JP2001330703A5 - - Google Patents

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Publication number
JP2001330703A5
JP2001330703A5 JP2001103192A JP2001103192A JP2001330703A5 JP 2001330703 A5 JP2001330703 A5 JP 2001330703A5 JP 2001103192 A JP2001103192 A JP 2001103192A JP 2001103192 A JP2001103192 A JP 2001103192A JP 2001330703 A5 JP2001330703 A5 JP 2001330703A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001103192A
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Japanese (ja)
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JP2001330703A (ja
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Publication date
Priority claimed from DE10016008A external-priority patent/DE10016008A1/de
Application filed filed Critical
Publication of JP2001330703A publication Critical patent/JP2001330703A/ja
Publication of JP2001330703A5 publication Critical patent/JP2001330703A5/ja
Pending legal-status Critical Current

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JP2001103192A 2000-03-31 2001-04-02 保護層系を有する多層系および製造方法 Pending JP2001330703A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10016008A DE10016008A1 (de) 2000-03-31 2000-03-31 Villagensystem und dessen Herstellung
DE10016008.5 2000-03-31

Publications (2)

Publication Number Publication Date
JP2001330703A JP2001330703A (ja) 2001-11-30
JP2001330703A5 true JP2001330703A5 (enrdf_load_stackoverflow) 2008-05-01

Family

ID=7637095

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001103192A Pending JP2001330703A (ja) 2000-03-31 2001-04-02 保護層系を有する多層系および製造方法

Country Status (6)

Country Link
US (1) US6656575B2 (enrdf_load_stackoverflow)
EP (1) EP1150139B1 (enrdf_load_stackoverflow)
JP (1) JP2001330703A (enrdf_load_stackoverflow)
AT (1) ATE354810T1 (enrdf_load_stackoverflow)
DE (2) DE10016008A1 (enrdf_load_stackoverflow)
TW (1) TW542920B (enrdf_load_stackoverflow)

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US7439530B2 (en) 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7372056B2 (en) 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7378673B2 (en) 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US20030064161A1 (en) * 2001-06-06 2003-04-03 Malinowski Michael E. Method for reducing carbon contamination of multilayer mirrors
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US20030008148A1 (en) 2001-07-03 2003-01-09 Sasa Bajt Optimized capping layers for EUV multilayers
DE10134267B4 (de) * 2001-07-18 2007-03-01 Gkss-Forschungszentrum Geesthacht Gmbh Einrichtung zur Reflexion von Röntgenstrahlen
EP1446811A1 (en) * 2001-10-24 2004-08-18 Carl Zeiss SMT AG Process for manufacturing multilayer systems
US6643353B2 (en) * 2002-01-10 2003-11-04 Osmic, Inc. Protective layer for multilayers exposed to x-rays
EP1333323A3 (en) * 2002-02-01 2004-10-06 Nikon Corporation Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same
DE10208705B4 (de) * 2002-02-25 2008-10-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Monochromatorspiegel für den EUV-Spektralbereich
EP1348984A1 (en) * 2002-03-27 2003-10-01 Carl Zeiss Semiconductor Manufacturing Technologies Ag Optical broad band element and process for its production
EP1394815B1 (en) * 2002-08-28 2011-06-22 ASML Netherlands B.V. Lithographic apparatus comprising a Mo/Si-multilayer with capping layer
CN100495210C (zh) 2002-08-28 2009-06-03 Asml荷兰有限公司 光刻设备和器件制造方法
DE10258709A1 (de) * 2002-12-12 2004-07-01 Carl Zeiss Smt Ag Schutzsystem für reflektive optische Elemente, reflektives optisches Element und Verfahren zu deren Herstellung
AU2003290093A1 (en) * 2002-12-19 2004-07-14 Carl Zeiss Smt Ag Coated optical element for corrective action obtained by producing layer thickness variations or by refraction factor variations in said coating
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
JP4521696B2 (ja) * 2003-05-12 2010-08-11 Ｈｏｙａ株式会社 反射多層膜付き基板及び反射型マスクブランクス並びに反射型マスク
EP1515188A1 (en) * 2003-09-10 2005-03-16 ASML Netherlands B.V. Method for protecting an optical element, and optical element
US7420653B2 (en) * 2003-10-02 2008-09-02 Asml Netherlands B.V. Lithographic projection apparatus, mirror, method of supplying a protective cap layer, device manufacturing method and device manufactured accordingly
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7567379B2 (en) * 2004-04-29 2009-07-28 Intel Corporation Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
DE102004034369B4 (de) * 2004-07-16 2007-04-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Halogenlampe
US20060024589A1 (en) 2004-07-28 2006-02-02 Siegfried Schwarzl Passivation of multi-layer mirror for extreme ultraviolet lithography
US20060175616A1 (en) * 2005-02-07 2006-08-10 Manish Chandhok Pre-oxidized protective layer for lithography
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7646004B2 (en) 2005-05-24 2010-01-12 Carl Zeiss Smt Ag Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
US7948675B2 (en) 2005-10-11 2011-05-24 Nikon Corporation Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods
US7453077B2 (en) 2005-11-05 2008-11-18 Cymer, Inc. EUV light source
EP2076801A1 (en) * 2006-10-13 2009-07-08 Media Lario S.r.L. Coated mirrors and their fabication
JPWO2008090988A1 (ja) * 2007-01-25 2010-05-20 株式会社ニコン 光学素子、これを用いた露光装置、及びデバイス製造方法
TWI427334B (zh) * 2007-02-05 2014-02-21 Zeiss Carl Smt Gmbh Ｅｕｖ蝕刻裝置反射光學元件
JP2008275919A (ja) * 2007-04-27 2008-11-13 Ulvac Japan Ltd 防汚層を備えた反射防止層の成膜方法及び同成膜を行うための成膜装置
JP5269079B2 (ja) * 2007-08-20 2013-08-21 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射コーティングを備えたミラー要素を有する投影対物系
JP4861963B2 (ja) * 2007-10-18 2012-01-25 信越化学工業株式会社 ペリクルおよびペリクルの製造方法
EP2061039A1 (en) * 2007-11-13 2009-05-20 Universidad Autonoma de Madrid A device for reflecting beams of atoms or molecules
ES2316321B2 (es) * 2008-10-20 2010-12-14 Abengoa Solar New Technologies, S.A. Recubrimiento absorbente selectivo solar y metodo de fabricacion.
JP2010231171A (ja) * 2009-03-04 2010-10-14 Seiko Epson Corp 光学物品およびその製造方法
DE102011076011A1 (de) 2011-05-18 2012-11-22 Carl Zeiss Smt Gmbh Reflektives optisches Element und optisches System für die EUV-Lithographie
DE102013222330A1 (de) * 2013-11-04 2015-05-07 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102014204660A1 (de) * 2014-03-13 2015-09-17 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
US9739913B2 (en) * 2014-07-11 2017-08-22 Applied Materials, Inc. Extreme ultraviolet capping layer and method of manufacturing and lithography thereof
DE102015005584A1 (de) 2015-05-04 2016-11-10 CRlSTALlCA GmbH Verfahren zur Beschichtung von Glasoberflächen
EP4120291A3 (en) * 2015-06-30 2023-04-05 Jaiswal, Supriya Coatings for extreme ultraviolet and soft x-ray optics
US10468149B2 (en) * 2017-02-03 2019-11-05 Globalfoundries Inc. Extreme ultraviolet mirrors and masks with improved reflectivity
JP7368363B2 (ja) 2018-03-09 2023-10-24 エーエスエムエル ネザーランズ ビー．ブイ． グラフェンペリクルリソグラフィ装置
US12287455B2 (en) 2019-07-16 2025-04-29 Asml Netherlands B.V. Oxygen-loss resistant top coating for optical elements

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JPH1138192A (ja) * 1997-07-17 1999-02-12 Nikon Corp 多層膜反射鏡
US5958605A (en) * 1997-11-10 1999-09-28 Regents Of The University Of California Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography
TWI267704B (en) 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements

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