JP2002190452A5 - - Google Patents
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- Publication number
- JP2002190452A5 JP2002190452A5 JP2001313318A JP2001313318A JP2002190452A5 JP 2002190452 A5 JP2002190452 A5 JP 2002190452A5 JP 2001313318 A JP2001313318 A JP 2001313318A JP 2001313318 A JP2001313318 A JP 2001313318A JP 2002190452 A5 JP2002190452 A5 JP 2002190452A5
- Authority
- JP
- Japan
- Prior art keywords
- light source
- lamp
- lamp light
- radiation
- semiconductor film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001313318A JP4004765B2 (ja) | 2000-10-10 | 2001-10-10 | 半導体装置の作製方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-309887 | 2000-10-10 | ||
JP2000309887 | 2000-10-10 | ||
JP2001313318A JP4004765B2 (ja) | 2000-10-10 | 2001-10-10 | 半導体装置の作製方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002190452A JP2002190452A (ja) | 2002-07-05 |
JP2002190452A5 true JP2002190452A5 (ko) | 2005-06-23 |
JP4004765B2 JP4004765B2 (ja) | 2007-11-07 |
Family
ID=26601827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001313318A Expired - Fee Related JP4004765B2 (ja) | 2000-10-10 | 2001-10-10 | 半導体装置の作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4004765B2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6759313B2 (en) | 2000-12-05 | 2004-07-06 | Semiconductor Energy Laboratory Co., Ltd | Method of fabricating a semiconductor device |
JP5130463B2 (ja) * | 2001-03-28 | 2013-01-30 | 独立行政法人産業技術総合研究所 | 薄膜半導体素子の製造方法 |
KR101025444B1 (ko) * | 2003-10-28 | 2011-03-30 | 엘지디스플레이 주식회사 | 급속열처리장치 및 이를 이용한 이온활성화 방법 |
JP5294231B2 (ja) * | 2007-03-26 | 2013-09-18 | 国立大学法人 奈良先端科学技術大学院大学 | 薄膜トランジスタの製造方法 |
JP5465828B2 (ja) * | 2007-10-01 | 2014-04-09 | 株式会社日立国際電気 | 基板処理装置及び半導体デバイスの製造方法 |
JP5374109B2 (ja) * | 2008-10-17 | 2013-12-25 | 株式会社アルバック | 加熱真空処理方法 |
KR101244488B1 (ko) | 2009-02-27 | 2013-03-18 | 가부시키가이샤 알박 | 진공 가열 장치, 진공 가열 처리 방법 |
KR101729724B1 (ko) * | 2014-12-26 | 2017-04-25 | 주식회사 비아트론 | 복수 열원을 포함하는 코팅층 열처리 장치 및 이를 이용한 열처리 방법 |
-
2001
- 2001-10-10 JP JP2001313318A patent/JP4004765B2/ja not_active Expired - Fee Related
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