方法及びその方法で用いられる基板のアライメント方法 | |
| WO2007029561A1 (ja) | 露光装置 | |
| JP2006287129A (ja) | レーザ照射装置、及びレーザ照射方法 | |
| JPH09306826A (ja) | 露光装置 | |
| JP4493428B2 (ja) | 異物検査装置及び異物検査方法 | |
| JP2003076030A (ja) | 露光装置における光照射装置 | |
| JP2013162110A (ja) | 露光装置 | |
| JP2010211028A (ja) | 露光装置 | |
| JP2000250223A (ja) | 露光装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20041201 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20041201 |
|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20060516 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070412 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070605 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070806 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070904 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080108 |