JP2002501627A - アルカリ性現像剤組成物及びそのリソグラフィー印刷プレート処理のための使用方法 - Google Patents
アルカリ性現像剤組成物及びそのリソグラフィー印刷プレート処理のための使用方法Info
- Publication number
- JP2002501627A JP2002501627A JP50068199A JP50068199A JP2002501627A JP 2002501627 A JP2002501627 A JP 2002501627A JP 50068199 A JP50068199 A JP 50068199A JP 50068199 A JP50068199 A JP 50068199A JP 2002501627 A JP2002501627 A JP 2002501627A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- printing plate
- weight
- alkali metal
- working
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.リソグラフィー印刷プレートの現像のための水性アルカリ性現像剤 組成物であって、当該組成物が、少なくとも12のpHを有し、 a)アルカリ金属ケイ酸塩、及び、 b)少なくとも6重量%のグリセリンを含み、 さらに、少なくとも0.0005重量%の、非イオン性フッ素界面活性 剤、リン酸エステルハイドロトロープ、またはこれらの混合物を含むことを特徴 とする組成物。 2.アルカリ金属ケイ酸塩が、紐成物1000g当たりのSiO2を少 なくとも20g、及び、Mをアルカリ金属としたときのM2Oに対するSiO2の 比率を少なくとも0.3とする量で存在する請求項1記載の組成物。 3.アルカリ金属ケイ酸塩が、組成物1000g当たりのSiO2を少 なくとも20から80g、及び、Mをアルカリ金属としたときのM2Oに対する SiO2の比率を少なくとも0.3から1.2とする量で存在する請求項1また は2記載の組成物。 4.グリセリンが6から30重量%の量で存在する請求項1から3のい ずれかに記載の組成物。 5.非イオン性フッ素界面活性剤が以下の化学式: (式中、zは4から20であり、Rfは下記: である)で表され、0.4重量%までの量で存在する請求項1から4のいずれか に記載の組成物。 6.リン酸エステルハイドロトロープが、アルキルアリールアルコキシ またはアリールアルコキシリン酸エステル、アルカリ金属塩であり、0.4重量 %までの量で存在する請求項1から5のいずれかに記載の組成物。 7.請求項1から6のいずれかに記載の水性アルカリ性現像剤組成物で 、画像的露光したポジティブ・ワーキングまたはネガティブ・ワーキングのリソ グラフィー印刷プレートを現像することを含んでなる処理方法。 8.印刷プレートが、ポジティブ・ワーキング印刷プレートであり、上 面にポジティブ・ワーキング感光性組成物を有するアルミニウムまたは処理した アルミニウム基体を具備し、当該ポジティブ・ワーキング感光性組成物が、感光 性成分としてo-ジアゾナフトキノンを含有する請求項7記載の方法。 9.印刷プレートが、ネガティブ・ワーキング印刷プレートであり、土 面にネガティブ・ワーキング感光性組成物を有するアルミニウムまたは処理した アルミニウム基体を具備し、当該ネガティブ・ワーキング感光性組成物が、感光 性ポリマーを含有する請求項7記載の方法。 10.印刷プレートが、ネガティブ・ワーキング感熱印刷プレートであ り、上面にネガティブ・ワーキング感光性組成物を有するアルミニウムまたは処 理したアルミニウム基体を具備し、当該感光性組成物が、赤外線吸収性化合物を さらに含有する請求項7記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/865,795 US5811221A (en) | 1997-05-30 | 1997-05-30 | Alkaline developing composition and method of use to process lithographic printing plates |
US08/865,795 | 1997-05-30 | ||
PCT/US1998/008783 WO1998054622A1 (en) | 1997-05-30 | 1998-04-30 | Alkaline developing composition and method of use to process lithographic printing plates |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002501627A true JP2002501627A (ja) | 2002-01-15 |
JP3902671B2 JP3902671B2 (ja) | 2007-04-11 |
Family
ID=25346244
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50068199A Expired - Fee Related JP3902671B2 (ja) | 1997-05-30 | 1998-04-30 | アルカリ性現像剤組成物及びそのリソグラフィー印刷プレート処理のための使用方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US5811221A (ja) |
EP (1) | EP0985167A1 (ja) |
JP (1) | JP3902671B2 (ja) |
WO (1) | WO1998054622A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001242639A (ja) * | 1999-12-21 | 2001-09-07 | Mitsubishi Chemicals Corp | ポジ画像形成方法及びそれに用いる現像液 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6248503B1 (en) * | 1997-11-07 | 2001-06-19 | Agfa-Gevaert | Method for making positive working printing plates from a heat mode sensitive imaging element |
US6399279B1 (en) * | 1998-01-16 | 2002-06-04 | Mitsubishi Chemical Corporation | Method for forming a positive image |
ES2196925T3 (es) * | 1998-11-16 | 2003-12-16 | Mitsubishi Chem Corp | Placa offset fotosensible positiva y procedimiento de produccion correspondiente. |
US6143479A (en) * | 1999-08-31 | 2000-11-07 | Kodak Polychrome Graphics Llc | Developing system for alkaline-developable lithographic printing plates |
US6255042B1 (en) | 1999-11-24 | 2001-07-03 | Kodak Polychrome Graphics, Llc | Developing system for alkaline-developable lithographic printing plates with different interlayers |
JP5162803B2 (ja) * | 2001-02-15 | 2013-03-13 | 三菱化学株式会社 | 非水系電解液二次電池及びそれに用いる非水系電解液 |
JP4230130B2 (ja) * | 2001-07-04 | 2009-02-25 | 富士フイルム株式会社 | 感光性平版印刷版用現像液及び平版印刷版の製版方法 |
JP2003195518A (ja) * | 2001-12-14 | 2003-07-09 | Shipley Co Llc | フォトレジスト用現像液 |
CN1802603A (zh) | 2003-07-17 | 2006-07-12 | 霍尼韦尔国际公司 | 用于高级微电子应用的平面化薄膜及其生产装置和方法 |
CN101750910B (zh) * | 2008-12-18 | 2012-11-21 | 京东方科技集团股份有限公司 | 显影液组成物 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1597784C3 (de) * | 1967-08-31 | 1976-01-02 | Hoechst Ag, 6000 Frankfurt | Sensibilisierte Druckplatte |
US3615480A (en) * | 1969-02-24 | 1971-10-26 | Du Pont | Developer solutions for photopolymerized layers |
US4259434A (en) * | 1977-10-24 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for developing positive acting light-sensitive planographic printing plate |
JPS5647041A (en) * | 1979-09-27 | 1981-04-28 | Fuji Photo Film Co Ltd | Production of positive type photosensitive lithographic printing plate |
JPS5754938A (en) * | 1980-09-20 | 1982-04-01 | Konishiroku Photo Ind Co Ltd | Developing method for positive type photosensitive lithographic printing plate |
US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
JPS58190952A (ja) * | 1982-04-30 | 1983-11-08 | Fuji Photo Film Co Ltd | 感光性印刷版の現像液 |
EP0097282A3 (en) * | 1982-06-17 | 1984-07-25 | Shipley Company Inc. | Developer compositions for photoresists |
DE3469074D1 (en) * | 1983-06-17 | 1988-03-03 | Petrarch Systems Inc | High contrast photoresist developer |
DE3346979A1 (de) * | 1983-12-24 | 1985-07-04 | Merck Patent Gmbh, 6100 Darmstadt | Entwickler fuer positivfotoresists |
US4613561A (en) * | 1984-10-17 | 1986-09-23 | James Marvin Lewis | Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution |
JPS61215554A (ja) * | 1985-03-20 | 1986-09-25 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版の現像液 |
US4592992A (en) * | 1985-04-11 | 1986-06-03 | American Hoechst Corporation | Developer compositions for lithographic plates |
GB8628613D0 (en) * | 1986-11-29 | 1987-01-07 | Horsell Graphic Ind Ltd | Developing fluid for lithographic plates |
JPS6456442A (en) * | 1987-08-27 | 1989-03-03 | Okamoto Kagaku Kogyo Kk | Production of printing plate |
US4822723A (en) * | 1987-11-30 | 1989-04-18 | Hoechst Celanese Corporation | Developer compositions for heavy-duty lithographic printing plates |
JPH01177541A (ja) * | 1988-01-07 | 1989-07-13 | Fuji Photo Film Co Ltd | 平版印刷版の製造方法 |
JPH01229003A (ja) * | 1988-03-09 | 1989-09-12 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JP2579189B2 (ja) * | 1988-05-13 | 1997-02-05 | コニカ株式会社 | 感光性平版印刷版の現像液組成物 |
JP2639693B2 (ja) * | 1988-06-17 | 1997-08-13 | 富士写真フイルム株式会社 | 感光性平版印刷版の現像処理方法 |
US5035982A (en) * | 1989-07-14 | 1991-07-30 | Eastman Kodak Company | Aqueous developer composition for developing negative working lithographic printing plate |
JP2814279B2 (ja) * | 1990-02-02 | 1998-10-22 | コニカ株式会社 | 水なし感光性平版印刷版用現像液 |
JPH0470756A (ja) * | 1990-07-11 | 1992-03-05 | Konica Corp | 感光性平版印刷版の現像方法及び現像液 |
DE4027299A1 (de) * | 1990-08-29 | 1992-03-05 | Hoechst Ag | Entwicklerzusammensetzung fuer bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische schichten und verfahren zur entwicklung solcher schichten |
US5480762A (en) * | 1990-11-28 | 1996-01-02 | Fuji Photo Film Co., Ltd. | Method for preparing lithographic printing plate |
US5250393A (en) * | 1990-12-20 | 1993-10-05 | Fuji Photo Film Co., Ltd. | Method for developing presensitized plate for use in making lithographic printing plate |
US5164286A (en) * | 1991-02-01 | 1992-11-17 | Ocg Microelectronic Materials, Inc. | Photoresist developer containing fluorinated amphoteric surfactant |
US5279927A (en) * | 1992-07-23 | 1994-01-18 | Eastman Kodak Company | Aqueous developer for lithographic printing plates with improved desensitizing capability |
US5316892A (en) * | 1992-07-23 | 1994-05-31 | Eastman Kodak Company | Method for developing lithographic printing plates |
US5380623A (en) * | 1992-12-17 | 1995-01-10 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which provides improved oleophilicity |
EP0602736B1 (en) * | 1992-12-17 | 1997-11-05 | Eastman Kodak Company | Aqueous developer for lithographic printing plates which exhibits reduced sludge formation |
JP3086354B2 (ja) * | 1993-03-30 | 2000-09-11 | 富士写真フイルム株式会社 | 感光性平版印刷版用の現像液および現像補充液 |
NL9400920A (nl) * | 1994-06-07 | 1996-01-02 | Davatech Europ V O F | Ontwikkelaarsamenstelling voor positiefwerkende lithografische drukplaten en werkwijze voor het ontwikkelen van positiefwerkende lithografische drukplaten. |
DE4445820A1 (de) * | 1994-12-21 | 1996-06-27 | Hoechst Ag | Verfahren zum Entwickeln bestrahlter, strahlungsempfindlicher Aufzeichnungsmaterialien |
US5766826A (en) * | 1996-10-11 | 1998-06-16 | Eastman Kodak Company | Alkaline developing composition and method of use to process lithographic printing plates |
-
1997
- 1997-05-30 US US08/865,795 patent/US5811221A/en not_active Expired - Lifetime
-
1998
- 1998-04-30 WO PCT/US1998/008783 patent/WO1998054622A1/en not_active Application Discontinuation
- 1998-04-30 JP JP50068199A patent/JP3902671B2/ja not_active Expired - Fee Related
- 1998-04-30 EP EP98918887A patent/EP0985167A1/en not_active Withdrawn
- 1998-07-08 US US09/111,666 patent/US5958655A/en not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001242639A (ja) * | 1999-12-21 | 2001-09-07 | Mitsubishi Chemicals Corp | ポジ画像形成方法及びそれに用いる現像液 |
Also Published As
Publication number | Publication date |
---|---|
US5958655A (en) | 1999-09-28 |
EP0985167A1 (en) | 2000-03-15 |
JP3902671B2 (ja) | 2007-04-11 |
WO1998054622A1 (en) | 1998-12-03 |
US5811221A (en) | 1998-09-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6143479A (en) | Developing system for alkaline-developable lithographic printing plates | |
EP1399783B1 (en) | Method of processing lithographic printing plate precursors | |
US5766826A (en) | Alkaline developing composition and method of use to process lithographic printing plates | |
US6083662A (en) | Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate | |
CA1090189A (en) | Lithographic plate finisher comprising a solvent phase and an aqueous phase containing tapioca dextrin | |
JP2007538279A (ja) | 感光性ポリマー印刷版の製造方法 | |
BRPI0616819A2 (pt) | método para a produção de uma placa para impressão litográfica | |
CN102132217A (zh) | 正性工作平版印刷版前体的加工 | |
EP1922589A2 (en) | Method of developing lithographic printing plate precursors | |
JP2002501627A (ja) | アルカリ性現像剤組成物及びそのリソグラフィー印刷プレート処理のための使用方法 | |
US6541188B2 (en) | Developer for alkaline-developable lithographic printing plates | |
US5897985A (en) | Potassium silicate developing composition and method of use to process lithographic printing plates | |
JPH11288101A (ja) | 印刷版の性能における改良 | |
JP2000171984A (ja) | 放射線感受性組成物の現像 | |
JP3052663B2 (ja) | 印刷用助剤 | |
JPS6113750B2 (ja) | ||
GB1571682A (en) | Printing plates | |
WO1994009993A1 (en) | Assistant for printing | |
US6063554A (en) | Processing of lithographic printing plate precursors | |
EP1204003B1 (en) | Process for developing exposed radiation-sensitive printing plate precursors | |
CN107000425B (zh) | 用于减少烧蚀碎屑的新系统 | |
JP4344563B2 (ja) | 平版印刷版用現像液の製造方法 | |
JPH0632081A (ja) | 平版印刷版用版面洗浄剤 | |
JP2019025726A (ja) | 平版印刷用湿し水組成物、平版印刷用湿し水、及び、印刷方法 | |
JP2003195528A (ja) | 平版印刷版の製版方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050426 |
|
A72 | Notification of change in name of applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A721 Effective date: 20051017 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20051017 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20051118 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060404 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20060704 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20060821 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061004 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20061205 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070104 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100112 Year of fee payment: 3 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
LAPS | Cancellation because of no payment of annual fees |