JP2002268207A - 現像可能性を助長するための添加剤を含むネガティブ−作用性放射線−感受性層を有する記録材料 - Google Patents

現像可能性を助長するための添加剤を含むネガティブ−作用性放射線−感受性層を有する記録材料

Info

Publication number
JP2002268207A
JP2002268207A JP2001389266A JP2001389266A JP2002268207A JP 2002268207 A JP2002268207 A JP 2002268207A JP 2001389266 A JP2001389266 A JP 2001389266A JP 2001389266 A JP2001389266 A JP 2001389266A JP 2002268207 A JP2002268207 A JP 2002268207A
Authority
JP
Japan
Prior art keywords
recording material
material according
radiation
sensitive layer
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001389266A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002268207A5 (https=
Inventor
Michael Dorr
ミヒヤエル・デア
Andreas Dr Elsaesser
アンドレアス・エルゼサー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Original Assignee
Agfa Gevaert NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV filed Critical Agfa Gevaert NV
Publication of JP2002268207A publication Critical patent/JP2002268207A/ja
Publication of JP2002268207A5 publication Critical patent/JP2002268207A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/0166Diazonium salts or compounds characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2001389266A 2000-12-23 2001-12-21 現像可能性を助長するための添加剤を含むネガティブ−作用性放射線−感受性層を有する記録材料 Pending JP2002268207A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10064889A DE10064889A1 (de) 2000-12-23 2000-12-23 Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält
DE10064889.4 2000-12-23

Publications (2)

Publication Number Publication Date
JP2002268207A true JP2002268207A (ja) 2002-09-18
JP2002268207A5 JP2002268207A5 (https=) 2005-07-21

Family

ID=7668882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001389266A Pending JP2002268207A (ja) 2000-12-23 2001-12-21 現像可能性を助長するための添加剤を含むネガティブ−作用性放射線−感受性層を有する記録材料

Country Status (4)

Country Link
US (1) US6911291B2 (https=)
EP (1) EP1217446A1 (https=)
JP (1) JP2002268207A (https=)
DE (1) DE10064889A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6569597B2 (en) * 2001-01-19 2003-05-27 Eastman Kodak Company Thermal imaging composition and member and methods of imaging and printing
JP4459091B2 (ja) * 2004-05-07 2010-04-28 富士フイルム株式会社 染料含有ネガ型硬化性組成物、カラーフィルタおよびその製造方法
US7008751B2 (en) * 2004-08-04 2006-03-07 Eastman Kodak Company Thermally switchable imageable elements containing betaine-containing co-polymers

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL132774C (https=) 1960-10-07
US3867147A (en) 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US4021243A (en) 1970-08-20 1977-05-03 Hoechst Aktiengesellschaft Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils
US4629680A (en) 1984-01-30 1986-12-16 Fuji Photo Film Co., Ltd. Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution
DE3404366A1 (de) 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DD261858A1 (de) * 1985-06-11 1988-11-09 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3541723A1 (de) 1985-11-26 1987-05-27 Hoechst Ag Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
AU616516B2 (en) 1988-05-27 1991-10-31 Takeda Chemical Industries Ltd. Binders for magnetic recording media and magnetic recording media
DE3832032A1 (de) 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2677460B2 (ja) * 1991-02-14 1997-11-17 日本ペイント株式会社 アルカリ現像性感光性樹脂組成物
JP2879390B2 (ja) 1992-04-03 1999-04-05 富士写真フイルム株式会社 感光性組成物
US5527655A (en) 1994-09-28 1996-06-18 Minnesota Mining And Manufacturing Company Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions
CA2191055A1 (en) 1995-12-04 1997-06-05 Major S. Dhillon Aqueous developable negative acting photosensitive composition having improved image contrast
US5846685A (en) 1997-01-31 1998-12-08 Kodak Polychrome Graphics, Llc Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate
DE19755295A1 (de) 1997-12-12 1999-06-17 Agfa Gevaert Ag Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien
DE19908529A1 (de) 1999-02-26 2000-08-31 Agfa Gevaert Ag Pigmentiertes und rückseitenbeschichtetes Aufzeichnungsmaterial zur Herstellung von Offsetdruckplatten
DE19915717A1 (de) 1999-04-08 2000-10-12 Agfa Gevaert Ag Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht

Also Published As

Publication number Publication date
EP1217446A1 (en) 2002-06-26
US20020123001A1 (en) 2002-09-05
US6911291B2 (en) 2005-06-28
DE10064889A1 (de) 2002-07-18

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