JP2002190452A5 - - Google Patents

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Publication number
JP2002190452A5
JP2002190452A5 JP2001313318A JP2001313318A JP2002190452A5 JP 2002190452 A5 JP2002190452 A5 JP 2002190452A5 JP 2001313318 A JP2001313318 A JP 2001313318A JP 2001313318 A JP2001313318 A JP 2001313318A JP 2002190452 A5 JP2002190452 A5 JP 2002190452A5
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JP
Japan
Prior art keywords
light source
lamp
lamp light
radiation
semiconductor film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001313318A
Other languages
English (en)
Japanese (ja)
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JP2002190452A (ja
JP4004765B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2001313318A priority Critical patent/JP4004765B2/ja
Priority claimed from JP2001313318A external-priority patent/JP4004765B2/ja
Publication of JP2002190452A publication Critical patent/JP2002190452A/ja
Publication of JP2002190452A5 publication Critical patent/JP2002190452A5/ja
Application granted granted Critical
Publication of JP4004765B2 publication Critical patent/JP4004765B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001313318A 2000-10-10 2001-10-10 半導体装置の作製方法 Expired - Fee Related JP4004765B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001313318A JP4004765B2 (ja) 2000-10-10 2001-10-10 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-309887 2000-10-10
JP2000309887 2000-10-10
JP2001313318A JP4004765B2 (ja) 2000-10-10 2001-10-10 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2002190452A JP2002190452A (ja) 2002-07-05
JP2002190452A5 true JP2002190452A5 (ko) 2005-06-23
JP4004765B2 JP4004765B2 (ja) 2007-11-07

Family

ID=26601827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001313318A Expired - Fee Related JP4004765B2 (ja) 2000-10-10 2001-10-10 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4004765B2 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6759313B2 (en) 2000-12-05 2004-07-06 Semiconductor Energy Laboratory Co., Ltd Method of fabricating a semiconductor device
JP5130463B2 (ja) * 2001-03-28 2013-01-30 独立行政法人産業技術総合研究所 薄膜半導体素子の製造方法
KR101025444B1 (ko) * 2003-10-28 2011-03-30 엘지디스플레이 주식회사 급속열처리장치 및 이를 이용한 이온활성화 방법
JP5294231B2 (ja) * 2007-03-26 2013-09-18 国立大学法人 奈良先端科学技術大学院大学 薄膜トランジスタの製造方法
JP5465828B2 (ja) * 2007-10-01 2014-04-09 株式会社日立国際電気 基板処理装置及び半導体デバイスの製造方法
JP5374109B2 (ja) * 2008-10-17 2013-12-25 株式会社アルバック 加熱真空処理方法
KR101244488B1 (ko) 2009-02-27 2013-03-18 가부시키가이샤 알박 진공 가열 장치, 진공 가열 처리 방법
KR101729724B1 (ko) * 2014-12-26 2017-04-25 주식회사 비아트론 복수 열원을 포함하는 코팅층 열처리 장치 및 이를 이용한 열처리 방법

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