JP2003174173A5 - - Google Patents

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Publication number
JP2003174173A5
JP2003174173A5 JP2002054875A JP2002054875A JP2003174173A5 JP 2003174173 A5 JP2003174173 A5 JP 2003174173A5 JP 2002054875 A JP2002054875 A JP 2002054875A JP 2002054875 A JP2002054875 A JP 2002054875A JP 2003174173 A5 JP2003174173 A5 JP 2003174173A5
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JP
Japan
Prior art keywords
film
gate electrode
main component
semiconductor device
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002054875A
Other languages
English (en)
Japanese (ja)
Other versions
JP4079655B2 (ja
JP2003174173A (ja
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Publication date
Application filed filed Critical
Priority to JP2002054875A priority Critical patent/JP4079655B2/ja
Priority claimed from JP2002054875A external-priority patent/JP4079655B2/ja
Publication of JP2003174173A publication Critical patent/JP2003174173A/ja
Publication of JP2003174173A5 publication Critical patent/JP2003174173A5/ja
Application granted granted Critical
Publication of JP4079655B2 publication Critical patent/JP4079655B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002054875A 2001-02-28 2002-02-28 半導体装置およびその作製方法 Expired - Fee Related JP4079655B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002054875A JP4079655B2 (ja) 2001-02-28 2002-02-28 半導体装置およびその作製方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001056063 2001-02-28
JP2001-56063 2001-02-28
JP2001-302687 2001-09-28
JP2001302687 2001-09-28
JP2002054875A JP4079655B2 (ja) 2001-02-28 2002-02-28 半導体装置およびその作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2004356650A Division JP4593256B2 (ja) 2001-02-28 2004-12-09 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2003174173A JP2003174173A (ja) 2003-06-20
JP2003174173A5 true JP2003174173A5 (enrdf_load_stackoverflow) 2005-07-21
JP4079655B2 JP4079655B2 (ja) 2008-04-23

Family

ID=27346133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002054875A Expired - Fee Related JP4079655B2 (ja) 2001-02-28 2002-02-28 半導体装置およびその作製方法

Country Status (1)

Country Link
JP (1) JP4079655B2 (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100544138B1 (ko) * 2003-11-12 2006-01-23 삼성에스디아이 주식회사 액티브 매트릭스형 유기전계발광소자
US7563658B2 (en) 2004-12-27 2009-07-21 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP5525224B2 (ja) 2008-09-30 2014-06-18 株式会社半導体エネルギー研究所 表示装置
WO2010038820A1 (en) * 2008-10-03 2010-04-08 Semiconductor Energy Laboratory Co., Ltd. Display device
US8106400B2 (en) 2008-10-24 2012-01-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9311129D0 (en) * 1993-05-28 1993-07-14 Philips Electronics Uk Ltd Electronic devices with-film circuit elements forming a sampling circuit
JP3402400B2 (ja) * 1994-04-22 2003-05-06 株式会社半導体エネルギー研究所 半導体集積回路の作製方法
JP3622934B2 (ja) * 1996-07-31 2005-02-23 エルジー フィリップス エルシーディー カンパニー リミテッド 薄膜トランジスタ型液晶表示装置
JP3765194B2 (ja) * 1998-01-19 2006-04-12 株式会社日立製作所 液晶表示装置
JP4583529B2 (ja) * 1998-11-09 2010-11-17 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
JP2000349301A (ja) * 1999-04-01 2000-12-15 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法

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