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2000-12-05 |
Nikon Corporation |
Dual-imaging optical system
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1996-12-21 |
2006-10-31 |
Carl Zeiss Smt Ag |
Reticle-masking objective with aspherical lenses
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1996-12-21 |
2004-01-20 |
Carl-Zeiss Smt Ag |
Partial objective in an illuminating systems
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EP1293830A1
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1998-06-08 |
2003-03-19 |
Nikon Corporation |
Projection exposure apparatus and method
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1999-12-29 |
2006-02-07 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
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JP2002350774A
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2001-05-29 |
2002-12-04 |
Minolta Co Ltd |
投影光学系とその光学調整方法
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2001-06-01 |
2004-01-27 |
Optical Research Associates |
Correction of birefringence in cubic crystalline optical systems
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2001-07-18 |
2004-11-04 |
Carl Zeiss Smt Ag |
Retardation element made from cubic crystal and an optical system therewith
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TW559885B
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2001-10-19 |
2003-11-01 |
Nikon Corp |
Projection optical system and exposure device having the projection optical system
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2001-10-30 |
2005-11-29 |
Asml Netherlands B.V. |
Structures and methods for reducing aberration in integrated circuit fabrication systems
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2001-10-30 |
2005-01-18 |
Mcguire, Jr. James P. |
Reducing aberration in optical systems comprising cubic crystalline optical elements
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2001-10-30 |
2006-02-07 |
Asml Netherlands B.V. |
Methods for reducing aberration in optical systems
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2001-10-30 |
2008-11-18 |
Asml Netherlands B.V. |
Structures and methods for reducing aberration in optical systems
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2002-04-17 |
2009-07-08 |
株式会社ニコン |
投影光学系、露光装置および露光方法
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2002-06-04 |
2005-05-24 |
Pentax Corporation |
Projection aligner and optical system therefor
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2002-07-09 |
2007-10-30 |
Asml Holding N.V. |
Relay lens used in an illumination system of a lithography system
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EP1523692A2
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|
2002-07-18 |
2005-04-20 |
Carl Zeiss SMT AG |
Catadioptric projection objective
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US6958864B2
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2002-08-22 |
2005-10-25 |
Asml Netherlands B.V. |
Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
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2002-08-23 |
2008-04-22 |
Nikon Corporation |
Projection optical system and method for photolithography and exposure apparatus and method using same
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*
|
2003-02-21 |
2011-01-11 |
Kla-Tencor Technologies Corporation |
Small ultra-high NA catadioptric objective using aspheric surfaces
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2003-05-06 |
2008-03-25 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
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EP2672307A3
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2003-05-06 |
2014-07-23 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
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WO2005006026A2
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*
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2003-07-01 |
2005-01-20 |
Nikon Corporation |
Using isotopically specified fluids as optical elements
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*
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2003-09-09 |
2009-06-23 |
Carl Zeiss Smt Ag |
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
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|
US8208198B2
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|
2004-01-14 |
2012-06-26 |
Carl Zeiss Smt Gmbh |
Catadioptric projection objective
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|
US6906866B2
(en)
*
|
2003-10-15 |
2005-06-14 |
Carl Zeiss Smt Ag |
Compact 1½-waist system for sub 100 nm ArF lithography
|
|
US7023524B2
(en)
*
|
2003-12-18 |
2006-04-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
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|
US20080151365A1
(en)
|
2004-01-14 |
2008-06-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
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KR20160085375A
(ko)
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2004-05-17 |
2016-07-15 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
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*
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2004-07-30 |
2009-03-31 |
Asml Holding N.V. |
Off-axis catadioptric projection optical system for lithography
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WO2006030684A1
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2004-09-13 |
2006-03-23 |
Nikon Corporation |
投影光学系、投影光学系の製造方法、露光装置及び露光方法
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*
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2004-10-28 |
2007-02-27 |
Asml Holding N.V. |
Lithographic apparatus having an adjustable projection system and device manufacturing method
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TWI305107B
(en)
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2005-09-29 |
2009-01-01 |
Young Optics Inc |
Optical projection apparatus
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(en)
*
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2006-01-19 |
2009-12-24 |
The Regents Of The University Of California |
Biomimetic Microfabricated Compound Eyes
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KR20080106505A
(ko)
*
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2006-04-03 |
2008-12-08 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치, 및 디바이스 제조 방법
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|
DE102006022958A1
(de)
*
|
2006-05-11 |
2007-11-22 |
Carl Zeiss Smt Ag |
Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs
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|
US7929114B2
(en)
*
|
2007-01-17 |
2011-04-19 |
Carl Zeiss Smt Gmbh |
Projection optics for microlithography
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|
DE102008023765A1
(de)
|
2007-05-15 |
2008-11-20 |
Carl Zeiss Smt Ag |
Verfahren zum Korrigieren von einwelligen Abbildungsfehlern eines Projektionsobjektivs einer mikrolithographischen Projektionsbelichtungsanlage, Projektionsobjektiv einer solchen Belichtungsanlage sowie Herstellungsverfahren für mikrostrukturierte Bauelemente
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|
DE102008041144A1
(de)
|
2007-08-21 |
2009-03-05 |
Carl Zeiss Smt Ag |
Optische Anordnung und optisches Abbildungssystem damit, Verfahren zu deren Optimierung und Verfahren zum Herstellen eines optischen Elements
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|
US7760425B2
(en)
*
|
2007-09-05 |
2010-07-20 |
Carl Zeiss Smt Ag |
Chromatically corrected catadioptric objective and projection exposure apparatus including the same
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|
DE102007054731A1
(de)
|
2007-11-14 |
2009-05-20 |
Carl Zeiss Smt Ag |
Optisches Element zur Reflexion von UV-Strahlung, Herstellungsverfahren dafür und Projektionsbelichtungsanlage damit
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|
DE102007055567A1
(de)
|
2007-11-20 |
2009-05-28 |
Carl Zeiss Smt Ag |
Optisches System
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*
|
2008-06-20 |
2009-12-24 |
Carl Zeiss Smt Ag |
Chromatically corrected objective and projection exposure apparatus including the same
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|
US8345350B2
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|
2008-06-20 |
2013-01-01 |
Carl Zeiss Smt Gmbh |
Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
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|
WO2011116792A1
(en)
|
2010-03-26 |
2011-09-29 |
Carl Zeiss Smt Gmbh |
Optical system, exposure apparatus, and waverfront correction method
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|
WO2015032418A1
(en)
|
2013-09-09 |
2015-03-12 |
Carl Zeiss Smt Gmbh |
Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
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|
DE102014204171A1
(de)
|
2014-03-06 |
2015-09-24 |
Carl Zeiss Smt Gmbh |
Optisches Element und optische Anordnung damit
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|
DE102015218328B4
(de)
|
2015-09-24 |
2019-01-17 |
Carl Zeiss Smt Gmbh |
Optisches System zur Feldabbildung und/oder Pupillenabbildung
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|
DE102016224400A1
(de)
|
2016-12-07 |
2018-06-07 |
Carl Zeiss Smt Gmbh |
Katadioptrisches Projektionsobjektiv und Verfahren zu seiner Herstellung
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|
DE102017207582A1
(de)
*
|
2017-05-05 |
2018-11-08 |
Carl Zeiss Smt Gmbh |
Projektionsobjektiv, Projektionsbelichtungsanlage und Projektionsbelichtungsverfahren
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|
CN112269256B
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2020-10-21 |
2022-07-05 |
麦克奥迪实业集团有限公司 |
一种显微镜物镜
|
