JPH10172899A5 - - Google Patents

Info

Publication number
JPH10172899A5
JPH10172899A5 JP1996340653A JP34065396A JPH10172899A5 JP H10172899 A5 JPH10172899 A5 JP H10172899A5 JP 1996340653 A JP1996340653 A JP 1996340653A JP 34065396 A JP34065396 A JP 34065396A JP H10172899 A5 JPH10172899 A5 JP H10172899A5
Authority
JP
Japan
Prior art keywords
adjusting
optical system
nitrogen
replacing
spatial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1996340653A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10172899A (ja
JP3716420B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP34065396A priority Critical patent/JP3716420B2/ja
Priority claimed from JP34065396A external-priority patent/JP3716420B2/ja
Publication of JPH10172899A publication Critical patent/JPH10172899A/ja
Publication of JPH10172899A5 publication Critical patent/JPH10172899A5/ja
Application granted granted Critical
Publication of JP3716420B2 publication Critical patent/JP3716420B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP34065396A 1996-12-05 1996-12-05 露光装置の光学調整方法 Expired - Fee Related JP3716420B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34065396A JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34065396A JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

Publications (3)

Publication Number Publication Date
JPH10172899A JPH10172899A (ja) 1998-06-26
JPH10172899A5 true JPH10172899A5 (enExample) 2005-01-06
JP3716420B2 JP3716420B2 (ja) 2005-11-16

Family

ID=18339039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34065396A Expired - Fee Related JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

Country Status (1)

Country Link
JP (1) JP3716420B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1143491A4 (en) * 1998-11-19 2003-11-26 Nikon Corp OPTICAL COMPONENT, EXPOSURE SYSTEM, LASER BEAM SOURCE, GAS SUPPLY PROCESS, EXPOSURE PROCESS AND COMPONENT PRODUCTION PROCESS
TWI311691B (en) * 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method

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