JP2003077883A5 - - Google Patents
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- JP2003077883A5 JP2003077883A5 JP2001268424A JP2001268424A JP2003077883A5 JP 2003077883 A5 JP2003077883 A5 JP 2003077883A5 JP 2001268424 A JP2001268424 A JP 2001268424A JP 2001268424 A JP2001268424 A JP 2001268424A JP 2003077883 A5 JP2003077883 A5 JP 2003077883A5
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Description
【０００１】
【発明の属する技術分野】
本発明は、液晶デバイスの製造工程において、液晶ディスプレイ（Liquid Crystal Display：ＬＣＤ）等に使用されるガラス基板に対し所定の液処理を行った後に、ガラス基板を乾燥させる基板乾燥方法、基板乾燥装置及び液処理装置に関する。[0001]
Field of the Invention
The present invention relates to a substrate drying method for drying a glass substrate after performing a predetermined liquid treatment on a glass substrate used for a liquid crystal display (LCD) or the like in a manufacturing process of a liquid crystal device , and a substrate drying apparatus And a liquid processing apparatus .
【００１２】
本発明の一の形態によれば、前記工程（ａ）は、（ｃ）前記搬送される基板の前端を検知し、この検知に基づいて前記前端付近の領域に第１の風量でエアを噴出する工程と、（ｄ）前記前端を検知した後、所定時間経過後に前記後端付近の領域に第１の風量でエアを噴出する工程とを具備する。例えば、工程（ｃ）の検知を光センサにより行うことも可能である。また一方、工程（ｃ）の検知を、基板に対しエアが当るときの「音」の変動に基づいて行うことも可能である。例えばこの「音」の強さ、周波数、音色等の変化に基づいて、基板の搬送速度を変化させることにより、基板全面にわたってばらつきなく処理液を完全に除去することができ乾燥ムラの発生を防止することができる。[0012]
According to one aspect of the present invention, the step (a) detects (c) the front end of the transported substrate, and based on the detection, ejects air with a first air volume in a region near the front end. And (d) ejecting the air with a first air volume in a region near the rear end after a predetermined time has elapsed after detecting the front end. For example, the detection of step (c) can be performed by an optical sensor. On the other hand, it is also possible to perform the detection of the step (c) based on the fluctuation of the "sound" when the air hits the substrate . For example, by changing the transfer speed of the substrate based on the change in the intensity, frequency, timbre, etc. of the "sound", the processing liquid can be completely removed without variation over the entire surface of the substrate, preventing the occurrence of uneven drying. can do.
【００１５】
本発明の一の形態によれば、前記工程（ａ）は、（ｃ）前記搬送される基板の前端を検知し、この検知に基づいて基板の搬送速度を第１の速度にする工程と、（ｄ）前記前端を検知した後、所定時間経過後に基板の搬送速度を第２の速度にする工程とを具備する。例えば、工程（ｃ）を光センサにより行うことも可能であるし、基板に対しエアが当るときの音の変動に基づいて行うことも可能である。[0015]
According to one aspect of the present invention, the step (a) detects (c) the front end of the transported substrate, and based on the detection, setting the substrate transport speed to a first speed; And (d) setting the transport speed of the substrate to a second speed after a predetermined time has elapsed after detecting the front end. For example, the step (c) can be performed by an optical sensor, or can be performed based on the variation of sound when air strikes the substrate.
【００２０】
本発明に係る第２の観点に係る基板乾燥装置は、基板を搬送させる搬送手段と、前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、前記搬送される基板の前端付近及び後端付近が所定の位置に到達したときに、基板の搬送速度を第１の速度にし、前記前端付近及び後端付近が前記所定の位置を通過した後に、基板の搬送速度を前記第１の速度と異なる第２の速度にする手段とを具備する。[0020]
According to a second aspect of the present invention, there is provided a substrate drying apparatus comprising: a transfer means for transferring a substrate; an air discharge means for discharging air to the substrate transferred by the transfer means; and drying the substrate When the vicinity of the front end and the vicinity of the rear end of the substrate reaches a predetermined position, the transport speed of the substrate is set to the first speed, and the substrate is conveyed after the vicinity of the front end and the vicinity of the rear end pass the predetermined position. And means for making the velocity a second velocity different from the first velocity.
【００２１】
このような構成によれば、例えば第１の搬送速度を第２の搬送速度よりも遅くすることにより、基板全面にわたってばらつきなく処理液を完全に除去することができ、乾燥ムラの発生を防止することができる。特に基板の前端付近及び後端付近で残存することがあった処理液を除去することができる。
本発明の一の形態によれば、前記第１の風量から前記第２の風量まで、又は、前記第２の風量から前記第１の風量まで徐々に風量を変化させる。
本発明の一の形態によれば、基板の速度を可変する。
本発明に係る第３の観点に係る液処理装置は、基板に液を供給して液処理を行う液処理装置であって、基板を搬送させる搬送手段と、前記搬送手段により搬送される基板に対し液を供給する手段と、前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、前記エア噴出手段から噴出されるエアの風量を、前記搬送される基板の前端付近及び後端付近の領域で第１の風量にし、前記前端付近及び後端付近以外の領域で前記第１の風量より少ない第２の風量に制御する手段とを具備する。
本発明に係る第４の観点に係る液処理装置は、基板に液を供給して液処理を行う液処理装置であって、基板を搬送させる搬送手段と、前記搬送手段により搬送される基板に対し液を供給する手段と、前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、前記エア噴出手段から噴出されるエアの風量を、前記搬送される基板の前端付近の領域で第１の風量にし、前記前端付近及び後端付近以外の領域で前記第１の風量より少ない第２の風量にし、前記搬送される基板の後端付近の領域で前記第１の風量より大きな風量に制御する手段とを具備する。
本発明の一の形態によれば、基板の前端付近の領域内において、前記第１の風量から段階的も若しくは線形的に風量を減少させ、及び／又は基板の前端付近及び後端付近以外の領域から基板の後端付近の領域にかけて段階的若しくは線形的に風量を増加させることを特徴とする。
本発明に係る第４の観点に係る液処理装置は、基板に液を供給して液処理を行う液処理装置であって、基板を搬送させる搬送手段と、前記搬送手段により搬送される基板に対し液を供給する手段と、前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、前記搬送される基板の前端が所定の位置に到達したときに、基板の搬送速度を第１の速度にして基板の前端付近の領域にエアを供給し、所定時間経過後に搬送速度を上げて基板の前端付近及び後端付近以外の領域エアを供給し、更に所定時間後搬送速度を減速して基板の後端付近の領域にエアを供給し、基板の後端が前記エア噴出手段を通過した後に再び搬送速度を上げるように制御する手段とを具備する。
本発明の一の形態によれば、基板の後端付近の領域にエアが供給されるときの基板の搬送速度を、前記第１の搬送速度より遅くすることを特徴とする。
本発明の一の形態によれば、エアの音の変動を検知することにより、基板の前端が所定の位置に到達したと検知する手段を有することを特徴とする。 [0021]
According to such a configuration, for example, by setting the first transport speed to be slower than the second transport speed, the processing liquid can be completely removed without variation over the entire surface of the substrate, and the occurrence of uneven drying can be prevented. be able to. In particular, the processing liquid that may remain near the front end and the rear end of the substrate can be removed.
According to one aspect of the present invention, the air volume is gradually changed from the first air volume to the second air volume, or from the second air volume to the first air volume.
According to one aspect of the invention, the speed of the substrate is varied.
A liquid processing apparatus according to a third aspect of the present invention is a liquid processing apparatus for supplying a liquid to a substrate to perform liquid processing, comprising: a transport unit for transporting a substrate; and a substrate transported by the transport unit. A means for supplying a liquid, an air jetting means for jetting air to the substrate carried by the carrying means to dry the substrate, and a volume of air jetted from the air jetting means, the substrate carried Means for controlling the first air volume in the area near the front end and the rear end of the vehicle, and controlling the second air volume smaller than the first air volume in the area other than the areas near the front end and the rear end.
A liquid processing apparatus according to a fourth aspect of the present invention is a liquid processing apparatus for supplying a liquid to a substrate to perform liquid processing, comprising: a transport unit for transporting the substrate; and the substrate transported by the transport unit. A means for supplying a liquid, an air jetting means for jetting air to the substrate carried by the carrying means to dry the substrate, and a volume of air jetted from the air jetting means, the substrate carried The first air volume in the region near the front end of the substrate, and the second air volume less than the first air volume in the region other than the vicinity of the front edge and the vicinity of the rear edge; And means for controlling the air volume to be larger than the air volume of 1.
According to one aspect of the present invention, in the area near the front end of the substrate, the air volume is reduced stepwise or linearly from the first air volume, and / or other than near the front end and near the rear end of the substrate The air volume is increased stepwise or linearly from the area to the area near the rear end of the substrate.
A liquid processing apparatus according to a fourth aspect of the present invention is a liquid processing apparatus for supplying a liquid to a substrate to perform liquid processing, comprising: a transport unit for transporting the substrate; and the substrate transported by the transport unit. A means for supplying a liquid, an air jetting means for jetting air to the substrate transported by the transporting means to dry the substrate, and a substrate when the front end of the transported substrate reaches a predetermined position Air is supplied to the area near the front end of the substrate at a first transfer speed, and after an elapse of a predetermined time, the transfer speed is increased to supply area air other than near the front end and near the rear end of the substrate; And means for supplying air to a region near the rear end of the substrate by reducing the post-conveying speed, and controlling to increase the conveying speed again after the rear end of the substrate passes through the air jetting means.
According to one aspect of the present invention, the transport speed of the substrate when air is supplied to the area near the rear end of the substrate is set to be slower than the first transport speed.
According to one aspect of the present invention, the apparatus is characterized by having means for detecting that the front end of the substrate has reached a predetermined position by detecting the variation of the sound of air.
Claims (18)
（ａ）前記搬送される基板の前端付近及び後端付近の領域に、第１の風量でエアを噴出する工程と、
（ｂ）前記基板の前端付近及び後端付近以外の領域に、前記第１の風量と異なる第２の風量でエアを噴出する工程と
を具備することを特徴とする基板乾燥方法。In the substrate drying method of drying while transporting the substrate,
(A) a step of ejecting air with a first air volume to the area near the front end and the rear end of the substrate to be transported;
(B) A substrate drying method comprising the steps of: injecting air in a region other than the vicinity of the front end and the rear end of the substrate with a second air volume different from the first air volume.
前記工程（ａ）は、
（ｃ）前記搬送される基板の前端を検知し、この検知に基づいて前記前端付近の領域に第１の風量でエアを噴出する工程と、
（ｄ）前記前端を検知した後、所定時間経過後に前記後端付近の領域に第１の風量でエアを噴出する工程と
を具備することを特徴とする基板乾燥方法。In the substrate drying method according to claim 1,
In the step (a),
(C) detecting the front end of the transported substrate, and based on the detection, ejecting air with a first air volume to an area near the front end;
(D) A substrate drying method comprising the steps of: ejecting air with a first air volume to a region near the rear end after a predetermined time has elapsed after detecting the front end.
（ａ）前記搬送される基板の前端付近及び後端付近が前記所定の位置に到達したときに、基板の搬送速度を第１の速度にする工程と、
（ｂ）前記前端付近及び後端付近が前記所定の位置を通過した後に、基板の搬送速度を前記第１の速度と異なる第２の速度にする工程と
を具備することを特徴とする基板乾燥方法。In the substrate drying method, the air is blown to the substrate at a predetermined position and dried while transporting the substrate.
(A) setting the transport speed of the substrate to a first speed when the vicinity of the front end and the rear end of the transported substrate reach the predetermined position;
(B) setting the transport speed of the substrate to a second speed different from the first speed after the vicinity of the front end and the vicinity of the rear end have passed the predetermined position. Method.
前記工程（ａ）は、
（ｃ）前記搬送される基板の前端を検知し、この検知に基づいて基板の搬送速度を第１の速度にする工程と、
（ｄ）前記前端を検知した後、所定時間経過後に基板の搬送速度を第２の速度にする工程と
を具備することを特徴とする基板乾燥方法。In the substrate drying method according to claim 3,
In the step (a),
(C) detecting the front end of the transported substrate, and setting the substrate transport speed to a first speed based on the detection;
(D) setting a transfer speed of the substrate to a second speed after a predetermined time has elapsed after detecting the front end, and drying the substrate.
前記工程（ｃ）の検知は、光センサにより行うことを特徴とする基板乾燥方法。In the substrate drying method according to claim 2 or 4,
The substrate drying method, wherein the detection in the step (c) is performed by an optical sensor.
前記工程（ｃ）の検知は、基板に対しエアが当るときの音の変動に基づいて行うことを特徴とする基板乾燥方法。 In the substrate drying method according to claim 2 or 4,
A substrate drying method characterized in that the detection in the step (c) is performed based on the variation of sound when air hits the substrate.
前記エアを噴出し、前記基板の前端又は後端の一辺に対して所定の角度を有する長尺状のノズルを備え、
前記長尺状のノズルにおける、前記基板の前端に近い方の部位から噴出されるエアの風量を、前記基板の後端に近い方の部位から噴出されるエアの風量と異なるようにすることを特徴とする基板乾燥方法。In the substrate drying method according to claim 1 or 3,
The air is jetted, and an elongated nozzle having a predetermined angle with one side of the front end or the rear end of the substrate is provided.
In the elongated nozzle, the air volume of the air ejected from the portion closer to the front end of the substrate is made different from the air volume of the air ejected from the portion closer to the rear end of the substrate. The substrate drying method characterized by
前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、
前記エア噴出手段から噴出されるエアの風量を、前記搬送される基板の前端付近及び後端付近の領域で第１の風量にし、前記前端付近及び後端付近以外の領域で前記第１の風量と異なる第２の風量に制御する手段と
を具備することを特徴とする基板乾燥装置。Transport means for transporting the substrate;
An air jet unit that jets air to the substrate transported by the transport unit to dry the substrate;
The air volume of the air jetted from the air jetting means is made the first air volume in the area near the front end and the rear end of the transported substrate, and the first air volume in the area other than the vicinity of the front end and the rear end And d) a second air flow rate control means.
前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、
前記搬送される基板の前端付近及び後端付近が所定の位置に到達したときに、基板の搬送速度を第１の速度にし、前記前端付近及び後端付近が前記所定の位置を通過した後に、基板の搬送速度を前記第１の速度と異なる第２の速度にする手段と
を具備することを特徴とする基板乾燥装置。Transport means for transporting the substrate;
An air jet unit that jets air to the substrate transported by the transport unit to dry the substrate;
When the vicinity of the front end and the rear end of the substrate to be conveyed reaches a predetermined position , the conveyance speed of the substrate is set to the first speed, and the vicinity of the front end and the vicinity of the rear end pass the predetermined position. Means for setting the transfer speed of the substrate to a second speed different from the first speed.
前記エア噴出手段は、前記基板の前端又は後端の一辺に対して所定の角度を有する長尺状のノズルを備え、
前記長尺状のノズルにおける、前記基板の前端に近い方の部位から噴出されるエアの風量を、前記基板の後端に近い方の部位から噴出されるエアの風量と異なるようにすることを特徴とする基板乾燥装置。The substrate drying apparatus according to claim 8 or 9,
The air jetting means comprises a long nozzle having a predetermined angle with respect to one side of the front end or the rear end of the substrate,
In the elongated nozzle, the air volume of the air ejected from the portion closer to the front end of the substrate is made different from the air volume of the air ejected from the portion closer to the rear end of the substrate. A substrate drying device characterized by
基板を搬送させる搬送手段と、Transport means for transporting the substrate;
前記搬送手段により搬送される基板に対し液を供給する手段と、Means for supplying liquid to the substrate transported by the transport means;
前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、An air jet unit that jets air to the substrate transported by the transport unit to dry the substrate;
前記エア噴出手段から噴出されるエアの風量を、前記搬送される基板の前端付近及び後端付近の領域で第１の風量にし、前記前端付近及び後端付近以外の領域で前記第１の風量より少ない第２の風量に制御する手段とThe air volume of the air jetted from the air jetting means is made the first air volume in the area near the front end and the rear end of the transported substrate, and the first air volume in the area other than the vicinity of the front end and the rear end And means for controlling the second air volume
を具備することを特徴とする液処理装置。A liquid processing apparatus comprising:
基板を搬送させる搬送手段と、Transport means for transporting the substrate;
前記搬送手段により搬送される基板に対し液を供給する手段と、Means for supplying liquid to the substrate transported by the transport means;
前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、An air jet unit that jets air to the substrate transported by the transport unit to dry the substrate;
前記エア噴出手段から噴出されるエアの風量を、前記搬送される基板の前端付近の領域で第１の風量にし、前記前端付近及び後端付近以外の領域で前記第１の風量より少ない第２の風量にし、前記搬送される基板の後端付近の領域で前記第１の風量より大きな風量に制御する手段とThe air volume of the air jetted from the air jetting means is made the first air volume in the area near the front end of the transported substrate, and the second air volume is smaller than the first air volume in the area other than the vicinity of the front edge and the vicinity of the rear end Means for controlling the air volume to be larger than the first air volume in a region near the rear end of the substrate to be transported.
を具備することを特徴とする液処理装置。 A liquid processing apparatus comprising:
基板を搬送させる搬送手段と、Transport means for transporting the substrate;
前記搬送手段により搬送される基板に対し液を供給する手段と、Means for supplying liquid to the substrate transported by the transport means;
前記搬送手段により搬送される基板に対しエアを噴出して基板を乾燥させるエア噴出手段と、An air jet unit that jets air to the substrate transported by the transport unit to dry the substrate;
前記搬送される基板の前端が所定の位置に到達したときに、基板の搬送速度を第１の速度にして基板の前端付近の領域にエアを供給し、所定時間経過後に搬送速度を上げて基板の前端付近及び後端付近以外の領域にエアを供給し、更に所定時間後搬送速度を減速して基板の後端付近の領域にエアを供給し、基板の後端が前記エア噴出手段を通過した後に再び搬送速度を上げるように制御する手段とWhen the front end of the substrate to be conveyed reaches a predetermined position, the substrate conveyance speed is set to the first speed, air is supplied to the area near the front end of the substrate, and the conveyance speed is increased after a predetermined time has elapsed. The air is supplied to the area other than the vicinity of the front end and the rear end of the substrate, and after a predetermined time, the transport speed is reduced to supply the air to the area near the rear end of the substrate. Control means to increase the transport speed again after
を具備することを特徴とする液処理装置。A liquid processing apparatus comprising:
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001268424A JP3790691B2 (en) | 2001-09-05 | 2001-09-05 | Substrate drying method and substrate drying apparatus |
| KR1020020053401A KR100877146B1 (en) | 2001-09-05 | 2002-09-05 | Substrate drying method and substrate drying apparatus |
| KR1020080041036A KR100886020B1 (en) | 2001-09-05 | 2008-05-01 | Substrate drying method and substrate drying apparatus |
| KR1020080041040A KR100854466B1 (en) | 2001-09-05 | 2008-05-01 | Substrate drying method and substrate drying apparatus |
| KR1020080091039A KR100899608B1 (en) | 2001-09-05 | 2008-09-17 | Substrate drying method and substrate drying apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001268424A JP3790691B2 (en) | 2001-09-05 | 2001-09-05 | Substrate drying method and substrate drying apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003077883A JP2003077883A (en) | 2003-03-14 |
| JP2003077883A5 true JP2003077883A5 (en) | 2004-09-16 |
| JP3790691B2 JP3790691B2 (en) | 2006-06-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001268424A Expired - Fee Related JP3790691B2 (en) | 2001-09-05 | 2001-09-05 | Substrate drying method and substrate drying apparatus |
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| JP (1) | JP3790691B2 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4152871B2 (en) | 2003-12-03 | 2008-09-17 | 東京エレクトロン株式会社 | Nozzle and substrate processing apparatus |
| JP4509613B2 (en) * | 2004-03-19 | 2010-07-21 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2006003036A (en) * | 2004-06-18 | 2006-01-05 | Shimada Phys & Chem Ind Co Ltd | Drying device |
| JP4557872B2 (en) * | 2005-11-28 | 2010-10-06 | 株式会社日立ハイテクノロジーズ | Substrate processing apparatus, substrate processing method, and substrate manufacturing method |
| JP4908316B2 (en) * | 2007-05-29 | 2012-04-04 | 株式会社日立ハイテクノロジーズ | Cleaning apparatus, flat panel display manufacturing apparatus and flat panel display |
| CN108847398B (en) * | 2018-05-16 | 2021-01-01 | 武汉华星光电半导体显示技术有限公司 | Air knife device for drying substrate |
| JP7451781B2 (en) | 2022-03-18 | 2024-03-18 | 芝浦メカトロニクス株式会社 | Substrate processing equipment |
| JP2023156115A (en) * | 2022-04-12 | 2023-10-24 | 日本電気硝子株式会社 | Device and method for manufacturing glass product |
| CN116287483B (en) * | 2023-03-23 | 2024-02-13 | 重庆能源职业学院 | Drying equipment with reciprocating motion structure |
-
2001
- 2001-09-05 JP JP2001268424A patent/JP3790691B2/en not_active Expired - Fee Related
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