JPH1041223A5 - - Google Patents

Info

Publication number
JPH1041223A5
JPH1041223A5 JP1996213131A JP21313196A JPH1041223A5 JP H1041223 A5 JPH1041223 A5 JP H1041223A5 JP 1996213131 A JP1996213131 A JP 1996213131A JP 21313196 A JP21313196 A JP 21313196A JP H1041223 A5 JPH1041223 A5 JP H1041223A5
Authority
JP
Japan
Prior art keywords
photosensitive material
projection
exposure
exposure area
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996213131A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1041223A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8213131A priority Critical patent/JPH1041223A/ja
Priority claimed from JP8213131A external-priority patent/JPH1041223A/ja
Priority to US08/899,909 priority patent/US5851707A/en
Publication of JPH1041223A publication Critical patent/JPH1041223A/ja
Publication of JPH1041223A5 publication Critical patent/JPH1041223A5/ja
Pending legal-status Critical Current

Links

JP8213131A 1996-07-24 1996-07-24 露光方法および露光装置 Pending JPH1041223A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8213131A JPH1041223A (ja) 1996-07-24 1996-07-24 露光方法および露光装置
US08/899,909 US5851707A (en) 1996-07-24 1997-07-24 Microlithography projection-exposure masks, and methods and apparatus employing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8213131A JPH1041223A (ja) 1996-07-24 1996-07-24 露光方法および露光装置

Publications (2)

Publication Number Publication Date
JPH1041223A JPH1041223A (ja) 1998-02-13
JPH1041223A5 true JPH1041223A5 (enExample) 2004-11-04

Family

ID=16634095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8213131A Pending JPH1041223A (ja) 1996-07-24 1996-07-24 露光方法および露光装置

Country Status (2)

Country Link
US (1) US5851707A (enExample)
JP (1) JPH1041223A (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3766165B2 (ja) * 1997-03-07 2006-04-12 株式会社ニコン 画像形成方法及び感光材料
US6534242B2 (en) 1997-11-06 2003-03-18 Canon Kabushiki Kaisha Multiple exposure device formation
US6377337B1 (en) 1998-05-02 2002-04-23 Canon Kabushiki Kaisha Projection exposure apparatus
US6136509A (en) * 1998-06-05 2000-10-24 Creo Srl Method of exposing thermoresist
US6387597B1 (en) 1998-06-05 2002-05-14 Creo Srl Method for exposing features on non-planar resists
US6590635B2 (en) 1998-06-19 2003-07-08 Creo Inc. High resolution optical stepper
US6593064B1 (en) 1998-06-19 2003-07-15 Creo Inc. High resolution optical stepper
JP3123548B2 (ja) * 1998-06-30 2001-01-15 キヤノン株式会社 露光方法及び露光装置
JP3352405B2 (ja) 1998-09-10 2002-12-03 キヤノン株式会社 露光方法及びそれを用いたデバイス製造方法並びに半導体デバイス
US6107011A (en) * 1999-01-06 2000-08-22 Creo Srl Method of high resolution optical scanning utilizing primary and secondary masks
JP2000277425A (ja) 1999-03-26 2000-10-06 Nec Corp 電子線描画方法とその装置
US6238850B1 (en) 1999-08-23 2001-05-29 International Business Machines Corp. Method of forming sharp corners in a photoresist layer
US6894295B2 (en) * 2000-12-11 2005-05-17 Leepl Corporation Electron beam proximity exposure apparatus and mask unit therefor
US6541166B2 (en) 2001-01-18 2003-04-01 International Business Machines Corporation Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposures
AU2003222799A1 (en) * 2002-04-15 2003-10-27 Carl Zeiss Smt Ag Interferometric measuring device and projection illumination installation comprising one such measuring device
US7510818B2 (en) * 2002-12-09 2009-03-31 Pixelligent Technologies Llc Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications
US20050054210A1 (en) * 2003-09-04 2005-03-10 Taiwan Semiconductor Manufacturing Co., Ltd. Multiple exposure method for forming patterned photoresist layer
US20050202352A1 (en) * 2004-03-11 2005-09-15 Worcester Polytechnic Institute Systems and methods for sub-wavelength imaging
KR100741110B1 (ko) * 2006-02-15 2007-07-19 삼성에스디아이 주식회사 광 파이버 및 플라즈마 디스플레이 패널의 전극 형성 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3491336B2 (ja) * 1994-05-31 2004-01-26 株式会社ニコン 露光方法及び露光装置
US5532090A (en) * 1995-03-01 1996-07-02 Intel Corporation Method and apparatus for enhanced contact and via lithography

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