JP2003100733A5 - - Google Patents

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Publication number
JP2003100733A5
JP2003100733A5 JP2001298025A JP2001298025A JP2003100733A5 JP 2003100733 A5 JP2003100733 A5 JP 2003100733A5 JP 2001298025 A JP2001298025 A JP 2001298025A JP 2001298025 A JP2001298025 A JP 2001298025A JP 2003100733 A5 JP2003100733 A5 JP 2003100733A5
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JP
Japan
Prior art keywords
electrode
gap
voltage application
substrate
processing apparatus
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Granted
Application number
JP2001298025A
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English (en)
Japanese (ja)
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JP2003100733A (ja
JP3722733B2 (ja
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Priority to JP2001298025A priority Critical patent/JP3722733B2/ja
Priority claimed from JP2001298025A external-priority patent/JP3722733B2/ja
Publication of JP2003100733A publication Critical patent/JP2003100733A/ja
Publication of JP2003100733A5 publication Critical patent/JP2003100733A5/ja
Application granted granted Critical
Publication of JP3722733B2 publication Critical patent/JP3722733B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001298025A 2001-09-27 2001-09-27 放電プラズマ処理装置 Expired - Fee Related JP3722733B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001298025A JP3722733B2 (ja) 2001-09-27 2001-09-27 放電プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001298025A JP3722733B2 (ja) 2001-09-27 2001-09-27 放電プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2003100733A JP2003100733A (ja) 2003-04-04
JP2003100733A5 true JP2003100733A5 (https=) 2005-08-11
JP3722733B2 JP3722733B2 (ja) 2005-11-30

Family

ID=19118993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001298025A Expired - Fee Related JP3722733B2 (ja) 2001-09-27 2001-09-27 放電プラズマ処理装置

Country Status (1)

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JP (1) JP3722733B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009119356A (ja) * 2007-11-14 2009-06-04 Toshiba Corp 放電表面処理装置及び放電表面処理方法
JP2010103455A (ja) * 2008-09-26 2010-05-06 Mitsubishi Electric Corp プラズマ処理装置
JP5025614B2 (ja) * 2008-10-21 2012-09-12 三菱電機株式会社 大気圧プラズマ処理方法
JP2010227897A (ja) * 2009-03-30 2010-10-14 Toray Eng Co Ltd 塗布装置システム及び塗布基板の作製方法
US10121655B2 (en) * 2015-11-20 2018-11-06 Applied Materials, Inc. Lateral plasma/radical source
JP7510037B2 (ja) * 2019-08-06 2024-07-03 ザ ロイヤル インスティテューション フォー ザ アドバンスメント オブ ラーニング／マクギル ユニバーシティ 変換可能なプラズマ源および方法

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