JP2002356464A5 - - Google Patents
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- Publication number
- JP2002356464A5 JP2002356464A5 JP2001161528A JP2001161528A JP2002356464A5 JP 2002356464 A5 JP2002356464 A5 JP 2002356464A5 JP 2001161528 A JP2001161528 A JP 2001161528A JP 2001161528 A JP2001161528 A JP 2001161528A JP 2002356464 A5 JP2002356464 A5 JP 2002356464A5
- Authority
- JP
- Japan
- Prior art keywords
- acid
- purity
- producing
- aminopolycarboxylic
- aminopolycarboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000002253 acid Substances 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 5
- 239000011780 sodium chloride Substances 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000003637 basic solution Substances 0.000 description 2
- 125000004432 carbon atoms Chemical group C* 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- ZMANZCXQSJIPKH-UHFFFAOYSA-N triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 2
- DCCWEYXHEXDZQW-BYPYZUCNSA-N (2S)-2-[bis(carboxymethyl)amino]butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)N(CC(O)=O)CC(O)=O DCCWEYXHEXDZQW-BYPYZUCNSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N 1,2-ethanediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N DETA Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- UWRBFYBQPCJRRL-UHFFFAOYSA-L OC(=O)CCN(CC([O-])=O)CC([O-])=O Chemical compound OC(=O)CCN(CC([O-])=O)CC([O-])=O UWRBFYBQPCJRRL-UHFFFAOYSA-L 0.000 description 1
- 229960003330 Pentetic Acid Drugs 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Tris Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Chemical group N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000005591 charge neutralization Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000005712 crystallization Effects 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N edta Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atoms Chemical class [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000001264 neutralization Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000003472 neutralizing Effects 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001161528A JP2002356464A (ja) | 2001-05-30 | 2001-05-30 | 高純度アミノポリカルボン酸及びその塩と製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001161528A JP2002356464A (ja) | 2001-05-30 | 2001-05-30 | 高純度アミノポリカルボン酸及びその塩と製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002356464A JP2002356464A (ja) | 2002-12-13 |
| JP2002356464A5 true JP2002356464A5 (zh) | 2008-06-26 |
Family
ID=19004787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001161528A Pending JP2002356464A (ja) | 2001-05-30 | 2001-05-30 | 高純度アミノポリカルボン酸及びその塩と製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002356464A (zh) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9080133B2 (en) | 2007-08-17 | 2015-07-14 | Akzo Nobel N.V. | Glutamic acid N,N-diacetic amide, glutamic acid N-acetic amide N-acetonitrile, alkali metal salts thereof, process to prepare them and their use |
| CN103261366B (zh) | 2010-12-17 | 2016-06-01 | 阿克佐诺贝尔化学国际公司 | 螯合剂的铵盐及其在油气田应用中的用途 |
| AU2011200525B8 (en) | 2010-12-17 | 2016-10-13 | Akzo Nobel Chemicals International B.V. | Environmentally friendly stimulation fluids, processes to create wormholes in carbonate reservoirs, and processes to remove wellbore damage in carbonate reservoirs |
| EP2931700B1 (en) * | 2012-12-14 | 2019-08-28 | Nouryon Chemicals International B.V. | Crystalline particles of salts of glutamic acid n,n-diacetic acid |
| CN104854078A (zh) | 2012-12-14 | 2015-08-19 | 阿克佐诺贝尔化学国际公司 | 谷氨酸n,n-二乙酸的结晶颗粒 |
| CN103058878B (zh) * | 2013-01-14 | 2014-08-13 | 聂世保 | 1.3丙烯基二胺四乙酸的制备方法和应用 |
| WO2016060685A1 (en) | 2014-10-17 | 2016-04-21 | Halliburton Energy Services, Inc. | Low ph metal-free preparation of aminated organic acid |
| WO2018004606A1 (en) | 2016-06-30 | 2018-01-04 | Halliburton Energy Services, Inc. | Sulfonated iminodialkanoic acids formed from an iminodialkylnitrile and a sultone and methods for use thereof |
| CN109789214B (zh) | 2016-09-27 | 2022-06-28 | 卡姆拉斯公司 | 包含edta烷基铵盐的混合物和制剂 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3887846B2 (ja) * | 1996-07-04 | 2007-02-28 | 三菱化学株式会社 | 高純度エチレンジアミンジオルトヒドロキシフェニル酢酸及びそれを用いた表面処理組成物 |
| JP3228211B2 (ja) * | 1997-01-27 | 2001-11-12 | 三菱化学株式会社 | 表面処理組成物及びそれを用いた基体の表面処理方法 |
-
2001
- 2001-05-30 JP JP2001161528A patent/JP2002356464A/ja active Pending
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