JP2003162043A5 - - Google Patents

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Publication number
JP2003162043A5
JP2003162043A5 JP2001360316A JP2001360316A JP2003162043A5 JP 2003162043 A5 JP2003162043 A5 JP 2003162043A5 JP 2001360316 A JP2001360316 A JP 2001360316A JP 2001360316 A JP2001360316 A JP 2001360316A JP 2003162043 A5 JP2003162043 A5 JP 2003162043A5
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JP
Japan
Prior art keywords
phase shift
shift mask
pattern
inspection
dimensional change
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Application number
JP2001360316A
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English (en)
Japanese (ja)
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JP2003162043A (ja
JP4023141B2 (ja
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Priority to JP2001360316A priority Critical patent/JP4023141B2/ja
Priority claimed from JP2001360316A external-priority patent/JP4023141B2/ja
Publication of JP2003162043A publication Critical patent/JP2003162043A/ja
Publication of JP2003162043A5 publication Critical patent/JP2003162043A5/ja
Application granted granted Critical
Publication of JP4023141B2 publication Critical patent/JP4023141B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001360316A 2001-11-27 2001-11-27 位相シフトマスクの検査方法 Expired - Fee Related JP4023141B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001360316A JP4023141B2 (ja) 2001-11-27 2001-11-27 位相シフトマスクの検査方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001360316A JP4023141B2 (ja) 2001-11-27 2001-11-27 位相シフトマスクの検査方法

Publications (3)

Publication Number Publication Date
JP2003162043A JP2003162043A (ja) 2003-06-06
JP2003162043A5 true JP2003162043A5 (zh) 2005-06-30
JP4023141B2 JP4023141B2 (ja) 2007-12-19

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ID=19171158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001360316A Expired - Fee Related JP4023141B2 (ja) 2001-11-27 2001-11-27 位相シフトマスクの検査方法

Country Status (1)

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JP (1) JP4023141B2 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005026360A (ja) 2003-06-30 2005-01-27 Toshiba Corp フォトマスクの欠陥検査方法、半導体装置の製造方法、およびフォトマスクの製造方法
JP5330019B2 (ja) * 2009-02-18 2013-10-30 ルネサスエレクトロニクス株式会社 マスクパターンの検査方法およびマスクパターン検査装置
JP2014154405A (ja) 2013-02-08 2014-08-25 Toshiba Corp 有機電界発光素子、照明装置及び照明システム
CN116203802B (zh) * 2022-10-12 2024-03-29 北京超弦存储器研究院 晶圆光刻参数获取方法和装置及晶圆光刻实现方法和装置

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