JP3716420B2 - 露光装置の光学調整方法 - Google Patents

露光装置の光学調整方法 Download PDF

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Publication number
JP3716420B2
JP3716420B2 JP34065396A JP34065396A JP3716420B2 JP 3716420 B2 JP3716420 B2 JP 3716420B2 JP 34065396 A JP34065396 A JP 34065396A JP 34065396 A JP34065396 A JP 34065396A JP 3716420 B2 JP3716420 B2 JP 3716420B2
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Japan
Prior art keywords
optical system
exposure
projection optical
optical
nitrogen
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Expired - Fee Related
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JP34065396A
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English (en)
Japanese (ja)
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JPH10172899A (ja
JPH10172899A5 (enExample
Inventor
哲男 高橋
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Nikon Corp
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Nikon Corp
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Priority to JP34065396A priority Critical patent/JP3716420B2/ja
Publication of JPH10172899A publication Critical patent/JPH10172899A/ja
Publication of JPH10172899A5 publication Critical patent/JPH10172899A5/ja
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Publication of JP3716420B2 publication Critical patent/JP3716420B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP34065396A 1996-12-05 1996-12-05 露光装置の光学調整方法 Expired - Fee Related JP3716420B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34065396A JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34065396A JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

Publications (3)

Publication Number Publication Date
JPH10172899A JPH10172899A (ja) 1998-06-26
JPH10172899A5 JPH10172899A5 (enExample) 2005-01-06
JP3716420B2 true JP3716420B2 (ja) 2005-11-16

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ID=18339039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34065396A Expired - Fee Related JP3716420B2 (ja) 1996-12-05 1996-12-05 露光装置の光学調整方法

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JP (1) JP3716420B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1143491A4 (en) * 1998-11-19 2003-11-26 Nikon Corp OPTICAL COMPONENT, EXPOSURE SYSTEM, LASER BEAM SOURCE, GAS SUPPLY PROCESS, EXPOSURE PROCESS AND COMPONENT PRODUCTION PROCESS
TWI311691B (en) * 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JPH10172899A (ja) 1998-06-26

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