JP2001351842A - 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法 - Google Patents

位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法

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Publication number
JP2001351842A
JP2001351842A JP2000168136A JP2000168136A JP2001351842A JP 2001351842 A JP2001351842 A JP 2001351842A JP 2000168136 A JP2000168136 A JP 2000168136A JP 2000168136 A JP2000168136 A JP 2000168136A JP 2001351842 A JP2001351842 A JP 2001351842A
Authority
JP
Japan
Prior art keywords
light
reference light
pattern
position detecting
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000168136A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001351842A5 (enExample
Inventor
Hideki Ine
秀樹 稲
Takehiko Suzuki
武彦 鈴木
Atsushi Kitaoka
厚志 北岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000168136A priority Critical patent/JP2001351842A/ja
Priority to US09/873,304 priority patent/US6552798B2/en
Publication of JP2001351842A publication Critical patent/JP2001351842A/ja
Publication of JP2001351842A5 publication Critical patent/JP2001351842A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000168136A 2000-06-05 2000-06-05 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法 Pending JP2001351842A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000168136A JP2001351842A (ja) 2000-06-05 2000-06-05 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法
US09/873,304 US6552798B2 (en) 2000-06-05 2001-06-05 Position detecting method and system for use in exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000168136A JP2001351842A (ja) 2000-06-05 2000-06-05 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法

Publications (2)

Publication Number Publication Date
JP2001351842A true JP2001351842A (ja) 2001-12-21
JP2001351842A5 JP2001351842A5 (enExample) 2007-07-19

Family

ID=18671185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000168136A Pending JP2001351842A (ja) 2000-06-05 2000-06-05 位置検出方法、位置検出装置、露光装置、デバイス製造方法、半導体製造工場および露光装置の保守方法

Country Status (2)

Country Link
US (1) US6552798B2 (enExample)
JP (1) JP2001351842A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7382470B2 (en) 2004-04-05 2008-06-03 Robert Bosch Gmbh Interferometric measuring device
JP2008292240A (ja) * 2007-05-23 2008-12-04 Olympus Corp ３次元形状観察装置
KR101371371B1 (ko) * 2012-05-22 2014-03-12 주식회사 고영테크놀러지 형상 측정장치
US11835865B2 (en) * 2022-03-28 2023-12-05 Auros Technology, Inc. Overlay measurement apparatus

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004031024A (ja) * 2002-06-24 2004-01-29 Canon Inc 光発生装置、露光装置、及びデバイスの製造方法
JP2006214856A (ja) * 2005-02-03 2006-08-17 Canon Inc 測定装置及び方法
US20060256345A1 (en) * 2005-05-12 2006-11-16 Kla-Tencor Technologies Corp. Interferometry measurement in disturbed environments
KR100715280B1 (ko) * 2005-10-01 2007-05-08 삼성전자주식회사 오버레이 키를 이용하는 오버레이 정밀도 측정 방법
US7948606B2 (en) * 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7728954B2 (en) 2006-06-06 2010-06-01 Asml Netherlands B.V. Reflective loop system producing incoherent radiation
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
DE102007027083A1 (de) * 2007-06-12 2008-12-18 Carl Zeiss Sms Gmbh Mikroskopbeleuchtung
WO2010020506A1 (en) * 2008-08-21 2010-02-25 Asml Netherlands B.V. Inspection method and apparatus, and lithographic apparatus
DE102008044515B4 (de) * 2008-09-10 2015-08-13 Vistec Semiconductor Systems Gmbh Verfahren zur Kompensation der Tool induced shift bei einer Koordinaten-Messmaschine
JP5306269B2 (ja) * 2009-06-25 2013-10-02 キヤノン株式会社 光干渉断層法を用いる撮像装置及び撮像方法
CN103293884B (zh) * 2012-02-24 2014-12-17 上海微电子装备有限公司 用于光刻设备的离轴对准系统及对准方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01167603A (ja) * 1987-12-24 1989-07-03 Tokyo Seimitsu Co Ltd 干渉計測装置
JPH10213486A (ja) * 1997-01-30 1998-08-11 Shimadzu Corp 偏光干渉計
JPH11211415A (ja) * 1998-01-29 1999-08-06 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JP2000121317A (ja) * 1998-10-12 2000-04-28 Hitachi Electronics Eng Co Ltd 光干渉計の干渉位相検出方式
JP2000138164A (ja) * 1998-10-30 2000-05-16 Canon Inc 位置検出装置及びそれを用いた露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5097261A (en) * 1989-11-22 1992-03-17 International Business Machines Corporation Data compression for recording on a record medium
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
US5477057A (en) * 1994-08-17 1995-12-19 Svg Lithography Systems, Inc. Off axis alignment system for scanning photolithography
US5760901A (en) * 1997-01-28 1998-06-02 Zetetic Institute Method and apparatus for confocal interference microscopy with background amplitude reduction and compensation

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01167603A (ja) * 1987-12-24 1989-07-03 Tokyo Seimitsu Co Ltd 干渉計測装置
JPH10213486A (ja) * 1997-01-30 1998-08-11 Shimadzu Corp 偏光干渉計
JPH11211415A (ja) * 1998-01-29 1999-08-06 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JP2000121317A (ja) * 1998-10-12 2000-04-28 Hitachi Electronics Eng Co Ltd 光干渉計の干渉位相検出方式
JP2000138164A (ja) * 1998-10-30 2000-05-16 Canon Inc 位置検出装置及びそれを用いた露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7382470B2 (en) 2004-04-05 2008-06-03 Robert Bosch Gmbh Interferometric measuring device
JP2008292240A (ja) * 2007-05-23 2008-12-04 Olympus Corp ３次元形状観察装置
KR101371371B1 (ko) * 2012-05-22 2014-03-12 주식회사 고영테크놀러지 형상 측정장치
US11835865B2 (en) * 2022-03-28 2023-12-05 Auros Technology, Inc. Overlay measurement apparatus

Also Published As

Publication number Publication date
US20020015156A1 (en) 2002-02-07
US6552798B2 (en) 2003-04-22

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