JP2002544205A - 新規な光開始剤及びその応用 - Google Patents

新規な光開始剤及びその応用

Info

Publication number
JP2002544205A
JP2002544205A JP2000617198A JP2000617198A JP2002544205A JP 2002544205 A JP2002544205 A JP 2002544205A JP 2000617198 A JP2000617198 A JP 2000617198A JP 2000617198 A JP2000617198 A JP 2000617198A JP 2002544205 A JP2002544205 A JP 2002544205A
Authority
JP
Japan
Prior art keywords
alkyl
phenyl
substituted
coo
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000617198A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002544205A5 (enExample
Inventor
斉 山戸
真樹 大和
敏景 朝倉
啓 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2002544205A publication Critical patent/JP2002544205A/ja
Publication of JP2002544205A5 publication Critical patent/JP2002544205A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/54—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and unsaturated
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F295/00—Macromolecular compounds obtained by polymerisation using successively different catalyst types without deactivating the intermediate polymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L53/02—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers of vinyl-aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00—Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D153/02—Vinyl aromatic monomers and conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00—Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • C09J153/02—Vinyl aromatic monomers and conjugated dienes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Plural Heterocyclic Compounds (AREA)
JP2000617198A 1999-05-10 2000-04-27 新規な光開始剤及びその応用 Withdrawn JP2002544205A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP99810413.7 1999-05-10
EP99810413 1999-05-10
PCT/EP2000/003812 WO2000068218A1 (en) 1999-05-10 2000-04-27 Novel photoinitiators and their applications

Publications (2)

Publication Number Publication Date
JP2002544205A true JP2002544205A (ja) 2002-12-24
JP2002544205A5 JP2002544205A5 (enExample) 2007-08-23

Family

ID=8242821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000617198A Withdrawn JP2002544205A (ja) 1999-05-10 2000-04-27 新規な光開始剤及びその応用

Country Status (8)

Country Link
US (1) US6673850B1 (enExample)
EP (1) EP1177182B1 (enExample)
JP (1) JP2002544205A (enExample)
KR (1) KR100698799B1 (enExample)
AT (1) ATE346847T1 (enExample)
AU (1) AU4752200A (enExample)
DE (1) DE60032131T2 (enExample)
WO (1) WO2000068218A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120046161A (ko) * 2009-08-26 2012-05-09 제이에스알 가부시끼가이샤 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막
JP2013522445A (ja) * 2010-03-22 2013-06-13 ヘンケル コーポレイション マクロ光開始剤およびそれらの硬化性組成物

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EP1241196A3 (en) * 2001-03-12 2002-11-20 Ciba SC Holding AG ROMP with alkoxy ether groups
MXPA02002378A (es) 2001-03-12 2002-09-24 Ciba Sc Holding Ag "romp con grupos alcoxi eter".
US7237893B2 (en) 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
JP2004043433A (ja) * 2002-04-26 2004-02-12 Kitai Kagi Kofun Yugenkoshi モルフォリノケトン誘導体及びその用途
US7235195B2 (en) * 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
CA2535089A1 (en) * 2003-08-08 2005-02-17 Calhoun Vision Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
US20050065227A1 (en) * 2003-09-22 2005-03-24 Condon John R. Visible-light sensitive macro-initiator
JP4504142B2 (ja) * 2003-09-30 2010-07-14 大日本印刷株式会社 光ラジカル発生剤、感光性樹脂組成物及び、物品
US7141354B2 (en) 2003-09-30 2006-11-28 Dai Nippon Printing Co., Ltd. Photo radical generator, photo sensitive resin composition and article
US7713628B2 (en) * 2005-05-31 2010-05-11 Chemque, Inc. Actinic radiation curable coating compositions
EP3118841B1 (en) 2006-07-14 2021-01-06 Dexerials Corporation Resin composition and display apparatus
FR2909093B1 (fr) * 2006-11-28 2012-07-13 Arkema France Memoire optique 3d comprenant un copolymere a blocs contenant un monomere photoactif porteur d'un groupement photoisomerisable.
EP2144219A4 (en) * 2007-04-09 2010-07-07 Sony Chem & Inf Device Corp IMAGE DISPLAY DEVICE
JP2009186957A (ja) * 2007-04-09 2009-08-20 Sony Chemical & Information Device Corp 樹脂組成物及び表示装置
JP5401824B2 (ja) * 2007-04-09 2014-01-29 デクセリアルズ株式会社 画像表示装置
JP5470735B2 (ja) 2007-04-10 2014-04-16 デクセリアルズ株式会社 画像表示装置の製造方法
GB0708531D0 (en) * 2007-05-03 2007-06-13 Fujifilm Imaging Colorants Ltd Process, compound, ink and use
KR100825420B1 (ko) * 2007-10-24 2008-04-29 주식회사 코오롱 자외선 및 열 경화형 액정디스플레이 패널용 접착제의제조방법
CN101320208B (zh) * 2008-07-21 2011-06-01 上海复旦天臣新技术有限公司 反射全息薄膜及其制备方法
KR101355901B1 (ko) * 2009-06-29 2014-01-28 디아이씨 가부시끼가이샤 마이클 부가 반응물 및 활성 에너지선 경화성 조성물
US8022243B1 (en) * 2010-05-24 2011-09-20 Chitec Technology Co. Ltd. Low odour oligomeric photoinitiator and method of making the same
CN105392772B (zh) * 2014-03-20 2017-09-15 意大利合成制造有限公司 奥格列汀的关键中间体的制备方法
WO2016069416A1 (en) 2014-10-27 2016-05-06 Ctech Adhesives Llc Assembly processes using uv curable pressure sensitive adhesives (psa) or stageable psa systems
WO2018177488A1 (en) * 2017-03-31 2018-10-04 Coloplast A/S Acrylami de photoi ni ti ators
CN107569403B (zh) * 2017-08-02 2020-05-22 珠海市傲博化妆品有限公司 一种可酒精卸除的甲油胶及其制备方法
EP3668555B2 (en) 2017-08-17 2024-07-24 Coloplast A/S Polymeric coatings
CN107793503A (zh) * 2017-09-28 2018-03-13 大连天源基化学有限公司 一种紫外光引发剂及其合成方法
US11325304B2 (en) * 2018-10-26 2022-05-10 Continuous Composites Inc. System and method for additive manufacturing
KR102446362B1 (ko) 2019-10-15 2022-09-21 삼성에스디아이 주식회사 반도체 포토 레지스트용 조성물 및 이를 이용한 패턴 형성 방법
CN114591241B (zh) * 2022-03-14 2024-02-13 内蒙古扬帆新材料有限公司 一种含有吡唑啉和α-氨基酮的分子内敏化大分子光引发剂及其制备方法和应用

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EP0088050B1 (de) 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
DE3465636D1 (en) * 1983-02-18 1987-10-01 Ciba Geigy Ag Coloured photo-curable mouldings
GB8312721D0 (en) * 1983-05-09 1983-06-15 Vickers Plc Photoinitiators
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
DE3738567A1 (de) * 1987-03-12 1988-09-22 Merck Patent Gmbh Coreaktive fotoinitiatoren
EP0284561B1 (de) * 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
DE3880920T2 (de) * 1987-08-05 1993-10-07 Ciba Geigy Verbindungen.
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FR2697840B1 (fr) * 1992-11-10 1994-12-02 Rhone Poulenc Chimie Utilisation de diènes comme agent de transfert lors de la préparation de polymères.
AU6916394A (en) * 1993-06-04 1995-01-03 Henkel Corporation Citral acetal ethers of alpha-hydroxy phenyl ketones and polymerizable compositions
TW328535B (en) * 1993-07-02 1998-03-21 Novartis Ag Functional photoinitiators and their manufacture
US5506279A (en) * 1993-10-13 1996-04-09 Minnesota Mining And Manufacturing Company Acrylamido functional disubstituted acetyl aryl ketone photoinitiators
FI972611A0 (fi) * 1994-12-30 1997-06-18 Ciba Geigy Ag Siloksaanipitoiset verkkorakenteet
TW434456B (en) * 1994-12-30 2001-05-16 Novartis Ag A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate
TW353086B (en) * 1994-12-30 1999-02-21 Novartis Ag Method for multistep coating of a surface
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
FR2770219A1 (fr) 1997-10-24 1999-04-30 Atochem Elf Sa Procede de fabrication de copolymeres a architecture controlee a l'aide d'amorceurs radicalaires fonctionnels en polymerisation radicalaire vivante, et composes amorceurs et copolymeres correspondants
DE69917261T2 (de) 1998-05-29 2004-09-09 Ciba Specialty Chemicals Holding Inc. Photoinitiatoren und ihre Verwendungen

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120046161A (ko) * 2009-08-26 2012-05-09 제이에스알 가부시끼가이샤 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막
JP5640978B2 (ja) * 2009-08-26 2014-12-17 Jsr株式会社 新規化合物、その製造方法、この新規化合物を含有する感放射線性組成物及び硬化膜
KR101677505B1 (ko) 2009-08-26 2016-11-18 제이에스알 가부시끼가이샤 신규 화합물, 그 제조 방법, 이 신규 화합물을 함유하는 감방사선성 조성물 및 경화막
JP2013522445A (ja) * 2010-03-22 2013-06-13 ヘンケル コーポレイション マクロ光開始剤およびそれらの硬化性組成物

Also Published As

Publication number Publication date
US6673850B1 (en) 2004-01-06
DE60032131D1 (de) 2007-01-11
EP1177182B1 (en) 2006-11-29
DE60032131T2 (de) 2007-10-25
KR20010113921A (ko) 2001-12-28
ATE346847T1 (de) 2006-12-15
WO2000068218A1 (en) 2000-11-16
AU4752200A (en) 2000-11-21
EP1177182A1 (en) 2002-02-06
KR100698799B1 (ko) 2007-03-26

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