JP2002254662A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002254662A5 JP2002254662A5 JP2002016080A JP2002016080A JP2002254662A5 JP 2002254662 A5 JP2002254662 A5 JP 2002254662A5 JP 2002016080 A JP2002016080 A JP 2002016080A JP 2002016080 A JP2002016080 A JP 2002016080A JP 2002254662 A5 JP2002254662 A5 JP 2002254662A5
- Authority
- JP
- Japan
- Prior art keywords
- ink supply
- substrate
- supply opening
- forming
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims 14
- 238000000034 method Methods 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 13
- 239000011241 protective layer Substances 0.000 claims 9
- 239000010409 thin film Substances 0.000 claims 8
- 238000005530 etching Methods 0.000 claims 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000000873 masking effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/770723 | 2001-01-25 | ||
| US09/770,723 US6419346B1 (en) | 2001-01-25 | 2001-01-25 | Two-step trench etch for a fully integrated thermal inkjet printhead |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002254662A JP2002254662A (ja) | 2002-09-11 |
| JP2002254662A5 true JP2002254662A5 (enExample) | 2005-04-07 |
| JP3980361B2 JP3980361B2 (ja) | 2007-09-26 |
Family
ID=25089474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002016080A Expired - Fee Related JP3980361B2 (ja) | 2001-01-25 | 2002-01-24 | 完全に一体化されたサーマル・インクジェットプリントヘッドを形成するための2段階のトレンチエッチング |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US6419346B1 (enExample) |
| EP (1) | EP1226946B1 (enExample) |
| JP (1) | JP3980361B2 (enExample) |
| DE (1) | DE60208088T2 (enExample) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6481832B2 (en) | 2001-01-29 | 2002-11-19 | Hewlett-Packard Company | Fluid-jet ejection device |
| US6626523B2 (en) * | 2001-10-31 | 2003-09-30 | Hewlett-Packard Development Company, Lp. | Printhead having a thin film membrane with a floating section |
| US6908784B1 (en) | 2002-03-06 | 2005-06-21 | Micron Technology, Inc. | Method for fabricating encapsulated semiconductor components |
| KR100484168B1 (ko) | 2002-10-11 | 2005-04-19 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| KR100499132B1 (ko) | 2002-10-24 | 2005-07-04 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
| US6648454B1 (en) * | 2002-10-30 | 2003-11-18 | Hewlett-Packard Development Company, L.P. | Slotted substrate and method of making |
| KR100459905B1 (ko) * | 2002-11-21 | 2004-12-03 | 삼성전자주식회사 | 두 개의 잉크챔버 사이에 배치된 히터를 가진 일체형잉크젯 프린트헤드 및 그 제조방법 |
| KR100468160B1 (ko) * | 2002-12-02 | 2005-01-26 | 삼성전자주식회사 | 모노리식 버블 잉크젯 프린트 헤드 및 그 제조방법 |
| KR100477707B1 (ko) * | 2003-05-13 | 2005-03-18 | 삼성전자주식회사 | 모놀리틱 잉크젯 프린트헤드 제조방법 |
| US7036913B2 (en) | 2003-05-27 | 2006-05-02 | Samsung Electronics Co., Ltd. | Ink-jet printhead |
| KR100517515B1 (ko) | 2004-01-20 | 2005-09-28 | 삼성전자주식회사 | 모놀리틱 잉크젯 프린트헤드의 제조방법 |
| GB2410464A (en) * | 2004-01-29 | 2005-08-03 | Hewlett Packard Development Co | A method of making an inkjet printhead |
| US20050260522A1 (en) * | 2004-02-13 | 2005-11-24 | William Weber | Permanent resist composition, cured product thereof, and use thereof |
| US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
| KR100765315B1 (ko) | 2004-07-23 | 2007-10-09 | 삼성전자주식회사 | 기판과 일체로 이루어진 필터링 부재를 구비하는 잉크젯헤드 및 그 제조방법. |
| US8043517B2 (en) * | 2005-09-19 | 2011-10-25 | Hewlett-Packard Development Company, L.P. | Method of forming openings in substrates and inkjet printheads fabricated thereby |
| KR20080046865A (ko) * | 2006-11-23 | 2008-05-28 | 삼성전자주식회사 | 헤드칩 및 이를 포함하는 화상형성장치용 잉크카트리지 |
| CN101568435A (zh) | 2006-12-07 | 2009-10-28 | 惠普发展公司,有限责任合伙企业 | 在基材中形成开口的方法以及由此制造的喷墨打印头 |
| US8241510B2 (en) * | 2007-01-22 | 2012-08-14 | Canon Kabushiki Kaisha | Inkjet recording head, method for producing same, and semiconductor device |
| KR20090024381A (ko) * | 2007-09-04 | 2009-03-09 | 삼성전자주식회사 | 잉크젯 프린트 헤드 |
| JP5854693B2 (ja) * | 2010-09-01 | 2016-02-09 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| EP2828081B1 (en) * | 2012-07-24 | 2019-10-09 | Hewlett-Packard Company, L.P. | Fluid ejection device with particle tolerant thin-film extension |
| JP6103879B2 (ja) * | 2012-10-24 | 2017-03-29 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| CN104853923B (zh) | 2012-12-20 | 2016-08-24 | 惠普发展公司,有限责任合伙企业 | 具有颗粒耐受层延伸部的流体喷射装置 |
| WO2015163888A1 (en) | 2014-04-24 | 2015-10-29 | Hewlett-Packard Development Company, L.P. | Fluidic ejection device with layers having different light sensitivities |
| EP3429856B1 (en) * | 2016-07-26 | 2022-01-12 | Hewlett-Packard Development Company, L.P. | Fluid ejection device with a portioning wall |
| JP7066418B2 (ja) * | 2018-01-17 | 2022-05-13 | キヤノン株式会社 | 液体吐出ヘッドおよびその製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0244214B1 (en) | 1986-04-28 | 1991-07-10 | Hewlett-Packard Company | Thermal ink jet printhead |
| US4789425A (en) * | 1987-08-06 | 1988-12-06 | Xerox Corporation | Thermal ink jet printhead fabricating process |
| US5648806A (en) | 1992-04-02 | 1997-07-15 | Hewlett-Packard Company | Stable substrate structure for a wide swath nozzle array in a high resolution inkjet printer |
| DE69730667T2 (de) | 1996-11-11 | 2005-09-22 | Canon K.K. | Verfahren zur Herstellung eines Durchgangslochs, Gebrauch dieses Verfahrens zur Herstellung eines Slikonsubstrates mit einem solchen Durchgangsloch oder eine Vorrichtung mit diesem Substrat, Verfahren zur Herstellung eines Tintenstrahl-Druckkopfes und Gebrauch dieses Verfahrens zur Herstellung eines Tintenstrahldruckkopfes |
| US6022482A (en) * | 1997-08-04 | 2000-02-08 | Xerox Corporation | Monolithic ink jet printhead |
| JP3408130B2 (ja) * | 1997-12-19 | 2003-05-19 | キヤノン株式会社 | インクジェット記録ヘッドおよびその製造方法 |
-
2001
- 2001-01-25 US US09/770,723 patent/US6419346B1/en not_active Expired - Lifetime
-
2002
- 2002-01-18 DE DE60208088T patent/DE60208088T2/de not_active Expired - Lifetime
- 2002-01-18 EP EP02250340A patent/EP1226946B1/en not_active Expired - Lifetime
- 2002-01-24 JP JP2002016080A patent/JP3980361B2/ja not_active Expired - Fee Related
- 2002-06-27 US US10/185,532 patent/US20020167553A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002254662A5 (enExample) | ||
| KR100506436B1 (ko) | 액체 토출 기록 헤드 및 이를 제조하기 위한 방법 | |
| KR100519764B1 (ko) | 잉크젯 프린트헤드의 압전 액츄에이터 및 그 형성 방법 | |
| US8173030B2 (en) | Liquid drop ejector having self-aligned hole | |
| US8377828B2 (en) | Method of manufacturing a substrate for a liquid discharge head | |
| KR100474423B1 (ko) | 버블 잉크젯 프린트 헤드 및 그 제조방법 | |
| EP1226946A3 (en) | Two-step trench etch for a fully integrated thermal inkjet printhead | |
| US7325310B2 (en) | Method for manufacturing a monolithic ink-jet printhead | |
| KR100560593B1 (ko) | 액체 토출 헤드의 제조방법 | |
| US7481942B2 (en) | Monolithic ink-jet printhead and method of manufacturing the same | |
| JP2002283580A5 (enExample) | ||
| JP2003165225A5 (enExample) | ||
| EP1241009A3 (en) | Ink feed trench etch technique for a fully integrated thermal inkjet printhead | |
| US8172370B2 (en) | Planar heater stack and method for making planar heater stack | |
| EP3160751A1 (en) | Fluid ejection structure | |
| KR20080060003A (ko) | 잉크젯 프린트 헤드의 제조방법 | |
| JP2016117174A (ja) | シリコン基板の加工方法、及び液体吐出ヘッド | |
| JP7134831B2 (ja) | 液体吐出ヘッドの製造方法 | |
| JP2007098813A5 (enExample) | ||
| JP4993731B2 (ja) | 液体吐出ヘッドの製造方法 | |
| JP5959979B2 (ja) | 貫通口を有する基板、液体吐出ヘッド用基板及び液体吐出ヘッドの製造方法 | |
| KR20070060924A (ko) | 패럴린 마스크를 이용한 실리콘 습식 식각 방법 및 이방법을 이용한 잉크젯 프린트헤드의 노즐 플레이트 제조방법 | |
| US10632754B2 (en) | Perforated substrate processing method and liquid ejection head manufacturing method | |
| JP4298286B2 (ja) | インクジェット記録ヘッドの製造方法 | |
| JP6032955B2 (ja) | 液体吐出ヘッドの製造方法 |