JP2002141768A - 表面弾性波素子 - Google Patents
表面弾性波素子Info
- Publication number
- JP2002141768A JP2002141768A JP2000336136A JP2000336136A JP2002141768A JP 2002141768 A JP2002141768 A JP 2002141768A JP 2000336136 A JP2000336136 A JP 2000336136A JP 2000336136 A JP2000336136 A JP 2000336136A JP 2002141768 A JP2002141768 A JP 2002141768A
- Authority
- JP
- Japan
- Prior art keywords
- film
- silicon oxide
- surface acoustic
- piezoelectric
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010897 surface acoustic wave method Methods 0.000 title claims abstract description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 31
- 229910003460 diamond Inorganic materials 0.000 claims abstract description 18
- 239000010432 diamond Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 229910013641 LiNbO 3 Inorganic materials 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052710 silicon Inorganic materials 0.000 abstract description 5
- 239000010703 silicon Substances 0.000 abstract description 5
- 239000010408 film Substances 0.000 description 107
- 239000000463 material Substances 0.000 description 9
- 230000000087 stabilizing effect Effects 0.000 description 5
- 238000010295 mobile communication Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 3
- 238000007667 floating Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000336136A JP2002141768A (ja) | 2000-11-02 | 2000-11-02 | 表面弾性波素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000336136A JP2002141768A (ja) | 2000-11-02 | 2000-11-02 | 表面弾性波素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002141768A true JP2002141768A (ja) | 2002-05-17 |
| JP2002141768A5 JP2002141768A5 (enExample) | 2004-11-11 |
Family
ID=18811759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000336136A Pending JP2002141768A (ja) | 2000-11-02 | 2000-11-02 | 表面弾性波素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002141768A (enExample) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7176903B2 (en) | 2003-10-07 | 2007-02-13 | Fujitsu Limited | Piezoelectric element and touch screen utilizing the same |
| KR100802882B1 (ko) * | 2005-11-18 | 2008-02-13 | 후지쯔 가부시끼가이샤 | 압전 소자, 그 제조 방법 및 터치 패널 장치 |
| JP2008125131A (ja) * | 2008-02-08 | 2008-05-29 | Murata Mfg Co Ltd | 表面波装置及びその製造方法 |
| JP2009290423A (ja) * | 2008-05-28 | 2009-12-10 | Fujitsu Media Device Kk | 弾性表面波デバイス |
| CN112953440A (zh) * | 2021-02-09 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953441A (zh) * | 2021-02-09 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953445A (zh) * | 2021-04-13 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| WO2023048191A1 (ja) * | 2021-09-24 | 2023-03-30 | 株式会社村田製作所 | フィルタ装置 |
-
2000
- 2000-11-02 JP JP2000336136A patent/JP2002141768A/ja active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7176903B2 (en) | 2003-10-07 | 2007-02-13 | Fujitsu Limited | Piezoelectric element and touch screen utilizing the same |
| KR100802882B1 (ko) * | 2005-11-18 | 2008-02-13 | 후지쯔 가부시끼가이샤 | 압전 소자, 그 제조 방법 및 터치 패널 장치 |
| JP2008125131A (ja) * | 2008-02-08 | 2008-05-29 | Murata Mfg Co Ltd | 表面波装置及びその製造方法 |
| JP2009290423A (ja) * | 2008-05-28 | 2009-12-10 | Fujitsu Media Device Kk | 弾性表面波デバイス |
| CN112953440A (zh) * | 2021-02-09 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953441A (zh) * | 2021-02-09 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953441B (zh) * | 2021-02-09 | 2023-10-24 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953440B (zh) * | 2021-02-09 | 2023-10-24 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953445A (zh) * | 2021-04-13 | 2021-06-11 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| CN112953445B (zh) * | 2021-04-13 | 2023-09-15 | 广东广纳芯科技有限公司 | 谐振器和谐振器的制造方法 |
| WO2023048191A1 (ja) * | 2021-09-24 | 2023-03-30 | 株式会社村田製作所 | フィルタ装置 |
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Legal Events
| Date | Code | Title | Description |
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| A977 | Report on retrieval |
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