JP2002353226A5 - - Google Patents
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- Publication number
- JP2002353226A5 JP2002353226A5 JP2002073382A JP2002073382A JP2002353226A5 JP 2002353226 A5 JP2002353226 A5 JP 2002353226A5 JP 2002073382 A JP2002073382 A JP 2002073382A JP 2002073382 A JP2002073382 A JP 2002073382A JP 2002353226 A5 JP2002353226 A5 JP 2002353226A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- reaction tube
- heat
- heating
- heating means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims 39
- 238000010438 heat treatment Methods 0.000 claims 36
- 239000000758 substrate Substances 0.000 claims 12
- 238000011144 upstream manufacturing Methods 0.000 claims 7
- 238000000034 method Methods 0.000 claims 5
- 239000006096 absorbing agent Substances 0.000 claims 3
- 230000005855 radiation Effects 0.000 claims 3
- 238000001816 cooling Methods 0.000 claims 2
- 238000007599 discharging Methods 0.000 claims 2
- 239000000112 cooling gas Substances 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002073382A JP4357786B2 (ja) | 2001-03-16 | 2002-03-15 | 熱処理装置及び熱処理方法 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001075756 | 2001-03-16 | ||
JP2001084905 | 2001-03-23 | ||
JP2001-75756 | 2001-03-23 | ||
JP2001-84905 | 2001-03-23 | ||
JP2002073382A JP4357786B2 (ja) | 2001-03-16 | 2002-03-15 | 熱処理装置及び熱処理方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002353226A JP2002353226A (ja) | 2002-12-06 |
JP2002353226A5 true JP2002353226A5 (enrdf_load_stackoverflow) | 2005-09-08 |
JP4357786B2 JP4357786B2 (ja) | 2009-11-04 |
Family
ID=27346265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002073382A Expired - Fee Related JP4357786B2 (ja) | 2001-03-16 | 2002-03-15 | 熱処理装置及び熱処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4357786B2 (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3501768B2 (ja) * | 2001-04-18 | 2004-03-02 | 株式会社ガソニックス | 基板熱処理装置およびフラットパネルデバイスの製造方法 |
JP4939699B2 (ja) * | 2001-05-31 | 2012-05-30 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP2004263206A (ja) * | 2003-02-10 | 2004-09-24 | Fuyuutec Furness:Kk | 熱処理装置 |
JP2007258452A (ja) * | 2006-03-23 | 2007-10-04 | Sumitomo Electric Ind Ltd | 処理装置 |
US8826693B2 (en) * | 2010-08-30 | 2014-09-09 | Corning Incorporated | Apparatus and method for heat treating a glass substrate |
CN103201828B (zh) * | 2010-11-05 | 2016-06-29 | 夏普株式会社 | 氧化退火处理装置和使用氧化退火处理的薄膜晶体管的制造方法 |
JP6010182B2 (ja) * | 2015-05-20 | 2016-10-19 | 光洋サーモシステム株式会社 | 連続拡散処理装置 |
JP6640985B2 (ja) * | 2016-03-22 | 2020-02-05 | 株式会社Kokusai Electric | 基板処理装置、半導体装置の製造方法および記録媒体 |
KR102277992B1 (ko) * | 2019-11-07 | 2021-07-15 | 세메스 주식회사 | 베이크 장치 |
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2002
- 2002-03-15 JP JP2002073382A patent/JP4357786B2/ja not_active Expired - Fee Related