JP2002243905A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002243905A5 JP2002243905A5 JP2001044275A JP2001044275A JP2002243905A5 JP 2002243905 A5 JP2002243905 A5 JP 2002243905A5 JP 2001044275 A JP2001044275 A JP 2001044275A JP 2001044275 A JP2001044275 A JP 2001044275A JP 2002243905 A5 JP2002243905 A5 JP 2002243905A5
- Authority
- JP
- Japan
- Prior art keywords
- polysiloxane
- carbon atoms
- refractive index
- carbon
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 polysiloxane Polymers 0.000 description 36
- 229920001296 polysiloxane Polymers 0.000 description 36
- 125000004432 carbon atom Chemical group C* 0.000 description 32
- 125000003545 alkoxy group Chemical group 0.000 description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 229910052799 carbon Inorganic materials 0.000 description 22
- 125000000217 alkyl group Chemical group 0.000 description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 239000008199 coating composition Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 5
- 229910003849 O-Si Inorganic materials 0.000 description 4
- 229910003872 O—Si Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- 239000002253 acid Substances 0.000 description 2
- 125000004423 acyloxy group Chemical group 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004104 aryloxy group Chemical group 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001044275A JP2002243905A (ja) | 2001-02-20 | 2001-02-20 | 反射防止フィルムおよびその製造方法並びに画像表示装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001044275A JP2002243905A (ja) | 2001-02-20 | 2001-02-20 | 反射防止フィルムおよびその製造方法並びに画像表示装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002243905A JP2002243905A (ja) | 2002-08-28 |
| JP2002243905A5 true JP2002243905A5 (https=) | 2007-07-05 |
Family
ID=18906296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001044275A Pending JP2002243905A (ja) | 2001-02-20 | 2001-02-20 | 反射防止フィルムおよびその製造方法並びに画像表示装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002243905A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100857967B1 (ko) * | 2003-06-03 | 2008-09-10 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 반사 방지막 재료, 이것을 이용한 반사 방지막 및 패턴형성 방법 |
| JP2005099693A (ja) * | 2003-09-05 | 2005-04-14 | Hitachi Chem Co Ltd | 反射防止膜形成用組成物及びそれを用いた反射防止膜の製造方法、光学部品、太陽電池ユニット |
| JP4893545B2 (ja) * | 2007-09-11 | 2012-03-07 | 凸版印刷株式会社 | 反射防止フィルムの製造方法 |
| KR20230169324A (ko) * | 2021-05-05 | 2023-12-15 | 와커 헤미 아게 | 중합체 알킬 실리케이트의 혼합물 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6321601A (ja) * | 1986-07-16 | 1988-01-29 | Toray Ind Inc | 反射防止性物品およびその製造方法 |
| JP4032185B2 (ja) * | 1995-12-01 | 2008-01-16 | 日産化学工業株式会社 | 低屈折率及び撥水性を有する被膜 |
| JP4117062B2 (ja) * | 1998-03-10 | 2008-07-09 | 富士フイルム株式会社 | 反射防止膜およびそれを配置した表示装置 |
| JP4297296B2 (ja) * | 1998-09-07 | 2009-07-15 | 大日本印刷株式会社 | 光学機能性膜の製造方法 |
| JP3932717B2 (ja) * | 1999-03-18 | 2007-06-20 | コニカミノルタホールディングス株式会社 | 反射防止フィルムの製造方法及び反射防止フィルム |
| JP2000275859A (ja) * | 1999-03-29 | 2000-10-06 | Nippon Paint Co Ltd | 光硬化性組成物 |
-
2001
- 2001-02-20 JP JP2001044275A patent/JP2002243905A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6575721B1 (ja) | パーフルオロ（ポリ）エーテル基含有シラン化合物 | |
| US10338278B2 (en) | Anti-fog coating | |
| JP6838614B2 (ja) | フルオロ（ポリ）エーテル基含有シラン化合物 | |
| JP2009544816A5 (https=) | ||
| US20200002551A1 (en) | Perfluoro(poly)ether group-containing compound, and surface treatment agent and article including same | |
| TWI622594B (zh) | 多面體寡聚矽倍半氧烷與其製備方法、包括其的塗佈組成物及抗反射膜 | |
| JP2007533448A5 (https=) | ||
| JP2013510333A5 (https=) | ||
| EP1113033A3 (en) | Polyhydroxyalkanoate, method for production thereof and microorganisms for use in the same | |
| US20210277258A1 (en) | Surface-treating agent comprising perfluoro(poly)ether group-containing compound | |
| WO2013094585A1 (ja) | ガラス繊維複合化樹脂基板 | |
| JP2014214194A (ja) | フルオロオキシアルキレン基含有ポリマー変性シラン及び該シランを含む表面処理剤並びに該表面処理剤で表面処理された物品 | |
| JP2007114772A5 (https=) | ||
| JP2013237825A (ja) | 含フッ素アルコール化合物を含む硬化性組成物 | |
| JP2004231934A5 (https=) | ||
| JP2008121011A5 (ja) | 無機微粒子、塗布組成物、硬化物、光学フィルム、反射防止フィルム、偏光板、及び画像表示装置 | |
| JP2017030356A5 (https=) | ||
| JP2002243905A5 (https=) | ||
| JP3991730B2 (ja) | 重合性化合物およびその重合体 | |
| JP6042972B2 (ja) | コーティング組成物 | |
| CN101177485B (zh) | 含双平行主链结构低表面能氟硅氧烷低聚物及其合成方法 | |
| JPS60208317A (ja) | 硬化性合成樹脂組成物と共重合体の製造方法 | |
| JP2007301970A5 (https=) | ||
| JPWO2023074622A5 (https=) | ||
| EP1486801A3 (en) | Optical composition, process for producing optical element using the same, and optical element |