JP2003114387A - 反射屈折光学系および該光学系を備える投影露光装置 - Google Patents

反射屈折光学系および該光学系を備える投影露光装置

Info

Publication number
JP2003114387A
JP2003114387A JP2001308754A JP2001308754A JP2003114387A JP 2003114387 A JP2003114387 A JP 2003114387A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A JP2003114387 A JP 2003114387A
Authority
JP
Japan
Prior art keywords
optical system
mirror
catadioptric
image
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001308754A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003114387A5 (enExample
Inventor
Yasuhiro Omura
泰弘 大村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2001308754A priority Critical patent/JP2003114387A/ja
Publication of JP2003114387A publication Critical patent/JP2003114387A/ja
Publication of JP2003114387A5 publication Critical patent/JP2003114387A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001308754A 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置 Pending JP2003114387A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Publications (2)

Publication Number Publication Date
JP2003114387A true JP2003114387A (ja) 2003-04-18
JP2003114387A5 JP2003114387A5 (enExample) 2005-08-18

Family

ID=19128013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001308754A Pending JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Country Status (1)

Country Link
JP (1) JP2003114387A (enExample)

Cited By (40)

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WO2004107011A1 (ja) * 2003-05-06 2004-12-09 Nikon Corporation 投影光学系、露光装置及び露光方法
JP2005115127A (ja) * 2003-10-09 2005-04-28 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
WO2005098506A1 (en) * 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Catadioptric projection objective
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
EP1828829A1 (de) * 2004-12-23 2007-09-05 Carl Zeiss SMT AG Hochaperturiges objektiv mit obskurierter pupille
US7309870B2 (en) 2003-05-06 2007-12-18 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP2008516434A (ja) * 2004-10-08 2008-05-15 カール ツァイス エスエムテー アクチェンゲゼルシャフト 投影光学系
US7385756B2 (en) 2004-01-14 2008-06-10 Carl Zeiss Smt Ag Catadioptric projection objective
CN100405119C (zh) * 2003-05-06 2008-07-23 株式会社尼康 投影光学系统、曝光装置及曝光方法
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US7557996B2 (en) 2005-04-29 2009-07-07 Carl Zeiss Smt Ag Projection objective
JP2010026526A (ja) * 2009-10-26 2010-02-04 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US7672047B2 (en) 2004-01-14 2010-03-02 Carl Zeiss Smt Ag Catadioptric projection objective
US7682031B2 (en) 2004-12-23 2010-03-23 Carl Zeiss Smt Ag Catoptric objectives and systems using catoptric objectives
EP2189848A2 (en) 2004-07-14 2010-05-26 Carl Zeiss SMT AG Catadioptric projection objective
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7755839B2 (en) 2003-12-19 2010-07-13 Carl Zeiss Smt Ag Microlithography projection objective with crystal lens
US7869138B2 (en) 2006-03-27 2011-01-11 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus with negative back focus of the entry pupil
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
JP2011257762A (ja) * 2011-07-04 2011-12-22 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US8169694B2 (en) 2005-09-13 2012-05-01 Carl Zeiss Smt Gmbh Catoptric objectives and systems using catoptric objectives
US8199400B2 (en) 2004-01-14 2012-06-12 Carl Zeiss Smt Gmbh Catadioptric projection objective
US8411251B2 (en) 2006-12-28 2013-04-02 Carl Zeiss Smt Gmbh Optical element and illumination optics for microlithography
JP2013191871A (ja) * 2013-05-13 2013-09-26 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8705005B2 (en) 2006-02-17 2014-04-22 Carl Zeiss Smt Gmbh Microlithographic illumination system
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
JP2015096959A (ja) * 2005-05-12 2015-05-21 株式会社ニコン 投影光学系、露光装置、および露光方法
JP2016075931A (ja) * 2015-11-30 2016-05-12 株式会社ニコン 露光装置、露光方法およびデバイス製造方法
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10488759B2 (en) 2005-05-03 2019-11-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective

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US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
CN100405119C (zh) * 2003-05-06 2008-07-23 株式会社尼康 投影光学系统、曝光装置及曝光方法
KR101516142B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
EP2722702A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
EP2722704A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
US10156792B2 (en) 2003-05-06 2018-12-18 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9846366B2 (en) 2003-05-06 2017-12-19 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
KR101790914B1 (ko) 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7309870B2 (en) 2003-05-06 2007-12-18 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US7312463B2 (en) 2003-05-06 2007-12-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
EP1630585A4 (en) * 2003-05-06 2010-07-14 Nikon Corp OPTICAL PROJECTION SYSTEM AND EXPOSURE DEVICE AND EXPOSURE METHOD
US9606443B2 (en) 2003-05-06 2017-03-28 Nikon Corporation Reducing immersion projection optical system
KR101194449B1 (ko) 2003-05-06 2012-10-24 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 마이크로 디바이스 제조 방법
US9500943B2 (en) 2003-05-06 2016-11-22 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9933705B2 (en) 2003-05-06 2018-04-03 Nikon Corporation Reduction projection optical system, exposure apparatus, and exposure method
US9086635B2 (en) 2003-05-06 2015-07-21 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2004107011A1 (ja) * 2003-05-06 2004-12-09 Nikon Corporation 投影光学系、露光装置及び露光方法
US9081295B2 (en) 2003-05-06 2015-07-14 Nikon Corporation Catadioptric projection optical system, exposure apparatus, and exposure method
KR101521407B1 (ko) * 2003-05-06 2015-05-18 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101647934B1 (ko) 2003-05-06 2016-08-11 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101516141B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101516140B1 (ko) 2003-05-06 2015-05-04 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR20150034817A (ko) * 2003-05-06 2015-04-03 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
KR101481935B1 (ko) * 2003-05-06 2015-01-14 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
EP2722703A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
EP2672307A3 (en) * 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US7190530B2 (en) 2003-08-12 2007-03-13 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
JP2005115127A (ja) * 2003-10-09 2005-04-28 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
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