JP2003177548A5 - - Google Patents

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Publication number
JP2003177548A5
JP2003177548A5 JP2001375759A JP2001375759A JP2003177548A5 JP 2003177548 A5 JP2003177548 A5 JP 2003177548A5 JP 2001375759 A JP2001375759 A JP 2001375759A JP 2001375759 A JP2001375759 A JP 2001375759A JP 2003177548 A5 JP2003177548 A5 JP 2003177548A5
Authority
JP
Japan
Prior art keywords
light
reflection
irradiation apparatus
light source
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001375759A
Other languages
Japanese (ja)
Other versions
JP2003177548A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2001375759A priority Critical patent/JP2003177548A/en
Priority claimed from JP2001375759A external-priority patent/JP2003177548A/en
Publication of JP2003177548A publication Critical patent/JP2003177548A/en
Publication of JP2003177548A5 publication Critical patent/JP2003177548A5/ja
Pending legal-status Critical Current

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Claims (4)

光源と、
前記光源から出射した光に対して変位する反射遮光型のシャッタであって、該光と対向する位置で当該光を透過する開口部と、該光と対向する位置で当該光を該光源に入射しない方向へ反射して遮光する反射遮光部とを備えるシャッタと
を具えた光照射装置。A light source;
A reflection / light-shielding type shutter that is displaced with respect to light emitted from the light source, and has an opening that transmits the light at a position facing the light, and the light is incident on the light source at a position facing the light. The light irradiation apparatus provided with the shutter provided with the reflection light-shielding part which reflects and shields in the direction which does not. 前記反射遮光部は、前記光源から出射した光の光線軸に対して斜めに配置される請求項１に記載の光照射装置。  The light irradiation apparatus according to claim 1, wherein the reflection light shielding unit is disposed obliquely with respect to a light axis of light emitted from the light source. 請求項１又は２に記載の光照射装置を用いてパターン形成用のマスクに光を照射して露光対象基板面上に所定のパターンを形成する露光装置。 Claim 1 or the exposure equipment to form a predetermined pattern by irradiating light onto an exposure target substrate surface a mask for pattern formation by using the light irradiation apparatus according to 2. 請求項３に記載の露光装置を用いたフラットディスプレイパネルの製造方法。A flat display panel manufacturing method using the exposure apparatus according to claim 3.
JP2001375759A 2001-12-10 2001-12-10 Light irradiation device equipped with reflective shading type shutter Pending JP2003177548A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001375759A JP2003177548A (en) 2001-12-10 2001-12-10 Light irradiation device equipped with reflective shading type shutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001375759A JP2003177548A (en) 2001-12-10 2001-12-10 Light irradiation device equipped with reflective shading type shutter

Publications (2)

Publication Number Publication Date
JP2003177548A JP2003177548A (en) 2003-06-27
JP2003177548A5 true JP2003177548A5 (en) 2005-07-21

Family

ID=19184072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001375759A Pending JP2003177548A (en) 2001-12-10 2001-12-10 Light irradiation device equipped with reflective shading type shutter

Country Status (1)

Country Link
JP (1) JP2003177548A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07280719A (en) * 1994-04-12 1995-10-27 Hitachi Electron Eng Co Ltd Particulate detector for cvd device
JPH1027751A (en) * 1996-07-11 1998-01-27 Nikon Corp Illuminating device and exposure system provided therewith
JPH11233423A (en) * 1998-02-06 1999-08-27 Canon Inc Shutter for exposure, aligner, and manufacture of device
JP3575281B2 (en) * 1998-05-27 2004-10-13 ウシオ電機株式会社 Shutter mechanism of light irradiation device

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