JP2002043289A5 - - Google Patents

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Publication number
JP2002043289A5
JP2002043289A5 JP2000222507A JP2000222507A JP2002043289A5 JP 2002043289 A5 JP2002043289 A5 JP 2002043289A5 JP 2000222507 A JP2000222507 A JP 2000222507A JP 2000222507 A JP2000222507 A JP 2000222507A JP 2002043289 A5 JP2002043289 A5 JP 2002043289A5
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JP
Japan
Prior art keywords
dielectric plate
vacuum vessel
plasma processing
antenna
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000222507A
Other languages
English (en)
Japanese (ja)
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JP2002043289A (ja
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Publication date
Application filed filed Critical
Priority to JP2000222507A priority Critical patent/JP2002043289A/ja
Priority claimed from JP2000222507A external-priority patent/JP2002043289A/ja
Publication of JP2002043289A publication Critical patent/JP2002043289A/ja
Publication of JP2002043289A5 publication Critical patent/JP2002043289A5/ja
Pending legal-status Critical Current

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JP2000222507A 2000-07-24 2000-07-24 プラズマ処理方法及び装置 Pending JP2002043289A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000222507A JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000222507A JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JP2002043289A JP2002043289A (ja) 2002-02-08
JP2002043289A5 true JP2002043289A5 (enExample) 2005-07-21

Family

ID=18716739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000222507A Pending JP2002043289A (ja) 2000-07-24 2000-07-24 プラズマ処理方法及び装置

Country Status (1)

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JP (1) JP2002043289A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7138767B2 (en) * 2004-09-30 2006-11-21 Tokyo Electron Limited Surface wave plasma processing system and method of using
JP4522980B2 (ja) * 2005-11-15 2010-08-11 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
JP4522984B2 (ja) * 2005-11-02 2010-08-11 パナソニック株式会社 プラズマ処理装置
TWI409873B (zh) * 2005-11-02 2013-09-21 松下電器產業股份有限公司 電漿處理裝置

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