JP2002277742A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002277742A5 JP2002277742A5 JP2001309516A JP2001309516A JP2002277742A5 JP 2002277742 A5 JP2002277742 A5 JP 2002277742A5 JP 2001309516 A JP2001309516 A JP 2001309516A JP 2001309516 A JP2001309516 A JP 2001309516A JP 2002277742 A5 JP2002277742 A5 JP 2002277742A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- imaging optical
- catadioptric
- imaging
- reflecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001309516A JP4245286B2 (ja) | 2000-10-23 | 2001-10-05 | 反射屈折光学系および該光学系を備えた露光装置 |
CNB018178618A CN100460921C (zh) | 2000-10-23 | 2001-10-23 | 折射反射光学系统和具有该折射反射光学系统的曝光装置 |
KR1020037005588A KR100799418B1 (ko) | 2000-10-23 | 2001-10-23 | 반사굴절광학계 및 이 광학계를 구비한 노광장치 |
US10/399,716 US7030965B2 (en) | 2000-10-23 | 2001-10-23 | Catadioptric system and exposure device having this system |
PCT/JP2001/009266 WO2002035273A1 (fr) | 2000-10-23 | 2001-10-23 | Systeme catadioptrique et dispositif d'exposition pourvu de ce systeme |
AU2001295994A AU2001295994A1 (en) | 2000-10-23 | 2001-10-23 | Catadioptric system and exposure device having this system |
EP01976807A EP1336887A4 (en) | 2000-10-23 | 2001-10-23 | CATADIOPTRIC SYSTEM AND EXPOSURE DEVICE PROVIDED WITH SAID SYSTEM |
TW090126179A TW529080B (en) | 2000-10-23 | 2001-10-23 | Reflection and refraction optical system and exposure device having this system |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000322068 | 2000-10-23 | ||
JP2000-322068 | 2001-01-11 | ||
JP2001-3200 | 2001-01-11 | ||
JP2001003200 | 2001-01-11 | ||
JP2001309516A JP4245286B2 (ja) | 2000-10-23 | 2001-10-05 | 反射屈折光学系および該光学系を備えた露光装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002277742A JP2002277742A (ja) | 2002-09-25 |
JP2002277742A5 true JP2002277742A5 (US06195213-20010227-M00001.png) | 2005-08-04 |
JP4245286B2 JP4245286B2 (ja) | 2009-03-25 |
Family
ID=27345004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001309516A Expired - Fee Related JP4245286B2 (ja) | 2000-10-23 | 2001-10-05 | 反射屈折光学系および該光学系を備えた露光装置 |
Country Status (8)
Families Citing this family (63)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
WO2002044786A2 (en) | 2000-11-28 | 2002-06-06 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
DE10210899A1 (de) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
DE10316428A1 (de) * | 2003-04-08 | 2004-10-21 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
KR101547077B1 (ko) | 2003-04-09 | 2015-08-25 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
SG10201405231YA (en) * | 2003-05-06 | 2014-09-26 | Nippon Kogaku Kk | Projection optical system, exposure apparatus, and exposure method |
JP4706171B2 (ja) * | 2003-10-24 | 2011-06-22 | 株式会社ニコン | 反射屈折投影光学系、露光装置及び露光方法 |
US7348575B2 (en) * | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
TWI282487B (en) * | 2003-05-23 | 2007-06-11 | Canon Kk | Projection optical system, exposure apparatus, and device manufacturing method |
US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
TWI573175B (zh) | 2003-10-28 | 2017-03-01 | 尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法 |
TW201809801A (zh) | 2003-11-20 | 2018-03-16 | 日商尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
WO2005059645A2 (en) * | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
WO2005069055A2 (en) | 2004-01-14 | 2005-07-28 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
TWI389174B (zh) | 2004-02-06 | 2013-03-11 | 尼康股份有限公司 | 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法 |
WO2005098504A1 (en) * | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
KR20140138350A (ko) | 2004-05-17 | 2014-12-03 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
US7400381B2 (en) * | 2004-05-26 | 2008-07-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1754110B1 (en) | 2004-06-10 | 2008-07-30 | Carl Zeiss SMT AG | Projection objective for a microlithographic projection exposure apparatus |
JP5600128B2 (ja) * | 2004-07-14 | 2014-10-01 | カール・ツァイス・エスエムティー・ゲーエムベーハー | カタディオプトリック投影対物系 |
DE602005018648D1 (de) | 2004-07-14 | 2010-02-11 | Zeiss Carl Smt Ag | Katadioptrisches projektionsobjektiv |
JP2006119244A (ja) * | 2004-10-20 | 2006-05-11 | Canon Inc | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
JP2008529094A (ja) * | 2005-02-03 | 2008-07-31 | カール・ツァイス・エスエムティー・アーゲー | 中間像を有する反射屈折投影対物レンズ |
US7324185B2 (en) | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP5495555B2 (ja) * | 2005-03-31 | 2014-05-21 | ケーエルエー−テンカー コーポレイション | 非球面を使用した小型で超高naの反射屈折対物レンズ |
JP2006309220A (ja) | 2005-04-29 | 2006-11-09 | Carl Zeiss Smt Ag | 投影対物レンズ |
US8248577B2 (en) | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101455551B1 (ko) | 2005-05-12 | 2014-10-27 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
DE102005024290A1 (de) | 2005-05-27 | 2006-11-30 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
KR101890082B1 (ko) * | 2005-06-02 | 2018-08-20 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 대물 렌즈 |
EP1746463A2 (de) * | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
US7920338B2 (en) * | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
US7738188B2 (en) * | 2006-03-28 | 2010-06-15 | Carl Zeiss Smt Ag | Projection objective and projection exposure apparatus including the same |
EP1852745A1 (en) | 2006-05-05 | 2007-11-07 | Carl Zeiss SMT AG | High-NA projection objective |
EP1890191A1 (en) | 2006-08-14 | 2008-02-20 | Carl Zeiss SMT AG | Catadioptric projection objective with pupil mirror |
WO2008087827A1 (ja) * | 2007-01-16 | 2008-07-24 | Nikon Corporation | 結像光学系、露光装置、およびデバイス製造方法 |
US7929114B2 (en) | 2007-01-17 | 2011-04-19 | Carl Zeiss Smt Gmbh | Projection optics for microlithography |
WO2008104192A1 (en) * | 2007-02-28 | 2008-09-04 | Carl Zeiss Smt Ag | Catadioptric projection objective with pupil correction |
US20080259304A1 (en) * | 2007-04-20 | 2008-10-23 | Asml Netherlands B.V. | Lithographic apparatus and method |
JP5267029B2 (ja) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
DE102009011328A1 (de) * | 2009-03-05 | 2010-08-19 | Carl Zeiss Smt Ag | Abbildende Optik |
JP2011049571A (ja) * | 2010-09-24 | 2011-03-10 | Nikon Corp | 反射屈折投影光学系、露光装置及び露光方法 |
JP2012073632A (ja) * | 2011-11-18 | 2012-04-12 | Nikon Corp | 反射屈折投影光学系、露光装置及び露光方法 |
JP5567098B2 (ja) * | 2012-10-31 | 2014-08-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 瞳補正を有する反射屈折投影対物系 |
DE102013105586B4 (de) * | 2013-05-30 | 2023-10-12 | Carl Zeiss Ag | Vorrichtung zur Abbildung einer Probe |
CN104062746B (zh) * | 2014-06-23 | 2016-08-24 | 中国科学院光电技术研究所 | 一种大数值孔径的折反射浸没投影光学系统 |
US9424388B2 (en) * | 2014-12-17 | 2016-08-23 | International Business Machines Corporation | Dividing lithography exposure fields to improve semiconductor fabrication |
CN105807410B (zh) * | 2014-12-31 | 2018-11-09 | 上海微电子装备(集团)股份有限公司 | 一种基于高数值孔径的折反射式投影物镜 |
JP2015132843A (ja) * | 2015-03-02 | 2015-07-23 | 株式会社ニコン | 投影光学系、露光装置、露光方法、およびデバイス製造方法 |
JP6358242B2 (ja) * | 2015-11-30 | 2018-07-18 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法およびパターン形成方法 |
JP2016136273A (ja) * | 2016-03-07 | 2016-07-28 | 株式会社ニコン | 投影光学系、露光装置、露光方法、およびデバイス製造方法 |
CN108152940B (zh) * | 2016-12-05 | 2021-04-27 | 佳能株式会社 | 反射折射光学系统、照明光学系统、曝光装置 |
JP2018010303A (ja) * | 2017-08-03 | 2018-01-18 | 株式会社ニコン | 露光装置およびデバイス製造方法 |
CN107582020B (zh) * | 2017-10-20 | 2019-05-31 | 视微影像(河南)科技有限公司 | 一种眼科成像诊断系统 |
JP2019082711A (ja) * | 2019-01-15 | 2019-05-30 | 株式会社ニコン | 投影光学系、露光装置、露光方法、及びデバイス製造方法 |
JP2019091057A (ja) * | 2019-01-15 | 2019-06-13 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0237041B1 (en) * | 1986-03-12 | 1993-08-18 | Matsushita Electric Industrial Co., Ltd. | Projection optical system for use in precise copy |
GB2197962A (en) * | 1986-11-10 | 1988-06-02 | Compact Spindle Bearing Corp | Catoptric reduction imaging apparatus |
FR2617985B1 (fr) * | 1987-07-10 | 1991-09-13 | Centre Nat Rech Scient | Dispositif optique de collection de lumiere formant objectif a miroir de grande ouverture numerique |
US5094539A (en) * | 1988-03-07 | 1992-03-10 | Hitachi, Ltd. | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same |
DE69121133T2 (de) | 1990-04-20 | 1996-12-12 | Dainippon Screen Mfg | Objektivlinsensystem zur Anwendung in einem Mikroskop |
US5734496A (en) * | 1991-06-03 | 1998-03-31 | Her Majesty The Queen In Right Of New Zealand | Lens system |
JP3339592B2 (ja) * | 1993-03-12 | 2002-10-28 | 株式会社ニコン | 反射屈折投影光学系、並びに露光方法及び装置 |
JP3635684B2 (ja) * | 1994-08-23 | 2005-04-06 | 株式会社ニコン | 反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置 |
JPH09311278A (ja) * | 1996-05-20 | 1997-12-02 | Nikon Corp | 反射屈折光学系 |
US5636066A (en) * | 1993-03-12 | 1997-06-03 | Nikon Corporation | Optical apparatus |
US5309541A (en) * | 1993-04-16 | 1994-05-03 | Laser Power Corporation | Flexible light conduit |
US5515207A (en) * | 1993-11-03 | 1996-05-07 | Nikon Precision Inc. | Multiple mirror catadioptric optical system |
US5559338A (en) | 1994-10-04 | 1996-09-24 | Excimer Laser Systems, Inc. | Deep ultraviolet optical imaging system for microlithography and/or microfabrication |
IL113350A (en) * | 1995-04-12 | 1998-06-15 | State Rafaelel Ministry Of Def | Catadioptric optics working staring detector system |
US6512631B2 (en) | 1996-07-22 | 2003-01-28 | Kla-Tencor Corporation | Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system |
US5815310A (en) | 1995-12-12 | 1998-09-29 | Svg Lithography Systems, Inc. | High numerical aperture ring field optical reduction system |
US6157498A (en) | 1996-06-19 | 2000-12-05 | Nikon Corporation | Dual-imaging optical system |
JPH1010430A (ja) * | 1996-06-19 | 1998-01-16 | Nikon Corp | 2回結像光学系 |
US5717518A (en) | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
US5999310A (en) | 1996-07-22 | 1999-12-07 | Shafer; David Ross | Ultra-broadband UV microscope imaging system with wide range zoom capability |
US6169627B1 (en) | 1996-09-26 | 2001-01-02 | Carl-Zeiss-Stiftung | Catadioptric microlithographic reduction objective |
DE19639586A1 (de) * | 1996-09-26 | 1998-04-02 | Zeiss Carl Fa | Katadioptrisches Mikrolithographie-Reduktionsobjektiv |
KR100597775B1 (ko) * | 1997-12-26 | 2006-07-10 | 가부시키가이샤 니콘 | 투영노광장치 및 노광방법 |
US6097537A (en) * | 1998-04-07 | 2000-08-01 | Nikon Corporation | Catadioptric optical system |
JP2000098228A (ja) * | 1998-09-21 | 2000-04-07 | Nikon Corp | 投影露光装置及び露光方法、並びに反射縮小投影光学系 |
US6213610B1 (en) | 1998-09-21 | 2001-04-10 | Nikon Corporation | Catoptric reduction projection optical system and exposure apparatus and method using same |
JP2000100694A (ja) | 1998-09-22 | 2000-04-07 | Nikon Corp | 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法 |
KR20010041257A (ko) * | 1998-12-25 | 2001-05-15 | 오노 시게오 | 반사굴절 결상 광학계 및 그 광학계를 구비한 투영 노광장치 |
EP1035445B1 (de) | 1999-02-15 | 2007-01-31 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
JP4717974B2 (ja) * | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
EP1093021A3 (en) | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projection optical system as well as equipment and methods making use of said system |
JP2001185480A (ja) * | 1999-10-15 | 2001-07-06 | Nikon Corp | 投影光学系及び該光学系を備える投影露光装置 |
US6600608B1 (en) * | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
WO2002044786A2 (en) * | 2000-11-28 | 2002-06-06 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2001228401A (ja) | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
US6842298B1 (en) | 2000-09-12 | 2005-01-11 | Kla-Tencor Technologies Corporation | Broad band DUV, VUV long-working distance catadioptric imaging system |
-
2001
- 2001-10-05 JP JP2001309516A patent/JP4245286B2/ja not_active Expired - Fee Related
- 2001-10-23 KR KR1020037005588A patent/KR100799418B1/ko not_active IP Right Cessation
- 2001-10-23 US US10/399,716 patent/US7030965B2/en not_active Expired - Fee Related
- 2001-10-23 TW TW090126179A patent/TW529080B/zh active
- 2001-10-23 AU AU2001295994A patent/AU2001295994A1/en not_active Abandoned
- 2001-10-23 WO PCT/JP2001/009266 patent/WO2002035273A1/ja active Application Filing
- 2001-10-23 CN CNB018178618A patent/CN100460921C/zh not_active Expired - Fee Related
- 2001-10-23 EP EP01976807A patent/EP1336887A4/en not_active Withdrawn
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2002277742A5 (US06195213-20010227-M00001.png) | ||
CN1307456C (zh) | 投影光学系统、曝光装置及器件的制造方法 | |
US7403262B2 (en) | Projection optical system and exposure apparatus having the same | |
JP2003114387A5 (US06195213-20010227-M00001.png) | ||
JP2005233979A (ja) | 反射屈折光学系 | |
JP2001027727A5 (US06195213-20010227-M00001.png) | ||
KR20000011933A (ko) | 카타다이옵트릭광학시스템및그를구비한노광장치 | |
KR101176686B1 (ko) | 접근 용이한 조리개 또는 구경 조리개를 구비한마이크로리소그래피 투영 시스템 | |
JP2004214242A5 (US06195213-20010227-M00001.png) | ||
JPH09197270A (ja) | マイクロリソグラフィ用投影露光装置のrema対物レンズ | |
US9146475B2 (en) | Projection exposure system and projection exposure method | |
JP2003107354A (ja) | 結像光学系および露光装置 | |
JP2004045885A (ja) | オプティカルインテグレータ、照明光学装置、露光装置および露光方法 | |
JP2004022708A (ja) | 結像光学系、照明光学系、露光装置及び露光方法 | |
JP7029564B2 (ja) | カタディオプトリック光学系、照明光学系、露光装置および物品製造方法 | |
KR20150133139A (ko) | 자외선 손상에 대한 감수성이 감소된 윈-다이슨 투사렌즈 | |
US20030210385A1 (en) | Projection optical system, a projection exposure apparatus provided with the same, as well as a device manufacturing method | |
US20040218164A1 (en) | Exposure apparatus | |
TW508655B (en) | Relay imaging optical system, and illumination optical device and exposure device having the optical system | |
US7292316B2 (en) | Illumination optical system and exposure apparatus having the same | |
JP2002244035A5 (US06195213-20010227-M00001.png) | ||
TWI301564B (en) | Relay lens used in an illumination system of a lithography system | |
JPH10197791A (ja) | 投影レンズ | |
JP2005037896A5 (US06195213-20010227-M00001.png) | ||
TW530335B (en) | Image-forming optical system and exposure device equipped therewith |