JP2001221230A - 静圧軸受装置 - Google Patents

静圧軸受装置

Info

Publication number
JP2001221230A
JP2001221230A JP2000026710A JP2000026710A JP2001221230A JP 2001221230 A JP2001221230 A JP 2001221230A JP 2000026710 A JP2000026710 A JP 2000026710A JP 2000026710 A JP2000026710 A JP 2000026710A JP 2001221230 A JP2001221230 A JP 2001221230A
Authority
JP
Japan
Prior art keywords
bearing
porous material
porous
hydrostatic
bearing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000026710A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001221230A5 (enExample
Inventor
Choshoku Sai
長植 崔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000026710A priority Critical patent/JP2001221230A/ja
Publication of JP2001221230A publication Critical patent/JP2001221230A/ja
Publication of JP2001221230A5 publication Critical patent/JP2001221230A5/ja
Pending legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00Bearings for parts moving only linearly
    • F16C29/02Sliding-contact bearings
    • F16C29/025Hydrostatic or aerostatic
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00Bearings not otherwise provided for
    • F16C32/06Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F16C32/0614Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings
    • F16C32/0618Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion the gas being supplied under pressure, e.g. aerostatic bearings via porous material

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
JP2000026710A 2000-02-03 2000-02-03 静圧軸受装置 Pending JP2001221230A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000026710A JP2001221230A (ja) 2000-02-03 2000-02-03 静圧軸受装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000026710A JP2001221230A (ja) 2000-02-03 2000-02-03 静圧軸受装置

Publications (2)

Publication Number Publication Date
JP2001221230A true JP2001221230A (ja) 2001-08-17
JP2001221230A5 JP2001221230A5 (enExample) 2007-03-15

Family

ID=18552406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000026710A Pending JP2001221230A (ja) 2000-02-03 2000-02-03 静圧軸受装置

Country Status (1)

Country Link
JP (1) JP2001221230A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103195811A (zh) * 2013-04-28 2013-07-10 昆明学院 新型中空轴式节能静压轴承
EP2977486A1 (en) * 2009-07-30 2016-01-27 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2977486A1 (en) * 2009-07-30 2016-01-27 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Apparatus and method for atomic layer deposition
CN103195811A (zh) * 2013-04-28 2013-07-10 昆明学院 新型中空轴式节能静压轴承

Similar Documents

Publication Publication Date Title
JP3312164B2 (ja) 真空吸着装置
EP1260720B1 (en) Hydrostatic bearing and stage apparatus using same
US9910370B2 (en) Environmental system including a transport region for an immersion lithography apparatus
JP3483452B2 (ja) ステージ装置および露光装置、ならびにデバイス製造方法
KR100485881B1 (ko) 리니어모터, 스테이지장치, 노광장치 및 디바이스제조방법
US6644855B2 (en) Stage device, exposure apparatus, device manufacturing method and movement guidance method
CN101408734A (zh) 曝光装置和器件制造方法
JP2001221230A (ja) 静圧軸受装置
JP2002257138A (ja) 静圧流体軸受装置、およびこれを用いたステージ装置、露光装置ならびにデバイス製造方法
JP2005155658A (ja) 静圧気体軸受装置およびそれを用いたステージ装置
JP4165844B2 (ja) 除振装置
JP2001143984A (ja) 位置決め装置
US6402380B1 (en) Fluid bearing operable in a vacuum region
JP5288191B2 (ja) 基板固定装置
JP2002333018A (ja) 流体軸受装置、およびこれを用いた露光装置ならびにデバイス製造方法
JP4455004B2 (ja) 流体軸受装置およびそれを用いたステージ装置
JP2008078499A (ja) 支持装置、露光装置及びデバイス製造方法
JPH11108059A (ja) 気体軸受装置およびステージ装置
Michel et al. Microfabrication technologies for high performance microactuators
JP2000228355A (ja) 半導体露光装置およびデバイス製造方法
JP3327784B2 (ja) マスク構造体、マスク保持方法、ならびにデバイス生産方法
JP2013211554A (ja) 基板固定装置
JP4500507B2 (ja) 移動案内装置及びそれを用いた露光装置
JP2001168173A (ja) 真空用位置決め装置
JPH07153664A (ja) マスク保持装置、ならびにこれを用いた露光装置とデバイス製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070126

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070126

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090223

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20090406

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090421

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20090818