GB2364392B - Photoresist composition containing photoradical generator with photoacid generator - Google Patents

Photoresist composition containing photoradical generator with photoacid generator

Info

Publication number
GB2364392B
GB2364392B GB0114259A GB0114259A GB2364392B GB 2364392 B GB2364392 B GB 2364392B GB 0114259 A GB0114259 A GB 0114259A GB 0114259 A GB0114259 A GB 0114259A GB 2364392 B GB2364392 B GB 2364392B
Authority
GB
United Kingdom
Prior art keywords
generator
composition containing
photoresist composition
photoradical
photoacid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0114259A
Other languages
English (en)
Other versions
GB0114259D0 (en
GB2364392A (en
Inventor
Jae-Chang Jung
Geun Su Lee
Min Ho Jung
Ki Ho Baik
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SK Hynix Inc
Original Assignee
Hynix Semiconductor Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hynix Semiconductor Inc filed Critical Hynix Semiconductor Inc
Publication of GB0114259D0 publication Critical patent/GB0114259D0/en
Publication of GB2364392A publication Critical patent/GB2364392A/en
Application granted granted Critical
Publication of GB2364392B publication Critical patent/GB2364392B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
GB0114259A 2000-06-30 2001-06-12 Photoresist composition containing photoradical generator with photoacid generator Expired - Fee Related GB2364392B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020000037228A KR100583095B1 (ko) 2000-06-30 2000-06-30 광산 발생제와 함께 광 라디칼 발생제(ｐｒｇ)를 포함하는포토레지스트 조성물

Publications (3)

Publication Number Publication Date
GB0114259D0 GB0114259D0 (en) 2001-08-01
GB2364392A GB2364392A (en) 2002-01-23
GB2364392B true GB2364392B (en) 2004-08-18

Family

ID=19675463

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0114259A Expired - Fee Related GB2364392B (en) 2000-06-30 2001-06-12 Photoresist composition containing photoradical generator with photoacid generator

Country Status (7)

Country Link
US (1) US6692891B2 (https=)
JP (1) JP3875519B2 (https=)
KR (1) KR100583095B1 (https=)
CN (1) CN1241065C (https=)
DE (1) DE10131123A1 (https=)
GB (1) GB2364392B (https=)
TW (1) TWI225967B (https=)

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JP5884961B2 (ja) * 2011-04-27 2016-03-15 日産化学工業株式会社 光ラジカル重合開始剤を含む感光性レジスト下層膜形成組成物
CN103582605B (zh) 2011-05-23 2017-04-05 奥的斯电梯公司 多边形补偿联接系统、乘客输送系统和减小链驱动系统中的多边形效应的方法
WO2013090892A1 (en) * 2011-12-16 2013-06-20 The University Of Akron Substituted phenacyl molecules and photoresponsive polymers
JP5772642B2 (ja) * 2012-02-09 2015-09-02 Jsr株式会社 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子
WO2013119134A1 (en) * 2012-10-16 2013-08-15 Eugen Pavel Photoresist with rare-earth sensitizers
WO2014126834A2 (en) 2013-02-12 2014-08-21 Eipi Systems, Inc. Method and apparatus for three-dimensional fabrication with feed through carrier
CA2898098A1 (en) 2013-02-12 2014-08-21 Carbon3D, Inc. Method and apparatus for three-dimensional fabrication
WO2015142546A1 (en) 2014-03-21 2015-09-24 Carbon3D, Inc. Method and apparatus for three-dimensional fabrication with gas injection through carrier
EP3656559A1 (en) 2014-04-25 2020-05-27 Carbon, Inc. Continuous three dimensional fabrication from immiscible liquids
US10569465B2 (en) 2014-06-20 2020-02-25 Carbon, Inc. Three-dimensional printing using tiled light engines
US10661501B2 (en) 2014-06-20 2020-05-26 Carbon, Inc. Three-dimensional printing method using increased light intensity and apparatus therefor
KR20170017941A (ko) 2014-06-20 2017-02-15 카본, 인크. 중합성 액체의 왕복 공급을 통한 3차원 프린팅
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US11390062B2 (en) 2014-08-12 2022-07-19 Carbon, Inc. Three-dimensional printing with supported build plates
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WO2016112084A1 (en) 2015-01-06 2016-07-14 Carbon3D, Inc. Build plate for three dimensional printing having a rough or patterned surface
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US20180133959A1 (en) 2015-01-30 2018-05-17 Carbon, Inc. Build plates for continuous liquid interface printing having permeable sheets and related methods, systems and devices
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WO2016133759A1 (en) 2015-02-20 2016-08-25 Carbon3D, Inc. Methods and apparatus for continuous liquid interface printing with electrochemically supported dead zone
US20180015662A1 (en) 2015-03-05 2018-01-18 Carbon, Inc. Fabrication of three dimensional objects with variable slice thickness
US10391711B2 (en) 2015-03-05 2019-08-27 Carbon, Inc. Fabrication of three dimensional objects with multiple operating modes
WO2016140891A1 (en) 2015-03-05 2016-09-09 Carbon3D, Inc. Continuous liquid interface production with sequential patterned exposure
WO2016145050A1 (en) 2015-03-10 2016-09-15 Carbon3D, Inc. Microfluidic devices having flexible features and methods of making the same
WO2016145182A1 (en) 2015-03-12 2016-09-15 Carbon3D, Inc. Additive manufacturing using polymerization initiators or inhibitors having controlled migration
WO2016149097A1 (en) 2015-03-13 2016-09-22 Carbon3D, Inc. Three-dimensional printing with reduced pressure build plate unit
WO2016149104A1 (en) 2015-03-13 2016-09-22 Carbon3D, Inc. Three-dimensional printing with flexible build plates
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JPH1195435A (ja) * 1997-09-17 1999-04-09 Fuji Photo Film Co Ltd ポジ型感光性着色組成物
JPH11305433A (ja) * 1998-04-21 1999-11-05 Toppan Printing Co Ltd 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ
US6051368A (en) * 1997-03-17 2000-04-18 Jsr Corporation Radiation sensitive composition containing a dispersed phosphor
GB2354596A (en) * 1999-09-21 2001-03-28 Hyundai Electronics Ind Photoresist composition containing photobase generator and photoacid generator

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Also Published As

Publication number Publication date
US6692891B2 (en) 2004-02-17
JP3875519B2 (ja) 2007-01-31
DE10131123A1 (de) 2002-02-14
KR100583095B1 (ko) 2006-05-24
JP2002082440A (ja) 2002-03-22
GB0114259D0 (en) 2001-08-01
GB2364392A (en) 2002-01-23
TWI225967B (en) 2005-01-01
CN1330288A (zh) 2002-01-09
CN1241065C (zh) 2006-02-08
US20020012873A1 (en) 2002-01-31
KR20020002877A (ko) 2002-01-10

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PCNP Patent ceased through non-payment of renewal fee

Effective date: 20090612