JP2001509952A - 粒子光学的装置の色収差を補正するための装置 - Google Patents
粒子光学的装置の色収差を補正するための装置Info
- Publication number
- JP2001509952A JP2001509952A JP52798099A JP52798099A JP2001509952A JP 2001509952 A JP2001509952 A JP 2001509952A JP 52798099 A JP52798099 A JP 52798099A JP 52798099 A JP52798099 A JP 52798099A JP 2001509952 A JP2001509952 A JP 2001509952A
- Authority
- JP
- Japan
- Prior art keywords
- quadrupole
- plane
- correction
- equation
- correction element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/049—Focusing means
- H01J2237/0492—Lens systems
- H01J2237/04924—Lens systems electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1534—Aberrations
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.装置の中で粒子ビームにより照射される物体(14)を露光するために、装 置の光軸(4)に沿って移動する電気的に帯電した粒子のビームを放出する粒子 源と、 電気的に帯電した粒子のビームを集束させるための集束レンズ(8)と、 集束レンズの色収差を補正するための補正器(28)とを有し、 該補正器(28)は、補正要素(34,40)を有し、各補正要素は、電気的 四極場を発生するための電極(62,64,66)を設けられ、前記電極は、光 軸に沿った連続する層に配置され、層の電極により発生された四極場は、隣接層 の電極により発生された四極場に関して、光軸の回りに実質的に90°の角度で 回転されている粒子光学的装置であって、 補正要素(34,40)は、少なくとも5層の四極電極を有することを特徴と する粒子光学的装置。 2.請求項1記載の色収差を補正するための補正器(28)。 3.補正器(28)は補正要素を有し、各々の補正要素には電気的四極場を発生 するための電極が設けられ、前記電極は光軸に沿って連続する層に配置され、そ の層の電極により発生された四極場は、隣接層の電極により発生された四極場に 関して装置の光軸の回りに、実質的に90°の角度で回転された、粒子光学的装 置の集束レンズの色収差を補正するための補正器(28)を動作させる方法であ って、 色の倍率誤差がゼロに等しい補正器の第1補正要素の点は、補正器の第2補正要 素の対応する点と一致するように、四極場を発生する場が励起されることを特徴 とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97203622.2 | 1997-11-20 | ||
EP97203622 | 1997-11-20 | ||
PCT/IB1998/001607 WO1999027558A1 (en) | 1997-11-20 | 1998-10-12 | Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2001509952A true JP2001509952A (ja) | 2001-07-24 |
Family
ID=8228944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52798099A Pending JP2001509952A (ja) | 1997-11-20 | 1998-10-12 | 粒子光学的装置の色収差を補正するための装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6184975B1 (ja) |
EP (1) | EP0981829B1 (ja) |
JP (1) | JP2001509952A (ja) |
DE (1) | DE69839072T2 (ja) |
WO (1) | WO1999027558A1 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19926927A1 (de) * | 1999-06-14 | 2000-12-21 | Ceos Gmbh | Elektrostatischer Korrektor zur Beseitigung des Farbfehlers von Teilchenlinsen |
DE19944857A1 (de) * | 1999-09-18 | 2001-03-22 | Ceos Gmbh | Elektronenoptische Linsenanordnung mit weit verschiebbarer Achse |
DE10102527A1 (de) * | 2001-01-20 | 2002-07-25 | Ceos Gmbh | Elektrostatischer Korrektor |
DE10159308A1 (de) * | 2001-12-04 | 2003-06-12 | Ceos Gmbh | Teilchenoptischer Korrektor |
DE10159454B4 (de) * | 2001-12-04 | 2012-08-02 | Carl Zeiss Nts Gmbh | Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades |
US6930308B1 (en) * | 2002-07-11 | 2005-08-16 | Kla-Tencor Technologies Corporation | SEM profile and surface reconstruction using multiple data sets |
DE10237141A1 (de) * | 2002-08-13 | 2004-02-26 | Leo Elektronenmikroskopie Gmbh | Strahlführungssystem, Abbildungsverfahren und Elektronenmikroskopiesystem |
EP1783811A3 (en) * | 2005-11-02 | 2008-02-27 | FEI Company | Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
JP5078431B2 (ja) * | 2007-05-17 | 2012-11-21 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置、その収差補正値算出装置、及びその収差補正プログラム |
EP2091062A1 (en) * | 2008-02-13 | 2009-08-19 | FEI Company | TEM with aberration corrector and phase plate |
EP2131385A1 (en) * | 2008-06-05 | 2009-12-09 | FEI Company | Hybrid phase plate |
EP2166557A1 (en) * | 2008-09-22 | 2010-03-24 | FEI Company | Method for correcting distortions in a particle-optical apparatus |
EP2197018A1 (en) | 2008-12-12 | 2010-06-16 | FEI Company | Method for determining distortions in a particle-optical apparatus |
EP2325862A1 (en) * | 2009-11-18 | 2011-05-25 | Fei Company | Corrector for axial aberrations of a particle-optical lens |
US20110142362A1 (en) * | 2009-12-11 | 2011-06-16 | Marimon Sanjuan David | Method for filtering data with symmetric weighted integral images |
EP2511936B1 (en) | 2011-04-13 | 2013-10-02 | Fei Company | Distortion free stigmation of a TEM |
EP2584584A1 (en) | 2011-10-19 | 2013-04-24 | FEI Company | Method for adjusting a STEM equipped with an aberration corrector |
EP2704177B1 (en) | 2012-09-04 | 2014-11-26 | Fei Company | Method of investigating and correcting aberrations in a charged-particle lens system |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8602196A (nl) * | 1986-08-29 | 1988-03-16 | Philips Nv | Geladen deeltjes bestralingsapparaat met optisch vervormbaar bundel begrenzend diafragma. |
DE4204512A1 (de) * | 1992-02-15 | 1993-08-19 | Haider Maximilian Dipl Phys Dr | Elektronenoptisches korrektiv |
EP0840939B1 (en) * | 1996-05-21 | 2005-08-03 | Fei Company | Correction device for the correction of lens aberrations in particle-optical apparatus |
-
1998
- 1998-10-12 DE DE69839072T patent/DE69839072T2/de not_active Expired - Lifetime
- 1998-10-12 JP JP52798099A patent/JP2001509952A/ja active Pending
- 1998-10-12 EP EP98945499A patent/EP0981829B1/en not_active Expired - Lifetime
- 1998-10-12 WO PCT/IB1998/001607 patent/WO1999027558A1/en active IP Right Grant
- 1998-11-19 US US09/195,887 patent/US6184975B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6184975B1 (en) | 2001-02-06 |
EP0981829A1 (en) | 2000-03-01 |
DE69839072T2 (de) | 2008-05-21 |
DE69839072D1 (de) | 2008-03-20 |
EP0981829B1 (en) | 2008-01-30 |
WO1999027558A1 (en) | 1999-06-03 |
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