JP2002082440A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2002082440A5 JP2002082440A5 JP2001200816A JP2001200816A JP2002082440A5 JP 2002082440 A5 JP2002082440 A5 JP 2002082440A5 JP 2001200816 A JP2001200816 A JP 2001200816A JP 2001200816 A JP2001200816 A JP 2001200816A JP 2002082440 A5 JP2002082440 A5 JP 2002082440A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- photoresist composition
- triflate
- hept
- ene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims description 43
- -1 diphenyliodo Chemical class 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 235000010290 biphenyl Nutrition 0.000 claims description 5
- 239000004305 biphenyl Substances 0.000 claims description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 5
- 125000006267 biphenyl group Chemical group 0.000 claims description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 4
- 150000003254 radicals Chemical class 0.000 claims description 3
- VUBUXALTYMBEQO-UHFFFAOYSA-N 2,2,3,3,3-pentafluoro-1-phenylpropan-1-one Chemical compound FC(F)(F)C(F)(F)C(=O)C1=CC=CC=C1 VUBUXALTYMBEQO-UHFFFAOYSA-N 0.000 claims description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 150000001925 cycloalkenes Chemical class 0.000 claims description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 claims description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 claims description 2
- RUVINXPYWBROJD-UHFFFAOYSA-N para-methoxyphenyl Natural products COC1=CC=C(C=CC)C=C1 RUVINXPYWBROJD-UHFFFAOYSA-N 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims description 2
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims 2
- BZBMBZJUNPMEBD-UHFFFAOYSA-N tert-butyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OC(C)(C)C)CC1C=C2 BZBMBZJUNPMEBD-UHFFFAOYSA-N 0.000 claims 2
- PHSXOZKMZYKHLY-UHFFFAOYSA-N 2-hydroxyethyl bicyclo[2.2.1]hept-2-ene-5-carboxylate Chemical compound C1C2C(C(=O)OCCO)CC1C=C2 PHSXOZKMZYKHLY-UHFFFAOYSA-N 0.000 claims 1
- BSMGLVDZZMBWQB-UHFFFAOYSA-N 2-methyl-1-phenylpropan-1-one Chemical compound CC(C)C(=O)C1=CC=CC=C1 BSMGLVDZZMBWQB-UHFFFAOYSA-N 0.000 claims 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 claims 1
- FYGUSUBEMUKACF-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C(=O)O)CC1C=C2 FYGUSUBEMUKACF-UHFFFAOYSA-N 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- ZLZZZUYVKRXMRS-UHFFFAOYSA-N (4-benzhydrylphenyl) trifluoromethanesulfonate Chemical compound O(S(=O)(=O)C(F)(F)F)C1=CC=C(C(C2=CC=CC=C2)C2=CC=CC=C2)C=C1 ZLZZZUYVKRXMRS-UHFFFAOYSA-N 0.000 description 1
- CPNBXOGOMSMGCF-UHFFFAOYSA-N (4-tert-butyl-2,3-diphenylphenyl) trifluoromethanesulfonate Chemical compound C=1C=CC=CC=1C=1C(C(C)(C)C)=CC=C(OS(=O)(=O)C(F)(F)F)C=1C1=CC=CC=C1 CPNBXOGOMSMGCF-UHFFFAOYSA-N 0.000 description 1
- CYJIAJHBQYSDNE-UHFFFAOYSA-N [4-(2-methylpropyl)-2,3-diphenylphenyl] trifluoromethanesulfonate Chemical compound C=1C=CC=CC=1C=1C(CC(C)C)=CC=C(OS(=O)(=O)C(F)(F)F)C=1C1=CC=CC=C1 CYJIAJHBQYSDNE-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020000037228A KR100583095B1 (ko) | 2000-06-30 | 2000-06-30 | 광산 발생제와 함께 광 라디칼 발생제(ｐｒｇ)를 포함하는포토레지스트 조성물 |
| KR2000-37228 | 2000-06-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002082440A JP2002082440A (ja) | 2002-03-22 |
| JP2002082440A5 true JP2002082440A5 (https=) | 2005-04-07 |
| JP3875519B2 JP3875519B2 (ja) | 2007-01-31 |
Family
ID=19675463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001200816A Expired - Fee Related JP3875519B2 (ja) | 2000-06-30 | 2001-07-02 | フォトレジスト組成物、フォトレジストパターン形成方法、及び、半導体素子の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6692891B2 (https=) |
| JP (1) | JP3875519B2 (https=) |
| KR (1) | KR100583095B1 (https=) |
| CN (1) | CN1241065C (https=) |
| DE (1) | DE10131123A1 (https=) |
| GB (1) | GB2364392B (https=) |
| TW (1) | TWI225967B (https=) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2197869B1 (en) * | 2007-10-10 | 2013-04-24 | Basf Se | Sulphonium salt initiators |
| JP5834630B2 (ja) * | 2011-02-04 | 2015-12-24 | 日立化成株式会社 | 樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP5884961B2 (ja) * | 2011-04-27 | 2016-03-15 | 日産化学工業株式会社 | 光ラジカル重合開始剤を含む感光性レジスト下層膜形成組成物 |
| CN103582605B (zh) | 2011-05-23 | 2017-04-05 | 奥的斯电梯公司 | 多边形补偿联接系统、乘客输送系统和减小链驱动系统中的多边形效应的方法 |
| WO2013090892A1 (en) * | 2011-12-16 | 2013-06-20 | The University Of Akron | Substituted phenacyl molecules and photoresponsive polymers |
| JP5772642B2 (ja) * | 2012-02-09 | 2015-09-02 | Jsr株式会社 | 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子 |
| WO2013119134A1 (en) * | 2012-10-16 | 2013-08-15 | Eugen Pavel | Photoresist with rare-earth sensitizers |
| WO2014126834A2 (en) | 2013-02-12 | 2014-08-21 | Eipi Systems, Inc. | Method and apparatus for three-dimensional fabrication with feed through carrier |
| CA2898098A1 (en) | 2013-02-12 | 2014-08-21 | Carbon3D, Inc. | Method and apparatus for three-dimensional fabrication |
| WO2015142546A1 (en) | 2014-03-21 | 2015-09-24 | Carbon3D, Inc. | Method and apparatus for three-dimensional fabrication with gas injection through carrier |
| EP3656559A1 (en) | 2014-04-25 | 2020-05-27 | Carbon, Inc. | Continuous three dimensional fabrication from immiscible liquids |
| US10569465B2 (en) | 2014-06-20 | 2020-02-25 | Carbon, Inc. | Three-dimensional printing using tiled light engines |
| US10661501B2 (en) | 2014-06-20 | 2020-05-26 | Carbon, Inc. | Three-dimensional printing method using increased light intensity and apparatus therefor |
| KR20170017941A (ko) | 2014-06-20 | 2017-02-15 | 카본, 인크. | 중합성 액체의 왕복 공급을 통한 3차원 프린팅 |
| BR112016029755A2 (pt) | 2014-06-23 | 2017-08-22 | Carbon Inc | métodos de produção de objetos tridimensionais a partir de materiais tendo múltiplos mecanismos de endurecimento |
| US11390062B2 (en) | 2014-08-12 | 2022-07-19 | Carbon, Inc. | Three-dimensional printing with supported build plates |
| EP3240671B1 (en) | 2014-12-31 | 2020-12-16 | Carbon, Inc. | Three-dimensional printing of objects with breathing orifices |
| WO2016112084A1 (en) | 2015-01-06 | 2016-07-14 | Carbon3D, Inc. | Build plate for three dimensional printing having a rough or patterned surface |
| WO2016112090A1 (en) | 2015-01-07 | 2016-07-14 | Carbon3D, Inc. | Microfluidic devices and methods of making the same |
| EP3245044B1 (en) | 2015-01-13 | 2021-05-05 | Carbon, Inc. | Three-dimensional printing with build plates having surface topologies for increasing permeability and related methods |
| EP3250369B8 (en) | 2015-01-30 | 2020-10-28 | Carbon, Inc. | Build plates for continuous liquid interface printing having permeable base and adhesive for increasing permeability and related method and apparatus |
| US20180133959A1 (en) | 2015-01-30 | 2018-05-17 | Carbon, Inc. | Build plates for continuous liquid interface printing having permeable sheets and related methods, systems and devices |
| EP3253558B1 (en) | 2015-02-05 | 2020-04-08 | Carbon, Inc. | Method of additive manufacturing by fabrication through multiple zones |
| WO2016133759A1 (en) | 2015-02-20 | 2016-08-25 | Carbon3D, Inc. | Methods and apparatus for continuous liquid interface printing with electrochemically supported dead zone |
| US20180015662A1 (en) | 2015-03-05 | 2018-01-18 | Carbon, Inc. | Fabrication of three dimensional objects with variable slice thickness |
| US10391711B2 (en) | 2015-03-05 | 2019-08-27 | Carbon, Inc. | Fabrication of three dimensional objects with multiple operating modes |
| WO2016140891A1 (en) | 2015-03-05 | 2016-09-09 | Carbon3D, Inc. | Continuous liquid interface production with sequential patterned exposure |
| WO2016145050A1 (en) | 2015-03-10 | 2016-09-15 | Carbon3D, Inc. | Microfluidic devices having flexible features and methods of making the same |
| WO2016145182A1 (en) | 2015-03-12 | 2016-09-15 | Carbon3D, Inc. | Additive manufacturing using polymerization initiators or inhibitors having controlled migration |
| WO2016149097A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with reduced pressure build plate unit |
| WO2016149104A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with flexible build plates |
| WO2016149151A1 (en) | 2015-03-13 | 2016-09-22 | Carbon3D, Inc. | Three-dimensional printing with concurrent delivery of different polymerizable liquids |
| WO2017048710A1 (en) | 2015-09-14 | 2017-03-23 | Carbon, Inc. | Light-curable article of manufacture with portions of differing solubility |
| JP6889155B2 (ja) | 2015-09-25 | 2021-06-18 | カーボン，インコーポレイテッド | ライティングパネルを有する継続的液体相間印刷用のビルドプレートアセンブリー、及び関連した方法、システム並びにデバイス |
| US20180243976A1 (en) | 2015-09-30 | 2018-08-30 | Carbon, Inc. | Method and Apparatus for Producing Three- Dimensional Objects |
| US12010287B2 (en) | 2015-10-09 | 2024-06-11 | Southern Methodist University | System and method for a three-dimensional optical switch display device |
| US12558845B2 (en) | 2015-10-09 | 2026-02-24 | Southern Methodist University | System and method for a three-dimensional optical switch display device |
| US10647873B2 (en) | 2015-10-30 | 2020-05-12 | Carbon, Inc. | Dual cure article of manufacture with portions of differing solubility |
| WO2017112521A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Production of flexible products by additive manufacturing with dual cure resins |
| CN108139665B (zh) | 2015-12-22 | 2022-07-05 | 卡本有限公司 | 用于用双重固化树脂的增材制造的双重前体树脂系统 |
| WO2017112483A2 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Accelerants for additive manufacturing with dual cure resins |
| JP6944935B2 (ja) | 2015-12-22 | 2021-10-06 | カーボン，インコーポレイテッド | 二重硬化樹脂を用いた積層造形による複数の中間体からの複合生産物の製作 |
| WO2017112571A1 (en) | 2015-12-22 | 2017-06-29 | Carbon, Inc. | Dual cure additive manufacturing of rigid intermediates that generate semi-rigid, flexible, or elastic final products |
| SG11201809614VA (en) | 2016-05-31 | 2018-11-29 | Univ Northwestern | Method for the fabrication of three-dimensional objects and apparatus for same |
| CN109153173B (zh) | 2016-07-01 | 2021-08-24 | 卡本有限公司 | 用于通过建造板脱气来减少气泡的三维打印方法和设备 |
| WO2018094131A1 (en) | 2016-11-21 | 2018-05-24 | Carbon, Inc. | Method of making three-dimensional object by delivering reactive component for subsequent cure |
| US10239255B2 (en) | 2017-04-11 | 2019-03-26 | Molecule Corp | Fabrication of solid materials or films from a polymerizable liquid |
| US11693318B2 (en) * | 2018-07-17 | 2023-07-04 | Shin-Etsu Chemical Co., Ltd. | Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, and black matrix |
| NL2022372B1 (en) | 2018-12-17 | 2020-07-03 | What The Future Venture Capital Wtfvc B V | Process for producing a cured 3d product |
| CN118636467A (zh) | 2019-03-07 | 2024-09-13 | 西北大学 | 形成三维物体的方法和形成三维物体的设备 |
| AU2020271078A1 (en) | 2019-04-09 | 2021-11-04 | Azul 3D, Inc. | Methodologies to rapidly cure and coat parts produced by additive manufacturing |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US245029A (en) * | 1881-08-02 | Sole-fastening staple | ||
| US4245029A (en) * | 1979-08-20 | 1981-01-13 | General Electric Company | Photocurable compositions using triarylsulfonium salts |
| US4968582A (en) * | 1988-06-28 | 1990-11-06 | Mcnc And University Of Nc At Charlotte | Photoresists resistant to oxygen plasmas |
| ES2110987T3 (es) * | 1990-11-05 | 1998-03-01 | Tokyo Ohka Kogyo Co Ltd | Composiciones fotopolimerizables. |
| JPH04349463A (ja) * | 1991-05-27 | 1992-12-03 | Nippon Telegr & Teleph Corp <Ntt> | ポジ型レジスト材料 |
| US5393642A (en) * | 1992-12-31 | 1995-02-28 | The University Of North Carolina At Charlotte | Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions |
| WO1997033198A1 (en) * | 1996-03-07 | 1997-09-12 | The B.F. Goodrich Company | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| KR100265597B1 (ko) * | 1996-12-30 | 2000-09-15 | 김영환 | Arf 감광막 수지 및 그 제조방법 |
| JP3802179B2 (ja) * | 1997-02-07 | 2006-07-26 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| JP3832013B2 (ja) | 1997-03-17 | 2006-10-11 | Ｊｓｒ株式会社 | プラズマディスプレイパネル用螢光面の形成方法 |
| JPH1195435A (ja) | 1997-09-17 | 1999-04-09 | Fuji Photo Film Co Ltd | ポジ型感光性着色組成物 |
| JPH11305433A (ja) * | 1998-04-21 | 1999-11-05 | Toppan Printing Co Ltd | 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ |
| KR100279497B1 (ko) * | 1998-07-16 | 2001-02-01 | 박찬구 | 술포늄 염의 제조방법 |
| KR20000056355A (ko) * | 1999-02-19 | 2000-09-15 | 김영환 | 고농도의 아민 존재하에서 우수한 특성을 갖는 포토레지스트 조성물 |
| KR100481601B1 (ko) | 1999-09-21 | 2005-04-08 | 주식회사 하이닉스반도체 | 광산 발생제와 함께 광염기 발생제를 포함하는 포토레지스트 조성물 |
-
2000
- 2000-06-30 KR KR1020000037228A patent/KR100583095B1/ko not_active Expired - Fee Related
-
2001
- 2001-06-12 GB GB0114259A patent/GB2364392B/en not_active Expired - Fee Related
- 2001-06-12 US US09/879,325 patent/US6692891B2/en not_active Expired - Fee Related
- 2001-06-21 TW TW090115057A patent/TWI225967B/zh not_active IP Right Cessation
- 2001-06-28 DE DE10131123A patent/DE10131123A1/de not_active Withdrawn
- 2001-06-29 CN CNB011188952A patent/CN1241065C/zh not_active Expired - Fee Related
- 2001-07-02 JP JP2001200816A patent/JP3875519B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2002082440A5 (https=) | ||
| JP3751065B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| JP3946449B2 (ja) | フォトレジスト重合体、フォトレジスト組成物、及びフォトレジストパターン形成方法 | |
| JP5810139B2 (ja) | 光酸発生剤のブレンドを含むフォトレジスト組成物 | |
| US6607868B2 (en) | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | |
| KR100257456B1 (ko) | 레지스트패턴 형성방법 | |
| US6692891B2 (en) | Photoresist composition containing photo radical generator with photoacid generator | |
| JP3380128B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| US6235448B1 (en) | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | |
| JP3691897B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| JP3688222B2 (ja) | フォトレジスト重合体とその製造方法、これを利用したフォトレジスト組成物、フォトレジストパターン形成方法、及び、半導体素子 | |
| JP2005509177A (ja) | 短波長像形成用フォトレジスト組成物 | |
| US6699645B2 (en) | Method for the formation of resist patterns | |
| CN101288027B (zh) | 用于光致抗蚀剂应用的低活化能溶解改性剂 | |
| JP4144957B2 (ja) | レジスト組成物及びレジストパターンの形成方法 | |
| JP3979726B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| KR100557555B1 (ko) | 불소가 치환된 벤질 카르복실레이트 그룹을 포함하는단량체 및 이를 함유한 포토레지스트 중합체 | |
| US6387589B1 (en) | Photoresist polymers and photoresist compositions containing the same | |
| JP2002055457A (ja) | 高エネルギー放射線でのイメージング用フォトレジスト | |
| US6749986B2 (en) | Polymers and photoresist compositions for short wavelength imaging | |
| JP3724890B2 (ja) | 化学増幅型レジスト組成物及びレジストパターンの形成方法 | |
| TWI307451B (en) | Photoresist composition | |
| JP3815844B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| JP3803313B2 (ja) | レジスト材料及びレジストパターンの形成方法 | |
| US20020015917A1 (en) | Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same |