JP2002060468A - Epoxy resin composition, prepreg, and copper-clad laminate using the prepreg - Google Patents

Epoxy resin composition, prepreg, and copper-clad laminate using the prepreg

Info

Publication number
JP2002060468A
JP2002060468A JP2000246660A JP2000246660A JP2002060468A JP 2002060468 A JP2002060468 A JP 2002060468A JP 2000246660 A JP2000246660 A JP 2000246660A JP 2000246660 A JP2000246660 A JP 2000246660A JP 2002060468 A JP2002060468 A JP 2002060468A
Authority
JP
Japan
Prior art keywords
epoxy resin
resin composition
particle size
prepreg
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000246660A
Other languages
Japanese (ja)
Inventor
Sumiya Miyake
澄也 三宅
Takayuki Baba
孝幸 馬場
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2000246660A priority Critical patent/JP2002060468A/en
Publication of JP2002060468A publication Critical patent/JP2002060468A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain an epoxy resin composition which, though it does not contain a halogenous flame retardant, can give an IC package substrate board having high heat resistance, low thermal expansion, and excellent flame retardance. SOLUTION: The resin composition contains (A) an epoxy resin having at least three epoxy groups, (B) a phenol resin-based curing agent having at least three phenolic hydroxyl groups, (C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10- oxide, (D) a triarylphosphine oxide, and (E) spherical fused silica having max. particle size of 24 μm or lower, an average particle size of 2 μm or higher but not higher than 5 μm, and a specific surface area of 5 m2/g or lower as essential ingredients.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ハロゲン系難燃剤
を使用せずとも優れた難燃性を有し、かつ優れた耐熱
性、寸法安定性を発現するエポキシ樹脂組成物、プリプ
レグ及びそれを用いた銅張積層板に関するものである。
TECHNICAL FIELD The present invention relates to an epoxy resin composition, prepreg, which has excellent flame retardancy without using a halogen-based flame retardant, and exhibits excellent heat resistance and dimensional stability. It relates to the used copper-clad laminate.

【0002】[0002]

【従来の技術】半導体の分野では高密度実装技術の進歩
から従来の面実装からエリア実装に移行していくトレン
ドが進行し、BGAやCSPなど新しいパッケージが登
場、増加しつつある。そのため以前にもましてインター
ポーザ用リジッド基板が注目されるようになり、高耐
熱、低熱膨張基板の要求が高まってきた。一方、これら
半導体に用いられる樹脂部材は難燃性が求められること
が多い。従来この難燃性を付与するため、エポキシ樹脂
においては臭素化エポキシなどのハロゲン系難燃剤を用
いることが一般的であった。しかし、ハロゲン含有化合
物からダイオキシンが発生するおそれがあることから、
昨今の環境問題の深刻化とともに、ハロゲン系難燃剤を
使用することが回避されるようになり、広く産業界にハ
ロゲンフリーの難燃化システムが求められるようになっ
た。このような時代の要求によってリン系難燃剤が脚光
を浴び、リン酸エステルや赤リンが検討されたが、これ
らの従来のリン系難燃剤は加水分解しやすく樹脂との反
応に乏しいため、耐半田性が低下したり、ガラス転移温
度が低下するという問題があった。
2. Description of the Related Art In the field of semiconductors, the trend of shifting from conventional surface mounting to area mounting has progressed due to the progress of high-density mounting technology, and new packages such as BGA and CSP have appeared and are increasing. For this reason, rigid substrates for interposers have attracted more attention than ever before, and demands for substrates having high heat resistance and low thermal expansion have increased. On the other hand, resin members used for these semiconductors are often required to have flame retardancy. Conventionally, in order to impart this flame retardancy, it has been common to use a halogen-based flame retardant such as a brominated epoxy in an epoxy resin. However, since dioxin may be generated from the halogen-containing compound,
With the recent increase in environmental problems, the use of halogen-based flame retardants has been avoided, and a wide range of industries has been demanded for halogen-free flame retardant systems. Phosphorus-based flame retardants have been spotlighted in response to the demands of such times, and phosphate esters and red phosphorus have been studied.However, these conventional phosphorus-based flame retardants are easily hydrolyzed and have a poor reaction with the resin. There are problems that the solderability is lowered and the glass transition temperature is lowered.

【0003】[0003]

【発明が解決しようとする課題】本発明はこのような問
題を解決するべくなされたもので、ハロゲンフリーで優
れた難燃性を有し、かつ高耐熱、低熱膨張の特性を発現
しうるエポキシ樹脂組成物、プリプレグ、及び銅張積層
板を提供するものである。
DISCLOSURE OF THE INVENTION The present invention has been made to solve such a problem, and is an epoxy which is halogen-free, has excellent flame retardancy, and can exhibit high heat resistance and low thermal expansion characteristics. A resin composition, a prepreg, and a copper-clad laminate are provided.

【0004】[0004]

【課題を解決するための手段】本発明は、耐熱性に寄与
する多官能エポキシ樹脂、フェノール樹脂系硬化剤、難
燃性や優れた耐加水分解性を有する特定構造のリン化合
物、及び低熱膨張性や低吸水性を発現する特定の球状シ
リカを必須成分として含有する銅張積層板用として好適
なエポキシ樹脂組成物を技術骨子とするものであり、か
かる組成により上記目的を達成するに至った。
SUMMARY OF THE INVENTION The present invention provides a polyfunctional epoxy resin which contributes to heat resistance, a phenolic resin-based curing agent, a phosphorus compound having a specific structure having flame retardancy and excellent hydrolysis resistance, and low thermal expansion. The technical gist is an epoxy resin composition suitable for a copper-clad laminate containing a specific spherical silica exhibiting water resistance and low water absorption as an essential component, and the above-described object has been achieved by such a composition. .

【0005】具体的には、1分子中に3個以上のエポキ
シ基を有するエポキシ樹脂、1分子中に3個以上のフェ
ノール性水酸基を有するフェノール樹脂系硬化剤、9,
10−ジヒドロ−9−オキサ−10−ホスファフェナン
トレン−10−オキシド、トリアリールホスフィンオキ
サイド、及び最大粒径24μ以下、かつ平均粒径が2μ
以上5μ以下、かつ比表面積が5m2/g以下の球状溶
融シリカを必須成分とすることを特徴とするエポキシ樹
脂組成物、さらにはこれらの成分に加え、カップリング
剤を必須成分とすることを特徴とするエポキシ樹脂組成
物、およびこれらのエポキシ樹脂組成物を基材に含浸、
乾燥して得られるプリプレグ、それを用いて加熱成形し
てなる銅張積層板である。
Specifically, an epoxy resin having three or more epoxy groups in one molecule, a phenol resin-based curing agent having three or more phenolic hydroxyl groups in one molecule,
10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, triarylphosphine oxide, and a maximum particle size of 24 μ or less and an average particle size of 2 μ
An epoxy resin composition characterized in that spherical fused silica having a specific surface area of 5 m 2 / g or less and a specific surface area of 5 m 2 / g or less is used as an essential component, and further, in addition to these components, a coupling agent is used as an essential component. Characterized epoxy resin compositions, and impregnating the substrate with these epoxy resin compositions,
It is a prepreg obtained by drying and a copper-clad laminate formed by heating and using the prepreg.

【0006】[0006]

【発明の実施の形態】本発明に用いる、(A)1分子中
に3個以上のエポキシ基を有するエポキシ樹脂として
は、オルソクレゾールノボラックエポキシ樹脂、フェノ
ールノボラックエポキシ樹脂、ビスフェノールAノボラ
ックエポキシ樹脂などのノボラック型エポキシ樹脂、ト
リスヒドロキシフェニルメタン型エポキシ樹脂および対
応する芳香環がアルキル化されたエポキシ樹脂などの誘
導体、1,1,2,2−テトラキスヒドロキシフェニル
エタンのグリシジルエーテル化物、およびその2量体、
3量体などのテトラキスヒドロキシフェニルエタン型エ
ポキシ樹脂、などが例示されるが、エポキシ樹脂は、後
述するリン化合物である、9,10−ジヒドロ−9−オ
キサ−10−ホスファフェナントレン−10−オキシド
やトリアリールホスフィンオキサイドがエポキシ基と反
応して樹脂中のエポキシ基が減少するため、ガラス転移
温度を高い状態に保つためには、3官能以上のエポキシ
樹脂であることが必須である。特に3官能以上のエポキ
シ樹脂の中でも、ノボラック型エポキシ樹脂(A1)及
び、トリスヒドロキシフェニルメタン型エポキシ樹脂と
テトラキスヒドロキシフェニルエタン型エポキシ樹脂か
らなる群から少なくとも1種選ばれるエポキシ樹脂(A
2)を組み合わせた場合、トリスヒドロキシフェニルメ
タン型エポキシ樹脂とテトラキスヒドロキシフェニルエ
タン型エポキシ樹脂からなる群から少なくとも1種選ば
れるエポキシ樹脂(A2)で架橋密度を高くしてガラス
転移温度を高くでき、一方ノボラック型エポキシ樹脂
(A1)によって、前述(A2)のエポキシ樹脂の欠点
である吸水性の大きさや架橋密度が過度に高くなること
による脆さ、密着性の低下などを防ぐすることができ
る。特にノボラック型エポキシ樹脂(A1)の中でもオ
ルソクレゾールノボラックエポキシ樹脂が吸水性を低減
できるので好ましい。本発明において、エポキシ樹脂組
成物中に占める(A)成分の割合は10〜50重量%が
好ましい。10重量%未満では、結合剤成分が少なくな
り、耐熱性が低下したり樹脂成分が少なくなり成形性が
悪化する場合がある。50重量%を越えると、充填材の
割合が低下し、熱膨張、吸水率が増加し好ましくない。
なお、エポキシ樹脂として、(A)成分以外のエポキシ
樹脂、例えばビスフェノールA型のエポキシ樹脂をエポ
キシ樹脂全体の30重量%以下配合してもよい。
BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin (A) having three or more epoxy groups in one molecule used in the present invention includes orthocresol novolak epoxy resin, phenol novolak epoxy resin, bisphenol A novolak epoxy resin and the like. Derivatives such as novolak type epoxy resin, trishydroxyphenylmethane type epoxy resin and corresponding epoxy resin having an alkylated aromatic ring, glycidyl etherified product of 1,1,2,2-tetrakishydroxyphenylethane, and dimer thereof ,
Examples thereof include a tetrakishydroxyphenylethane type epoxy resin such as a trimer, and the epoxy resin is a phosphorus compound described below, which is 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide. Since the epoxy group in the resin decreases due to the reaction of the triarylphosphine oxide with the epoxy group, an epoxy resin having three or more functions is essential to keep the glass transition temperature high. In particular, among trifunctional or higher functional epoxy resins, novolak type epoxy resin (A1) and at least one epoxy resin selected from the group consisting of trishydroxyphenylmethane type epoxy resin and tetrakishydroxyphenylethane type epoxy resin (A
When 2) is combined, at least one epoxy resin (A2) selected from the group consisting of a trishydroxyphenylmethane type epoxy resin and a tetrakishydroxyphenylethane type epoxy resin can increase the crosslink density and increase the glass transition temperature, On the other hand, the novolak-type epoxy resin (A1) can prevent the disadvantages of the epoxy resin (A2) described above, such as brittleness due to excessively high water absorption and cross-linking density, and decrease in adhesion. In particular, among the novolak-type epoxy resins (A1), ortho-cresol novolak epoxy resin is preferable because the water absorption can be reduced. In the present invention, the proportion of the component (A) in the epoxy resin composition is preferably from 10 to 50% by weight. If the content is less than 10% by weight, the binder component may be reduced, and the heat resistance may be reduced, or the resin component may be reduced, so that the moldability may be deteriorated. If it exceeds 50% by weight, the proportion of the filler decreases, and the thermal expansion and the water absorption increase, which is not preferable.
In addition, as the epoxy resin, an epoxy resin other than the component (A), for example, a bisphenol A type epoxy resin may be blended in an amount of 30% by weight or less of the entire epoxy resin.

【0007】次に成分(B)1分子中に3個以上のフェ
ノール性水酸基を有するフェノール樹脂系硬化剤として
は、フェノールノボラック、ビスフェノールAノボラッ
ク、フェノールアラルキル樹脂等が例示されるが、フェ
ノール性水酸基当量が比較的小さく、低官能のモノマー
を容易に除去できるフェノールノボラックが好ましい。
本発明では(B)成分は、エポキシ樹脂のエポキシ基の
モル数と、(B)成分のフェノール性水酸基およびその
他の活性水素の合計の比(当量比)が0.8以上1.2
以下となるよう添加することが好ましい。この範囲外で
はガラス転移温度の低下や電気特性の低下が生じること
がある。
The phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule of component (B) is exemplified by phenol novolak, bisphenol A novolak, phenol aralkyl resin and the like. Phenol novolak having a relatively small equivalent weight and capable of easily removing low-functional monomers is preferable.
In the present invention, the component (B) has a molar ratio of the epoxy group of the epoxy resin to the total (equivalent ratio) of the phenolic hydroxyl group and other active hydrogen of the component (B) of 0.8 to 1.2.
It is preferable to add so as to be as follows. Outside this range, the glass transition temperature and the electrical properties may be reduced.

【0008】本発明の難燃成分の1つである、成分
(C)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシドは、リンに結合して
いる水素がエポキシ基と反応する反応性リン化合物であ
り、従来のリン酸エステルや赤リンのように加水分解し
て吸水性を高めたり、密着性を低下させたりすることが
なく極めて優れたリン系難燃剤である。しかしこの化合
物は一方で樹脂の硬化性を遅らせる作用があるため、プ
レス成形時間を短縮した場合に硬化性に問題が出ること
がある。難燃成分のもう一方の成分である(D)トリア
リールホスフィンオキサイドは、マトリックス樹脂と反
応しないかまたは反応性が小さいと考えられるが、耐加
水分解性に優れており、加えてHCAのように硬化性に
影響を与えない。したがって成分(C)と(D)を併用
すると難燃性と硬化性を維持しながら吸水性や密着性も
悪化させず良好な半田耐熱性を実現できる。この(C)
と(D)の添加重量比率は1:4〜4:1が好ましい。
この範囲をはずれると併用効果が薄れる場合がある。本
発明の(C)と(D)の合計添加量は、エポキシ樹脂組
成物全体に対して、0.5〜10重量%が好ましい。
0.5重量%未満では難燃効果が低下するおそれがあ
り、10重量%を越えるとガラス転移温度が低下する場
合がある。トリアリールホスフィンオキサイドの例とし
てはトリフェニルホスフィンオキサイド、トリスヒドロ
キシフェニルホスフィンオキサイド、ビス(ヒドロキシ
フェニル)フェニルホスフィンオキサイド、トリスアミ
ノフェニルホスフィンオキサイド、ビス(アミノフェニ
ル)フェニルホスフィンオキサイドが例示できるが、ト
リアリールホスフィンオキサイドのアリール基が無置換
であっても、何らかの置換基を有していてもよい。
Component (C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, which is one of the flame retardant components of the present invention, is characterized in that the hydrogen bonded to phosphorus is an epoxy group. It is a reactive phosphorus compound that reacts with, and is a very excellent phosphorus-based flame retardant without hydrolyzing to increase water absorption or reducing adhesion like conventional phosphate esters and red phosphorus . However, on the other hand, since this compound has an effect of delaying the curability of the resin, there is a case where a problem occurs in the curability when the press molding time is shortened. (D) Triarylphosphine oxide, which is the other component of the flame retardant component, is considered not to react with the matrix resin or to have low reactivity. However, it is excellent in hydrolysis resistance, and in addition, like HCA, Does not affect curability. Therefore, when the components (C) and (D) are used in combination, good solder heat resistance can be realized without deteriorating water absorption and adhesion while maintaining flame retardancy and curability. This (C)
The weight ratio of (D) to (D) is preferably from 1: 4 to 4: 1.
Outside of this range, the combined effect may be diminished. The total added amount of (C) and (D) of the present invention is preferably 0.5 to 10% by weight based on the entire epoxy resin composition.
If it is less than 0.5% by weight, the flame-retardant effect may be reduced. If it exceeds 10% by weight, the glass transition temperature may be lowered. Examples of the triarylphosphine oxide include triphenylphosphine oxide, trishydroxyphenylphosphine oxide, bis (hydroxyphenyl) phenylphosphine oxide, trisaminophenylphosphine oxide, and bis (aminophenyl) phenylphosphine oxide. The aryl group of the oxide may be unsubstituted or may have any substituent.

【0009】本発明の成分(E)は、最大粒径24μm
以下で、平均粒径2μm以上5μm以下、かつ比表面積
が5m2/g以下の球状溶融シリカである。多量に充填
材を添加し低熱膨張性と樹脂の流動性を両立させるには
球状溶融シリカが他の充填材に勝っており最適である。
球状溶融シリカの中でもレーザー回折式粒度分布測定
で、最大粒径24μm以下で、平均粒径2μm以上5μ
m以下、かつBET法による比表面積が5m2/g以下
の球状溶融シリカが好ましい。最大粒径が24μmを超
える粗粒が含まれると銅箔と基材の間で粗粒に起因する
空間ができ、吸湿した場合に水が滞留して半田耐熱が悪
化したり、銅張積層板の外観が悪化したりする。また平
均粒径が2μmより小さい場合や比表面積が5m2/g
を超える場合、粒子の2次凝集により前述粗粒が含まれ
る場合と同様の問題が生じる場合がある。この球状溶融
シリカはエポキシ樹脂組成物中50重量%以上を占める
と熱膨張、吸水率が小さくなるので好ましい。ただし、
90重量%を越えるとエポキシ樹脂組成物中の無機充填
材の割合が大きすぎて含浸等の操作が困難となる。また
必要に応じて特性を妨げない範囲で他の充填材を使用し
てもよい。この場合、最大粒径24μm以下で、平均粒
径2μm以上5μm以下、かつ比表面積が5m2/g以
下の球状溶融シリカ以外の球状シリカをはじめとして従
来公知の充填材を、半田耐熱性等の特性を悪化させない
程度において、任意に使用可能である。
The component (E) of the present invention has a maximum particle size of 24 μm.
Spherical fused silica having an average particle size of 2 μm or more and 5 μm or less and a specific surface area of 5 m 2 / g or less. In order to achieve both low thermal expansion and resin fluidity by adding a large amount of filler, spherical fused silica is optimal because it is superior to other fillers.
Among the spherical fused silicas, the maximum particle size is 24 μm or less, and the average particle size is 2 μm or more and 5 μm by laser diffraction particle size distribution measurement.
m and a fused silica having a specific surface area of 5 m 2 / g or less according to the BET method are preferred. When coarse particles having a maximum particle size of more than 24 μm are contained, a space caused by the coarse particles is formed between the copper foil and the base material, and when moisture is absorbed, water stays and the solder heat resistance deteriorates. Or the appearance of the glass deteriorates. When the average particle size is smaller than 2 μm or when the specific surface area is 5 m 2 / g
In the case where the average particle diameter is larger than the above, the same problem as the case where the coarse particles are contained may occur due to the secondary aggregation of the particles. When the spherical fused silica accounts for 50% by weight or more of the epoxy resin composition, thermal expansion and water absorption are reduced, which is preferable. However,
If the content exceeds 90% by weight, the proportion of the inorganic filler in the epoxy resin composition is too large, and operations such as impregnation become difficult. If necessary, other fillers may be used as long as the properties are not hindered. In this case, a conventionally known filler such as a spherical silica other than a spherical fused silica having a maximum particle size of 24 μm or less, an average particle size of 2 μm or more and 5 μm or less, and a specific surface area of 5 m 2 / g or less is used for solder heat resistance and the like. It can be used arbitrarily as long as the characteristics are not deteriorated.

【0010】本発明の樹脂組成物にさらにカップリング
剤を用いると、樹脂と充填材の界面のぬれ性が向上し好
ましい。特にシロキサン結合の繰り返し単位を2個以上
有し、かつアルコキシ基を有するシリコーンオイル型カ
ップリング剤はプリプレグ製造時の高温にさらされても
揮発することなく、充填材表面にコーティングされるの
で好ましく用いられる。この場合、汎用シランカップリ
ング剤との併用が充填材とのぬれ性と充填材表面へのカ
ップリング剤の定着性のバランスがとれ効果的である。
本発明では(F)成分は、エポキシ樹脂組成物全体に対
して、0.1〜5重量%が好ましい。0.1重量%未満
では充填材の表面全体にカップリング剤を分散させるこ
とができない可能性がある。また5重量%を越えるとガ
ラス転移温度が低下する場合がある。
It is preferable to further use a coupling agent in the resin composition of the present invention since the wettability at the interface between the resin and the filler is improved. In particular, silicone oil type coupling agents having two or more repeating units of siloxane bonds and having an alkoxy group are preferably used because they are coated on the filler surface without volatilization even when exposed to high temperatures during prepreg production. Can be In this case, the combined use with the general-purpose silane coupling agent is effective in balancing the wettability with the filler and the fixability of the coupling agent on the surface of the filler.
In the present invention, the content of the component (F) is preferably 0.1 to 5% by weight based on the entire epoxy resin composition. If the amount is less than 0.1% by weight, the coupling agent may not be dispersed on the entire surface of the filler. If it exceeds 5% by weight, the glass transition temperature may decrease.

【0011】本発明のエポキシ樹脂組成物は必要に応じ
て、上記成分以外の添加剤を特性を損なわない範囲で添
加することができる。本発明のエポキシ樹脂組成物は溶
剤を用いてワニスとして、または無溶剤にて基材に塗布
しプリプレグを得ることができる。基材としてはガラス
織布、ガラス不織布、その他有機基材などを用いること
ができる。本発明のエポキシ樹脂組成物は繊維基材に含
浸、乾燥することによりプリプレグが得られ、このプリ
プレグの1枚又は複数枚を銅箔とともに加熱成形して銅
張積層板が得られる。これらのプリプレグ及び銅張積層
板も本発明に含まれるものである。
The epoxy resin composition of the present invention may optionally contain additives other than the above components as long as the properties are not impaired. The epoxy resin composition of the present invention can be applied to a substrate as a varnish using a solvent or without a solvent to obtain a prepreg. As the substrate, a glass woven fabric, a glass nonwoven fabric, or another organic substrate can be used. The epoxy resin composition of the present invention is impregnated into a fiber base material and dried to obtain a prepreg, and one or more of the prepregs is heat-formed together with a copper foil to obtain a copper-clad laminate. These prepregs and copper-clad laminates are also included in the present invention.

【0012】[0012]

【実施例】実施例1 オルソクレゾールノボラックエポキシ樹脂(大日本イン
キ化学製エピクロンN−665)25重量部(以下、部
と略す)、フェノールノボラック(軟化点105℃)
9.5部、9,10−ジヒドロ−9−オキサ−10−ホ
スファフェナントレン−10−オキシド(三光化学製)
2部、トリフェニルホスフィンオキサイド3部、および
エポキシ樹脂と硬化剤量の合計100部に対し2−フェ
ニル−4−メチルイミダゾールを0.05部をメチルエ
チルケトンとメチルセロソルブの混合溶剤に溶解した
後、この溶液にエポキシシランカップリング剤(日本ユ
ニカー製A−187)0.4部、シリコーンオイル型カ
ップリング剤A(日本ユニカー製MAC2101)0.
1部を加え撹拌し、続いて球状溶融シリカA(24μ以
上をカットした平均粒径4μの球状溶融シリカ、比表面
積2m2/g )60部をいかり型撹拌羽根で撹拌しなが
ら少しずつ添加した。全成分を混合したところで高速攪
拌機を用いて10分撹拌した。作製したワニスを用いて
ガラスクロス(厚さ180μm、日東紡績製)に含浸
し、150℃の加熱炉で6分乾燥してワニス固形分(プ
リプレグ中、ガラスクロスを除く成分)が約50重量%
のプリプレグを得た。このプリプレグを所定枚数重ね、
両面に12μmの銅箔を重ねて、圧力40kgf/cm
2 、温度190℃で60分加熱加圧成形を行い両面銅張
積層板を得た。
EXAMPLES Example 1 Orthocresol novolak epoxy resin (Epiclon N-665, manufactured by Dainippon Ink and Chemicals), 25 parts by weight (hereinafter abbreviated as "part"), phenol novolak (softening point: 105 ° C)
9.5 parts, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (manufactured by Sanko Chemical)
After dissolving 0.05 parts of 2-phenyl-4-methylimidazole in a mixed solvent of methyl ethyl ketone and methyl cellosolve for 2 parts, triphenylphosphine oxide 3 parts, and a total of 100 parts of epoxy resin and curing agent, 0.4 parts of an epoxysilane coupling agent (A-187 manufactured by Nippon Unicar) and a silicone oil-type coupling agent A (MAC2101 manufactured by Nippon Unicar) were added to the solution.
1 part was added and stirred, and then 60 parts of spherical fused silica A (spherical fused silica having an average particle size of 4 µ cut from 24 µ or more, specific surface area 2 m 2 / g) was added little by little while stirring with an irrigating stirring blade. . When all the components were mixed, the mixture was stirred for 10 minutes using a high-speed stirrer. A glass cloth (thickness: 180 μm, manufactured by Nitto Boseki) is impregnated with the prepared varnish, dried in a heating furnace at 150 ° C. for 6 minutes, and a varnish solid content (a component in the prepreg except glass cloth) is about 50% by weight.
Prepreg was obtained. This prepreg is stacked a predetermined number of times,
Laminate 12μm copper foil on both sides, pressure 40kgf / cm
2. Heat and pressure molding was performed at 190 ° C. for 60 minutes to obtain a double-sided copper-clad laminate.

【0013】得られた両面銅張積層板の評価方法を〜
に、BGAの評価方法を、に示す。 ガラス転移温度 厚さ0.6mmの両面銅張積層板を全面エッチングし、
得られた積層板から10mm×60mmのテストピース
を切り出し、動的粘弾性測定装置を用いて3℃/分で昇
温し、tanδのピーク位置をガラス転移温度とした。 線膨張係数 厚さ1.2mmの両面銅張積層板を全面エッチングし、
得られた積層板から2mm×2mmのテストピースを切
り出し、TMAを用いてZ方向の線膨張係数を5℃/分
で測定した。 難燃性 厚さ0.6mmの両面銅張積層板を全面エッチングし、
得られた積層板からUL−94規格、垂直法により測定
した。 半田耐熱 厚さ0.4mmの両面銅張積層板を作製し、JISC6
481に準じた方法でテストピースを4枚作製し、プレ
ッシャークッカー4時間吸湿処理を行った後、260℃
の半田槽に120秒浸せきさせて外観異常が出た数を調
べた。
The evaluation method of the obtained double-sided copper-clad laminate is as follows.
The BGA evaluation method is shown in FIG. Glass transition temperature Double-sided copper-clad laminate with a thickness of 0.6 mm is entirely etched,
A test piece of 10 mm × 60 mm was cut out from the obtained laminate, and the temperature was raised at 3 ° C./min using a dynamic viscoelasticity measuring apparatus, and the peak position of tan δ was taken as the glass transition temperature. Coefficient of linear expansion The whole surface of the double-sided copper-clad laminate with a thickness of 1.2 mm is etched,
A test piece of 2 mm × 2 mm was cut out from the obtained laminate, and the linear expansion coefficient in the Z direction was measured at 5 ° C./min using TMA. Flame retardant Double-sided copper-clad laminate with a thickness of 0.6mm is etched over the entire surface,
It measured from the obtained laminated board by UL-94 standard and a vertical method. Solder heat resistance A double-sided copper-clad laminate with a thickness of 0.4 mm was manufactured and JISC6
After preparing four test pieces by a method according to 481 and performing a moisture absorption treatment for 4 hours with a pressure cooker,
Was immersed in the solder bath for 120 seconds, and the number of appearance abnormalities was examined.

【0014】パッケージ反り量 実施例で作製した厚さ0.4mmの両面銅張積層板をB
GA用に回路加工した。この回路基板(リジッドインタ
ーポーザ)と封止材料に住友ベークライト製EME−7
720を用いて、金型温度180℃、注入圧力75kg
/cm2 、硬化時間2分で225pBGA(パッケージ
サイズは24×24mm、厚さ1.17mm、シリコン
チップはサイズ9×9mm、厚さ0.35mm、チップ
と回路基板のボンディングパッドとを25μm径の金線
でボンディングしている。)を成形し、175℃、8時
間で後硬化した。室温に冷却後、パッケージのゲート部
から対角線方向に、パッケージ上面の高さの変位を表面
粗さ計により測定し、ゲート部を基準とした最大の変位
値を反り量とした。単位はμm。 BGA耐半田クラック性 と同様の方法で得たパッケージ8個を、85℃、相対
湿度60%の環境下で240時間放置した後、JEDE
Cの方法に準じてIRリフロー処理を行った。処理後の
内部の剥離、及びクラックの有無を超音波探傷機で観察
し、不良パッケージの個数を数えた。不良パッケージの
個数がn個であるとき、n/8と表示する。
Package warpage A double-sided copper-clad laminate having a thickness of 0.4 mm produced in the embodiment
Circuit processed for GA. This circuit board (rigid interposer) and the sealing material are EME-7 manufactured by Sumitomo Bakelite.
Using 720, mold temperature 180 ° C, injection pressure 75kg
/ Cm 2 , 225 pBGA with a curing time of 2 minutes (package size: 24 × 24 mm, thickness: 1.17 mm, silicon chip size: 9 × 9 mm, thickness: 0.35 mm, chip and bonding pad of circuit board having diameter of 25 μm) (Bonded with a gold wire.) And post-cured at 175 ° C. for 8 hours. After cooling to room temperature, the displacement of the height of the package upper surface was measured diagonally from the gate portion of the package by a surface roughness meter, and the maximum displacement value based on the gate portion was defined as the amount of warpage. The unit is μm. Eight packages obtained by the same method as in the BGA solder crack resistance were left in an environment of 85 ° C. and a relative humidity of 60% for 240 hours.
IR reflow treatment was performed according to the method of C. After the treatment, the presence of peeling and cracks in the inside was observed with an ultrasonic flaw detector, and the number of defective packages was counted. When the number of defective packages is n, it is displayed as n / 8.

【0015】実施例2〜14及び比較例1〜4 表1及び表2に示す配合にて、実施例1と同様の方法で
両面銅張積層板を得た。評価方法も前述の通りである。
評価結果を表1及び表2の下欄に示す。本発明のエポキ
シ樹脂組成物を用いて得られた銅張積層板は、ハロゲン
化合物を使用していないにもかかわらず優れた難燃性を
有し、積層板単体及びICパッケージでの評価において
優れた半田耐熱性を示し、加えて成形後の反りも極めて
小さい。
Examples 2 to 14 and Comparative Examples 1 to 4 Double-sided copper-clad laminates were obtained in the same manner as in Example 1 with the compositions shown in Tables 1 and 2. The evaluation method is also as described above.
The evaluation results are shown in the lower columns of Tables 1 and 2. The copper-clad laminate obtained using the epoxy resin composition of the present invention has excellent flame retardancy despite not using a halogen compound, and is excellent in evaluation of a laminate alone and an IC package. In addition, it shows excellent soldering heat resistance and, in addition, the warpage after molding is extremely small.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】表の注 1)球状溶融シリカA:24μ以上をカットした平均粒
径4μの球状溶融シリカ、比表面積2m2/g 2)球状溶融シリカB:24μ以上をカットした平均粒
径3μの球状溶融シリカ、比表面積4m2/g 3)球状溶融シリカC:24μ以上をカットした平均粒
径2.5μの球状溶融シリカ、比表面積4.5m2/g 4)球状溶融シリカD:24μ以上をカットしていない
平均粒径22μの球状溶融シリカ、比表面積2.7m2
/g 5)球状溶融シリカE:平均粒径0.6μの球状溶融シ
リカ、比表面積6m2/g 6)破砕状溶融シリカF:平均粒径18μの破砕状溶融
シリカ、比表面積2.2m2/g 7)平均粒径5μのタルク 8)平均粒径12μの水酸化アルミニウム 9)エポキシシランカップリング剤:日本ユニカー製A
187 10)シリコーンオイル型カップリング剤A:日本ユニ
カー製MAC2101 11)シリコーンオイル型カップリング剤B:日本ユニ
カー製MAC2301 12)オルソクレゾールノボラックエポキシ樹脂:大日
本インキ化学製エピクロンN−665 13)フェノールノボラックエポキシ樹脂:大日本イン
キ化学製エピクロンN−775 14)テトラキスヒドロキシフェニルエタン型エポキシ
樹脂:油化シェルエポキシ製エピコートE1031S 15)トリスヒドロキシフェニルメタン型エポキシ樹
脂:油化シェルエポキシ製エピコートE1032 16)ビスフェノールAノボラックエポキシ樹脂:軟化
点70℃、エポキシ当量201 17)ビスフェノールA型エポキシ樹脂:エポキシ当量
250 18)フェノールノボラック:軟化点105℃、水酸基
当量104 19)ビスフェノールAノボラック:軟化点115℃、
水酸基当量129 20)フェノールアラルキル樹脂:三井化学製XL−2
25 21)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド(三光化学製) 22)2−フェニル−4−メチルイミダゾール:配合量
はエポキシ樹脂と硬化剤の合計量100部に対する量 23)平均粒径3μの破砕状溶融シリカG、比表面積1
5m2/g
Notes to Table 1) Spherical fused silica A: Spherical fused silica having an average particle size of 4 μ cut from 24 μ or more, specific surface area 2 m 2 / g 2) Spherical fused silica B: Spherical fused silica having an average particle size cut from 24 μ or more Spherical fused silica, specific surface area 4 m 2 / g 3) Spherical fused silica C: Spherical fused silica having an average particle size of 2.5 μ cut from 24 μ or more, specific surface area 4.5 m 2 / g 4) Spherical fused silica D: 24 μ or more Is not cut, spherical fused silica having an average particle size of 22 μm, specific surface area of 2.7 m 2
/ G 5) Spherical fused silica E: Spherical fused silica having an average particle size of 0.6 μm, specific surface area 6 m 2 / g 6) Crushed fused silica F: Crushed fused silica having an average particle size of 18 μm, specific surface area 2.2 m 2 / G 7) Talc having an average particle size of 5μ 8) Aluminum hydroxide having an average particle size of 12μ 9) Epoxysilane coupling agent: A manufactured by Nippon Unicar
187 10) Silicone oil type coupling agent A: MAC2101 manufactured by Nippon Unicar 11) Silicone oil type coupling agent B: MAC2301 manufactured by Nippon Unicar 12) Orthocresol novolak Epoxy resin: Epicron N-665 manufactured by Dainippon Ink and Chemicals 13) Phenol novolak Epoxy resin: Epicron N-775 manufactured by Dainippon Ink and Chemicals, Inc. 14) Tetrakishydroxyphenylethane type epoxy resin: Epicoat E1031S manufactured by Yuka Shell Epoxy 15) Trishydroxyphenylmethane type epoxy resin: Epicoat E1032 manufactured by Yuka Shell Epoxy 16) Bisphenol A Novolak epoxy resin: softening point 70 ° C, epoxy equivalent 201 17) bisphenol A type epoxy resin: epoxy equivalent 250 18) phenol novolak: Of point 105 ° C., a hydroxyl equivalent of 104 19) bisphenol A novolac: softening point 115 ° C.,
Hydroxyl equivalent 129 20) phenol aralkyl resin: XL-2 manufactured by Mitsui Chemicals, Inc.
25 21) 9,10-Dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (manufactured by Sanko Chemical) 22) 2-Phenyl-4-methylimidazole: The compounding amount is 100 of the total amount of the epoxy resin and the curing agent. 23) Fragmented fused silica G having an average particle size of 3 μm, specific surface area 1
5m 2 / g

【0019】[0019]

【発明の効果】本発明のエポキシ樹脂組成物は、ハロゲ
ン系難燃剤を使用せずとも優れた難燃性を有し、高耐
熱、低熱膨張の特性を有している。従って、本発明のエ
ポキシ樹脂組成物から得られた銅張積層板は半田耐熱性
に優れ、反りの小さいICパッケージ用基板を提供で
き、関連産業に大きく寄与することができる。
The epoxy resin composition of the present invention has excellent flame retardancy without using a halogen-based flame retardant, and has high heat resistance and low thermal expansion characteristics. Therefore, the copper-clad laminate obtained from the epoxy resin composition of the present invention has excellent solder heat resistance and can provide a substrate for an IC package with a small warpage, which can greatly contribute to related industries.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08K 7/18 C08K 7/18 C08L 63/00 C08L 63/00 C 83/06 83/06 H05K 1/03 610 H05K 1/03 610K 610L 610S // B29K 63:00 B29K 63:00 105:08 105:08 B29L 31:34 B29L 31:34 Fターム(参考) 4F072 AA04 AA07 AB09 AB28 AD27 AE01 AE07 AE23 AF06 AF16 AF21 AG03 AG19 AH02 AH21 AJ04 AK05 AK14 AL13 4F204 AA39 AB03 AB17 AB22 AB24 AB25 AD03 AD08 AG03 AH36 FA01 FB01 FB13 FB24 FH06 FN17 4J002 CC03Y CD00W CD00X CD06W CD07X CP054 DJ018 EW136 EW147 FA088 FD136 FD137 FD138 FD14Y FD204 GQ01 4J036 AA02 AA05 AC02 AC03 AF06 AF08 AF19 AF27 FA05 FA12 FB08 FB16 JA08 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification code FI Theme coat ゛ (Reference) C08K 7/18 C08K 7/18 C08L 63/00 C08L 63/00 C 83/06 83/06 H05K 1/03 610 H05K 1/03 610K 610L 610S // B29K 63:00 B29K 63:00 105: 08 105: 08 B29L 31:34 B29L 31:34 F term (reference) 4F072 AA04 AA07 AB09 AB28 AD27 AE01 AE07 AE23 AF06 AF16 AF21 AG03 AG19 AH02 AH21 AJ04 AK05 AK14 AL13 4F204 AA39 AB03 AB17 AB22 AB24 AB25 AD03 AD08 AG03 AH36 FA01 FB01 FB13 FB24 FH06 FN17 4J002 CC03Y CD00W CD00X CD06W CD07X CP054 DJ018 EW136 EW147 AC03 AF01 FD136 A02 FD136 FA05 FA12 FB08 FB16 JA08

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 (A)1分子中に3個以上のエポキシ基
を有するエポキシ樹脂、(B)1分子中に3個以上のフ
ェノール性水酸基を有するフェノール樹脂系硬化剤、
(C)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド、(D)トリアリー
ルホスフィンオキサイド、及び(E)最大粒径24μm
以下、かつ平均粒径が2μm以上5μm以下、かつ比表
面積が5m2/g以下の球状溶融シリカを必須成分とす
ることを特徴とするエポキシ樹脂組成物。
(A) an epoxy resin having three or more epoxy groups in one molecule; (B) a phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule;
(C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, (D) triarylphosphine oxide, and (E) maximum particle size 24 μm
An epoxy resin composition comprising spherical fused silica having an average particle diameter of 2 μm or more and 5 μm or less and a specific surface area of 5 m 2 / g or less as an essential component.
【請求項2】 成分(A)がトリスヒドロキシフェニル
メタン型エポキシ樹脂、テトラキスヒドロキシフェニル
エタン型エポキシ樹脂、ノボラック型エポキシ樹脂から
なる群から選ばれる少なくとも1種のエポキシ樹脂であ
る請求項1記載のエポキシ樹脂組成物。
2. The epoxy according to claim 1, wherein the component (A) is at least one epoxy resin selected from the group consisting of a trishydroxyphenylmethane type epoxy resin, a tetrakishydroxyphenylethane type epoxy resin, and a novolak type epoxy resin. Resin composition.
【請求項3】 成分(A)において、ノボラック型エポ
キシ樹脂(A1)及び、トリスヒドロキシフェニルメタ
ン型エポキシ樹脂とテトラキスヒドロキシフェニルエタ
ン型エポキシ樹脂からなる群から少なくとも1種選ばれ
るエポキシ樹脂(A2)が必須であることを特徴とする
請求項1記載のエポキシ樹脂組成物。
3. The component (A) comprises a novolak epoxy resin (A1) and at least one epoxy resin (A2) selected from the group consisting of a trishydroxyphenylmethane epoxy resin and a tetrakishydroxyphenylethane epoxy resin. The epoxy resin composition according to claim 1, which is essential.
【請求項4】 成分(B)がフェノールノボラックであ
る請求項1乃至3記載のエポキシ樹脂組成物。
4. The epoxy resin composition according to claim 1, wherein the component (B) is phenol novolak.
【請求項5】(A)1分子中に3個以上のエポキシ基を
有するエポキシ樹脂、(B)1分子中に3個以上のフェ
ノール性水酸基を有するフェノール樹脂系硬化剤、
(C)9,10−ジヒドロ−9−オキサ−10−ホスフ
ァフェナントレン−10−オキシド、(D)トリアリー
ルホスフィンオキサイド、(E)最大粒径24μ以下、
かつ平均粒径が2μ以上5μ以下、かつ比表面積が5m
2/g以下の球状溶融シリカ、及び(F)カップリング
剤を必須成分とすることを特徴とするエポキシ樹脂組成
物。
(A) an epoxy resin having three or more epoxy groups in one molecule, (B) a phenolic resin-based curing agent having three or more phenolic hydroxyl groups in one molecule,
(C) 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, (D) triarylphosphine oxide, (E) maximum particle size of 24 μ or less,
And the average particle size is 2 μm or more and 5 μm or less, and the specific surface area is 5 m
An epoxy resin composition comprising spherical fused silica of 2 / g or less and (F) a coupling agent as essential components.
【請求項6】 成分(F)が、シロキサン結合の繰り返
し単位を2個以上有し、かつアルコキシ基を有するシリ
コーンオイル型カップリング剤である請求項5記載のエ
ポキシ樹脂組成物。
6. The epoxy resin composition according to claim 5, wherein the component (F) is a silicone oil type coupling agent having two or more siloxane bond repeating units and having an alkoxy group.
【請求項7】 請求項1乃至6のいずれかに記載のエポ
キシ樹脂組成物を繊維基材に含浸、乾燥してなることを
特徴とするプリプレグ。
7. A prepreg obtained by impregnating a fiber base material with the epoxy resin composition according to claim 1 and drying it.
【請求項8】 請求項7記載のプリプレグを加熱成形し
てなることを特徴とする銅張積層板。
8. A copper-clad laminate obtained by heating and molding the prepreg according to claim 7.
JP2000246660A 2000-08-16 2000-08-16 Epoxy resin composition, prepreg, and copper-clad laminate using the prepreg Pending JP2002060468A (en)

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JP2002088140A (en) * 2000-09-13 2002-03-27 Sumitomo Bakelite Co Ltd Epoxy resin composition, prepreg and copper-clad laminate using the same
JP2002114837A (en) * 2000-10-05 2002-04-16 Sumitomo Bakelite Co Ltd Epoxy resin composition for interposer, prepreg and copper-clad laminate using the same
JP2006222409A (en) * 2005-01-17 2006-08-24 Hitachi Chem Co Ltd Printed wiring board resin composition, prepreg, metal-clad laminated board, and printed wiring board
JP2011140661A (en) * 2011-03-18 2011-07-21 Hitachi Chem Co Ltd Resin composition, and prepreg and printed wiring board using the same
JP2013100538A (en) * 2013-02-01 2013-05-23 Hitachi Chemical Co Ltd Resin composition, prepreg using the same, metal-clad laminate, and printed wiring board
JP2015143302A (en) * 2014-01-31 2015-08-06 日本ゼオン株式会社 Curable epoxy composition, film, laminate film, prepreg, laminate, cured product and composite
JP2019011475A (en) * 2013-06-12 2019-01-24 味の素株式会社 Resin composition

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JP2013100538A (en) * 2013-02-01 2013-05-23 Hitachi Chemical Co Ltd Resin composition, prepreg using the same, metal-clad laminate, and printed wiring board
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