JP2002268207A5 - - Google Patents
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- Publication number
- JP2002268207A5 JP2002268207A5 JP2001389266A JP2001389266A JP2002268207A5 JP 2002268207 A5 JP2002268207 A5 JP 2002268207A5 JP 2001389266 A JP2001389266 A JP 2001389266A JP 2001389266 A JP2001389266 A JP 2001389266A JP 2002268207 A5 JP2002268207 A5 JP 2002268207A5
- Authority
- JP
- Japan
- Prior art keywords
- recording material
- groups
- nde
- sulfobetaine
- unsubstituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims 5
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 claims 2
- 125000002015 acyclic group Chemical group 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 229940117986 sulfobetaine Drugs 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 239000012954 diazonium Substances 0.000 claims 1
- 150000001989 diazonium salts Chemical class 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10064889A DE10064889A1 (de) | 2000-12-23 | 2000-12-23 | Aufzeichnungsmaterial mit negativ arbeitender, strahlungsempfindlicher Schicht, die Zusätze zur Förderung der Entwickelbarkeit enthält |
| DE10064889.4 | 2000-12-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002268207A JP2002268207A (ja) | 2002-09-18 |
| JP2002268207A5 true JP2002268207A5 (https=) | 2005-07-21 |
Family
ID=7668882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001389266A Pending JP2002268207A (ja) | 2000-12-23 | 2001-12-21 | 現像可能性を助長するための添加剤を含むネガティブ−作用性放射線−感受性層を有する記録材料 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6911291B2 (https=) |
| EP (1) | EP1217446A1 (https=) |
| JP (1) | JP2002268207A (https=) |
| DE (1) | DE10064889A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6569597B2 (en) * | 2001-01-19 | 2003-05-27 | Eastman Kodak Company | Thermal imaging composition and member and methods of imaging and printing |
| JP4459091B2 (ja) * | 2004-05-07 | 2010-04-28 | 富士フイルム株式会社 | 染料含有ネガ型硬化性組成物、カラーフィルタおよびその製造方法 |
| US7008751B2 (en) * | 2004-08-04 | 2006-03-07 | Eastman Kodak Company | Thermally switchable imageable elements containing betaine-containing co-polymers |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL132774C (https=) | 1960-10-07 | |||
| US3867147A (en) | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
| US4021243A (en) | 1970-08-20 | 1977-05-03 | Hoechst Aktiengesellschaft | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils |
| US4629680A (en) | 1984-01-30 | 1986-12-16 | Fuji Photo Film Co., Ltd. | Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution |
| DE3404366A1 (de) | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DD261858A1 (de) * | 1985-06-11 | 1988-11-09 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| DE3541723A1 (de) | 1985-11-26 | 1987-05-27 | Hoechst Ag | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt |
| AU616516B2 (en) | 1988-05-27 | 1991-10-31 | Takeda Chemical Industries Ltd. | Binders for magnetic recording media and magnetic recording media |
| DE3832032A1 (de) | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JP2677460B2 (ja) * | 1991-02-14 | 1997-11-17 | 日本ペイント株式会社 | アルカリ現像性感光性樹脂組成物 |
| JP2879390B2 (ja) | 1992-04-03 | 1999-04-05 | 富士写真フイルム株式会社 | 感光性組成物 |
| US5527655A (en) | 1994-09-28 | 1996-06-18 | Minnesota Mining And Manufacturing Company | Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions |
| CA2191055A1 (en) | 1995-12-04 | 1997-06-05 | Major S. Dhillon | Aqueous developable negative acting photosensitive composition having improved image contrast |
| US5846685A (en) | 1997-01-31 | 1998-12-08 | Kodak Polychrome Graphics, Llc | Radiation sensitive diazo sulfo-acrylic adducts and method for producing a printing plate |
| DE19755295A1 (de) | 1997-12-12 | 1999-06-17 | Agfa Gevaert Ag | Entwickler für bestrahlte, strahlungsempfindliche Aufzeichnungsmaterialien |
| DE19908529A1 (de) | 1999-02-26 | 2000-08-31 | Agfa Gevaert Ag | Pigmentiertes und rückseitenbeschichtetes Aufzeichnungsmaterial zur Herstellung von Offsetdruckplatten |
| DE19915717A1 (de) | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
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2000
- 2000-12-23 DE DE10064889A patent/DE10064889A1/de not_active Withdrawn
-
2001
- 2001-11-26 EP EP01000663A patent/EP1217446A1/en not_active Withdrawn
- 2001-12-14 US US10/017,804 patent/US6911291B2/en not_active Expired - Fee Related
- 2001-12-21 JP JP2001389266A patent/JP2002268207A/ja active Pending