JP2001511311A5 - - Google Patents
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- Publication number
- JP2001511311A5 JP2001511311A5 JP1998532879A JP53287998A JP2001511311A5 JP 2001511311 A5 JP2001511311 A5 JP 2001511311A5 JP 1998532879 A JP1998532879 A JP 1998532879A JP 53287998 A JP53287998 A JP 53287998A JP 2001511311 A5 JP2001511311 A5 JP 2001511311A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/794,802 US6133577A (en) | 1997-02-04 | 1997-02-04 | Method and apparatus for producing extreme ultra-violet light for use in photolithography |
| US08/794,802 | 1997-02-04 | ||
| PCT/US1997/023915 WO1998034234A1 (en) | 1997-02-04 | 1997-12-23 | Method and apparatus for producing extreme ultra-violet light for use in photolithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001511311A JP2001511311A (ja) | 2001-08-07 |
| JP2001511311A5 true JP2001511311A5 (enExample) | 2005-08-11 |
Family
ID=25163724
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53287998A Ceased JP2001511311A (ja) | 1997-02-04 | 1997-12-23 | フォトリソグラフィに使用するための極紫外線を生成するための方法と装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6133577A (enExample) |
| EP (1) | EP1016092B1 (enExample) |
| JP (1) | JP2001511311A (enExample) |
| DE (1) | DE69729588T2 (enExample) |
| WO (1) | WO1998034234A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999051356A1 (en) * | 1998-04-03 | 1999-10-14 | Advanced Energy Systems, Inc. | Fluid nozzle system, energy emission system for photolithography and its method of manufacture |
| WO1999051355A1 (en) * | 1998-04-03 | 1999-10-14 | Advanced Energy Systems, Inc. | Diffuser system and energy emission system for photolithography |
| US6065203A (en) * | 1998-04-03 | 2000-05-23 | Advanced Energy Systems, Inc. | Method of manufacturing very small diameter deep passages |
| WO1999051357A1 (en) * | 1998-04-03 | 1999-10-14 | Advanced Energy Systems, Inc. | Energy emission system for photolithography |
| US6105885A (en) | 1998-04-03 | 2000-08-22 | Advanced Energy Systems, Inc. | Fluid nozzle system and method in an emitted energy system for photolithography |
| US6194733B1 (en) | 1998-04-03 | 2001-02-27 | Advanced Energy Systems, Inc. | Method and apparatus for adjustably supporting a light source for use in photolithography |
| US6190835B1 (en) | 1999-05-06 | 2001-02-20 | Advanced Energy Systems, Inc. | System and method for providing a lithographic light source for a semiconductor manufacturing process |
| KR100647968B1 (ko) | 1999-07-22 | 2006-11-17 | 코닝 인코포레이티드 | 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스 |
| US6304630B1 (en) * | 1999-12-24 | 2001-10-16 | U.S. Philips Corporation | Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit |
| AU2001282361A1 (en) * | 2000-08-31 | 2002-03-13 | Powerlase Limited | Electromagnetic radiation generation using a laser produced plasma |
| US6776006B2 (en) | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
| GB0111204D0 (en) * | 2001-05-08 | 2001-06-27 | Mertek Ltd | High flux,high energy photon source |
| US6744851B2 (en) | 2002-05-31 | 2004-06-01 | Northrop Grumman Corporation | Linear filament array sheet for EUV production |
| US6770895B2 (en) * | 2002-11-21 | 2004-08-03 | Asml Holding N.V. | Method and apparatus for isolating light source gas from main chamber gas in a lithography tool |
| DE10306668B4 (de) * | 2003-02-13 | 2009-12-10 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas |
| US6919573B2 (en) * | 2003-03-20 | 2005-07-19 | Asml Holding N.V | Method and apparatus for recycling gases used in a lithography tool |
| DE10326279A1 (de) * | 2003-06-11 | 2005-01-05 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial |
| US7469710B1 (en) | 2004-06-22 | 2008-12-30 | Ksy Corporation | Supersonic diffuser |
| US7154931B2 (en) * | 2004-06-22 | 2006-12-26 | Ksy Corporation | Laser with Brayton cycle outlet pump |
| US7655925B2 (en) | 2007-08-31 | 2010-02-02 | Cymer, Inc. | Gas management system for a laser-produced-plasma EUV light source |
| JP5559562B2 (ja) | 2009-02-12 | 2014-07-23 | ギガフォトン株式会社 | 極端紫外光光源装置 |
| JP2011054376A (ja) * | 2009-09-01 | 2011-03-17 | Ihi Corp | Ｌｐｐ方式のｅｕｖ光源とその発生方法 |
| JP5578482B2 (ja) * | 2009-09-01 | 2014-08-27 | 株式会社Ｉｈｉ | Ｌｐｐ方式のｅｕｖ光源とその発生方法 |
| JP5578483B2 (ja) * | 2009-09-01 | 2014-08-27 | 株式会社Ｉｈｉ | Ｌｐｐ方式のｅｕｖ光源とその発生方法 |
| KR101415886B1 (ko) | 2009-09-01 | 2014-07-04 | 가부시키가이샤 아이에이치아이 | 플라즈마 광원 |
| WO2013156041A1 (en) * | 2012-04-18 | 2013-10-24 | Carl Zeiss Smt Gmbh | A microlithographic apparatus and a method of changing an optical wavefront in an objective of such an apparatus |
| US20140166051A1 (en) * | 2012-12-17 | 2014-06-19 | Kla-Tencor Corporation | Apparatus, system, and method for separating gases and mitigating debris in a controlled pressure environment |
| US9585236B2 (en) | 2013-05-03 | 2017-02-28 | Media Lario Srl | Sn vapor EUV LLP source system for EUV lithography |
| WO2017030948A1 (en) | 2015-08-19 | 2017-02-23 | The Regents Of The University Of California | Shock injector for low-laser energy electron injection in a laser plasma accelerator |
| WO2025153242A1 (en) * | 2024-01-17 | 2025-07-24 | Asml Netherlands B.V. | Method and device for tuning flow velocity profile |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL292326A (enExample) * | 1962-05-09 | |||
| US3686528A (en) * | 1969-12-05 | 1972-08-22 | Tamarack Scient Co Inc | Jet pinched plasma arc lamp and method of forming plasma arc |
| DE2020055A1 (de) * | 1970-04-24 | 1971-12-02 | Mueller Ernst Kg | Verfahren und Vorrichtung zum UEberziehen von Gegenstaenden mit pulverfoermigen Stoffen |
| US3904985A (en) * | 1971-12-21 | 1975-09-09 | Us Energy | Explosive laser |
| US3876149A (en) * | 1973-04-26 | 1975-04-08 | William J Futerko | Method of forming a torch tip and torch tips |
| US3972474A (en) * | 1974-11-01 | 1976-08-03 | A. B. Dick Company | Miniature ink jet nozzle |
| US4161280A (en) * | 1977-10-13 | 1979-07-17 | State Of Connecticut | Method and apparatus for dispensing a deicer liquid |
| US4178078A (en) * | 1978-09-19 | 1979-12-11 | United Technologies Corporation | Aerodynamic window |
| US4455470A (en) * | 1981-08-14 | 1984-06-19 | The Perkin-Elmer Corporation | Plasma spray gun nozzle and coolant deionizer |
| US4408338A (en) * | 1981-12-31 | 1983-10-04 | International Business Machines Corporation | Pulsed electromagnetic radiation source having a barrier for discharged debris |
| US4584479A (en) * | 1982-10-19 | 1986-04-22 | Varian Associates, Inc. | Envelope apparatus for localized vacuum processing |
| US4607167A (en) * | 1982-10-19 | 1986-08-19 | Varian Associates, Inc. | Charged particle beam lithography machine incorporating localized vacuum envelope |
| US4549082A (en) * | 1983-04-19 | 1985-10-22 | Mcmillan Michael R | Synthetic plasma ion source |
| US4560880A (en) * | 1983-09-19 | 1985-12-24 | Varian Associates, Inc. | Apparatus for positioning a workpiece in a localized vacuum processing system |
| US4577122A (en) * | 1983-12-28 | 1986-03-18 | The Regents Of The University Of California | Method and apparatus for generation of coherent VUV and XUV radiation |
| US4692934A (en) * | 1984-11-08 | 1987-09-08 | Hampshire Instruments | X-ray lithography system |
| US4820927A (en) * | 1985-06-28 | 1989-04-11 | Control Data Corporation | Electron beam source employing a photo-emitter cathode |
| LU86322A1 (fr) * | 1986-02-25 | 1987-09-10 | Arbed | Lance de soufflage d'oxygene |
| US5204506A (en) * | 1987-12-07 | 1993-04-20 | The Regents Of The University Of California | Plasma pinch surface treating apparatus and method of using same |
| US4830280A (en) * | 1988-03-21 | 1989-05-16 | Yankoff Gerald K | Nozzle |
| JPH0637521Y2 (ja) * | 1988-10-05 | 1994-09-28 | 高橋 柾弘 | マイクロ波励起による紫外線発生装置 |
| US5298835A (en) * | 1988-07-21 | 1994-03-29 | Electro-Plasma, Inc. | Modular segmented cathode plasma generator |
| US5012853A (en) * | 1988-09-20 | 1991-05-07 | Sundstrand Corporation | Process for making articles with smooth complex internal geometries |
| US4982067A (en) * | 1988-11-04 | 1991-01-01 | Marantz Daniel Richard | Plasma generating apparatus and method |
| US5012105A (en) * | 1989-02-02 | 1991-04-30 | Nippon Seiko Kabushiki Kaisha | Multiple-imaging charged particle-beam exposure system |
| US5103102A (en) * | 1989-02-24 | 1992-04-07 | Micrion Corporation | Localized vacuum apparatus and method |
| US4954715A (en) * | 1989-06-26 | 1990-09-04 | Zoeld Tibor | Method and apparatus for an optimized multiparameter flow-through particle and cell analyzer |
| US4980563A (en) * | 1990-01-09 | 1990-12-25 | United States Department Of Energy | VUV lithography |
| EP0463815B1 (en) * | 1990-06-22 | 1995-09-27 | Kabushiki Kaisha Toshiba | Vacuum ultraviolet light source |
| JP2619565B2 (ja) * | 1990-11-05 | 1997-06-11 | 株式会社日立製作所 | 電子ビーム描画装置 |
| WO1994013010A1 (en) * | 1991-04-15 | 1994-06-09 | Fei Company | Process of shaping features of semiconductor devices |
| US5175929A (en) * | 1992-03-04 | 1993-01-05 | General Electric Company | Method for producing articles by chemical vapor deposition |
| US5643801A (en) * | 1992-11-06 | 1997-07-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing method and alignment |
| US5577091A (en) * | 1994-04-01 | 1996-11-19 | University Of Central Florida | Water laser plasma x-ray point sources |
| US5499282A (en) * | 1994-05-02 | 1996-03-12 | University Of Central Florida | Efficient narrow spectral width soft-X-ray discharge sources |
| US5577092A (en) * | 1995-01-25 | 1996-11-19 | Kublak; Glenn D. | Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources |
| US5644137A (en) * | 1996-03-04 | 1997-07-01 | Waggener; Herbert A. | Stabilizing support mechanism for electron beam apparatus |
-
1997
- 1997-02-04 US US08/794,802 patent/US6133577A/en not_active Expired - Fee Related
- 1997-12-23 EP EP97954243A patent/EP1016092B1/en not_active Expired - Lifetime
- 1997-12-23 DE DE69729588T patent/DE69729588T2/de not_active Expired - Fee Related
- 1997-12-23 WO PCT/US1997/023915 patent/WO1998034234A1/en not_active Ceased
- 1997-12-23 JP JP53287998A patent/JP2001511311A/ja not_active Ceased