JP2002190437A - 電子ビーム露光装置及び校正方法 - Google Patents

電子ビーム露光装置及び校正方法

Info

Publication number
JP2002190437A
JP2002190437A JP2000386986A JP2000386986A JP2002190437A JP 2002190437 A JP2002190437 A JP 2002190437A JP 2000386986 A JP2000386986 A JP 2000386986A JP 2000386986 A JP2000386986 A JP 2000386986A JP 2002190437 A JP2002190437 A JP 2002190437A
Authority
JP
Japan
Prior art keywords
electron beam
conductive members
exposure apparatus
unit
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000386986A
Other languages
English (en)
Japanese (ja)
Inventor
Harunobu Muto
治信 武藤
Hiroshi Yano
弘 矢野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Priority to JP2000386986A priority Critical patent/JP2002190437A/ja
Priority to PCT/JP2001/009813 priority patent/WO2002050877A1/fr
Publication of JP2002190437A publication Critical patent/JP2002190437A/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30433—System calibration
    • H01J2237/3045—Deflection calibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2000386986A 2000-12-20 2000-12-20 電子ビーム露光装置及び校正方法 Withdrawn JP2002190437A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000386986A JP2002190437A (ja) 2000-12-20 2000-12-20 電子ビーム露光装置及び校正方法
PCT/JP2001/009813 WO2002050877A1 (fr) 2000-12-20 2001-11-09 Systeme d'exposition a un faisceau d'electrons, element correcteur, procede de correction et procede d'exposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000386986A JP2002190437A (ja) 2000-12-20 2000-12-20 電子ビーム露光装置及び校正方法

Publications (1)

Publication Number Publication Date
JP2002190437A true JP2002190437A (ja) 2002-07-05

Family

ID=18854000

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000386986A Withdrawn JP2002190437A (ja) 2000-12-20 2000-12-20 電子ビーム露光装置及び校正方法

Country Status (2)

Country Link
JP (1) JP2002190437A (fr)
WO (1) WO2002050877A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016076548A (ja) * 2014-10-03 2016-05-12 株式会社ニューフレアテクノロジー ブランキングアパーチャアレイ及び荷電粒子ビーム描画装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4836280B2 (ja) 2004-06-18 2011-12-14 ノバルティス バクシンズ アンド ダイアグノスティックス，インコーポレーテッド 癌を治療するためのキネシンスピンドルタンパク質（ｋｓｐ）阻害剤としてのｎ−（１−（１−ベンジル−４−フェニル−１ｈ−イミダゾール−２−イル）−２，２−ジメチルプロピル）ベンズアミド誘導体および関連化合物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102019A (ja) * 1991-10-08 1993-04-23 Nippon Seiko Kk アライメントマーク位置検出装置
JPH06177025A (ja) * 1992-12-10 1994-06-24 Hitachi Ltd 電子ビーム描画方法および描画装置
JP3298347B2 (ja) * 1995-01-11 2002-07-02 株式会社日立製作所 電子線描画装置
US5929454A (en) * 1996-06-12 1999-07-27 Canon Kabushiki Kaisha Position detection apparatus, electron beam exposure apparatus, and methods associated with them

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016076548A (ja) * 2014-10-03 2016-05-12 株式会社ニューフレアテクノロジー ブランキングアパーチャアレイ及び荷電粒子ビーム描画装置
TWI647734B (zh) * 2014-10-03 2019-01-11 日商紐富來科技股份有限公司 Masking aperture array and charged particle beam depicting device

Also Published As

Publication number Publication date
WO2002050877A1 (fr) 2002-06-27

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A300 Application deemed to be withdrawn because no request for examination was validly filed

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Effective date: 20080304