JP2001166272A - Method and device for assembling substrate - Google Patents

Method and device for assembling substrate

Info

Publication number
JP2001166272A
JP2001166272A JP35050299A JP35050299A JP2001166272A JP 2001166272 A JP2001166272 A JP 2001166272A JP 35050299 A JP35050299 A JP 35050299A JP 35050299 A JP35050299 A JP 35050299A JP 2001166272 A JP2001166272 A JP 2001166272A
Authority
JP
Japan
Prior art keywords
substrate
substrates
holding
upper substrate
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP35050299A
Other languages
Japanese (ja)
Other versions
JP3641709B2 (en
Inventor
Kiyoshi Imaizumi
潔 今泉
Satoshi Hachiman
聡 八幡
Masayuki Saito
正行 齊藤
Akira Hirai
明 平井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Plant Technologies Ltd
Original Assignee
Hitachi Techno Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Techno Engineering Co Ltd filed Critical Hitachi Techno Engineering Co Ltd
Priority to JP35050299A priority Critical patent/JP3641709B2/en
Priority to SG200007223A priority patent/SG87915A1/en
Priority to TW089126120A priority patent/TW571144B/en
Priority to KR10-2000-0074503A priority patent/KR100384253B1/en
Publication of JP2001166272A publication Critical patent/JP2001166272A/en
Application granted granted Critical
Publication of JP3641709B2 publication Critical patent/JP3641709B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133354Arrangements for aligning or assembling substrates
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/28Adhesive materials or arrangements

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method and a device for substrate assembling by which upper and lower substrates can be stuck together in a vacuum even when they are in the same shape. SOLUTION: The two substrates to be stuck together are set opposite to each other and stuck with adhesive provided on one of the substrates; and both substrates are stuck together by holding the substrates in a vacuum vertically and opposite to each other and dropping the upper substrate on the lower substrate by releasing the upper substrate from a held state.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、貼り合せる2枚の
基板を対向させ、真空中で基板同士の間隔を狭めて貼り
合わせる基板の組立方法とその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for assembling substrates to be bonded together, with two substrates to be bonded facing each other and the distance between the substrates being reduced in a vacuum.

【0002】[0002]

【従来の技術】液晶表示パネルの製造には、透明電極や
薄膜トランジスタアレイを付けた2枚のガラス基板を数
μm程度の極めて接近した間隔をもって接着剤(以下、
シール剤ともいう)で貼り合わせ(以後、貼り合せ後の
基板をセルと呼ぶ)、それによって形成される空間に液
晶を封止する工程がある。
2. Description of the Related Art In manufacturing a liquid crystal display panel, an adhesive (hereinafter, referred to as a glass substrate) having two glass substrates provided with a transparent electrode and a thin film transistor array at an extremely close interval of about several micrometers.
There is a step of bonding together (hereinafter, the substrate after bonding is called a cell) by sealing with a liquid crystal in a space formed by the bonding.

【0003】この液晶の封止には、注入口を設けないよ
うにシール剤をクローズしたパターンに描画した一方の
基板上に液晶を滴下しておいて、他方の基板を一方の基
板上に配置し、真空中で上下の基板を接近させて貼り合
せる特開昭62−165622号公報で提案された方法
や、一方の基板上に注入口を設けるようにシール剤をパ
ターン描画し、真空中で基板同士を貼り合わせ、シール
剤の注入口から液晶を注入する特開平10−26763
号公報で提案された方法などがある。
In order to seal the liquid crystal, the liquid crystal is dropped on one of the substrates on which a sealing agent is drawn in a closed pattern so that no injection port is provided, and the other substrate is disposed on the one of the substrates. Then, a method proposed in Japanese Patent Application Laid-Open No. 62-165622, in which the upper and lower substrates are brought close together in a vacuum, or a sealing agent is patterned so as to provide an injection port on one of the substrates, JP-A-10-26763 in which substrates are bonded to each other and liquid crystal is injected from a sealing agent injection port
And the method proposed in Japanese Patent Publication No.

【0004】[0004]

【発明が解決しようとする課題】上記技術では、両基板
を真空中で貼り合わせているが、真空中では基板を大気
との圧力差で吸引吸着できないので、上方の基板(以
下、上基板と呼ぶ。)の端部を機械的に保持している。
このためテーブル上の基板(以下、下基板と呼ぶ。)と
位置合わせを行いながら上基板を下降させて行くために
は、保持部が下基板と干渉しないように上基板に保持代
を設ける都合から上基板を大きくする必要があり、上下
基板を同一の形状にできない。
In the above technique, the two substrates are bonded in a vacuum. However, in a vacuum, the substrates cannot be suctioned and adsorbed due to a pressure difference from the atmosphere. ) Is mechanically held.
Therefore, in order to lower the upper substrate while performing alignment with the substrate on the table (hereinafter, referred to as the lower substrate), it is convenient to provide a holding margin on the upper substrate so that the holding portion does not interfere with the lower substrate. Therefore, it is necessary to make the upper substrate large, and the upper and lower substrates cannot be formed in the same shape.

【0005】また、上下基板の位置合わせマークを検出
して、位置合わせを行いながら上基板を下降させるの
で、貼り合わせるまでに時間がかかり生産性が低下して
いた。
Further, since the upper substrate is moved down while detecting the alignment marks of the upper and lower substrates while performing the alignment, it takes a long time to bond the substrates and the productivity is reduced.

【0006】それゆえ、本発明の目的は、上下基板が同
一形状であっても真空中で貼り合わせることができる基
板の組立方法およびその装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method and apparatus for assembling a substrate which can be bonded in a vacuum even if the upper and lower substrates have the same shape.

【0007】さらに本発明の目的は、真空中で基板同士
を短時間で貼り合わせて生産性を向上することができる
基板の組立方法およびその装置を提供することにある。
It is a further object of the present invention to provide a method and apparatus for assembling a substrate capable of improving the productivity by bonding the substrates in a short time in a vacuum.

【0008】[0008]

【課題を解決するための手段】上記目的を達成する本発
明の特徴とするところは、貼り合わせる2枚の基板を対
向させ、いづれかの基板に設けた接着剤により両基板を
貼り合わせるものにおいて、真空中で両基板を上下に対
向させて保持し、上方の基板の保持を解放して下方の基
板上に落下させて両基板を貼り合わせることにある。
A feature of the present invention that achieves the above object is that two substrates to be bonded are opposed to each other, and both substrates are bonded to each other by an adhesive provided on one of the substrates. An object of the present invention is to hold both substrates up and down in a vacuum, release the holding of the upper substrate, drop the substrate on the lower substrate, and bond the two substrates together.

【0009】大気中で上基板を落下させると、両基板間
に存在する空気が上基板の落下の障害になって上基板は
下基板上に開放時のままの状態で落下しない。落葉や紙
がひらひらと舞い落ちるのはそのためである。薄い落下
物であれば、重量が増えても空気との粘性抵抗でそのま
ま落下せず、位置ずれを起こす。
When the upper substrate is dropped in the air, the air existing between the two substrates hinders the drop of the upper substrate, so that the upper substrate does not drop onto the lower substrate in the open state. That is why leaves and paper flutter down. If the object is thin, it will not fall as it is due to viscous resistance with air even if the weight increases, resulting in displacement.

【0010】本発明は真空中では両基板間に気体が存在
しないことに基づいて、上基板を開放するだけで、その
まま上基板が下基板上に落下することを利用して両基板
を貼り合わせるものである。
According to the present invention, based on the absence of gas between the two substrates in a vacuum, the two substrates are bonded by simply opening the upper substrate and utilizing the fact that the upper substrate falls onto the lower substrate. Things.

【0011】[0011]

【発明の実施の形態】以下,本発明の一実施形態を図に
基づいて説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.

【0012】図1乃至図3において、本発明による基板
組立装置は、液晶滴下部S1と基板貼合部S2から構成
され、この両部分は架台2上に隣接して配置される。架
台2の上方には基板貼合部S2を支持するフレーム3が
ある。また、架台2の上面には、XYθステージT1が
備えられている。Xステージ4aは、駆動モータ5によ
り図面上で左右のX軸方向に、即ち、液晶滴下部S1と
基板貼合部S2の間を往来できるようになっている。Y
ステージ4bはXステージ4a上にあり、駆動モータ6
によりXステージ4aの移動方向であるX軸方向と直交
するY軸方向に往来できるようになっている。
1 to 3, the substrate assembling apparatus according to the present invention comprises a liquid crystal dropping portion S1 and a substrate bonding portion S2, both of which are disposed adjacent to each other on the gantry 2. Above the gantry 2, there is a frame 3 that supports the substrate bonding portion S2. An XYθ stage T1 is provided on the upper surface of the gantry 2. The X stage 4a can be moved by the drive motor 5 in the left and right X-axis directions on the drawing, that is, between the liquid crystal dropping portion S1 and the substrate bonding portion S2. Y
The stage 4b is on the X stage 4a,
Thus, the X stage 4a can move in the Y axis direction orthogonal to the X axis direction which is the moving direction of the X stage 4a.

【0013】θステージ4cはYステージ4b上にあ
り、回転ベアリング7を介して駆動モータ8によりYス
テージ4bに対して水平に回転可能になっていて、θス
テージ4c上に下基板1aを搭載するテーブル9が固定
されている。テーブル9は真空吸着(吸引吸着)で下基
板1aを保持搭載する手段を内蔵している。また、Yス
テージ4bにプレート13で下チャンバユニット10が
固定されている。θステージ4cは下チャンバユニット
10に対し回転ベアリング11と真空シール12を介し
て回転自由に取付けられ、θステージ4cが回転しても
下チャンバユニット10は連られて回転しない構造とし
ている。
The θ stage 4c is on the Y stage 4b, is rotatable horizontally with respect to the Y stage 4b by a drive motor 8 via a rotary bearing 7, and mounts the lower substrate 1a on the θ stage 4c. The table 9 is fixed. The table 9 has a built-in means for holding and mounting the lower substrate 1a by vacuum suction (suction suction). The lower chamber unit 10 is fixed to the Y stage 4b with a plate 13. stage 4c is rotatably mounted on the lower chamber unit 10 via a rotary bearing 11 and a vacuum seal 12, so that even when the θ stage 4c rotates, the lower chamber unit 10 is connected and does not rotate.

【0014】液晶滴下部S1は、テーブル9に保持され
た下基板1aに所望量の液晶剤を滴下するためのフレー
ム3から突出したブラケット14で支持されたディスペ
ンサ17とこれを上下移動させるためのZ軸ステージ1
5とそれを駆動するモータ16とで構成される。下基板
1aをテーブル9上に保持搭載したXYθステージT1
は、液晶剤を滴下するディスペンサ17のノズル18に
対し、XおよびY軸方向に移動する。これにより、下基板
1a上の任意の個所に所望量の液晶剤が滴下される。液
晶滴下後の下基板1aを搭載保持したXYθステージT
1は基板貼合部S2の下部に駆動モータ5によって移動
する。
The liquid crystal dropping section S1 is provided with a dispenser 17 supported by a bracket 14 protruding from the frame 3 for dropping a desired amount of liquid crystal agent onto the lower substrate 1a held on the table 9, and for moving the dispenser 17 up and down. Z axis stage 1
5 and a motor 16 for driving it. XYθ stage T1 holding and mounting lower substrate 1a on table 9
Moves in the X and Y axis directions with respect to the nozzle 18 of the dispenser 17 for dropping the liquid crystal agent. As a result, a desired amount of the liquid crystal agent is dropped at an arbitrary position on the lower substrate 1a. XYθ stage T on which the lower substrate 1a is mounted and held after liquid crystal is dropped
1 is moved by the drive motor 5 to the lower part of the substrate bonding part S2.

【0015】基板貼合部S2では、上チャンバユニット
21と真空吸着機能を内蔵した加圧板27がそれぞれ独
立して上下動できる構造になっている。即ち、上チャン
バユニット21は、リニアブッシュと真空シールを内蔵
したハウジング30を有しており、フレーム3に固定さ
れたシリンダ22により上下のZ軸方向に移動する。
In the substrate bonding portion S2, the upper chamber unit 21 and the pressure plate 27 having a vacuum suction function can move up and down independently of each other. That is, the upper chamber unit 21 has a housing 30 containing a linear bush and a vacuum seal, and is moved in the vertical Z-axis direction by a cylinder 22 fixed to the frame 3.

【0016】XYθステージT1が基板貼合部S2に移
動していて上チャンバユニット21が下降すると、下チ
ャンバユニット10の周りに配置してあるOリング44
に上チャンバユニット21のフランジ21aが接触して
一体となり、この時真空チャンバとして機能する状態に
なる。
When the XYθ stage T1 moves to the substrate bonding portion S2 and the upper chamber unit 21 descends, the O-ring 44 disposed around the lower chamber unit 10
Then, the flange 21a of the upper chamber unit 21 comes into contact with the upper chamber unit 21 to be integrated, and at this time, a state of functioning as a vacuum chamber is established.

【0017】23は真空バルブ、24は配管ホースで、
図示していない真空源に接続され、これらは真空チャン
バを減圧し真空にする時に使用される。また、25はガ
スパージバルブ、26はガスチューブで、窒素ガスやク
リーンドライエア等の圧力源に接続され、これらは真空
チャンバを大気圧に戻す時に使用される。
23 is a vacuum valve, 24 is a piping hose,
Connected to vacuum sources not shown, these are used to depressurize and evacuate the vacuum chamber. Reference numeral 25 denotes a gas purge valve, and reference numeral 26 denotes a gas tube, which is connected to a pressure source such as nitrogen gas or clean dry air, and is used for returning the vacuum chamber to atmospheric pressure.

【0018】ハウジング30は、上チャンバユニット2
1が下チャンバユニット10と真空チャンバを形成して
変形しても、シャフト29に対し真空漏れを起こさない
で上下動可能な真空シールを内蔵しているので、真空チ
ャンバの変形がシャフト29に与える力を吸収すること
ができ、シャフト29に固定された加圧板27の変形が
ほぼ防止でき、加圧板27はテーブル9との平行を保っ
て降下(下降)することが可能となる。
The housing 30 includes the upper chamber unit 2
Even if the vacuum chamber 1 is deformed by forming the vacuum chamber with the lower chamber unit 10, the vacuum chamber gives the shaft 29 due to the built-in vacuum seal that can move up and down without causing a vacuum leak to the shaft 29. The force can be absorbed, the deformation of the pressing plate 27 fixed to the shaft 29 can be substantially prevented, and the pressing plate 27 can descend (fall) while keeping parallel to the table 9.

【0019】上基板1bは加圧板27の下面に、大気下
において真空吸着(吸引吸着)で保持されるようになっ
ている。即ち、41は吸引吸着用継手、42は吸引チュ
ーブであり、図示していない真空源に接続され、加圧板
27の下面にはそれにつながる複数の吸引孔が設けられ
ている。
The upper substrate 1b is held on the lower surface of the pressure plate 27 by vacuum suction (suction suction) in the atmosphere. That is, 41 is a suction / suction joint, 42 is a suction tube, which is connected to a vacuum source (not shown), and a plurality of suction holes connected to the lower surface of the pressure plate 27 are provided.

【0020】加圧板27はシャフト29に取付けられて
おり、シャフト29はハウジング31、32に固定され
ている。ハウジング31はフレーム2に対してリニアガ
イド34で取付けられ、加圧板27は上下動可能な構造
になっている。その上下駆動は、フレーム3とつながる
フレーム35上のブラケット38に固定されたモータ4
0により行う。その駆動の伝達は、ボールねじ36とナ
ットハウジング37で実行される。ナットハウジング3
7は荷重計33を介してハウジング32とつながり、そ
の下部の加圧板27と一体で動作する。従って、モータ
40によってシャフト29が降下することで加圧板27
が降下し、貼り合わされた上基板1bと下基板1aに加
圧力を与えることができる。
The pressure plate 27 is attached to a shaft 29, and the shaft 29 is fixed to the housings 31, 32. The housing 31 is attached to the frame 2 by a linear guide 34, and the pressing plate 27 has a structure capable of moving up and down. The vertical drive is performed by a motor 4 fixed to a bracket 38 on a frame 35 connected to the frame 3.
Performed with 0. The transmission of the drive is executed by the ball screw 36 and the nut housing 37. Nut housing 3
Reference numeral 7 is connected to the housing 32 via the load meter 33, and operates integrally with the pressing plate 27 below the housing 32. Therefore, when the shaft 29 is lowered by the motor 40, the pressure plate 27
Is lowered, and a pressing force can be applied to the bonded upper substrate 1b and lower substrate 1a.

【0021】この場合、荷重計33は加圧力センサとし
て働き、逐次、フィードバックされた信号を基にモータ
40を制御することで、上下基板1a,1bに所望の加
圧力を与えることが可能となっている。
In this case, the load meter 33 functions as a pressure sensor, and by controlling the motor 40 based on the sequentially fed-back signal, it becomes possible to apply a desired pressure to the upper and lower substrates 1a and 1b. ing.

【0022】下基板1aをテーブル9に真空吸着で吸引
吸着保持すると共に、上基板1bを加圧板27に真空吸
着で吸引吸着保持した後、真空チャンバ内が減圧される
と真空になる過程で上下基板1a,1bを保持している
吸引吸着力が消えて行くので、下基板1aとテーブル9
との間あるいは上基板1bと加圧板27との間に入り込
んでいる空気が逃げて、下基板1aが踊ってずれたり、
上基板1bが自重で落下したりするおそれがあるため、
下チャンバユニット10に下基板1aの移動阻止や上基
板1bを保持する機構と、上基板1bを決められた位置
に落下させる機構(図2および図3に図示)を設けてい
る。即ち、この移動阻止と基板保持や決められた位置に
落下させる機構は、図2および図3に示すように、テー
ブル9上に載置される下基板1aにおける四隅をX方向
及びY方向から水平方向に押して位置決めや上基板1b
を保持する位置決め保持駒51と、テーブル9上に載置
される下基板1aにおける四隅をX方向及びY方向から
水平方向に押して位置決めや上基板1bを決められた位
置に落下させるガイド機構56が、θステージ4cのリ
ニヤガイド52で案内されるようになっており、この位
置決め保持駒51とガイド機構56はばね53で下チャ
ンバユニット10の内壁側に引かれている。下チャンバ
ユニット10のフランジ部10aの外周に、下チャンバ
ユニット10内部の位置決め保持駒51やガイド機構5
6に向けてプランジャ54aを伸ばしたシリンダ54を
ブラケット55を介して設けている。シリンダ54はプ
ランジャ54aでばね53の引張力に抗して位置決め保
持駒51で下基板1aの側面を押し、ガイド機構56で
上下基板1a,1bの側面を押すようになっている。
After the lower substrate 1a is held by suction on the table 9 by vacuum suction and the upper substrate 1b is held by suction on the pressing plate 27 by vacuum suction, when the vacuum chamber is depressurized, the upper and lower substrates become up and down in the process of becoming vacuum. Since the suction force holding the substrates 1a and 1b disappears, the lower substrate 1a and the table 9
Air or between the upper substrate 1b and the pressure plate 27 escapes, and the lower substrate 1a dances,
Since the upper substrate 1b may fall under its own weight,
The lower chamber unit 10 is provided with a mechanism for preventing movement of the lower substrate 1a and holding the upper substrate 1b, and a mechanism for dropping the upper substrate 1b to a predetermined position (shown in FIGS. 2 and 3). That is, as shown in FIG. 2 and FIG. 3, the mechanism for preventing the movement, holding the substrate, and dropping the substrate to a predetermined position is to move the four corners of the lower substrate 1a placed on the table 9 horizontally from the X direction and the Y direction. Direction and position the upper substrate 1b
And a guide mechanism 56 that pushes the four corners of the lower substrate 1a placed on the table 9 in the horizontal direction from the X and Y directions to position and drop the upper substrate 1b to a predetermined position. , The θ stage 4c is guided by a linear guide 52, and the positioning holding piece 51 and the guide mechanism 56 are pulled toward the inner wall side of the lower chamber unit 10 by a spring 53. On the outer periphery of the flange portion 10a of the lower chamber unit 10, a positioning holding piece 51 and a guide mechanism 5 inside the lower chamber unit 10 are provided.
A cylinder 54 having a plunger 54a extended toward 6 is provided via a bracket 55. The cylinder 54 pushes the side surface of the lower substrate 1a with the positioning holding piece 51 against the pulling force of the spring 53 with the plunger 54a, and pushes the side surfaces of the upper and lower substrates 1a and 1b with the guide mechanism 56.

【0023】位置決め保持駒51は、垂直部51aとこ
の垂直部51aから基板と平行に伸びた水平部51bを
有している。水平部51bは、図2に示すように、下側
で下基板1aの上面より離れていて上側で上基板1bの
下面に当接する。また、垂直部51aは、図2に示すよ
うに、下基板1aの側面に当接している。
The positioning holder 51 has a vertical portion 51a and a horizontal portion 51b extending from the vertical portion 51a in parallel with the substrate. As shown in FIG. 2, the horizontal portion 51b is separated from the upper surface of the lower substrate 1a on the lower side and abuts on the lower surface of the upper substrate 1b on the upper side. Further, as shown in FIG. 2, the vertical portion 51a is in contact with the side surface of the lower substrate 1a.

【0024】ガイド機構56は、図2に示すように、上
下基板1a,1bの側面に当接している。加圧板27に
はガイド機構56と嵌合するZ軸方向に伸びた凹部27
aがあり、ガイド機構56が存在しても加圧板27が降
下するときの移動を円滑なものとしている。
As shown in FIG. 2, the guide mechanism 56 is in contact with the side surfaces of the upper and lower substrates 1a and 1b. The pressing plate 27 has a recess 27 extending in the Z-axis direction to be fitted with the guide mechanism 56.
a, the movement when the pressing plate 27 descends is smooth even if the guide mechanism 56 is present.

【0025】次に、本基板組立装置で基板を貼り合わせ
る工程について説明する。
Next, a description will be given of a step of bonding substrates by the present substrate assembling apparatus.

【0026】先ず、図1において、注入口を設けないよ
うにシール剤をクローズしたパターンに描画した下基板
1aをテーブル9上に搭載し、各四隅の位置決め保持駒
51をシリンダ54で駆動して下基板1aの位置決めを
行い、テーブル9に真空吸着で保持させてから、各プラ
ンジャ54aを退避させ、各位置決め保持駒51を退避
させておく。その後、図示していないロボットハンドな
どで上基板1bを加圧板27に吸引(真空)吸着で保持
させる。そして、駆動モータ5でXYθステージT1を
基板貼合部S2側に移動させ、上チャンバユニット21
に設けている図示していない画像処理カメラで各基板1
a,1bの位置合せマークを読んで、XYθステージT
1を微少移動させて両基板1a,1bの位置合せを行う。
この位置合せでは、モータ40でボールねじ36を回転
させ、各基板1a,1bの位置合せマークをカメラで取
込み易いように加圧板27を若干降下させてもよい。そ
の後、XYθステージT1で下基板1aを液晶滴下部S
1に戻し、ディスペンサ17から下基板1a上のクロー
ズしたパターンを持ったシール剤の内側に所望量の液晶
を供給する。そして再び、XYθステージT1で下基板
1aを基板貼合部S2に移動させる。この時の移動量は
駆動モータ5の回転量で確認できるから、両基板1a,
1b間に位置ずれは発生しない。
First, in FIG. 1, a lower substrate 1a in which a sealant is drawn in a closed pattern so as not to have an injection port is mounted on a table 9, and positioning holding pieces 51 at each of four corners are driven by a cylinder 54. After the lower substrate 1a is positioned and held on the table 9 by vacuum suction, each plunger 54a is retracted, and each positioning holding piece 51 is retracted. Thereafter, the upper substrate 1b is held on the pressure plate 27 by suction (vacuum) suction using a robot hand (not shown) or the like. Then, the XYθ stage T1 is moved to the substrate bonding part S2 side by the drive motor 5, and the upper chamber unit 21 is moved.
Each substrate 1 is connected to an image processing camera (not shown)
Read the alignment marks of a and 1b, and
The substrate 1 is slightly moved to align the two substrates 1a and 1b.
In this alignment, the ball screw 36 may be rotated by the motor 40, and the pressing plate 27 may be slightly lowered so that the alignment marks of the substrates 1a and 1b can be easily captured by the camera. Thereafter, the lower substrate 1a is moved to the liquid crystal dropping portion S by the XYθ stage T1.
Then, a desired amount of liquid crystal is supplied from the dispenser 17 to the inside of the sealant having a closed pattern on the lower substrate 1a. Then, the lower substrate 1a is moved to the substrate bonding portion S2 again on the XYθ stage T1. The amount of movement at this time can be confirmed by the amount of rotation of the drive motor 5, so that both substrates 1a,
No displacement occurs between 1b.

【0027】次に、位置決め保持駒51をシリンダ54
のプランジャ54aで移動させ、位置決め保持駒51の
垂直部51aと水平部51bによって下基板1aの側面
と上面をそれぞれ四隅で抑える。次に、加圧板27を降
下させて上基板1bの下面を位置決め保持駒51の水平
部51bの上面に接近させてから、ガイド機構56をシ
リンダ54のプランジャ54aで移動させて上下基板1
a,1bの側面を、念のため、緩やかに四隅で抑える。
Next, the positioning holding piece 51 is
And the vertical and horizontal portions 51a and 51b of the positioning and holding piece 51 hold the side and top surfaces of the lower substrate 1a at four corners, respectively. Next, the pressure plate 27 is lowered to bring the lower surface of the upper substrate 1b closer to the upper surface of the horizontal portion 51b of the positioning holding piece 51, and then the guide mechanism 56 is moved by the plunger 54a of the cylinder 54 to move the upper and lower substrates 1b.
The sides of a and 1b are gently held down at the four corners just in case.

【0028】その後、シリンダ22により上チャンバユ
ニット21を降下させ、真空チャンバを形成して減圧を
開始する。減圧を進めていくと、各基板1a,1bとテ
ーブル9あるいは加圧板27間に存在していた空気が逃
げ出すが、各基板1a,1bは位置決め保持駒51とガ
イド機構56で移動を規制させているので、空気の流れ
などで移動することはない。即ち、下基板1aが浮き上
がろうとしても水平部51bの下面が下基板1aを押圧
するし、垂直部51aとガイド機構56がX方向とY方
向の動きを規制している。
Thereafter, the upper chamber unit 21 is lowered by the cylinder 22 to form a vacuum chamber, and pressure reduction is started. As the pressure is reduced, the air existing between the substrates 1a and 1b and the table 9 or the pressure plate 27 escapes, but the movement of the substrates 1a and 1b is regulated by the positioning and holding pieces 51 and the guide mechanism 56. There is no movement due to the air flow. That is, even if the lower substrate 1a rises, the lower surface of the horizontal portion 51b presses the lower substrate 1a, and the vertical portion 51a and the guide mechanism 56 regulate the movement in the X and Y directions.

【0029】上基板1bは加圧板27での吸引吸着力が
消えて自重で位置決め保持駒51の水平部51bの上面
に落下して保持される。落下する際にガイド機構56が
X方向とY方向の動きを規制している。
The upper substrate 1b drops on the upper surface of the horizontal portion 51b of the positioning holding piece 51 and is held by its own weight due to the disappearance of the suction force of the pressure plate 27. When falling, the guide mechanism 56 regulates the movement in the X direction and the Y direction.

【0030】真空チャンバが所望の真空度になったとこ
ろで、位置決め保持駒51を退避させて上基板1bを下
基板1a上に落下させ、上下基板1a,1bを貼り合わ
せる。
When the vacuum chamber reaches a desired degree of vacuum, the positioning holding piece 51 is retracted, the upper substrate 1b is dropped onto the lower substrate 1a, and the upper and lower substrates 1a and 1b are bonded.

【0031】位置決め保持駒51を退避させるだけで上
基板1bは下基板1a上に落下するから、上下基板1
a,1bの貼り合わせは短時間で済むし、両基板1a,1
bは同一寸法のものを使用できる。必要に応じて、異な
る寸法のものを貼り合わせても構わない。
The upper substrate 1b falls onto the lower substrate 1a only by retracting the positioning and holding pieces 51.
The bonding of the substrates 1a and 1b can be completed in a short time.
b can be of the same size. If necessary, different sizes may be attached.

【0032】上基板1bが落下する際にそのまま下基板
1a上に落下するが、予期しない原因でずれが生じよう
としても、ガイド機構56が上基板1bのX方向とY方
向の動きを規制しているので、下基板1a上の決められ
た位置に落下する。
When the upper substrate 1b falls onto the lower substrate 1a, the guide mechanism 56 restricts the movement of the upper substrate 1b in the X direction and the Y direction even if the upper substrate 1b is likely to shift due to an unexpected cause. Therefore, it falls to a predetermined position on the lower substrate 1a.

【0033】そして、更に加圧板27を降下させ、上下
基板1a,1bを加圧して両基板1a,1bを所望間隔
に貼り合わせる。貼り合わせて加圧する過程でも両基板
1a,1bは、ガイド機構56によってX方向とY方向
の動きを規制されているので位置ずれを起こすことは無
い。
Then, the pressing plate 27 is further lowered, and the upper and lower substrates 1a and 1b are pressed to bond the substrates 1a and 1b at a desired interval. Even in the process of bonding and pressing, the two substrates 1a and 1b are not displaced because the movement in the X and Y directions is regulated by the guide mechanism 56.

【0034】上記の実施形態では念のため、ガイド機構
56で上基板1bが落下する際の動きを規制している
が、ガイド機構56を使用しなくとも、各位置決め保持
駒51を同期して高速に退避することで、真空中では空
気抵抗がなく上基板1bは慣性によりほぼ垂直に自然落
下することを確認しているので、上基板1bを落下させ
る際にガイド機構56を待避しておき、上基板1bを落
下させた後にそのまま加圧して貼り合わせても良いし、
ガイド機構56は省略しても良い。
In the above-described embodiment, the movement of the upper substrate 1b when the upper substrate 1b is dropped is regulated by the guide mechanism 56 just in case. However, even if the guide mechanism 56 is not used, the positioning holding pieces 51 are synchronized with each other. Since it has been confirmed that the upper substrate 1b is naturally dropped by the inertia due to no air resistance in a vacuum by retreating at high speed, the guide mechanism 56 is retracted when the upper substrate 1b is dropped. After the upper substrate 1b is dropped, it may be pressed and bonded as it is,
The guide mechanism 56 may be omitted.

【0035】念のため、上基板1bを落下させてからガ
イド機構56をシリンダ54のプランジャ54aで移動
させて上下基板1a,1bの側面を四隅で抑えて位置決
めを行って貼り合わせても良い。
As a precautionary measure, after the upper substrate 1b is dropped, the guide mechanism 56 may be moved by the plunger 54a of the cylinder 54, and the side surfaces of the upper and lower substrates 1a, 1b may be held at four corners for positioning and bonding.

【0036】そして、ガイド機構56は移動できる構造
であるが、移動させなくとも貼り合わせができるので、
ステージ4cやテーブル9に固定しても良い。
Although the guide mechanism 56 has a movable structure, it can be bonded without being moved.
It may be fixed to the stage 4c or the table 9.

【0037】貼り合わせ後は、真空チャンバ内を大気圧
に戻し、上チャンバユニット21をシリンダ22で上昇
させ、XYθステージT1を液晶滴下部S1に戻し、テ
ーブル9上から一体化した基板1a,1b(セル)を取
り外す。
After the bonding, the inside of the vacuum chamber is returned to the atmospheric pressure, the upper chamber unit 21 is raised by the cylinder 22, the XYθ stage T1 is returned to the liquid crystal dropping unit S1, and the substrates 1a and 1b integrated from the table 9 are integrated. Remove (cell).

【0038】図4は本発明による第2の実施形態を示す
図であり、図2に示したものと同一の部分には同一符号
つけて重複する説明を省略する。
FIG. 4 is a view showing a second embodiment according to the present invention, and the same portions as those shown in FIG. 2 are denoted by the same reference numerals, and redundant description will be omitted.

【0039】この実施形態では、加圧板27を降下させ
て上基板1bの下面を位置決め保持駒51の水平部51
bの上面に接触させてから真空チャンバ内を減圧する。
In this embodiment, the lower surface of the upper substrate 1b is lowered by lowering the pressure plate 27 so that the horizontal portion 51
Then, the inside of the vacuum chamber is depressurized after being brought into contact with the upper surface of b.

【0040】すると、上基板1bを保持している吸引吸
着力が消えて自重で上基板1bが位置決め保持駒51上
に保持される。この時、上基板1bは位置決め保持駒5
1の水平部51bの上面に接触して移動を規制されてい
るので、減圧時に生じる空気の流れなどで移動すること
はない。
Then, the attraction force holding the upper substrate 1b disappears, and the upper substrate 1b is held on the positioning holding piece 51 by its own weight. At this time, the upper substrate 1b is
Since the movement is restricted by contacting the upper surface of the first horizontal portion 51b, it does not move due to the flow of air generated at the time of pressure reduction.

【0041】位置決め保持駒51上に保持された上基板
1bは自重で撓むので、位置決め保持駒51の水平部5
1bの高さを、上基板1bが撓んで下基板1aに接触す
る高さに設定する。
Since the upper substrate 1b held on the positioning and holding piece 51 bends under its own weight, the horizontal portion 5 of the positioning and holding piece 51
The height of the upper substrate 1b is set to a height at which the upper substrate 1b bends and contacts the lower substrate 1a.

【0042】所望の真空度になったところで、位置決め
保持駒51を退避して上基板1bを下基板1a上に落下
させて、上下基板1a,1bを貼り合わせる。
When the desired degree of vacuum is attained, the upper and lower substrates 1a and 1b are bonded by dropping the positioning and holding piece 51 and dropping the upper substrate 1b onto the lower substrate 1a.

【0043】上下基板1a,1bは上基板の撓んだ部分
が接触しているので、落下する際に両基板1a,1b間
に摩擦抵抗が発生する。この摩擦抵抗で上基板1bは動
きを規制されるので、第一の実施形態で用いていた図2
のガイド機構56がなくても、上基板1bは下基板1a
上の決められた位置に落下する。そして、更に加圧板2
7を降下させ上下基板1a,1bを加圧して、両基板1
a,1bを所望間隔に貼り合わせる。特に、上基板1a
の対向した2辺や角部を位置決め保持駒51で保持する
ようにすると、残りの上基板1aの対向した2辺や角部
は帯状に下基板1aと接触するので、その部分に両基板
1a,1bの位置合わせマークを設けておけば、画像認
識カメラを活用した位置合わせ精度は向上する。
Since the upper and lower substrates 1a and 1b are in contact with the bent portions of the upper substrate, a frictional resistance is generated between the substrates 1a and 1b when falling. Since the movement of the upper substrate 1b is regulated by this frictional resistance, the upper substrate 1b shown in FIG.
Without the guide mechanism 56 of FIG.
Fall to the determined position above. And, furthermore, the pressing plate 2
7 and pressurize the upper and lower substrates 1a, 1b to
a and 1b are bonded at desired intervals. In particular, the upper substrate 1a
If the two opposing sides and corners of the upper substrate 1a are held by the positioning holding piece 51, the opposing two sides and corners of the upper substrate 1a contact the lower substrate 1a in a strip shape. , 1b, the positioning accuracy utilizing the image recognition camera is improved.

【0044】尚、下基板1a上には前以って柱状スペー
サや粘着ビーズを設けることで、上基板1bが撓んで下
基板1aに接触しても上下基板1a,1bを貼り合わせ
た後の間隔を一様なものとすることができる。また、図
2に示すようにガイド機構56を併用して使用しても良
い。
By providing a columnar spacer or an adhesive bead on the lower substrate 1a in advance, even if the upper substrate 1b is bent and comes into contact with the lower substrate 1a, the upper and lower substrates 1a and 1b are bonded together. The intervals can be uniform. Further, as shown in FIG. 2, a guide mechanism 56 may be used in combination.

【0045】図5は本発明による第3の実施形態を示す
図であり、図4と同様、図2に示したものと同一の部分
には同一符号つけて重複する説明を省略する。
FIG. 5 is a view showing a third embodiment according to the present invention. Like FIG. 4, the same parts as those shown in FIG. 2 are denoted by the same reference numerals, and redundant description is omitted.

【0046】図5において、57は位置決め駒、58は
基板保持ガイド、59は軸で、軸59を中心に回転する
基板保持ガイド58を上基板1bの四隅近傍に設け、こ
の基板保持ガイド58には平面部58aがある。また図
2の位置決め保持駒51の代わりに位置決め駒57を下
基板1aの四隅近傍に設けている。
In FIG. 5, reference numeral 57 denotes a positioning piece, 58 denotes a substrate holding guide, and 59 denotes an axis. A substrate holding guide 58 that rotates about the axis 59 is provided near the four corners of the upper substrate 1b. Has a plane portion 58a. In addition, positioning pieces 57 are provided near the four corners of the lower substrate 1a instead of the positioning holding pieces 51 of FIG.

【0047】図5(a)に示すように、上基板1bを真
空吸着した加圧板27を降下させて、上基板1bの下面
を基板保持ガイド58の平面部58aの上面に接触させ
てから真空チャンバ内を減圧する。すると、上基板1b
を保持している吸引吸着力が消えて自重で上基板1bが
基板保持ガイド58に保持される。この時、上基板1b
の四隅部は基板保持ガイド58の平面部58aの上面と
加圧板27で挟まれていて移動を規制されているので、
減圧で生じる空気の流れなどで移動することはない。
As shown in FIG. 5A, the lower surface of the upper substrate 1b is brought into contact with the upper surface of the flat portion 58a of the substrate holding guide 58 by lowering the pressure plate 27 which has vacuum-adsorbed the upper substrate 1b. Reduce the pressure inside the chamber. Then, the upper substrate 1b
The upper substrate 1b is held by the substrate holding guide 58 by its own weight. At this time, the upper substrate 1b
Since the four corners are sandwiched between the upper surface of the flat portion 58a of the substrate holding guide 58 and the pressing plate 27 and are restricted from moving,
It does not move due to the flow of air generated by the decompression.

【0048】真空チャンバ内が所望の真空度になったと
ころで、図5(b)に示すように、全ての基板保持ガイ
ド58をその平面部58aが垂直になるように矢印方向
に同時に90度回転させる。すると、上基板1bは下基
板1a上に落下する。
When the inside of the vacuum chamber reaches a desired degree of vacuum, as shown in FIG. 5B, all the substrate holding guides 58 are simultaneously rotated 90 degrees in the direction of the arrow so that the plane portions 58a are vertical. Let it. Then, the upper substrate 1b falls on the lower substrate 1a.

【0049】基板保持ガイド58の平面部58aが落下
する上基板1bのガイドとして機能し、上基板1bはX
方向とY方向の動きを規制されて決められた位置に落下
する。そして、更に加圧板27を降下させ、上下基板1
a,1bを加圧して両基板1a,1bを所望間隔に貼り
合わせる。
The flat portion 58a of the substrate holding guide 58 functions as a guide for the upper substrate 1b on which the upper substrate 1b falls.
The movement in the direction and the Y direction is regulated, and the robot falls to a predetermined position. Then, the pressing plate 27 is further lowered, and the upper and lower substrates 1 are moved.
The substrates 1a and 1b are bonded at a desired interval by applying pressure to the substrates 1a and 1b.

【0050】基板保持ガイド58は平面部58aを備え
ているものであれば、いかなる形状であっても構わな
い。
The substrate holding guide 58 may have any shape as long as it has a flat portion 58a.

【0051】図6は本発明による第4の実施形態を示す
図であり、図5と同様、図2に示したものと同一の部分
には同一符号つけて重複する説明を省略する。
FIG. 6 is a view showing a fourth embodiment of the present invention. Similar to FIG. 5, the same parts as those shown in FIG. 2 are denoted by the same reference numerals, and duplicate description is omitted.

【0052】図6において、57は図5に示したものと
同様の位置決め駒、60は基板保持駒、59は軸であ
る。軸59を中心に回転する基板保持駒60は図5に示
した基板保持ガイド58に相当するものあるが、横断面
が十字形であることにおいて相違している。
In FIG. 6, 57 is a positioning piece similar to that shown in FIG. 5, 60 is a board holding piece, and 59 is a shaft. The substrate holding piece 60 that rotates around the shaft 59 corresponds to the substrate holding guide 58 shown in FIG. 5, but differs in that the cross section is a cross shape.

【0053】図6(a)に示すように、図5の実施形態
と同様に、加圧板27を降下させて上基板1bの下面を
図に示すように基板保持駒60の水平部に接触させてか
ら、真空チャンバ内を減圧すると、上基板1bを保持し
ている吸引吸着力が消えて自重で上基板1bが基板保持
駒60に保持される。この時、上基板1bは基板保持駒
60の垂直部で移動を規制されるので、減圧時の空気の
流れなどで移動することはない。
As shown in FIG. 6A, similarly to the embodiment of FIG. 5, the pressing plate 27 is lowered to bring the lower surface of the upper substrate 1b into contact with the horizontal portion of the substrate holding piece 60 as shown in the figure. Then, when the pressure in the vacuum chamber is reduced, the suction attraction holding the upper substrate 1b disappears, and the upper substrate 1b is held by the substrate holding piece 60 by its own weight. At this time, since the movement of the upper substrate 1b is restricted by the vertical portion of the substrate holding piece 60, the upper substrate 1b does not move due to the flow of air at the time of pressure reduction.

【0054】真空チャンバ内が所望の真空度になったと
ころで、図6(b)のように、全基板保持駒60を矢印
方向に同時に90度回転させ、上基板1bを下基板1a
上に落下させて、上下基板1a,1bを貼り合わせる。
真空中では空気抵抗がなく上基板1bは地球の引力によ
り垂直に落下するので、上基板1bは決められた位置に
落下する。そして、更に加圧板27を降下させ、上下基
板1a,1bを加圧して両基板1a,1bを所望間隔に
貼り合わせる。
When the inside of the vacuum chamber reaches a desired degree of vacuum, as shown in FIG. 6B, all the substrate holding pieces 60 are simultaneously rotated by 90 degrees in the direction of the arrow, and the upper substrate 1b is moved to the lower substrate 1a.
Then, the upper and lower substrates 1a and 1b are bonded together.
Since there is no air resistance in a vacuum and the upper substrate 1b falls vertically due to the gravitational force of the earth, the upper substrate 1b falls to a predetermined position. Then, the pressing plate 27 is further lowered, and the upper and lower substrates 1a and 1b are pressed to bond the substrates 1a and 1b at a desired interval.

【0055】この実施形態では、基板保持駒60が上基
板1bを落下させる方向に保持を開放するので、上基板
1bは垂直に落下し易い。尚、本図には記していない
が、図2に示すようにガイド機構56を併用して使用し
ても良い。
In this embodiment, since the substrate holding piece 60 releases the holding in the direction of dropping the upper substrate 1b, the upper substrate 1b is easily dropped vertically. Although not shown in the drawing, the guide mechanism 56 may be used in combination as shown in FIG.

【0056】図7は本発明による第5の実施形態を示す
図であり、図5と同様、図2に示したものと同一の部分
には同一符号つけて重複する説明を省略する。
FIG. 7 is a view showing a fifth embodiment according to the present invention. As in FIG. 5, the same parts as those shown in FIG. 2 are denoted by the same reference numerals, and redundant description is omitted.

【0057】図7において、61は位置決め保持ガイド
である。この実施形態では、図2の位置決め保持駒51
の上面部に垂直部を設けた位置決め保持ガイド61を基
板の四隅部に設けている。
In FIG. 7, reference numeral 61 denotes a positioning and holding guide. In this embodiment, the positioning holding piece 51 shown in FIG.
The positioning and holding guide 61 having a vertical portion on the upper surface of the substrate is provided at the four corners of the substrate.

【0058】図7(a)のように、上基板1bを保持し
た加圧板27を降下させて上基板1bの下面を位置決め
保持ガイド61に接近させてから真空チャンバ内を減圧
する。上基板1bを保持している吸引吸着力が消えて自
重で上基板1bが落下して、図に示すように位置決め保
持ガイド61に保持される。この時、上基板1bは位置
決め保持ガイド61でX方向とY方向の移動を規制され
ているので空気の流れなどでX方向とY方向に移動する
ことはない。
As shown in FIG. 7A, the pressure plate 27 holding the upper substrate 1b is lowered to bring the lower surface of the upper substrate 1b closer to the positioning and holding guide 61, and then the pressure in the vacuum chamber is reduced. The suction attraction force holding the upper substrate 1b disappears, and the upper substrate 1b falls by its own weight and is held by the positioning and holding guide 61 as shown in the figure. At this time, since the upper substrate 1b is restricted from moving in the X and Y directions by the positioning and holding guide 61, it does not move in the X and Y directions due to the flow of air or the like.

【0059】所望の真空度になったところで、各位置決
め保持ガイド61を同時に待避させて上基板1bを下基
板1a上に落下させ、上下基板1a,1bを貼り合わせ
る。真空中では空気抵抗がなく上基板1bは垂直に落下
するので、上基板1bは下基板1a上の決められた位置
に落下する。その後、位置決め保持ガイド61を前進さ
せて上下基板1a,1bの側面を四隅で抑える。そし
て、更に加圧板27を降下させ上下基板1a,1bを加
圧して、両基板1a,1bを所望間隔に貼り合わせる。
When the desired degree of vacuum is reached, the positioning and holding guides 61 are simultaneously retracted, the upper substrate 1b is dropped onto the lower substrate 1a, and the upper and lower substrates 1a and 1b are bonded. Since there is no air resistance in vacuum and the upper substrate 1b falls vertically, the upper substrate 1b falls to a predetermined position on the lower substrate 1a. Thereafter, the positioning and holding guide 61 is moved forward to hold the side surfaces of the upper and lower substrates 1a and 1b at the four corners. Then, the pressing plate 27 is further lowered to press the upper and lower substrates 1a and 1b, and the substrates 1a and 1b are bonded to each other at a desired interval.

【0060】この実施形態では、図2の位置決め保持駒
51とガイド機構56を一緒にした形で部品点数が減
り、装置の簡略化を図ることができる。
In this embodiment, the number of parts is reduced by combining the positioning holding piece 51 and the guide mechanism 56 shown in FIG. 2, and the apparatus can be simplified.

【0061】尚、本図には記していないが、図2に示す
ようにガイド機構56を併用しても良いし、位置決め保
持ガイド61を待避したまま加圧しても良い。
Although not shown in the drawing, the guide mechanism 56 may be used together as shown in FIG. 2, or the pressure may be applied while the positioning and holding guide 61 is retracted.

【0062】図8、図9は本発明による第6、第7の実
施形態を示す図であって、真空状況下にあっても加圧板
27に上基板1bを保持できる機能を内蔵させている。
FIGS. 8 and 9 show the sixth and seventh embodiments according to the present invention. The press plate 27 has a built-in function to hold the upper substrate 1b even under a vacuum condition. .

【0063】尚両図において、図2に示したものと同一
の部分には同一符号つけて重複する説明を省略する。
In both figures, the same parts as those shown in FIG. 2 are denoted by the same reference numerals, and redundant description will be omitted.

【0064】図8における加圧板27は内部に電極板を
内蔵した絶縁性部材で構成され、上基板1bを保持でき
る静電吸着機能を備えたものである。
The pressing plate 27 in FIG. 8 is formed of an insulating member having an electrode plate built therein, and has an electrostatic attraction function capable of holding the upper substrate 1b.

【0065】また、図9の加圧板27は上基板1bを保
持できる粘着を利用した粘着部62とそれを駆動するシ
リンダ63を内蔵している。
The pressure plate 27 shown in FIG. 9 has a built-in adhesive portion 62 using an adhesive capable of holding the upper substrate 1b and a cylinder 63 for driving the adhesive portion.

【0066】両図において、各加圧板27に上基板1b
を静電吸着機能や粘着部62で保持させた後、真空チャ
ンバ内を減圧する。
In both figures, the upper substrate 1b is
Is held by the electrostatic adsorption function or the adhesive portion 62, and then the pressure in the vacuum chamber is reduced.

【0067】この時、上基板1bは静電吸着機能や粘着
部62で保持されているので、真空下でも各加圧板27
から上基板1bは落下しないし、移動することもない。
At this time, since the upper substrate 1b is held by the electrostatic attraction function and the adhesive portion 62, each of the pressing plates 27
The upper substrate 1b does not fall and does not move.

【0068】真空チャンバ内が所望の真空度になったと
ころで、上基板1bの保持を解除(静電吸着機能の解除
や粘着部62を加圧板27内にシリンダ63で待避させ
る)して上基板1bを下基板1a上に落下させて、上下
基板1a,1bを貼り合わせる。
When the inside of the vacuum chamber reaches a desired degree of vacuum, the holding of the upper substrate 1b is released (the electrostatic attraction function is released or the adhesive portion 62 is retracted in the pressure plate 27 by the cylinder 63). 1b is dropped on the lower substrate 1a, and the upper and lower substrates 1a and 1b are bonded.

【0069】真空中では空気抵抗がなく上基板1bは垂
直に落下するするので、上基板1bは下基板1a上の決
められた位置に落下する。そして、更に加圧板27を降
下させ上下基板1a,1bを加圧して両基板1a,1b
を所望間隔に貼り合わせる。
Since there is no air resistance in vacuum and the upper substrate 1b falls vertically, the upper substrate 1b falls to a predetermined position on the lower substrate 1a. Then, the pressing plate 27 is further lowered to press the upper and lower substrates 1a and 1b, and the both substrates 1a and 1b are pressed.
Are bonded at desired intervals.

【0070】尚、図8、図9に示すように位置決め保持
ガイド機構56を併用してもよいし、省略しても良い。
As shown in FIGS. 8 and 9, the positioning and holding guide mechanism 56 may be used in combination or may be omitted.

【0071】以上説明した両実施形態でも、上下基板1
a,1bとして同一寸法のものが使用でき、また、基板
を落下させて所望間隔に貼り合わせる過程で基板はX方
向とY方向に移動しないので、貼り合わせを行う段階で
位置合せをする必要はなく、また、落下によって短時間
に貼り合わせるので生産性は向上する。
In both embodiments described above, the upper and lower substrates 1
The same size can be used as a and 1b. Also, since the substrate does not move in the X direction and the Y direction in the process of dropping and bonding the substrate at a desired interval, it is not necessary to perform positioning at the stage of bonding. In addition, productivity is improved because the sheets are stuck in a short time by dropping.

【0072】本発明は以上説明した実施形態に限らず、
以下の様に実施しても良い。 (1) 下基板1aや上基板1bの移動阻止機構や保持
機構は、θステージ4c或いはテーブル9に内蔵させて
もよい。また、上チャンバユニット21側に設けても良
い。
The present invention is not limited to the embodiment described above,
You may implement as follows. (1) The movement preventing mechanism and the holding mechanism for the lower substrate 1a and the upper substrate 1b may be built in the θ stage 4c or the table 9. Further, it may be provided on the upper chamber unit 21 side.

【0073】(2) 移動阻止機構や保持機構をおのお
の併用して組み合わせて使用しても良い。
(2) The movement preventing mechanism and the holding mechanism may be used in combination with each other.

【0074】(3) 本発明では上下基板1a、1bは
同一形状とすることができるが、上下基板1a、1bの
形状が異なっても、移動阻止機構や保持機構をその形状
に合わせることで、貼り合わせることができる。
(3) In the present invention, the upper and lower substrates 1a and 1b can have the same shape. However, even if the upper and lower substrates 1a and 1b have different shapes, the movement preventing mechanism and the holding mechanism can be made to conform to the shapes. Can be laminated.

【0075】(4) 液晶表示パネルの基板貼り合わせ
だけでなく、他の基板の貼り合わせにも適用できる。
(4) The present invention can be applied not only to the bonding of the substrates of the liquid crystal display panel but also to the bonding of other substrates.

【0076】[0076]

【発明の効果】以上説明したように、本発明によれば、
上下基板が同一形状であっても真空中で両基板を貼り合
わせることができる。また、本発明によれば、真空中で
基板同士を短時間で貼り合わせて生産性を向上すること
ができる。
As described above, according to the present invention,
Even if the upper and lower substrates have the same shape, both substrates can be bonded in a vacuum. Further, according to the present invention, productivity can be improved by bonding substrates in a short time in a vacuum.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施形態を示す基板組立装置の全体
構成を示す概略図である。
FIG. 1 is a schematic diagram showing an overall configuration of a board assembling apparatus showing an embodiment of the present invention.

【図2】図1に示した基板組立装置で基板を貼り合わせ
るときの状況を示す基板貼合部の部分的断面図である。
FIG. 2 is a partial cross-sectional view of a substrate bonding section showing a situation when substrates are bonded by the substrate assembling apparatus shown in FIG. 1;

【図3】図1に示した基板組立装置で基板を貼り合わせ
る状況を示す基板貼合部の部分的平面図である。
FIG. 3 is a partial plan view of a substrate bonding section showing a state where substrates are bonded by the substrate assembling apparatus shown in FIG. 1;

【図4】本発明における第2の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 4 is a partial cross-sectional view of a substrate bonding portion showing a state of bonding substrates according to a second embodiment of the present invention.

【図5】本発明における第3の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 5 is a partial cross-sectional view of a substrate bonding portion illustrating a state in which substrates are bonded according to a third embodiment of the present invention.

【図6】本発明における第4の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 6 is a partial cross-sectional view of a substrate bonding portion illustrating a state in which substrates are bonded according to a fourth embodiment of the present invention.

【図7】本発明における第5の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 7 is a partial cross-sectional view of a substrate bonding portion illustrating a state in which substrates are bonded according to a fifth embodiment of the present invention.

【図8】本発明における第6の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 8 is a partial cross-sectional view of a substrate bonding portion illustrating a state in which substrates are bonded according to a sixth embodiment of the present invention.

【図9】本発明における第7の実施形態により基板を貼
り合わせる状況を示す基板貼合部の部分的断面図であ
る。
FIG. 9 is a partial cross-sectional view of a substrate bonding portion showing a state where substrates are bonded according to a seventh embodiment of the present invention.

【符号の説明】[Explanation of symbols]

S1 …液晶滴下部 S2 …基板貼合部 1a …下基板 1b …上基板 9 …テーブル 10 …下チャンバユニット 21 …上チャンバユニット 27 …加圧板 51 …位置決め保持駒 56 …ガイド機構 57 …位置決め駒 58 …基板保持カイド 59 …軸 60 …基板保持駒 61 …位置決め保持ガイド 62 …粘着部 63 …シリンダ S1 ... Liquid crystal dropping part S2 ... Substrate bonding part 1a ... Lower substrate 1b ... Upper substrate 9 ... Table 10 ... Lower chamber unit 21 ... Upper chamber unit 27 ... Pressing plate 51 ... Positioning holding piece 56 ... Guide mechanism 57 ... Positioning piece 58 ... board holding guide 59 ... shaft 60 ... board holding piece 61 ... positioning and holding guide 62 ... adhesive section 63 ... cylinder

───────────────────────────────────────────────────── フロントページの続き (72)発明者 齊藤 正行 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 (72)発明者 平井 明 茨城県竜ヶ崎市向陽台5丁目2番 日立テ クノエンジニアリング株式会社開発研究所 内 Fターム(参考) 2H088 FA01 FA09 FA16 FA17 FA30 HA01 MA20  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Masayuki Saito 5-2-2 Koyodai, Ryugasaki-shi, Ibaraki Pref. Hitachi Techno Engineering Co., Ltd. (72) Inventor Akira Hirai 5-2-2 Koyodai, Ryugasaki-shi, Ibaraki Hitachi TECHNO ENGINEERING CORPORATION Development Laboratory F-term (reference) 2H088 FA01 FA09 FA16 FA17 FA30 HA01 MA20

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】貼り合わせる2枚の基板を対向させ、いづ
れかの基板に設けた接着剤により両基板を貼り合わせる
基板の組立方法において、 真空中で両基板を上下に対向させて保持し、上方の基板
の保持を解放して下方の基板上に落下させて両基板を貼
り合わせることを特徴とする基板の組立方法。
1. A method for assembling two substrates to be bonded, wherein the two substrates to be bonded are opposed to each other, and the two substrates are bonded to each other by an adhesive provided on one of the substrates. And releasing the holding of the substrate and dropping the substrate onto a lower substrate to bond the two substrates together.
【請求項2】上記請求項1に記載の基板の組立方法にお
いて、 上方の基板の落下をガイドしつつ下方の基板上に落下さ
せることを特徴とする基板の組立方法。
2. The method of assembling a substrate according to claim 1, wherein the upper substrate is dropped onto a lower substrate while guiding the upper substrate to fall.
【請求項3】上記請求項1に記載の基板の組立方法にお
いて、 上方の基板の撓んだ個所を水平に保持した下方の基板に
接触させた状態で上方の基板を下方の基板上に落下させ
ることを特徴とする基板の組立方法。
3. The method for assembling a substrate according to claim 1, wherein the upper substrate is dropped onto the lower substrate while the bent portion of the upper substrate is in contact with the lower substrate which is held horizontally. A method for assembling a substrate, comprising:
【請求項4】上記請求項1に記載の基板の組立方法にお
いて、 上方の基板を下方の基板上に落下させる前或いは後に、
該両基板同士の位置合わせを行うことを特徴とする基板
の組立方法。
4. The method for assembling a substrate according to claim 1, wherein before or after the upper substrate is dropped onto the lower substrate.
A method of assembling a substrate, wherein the two substrates are aligned with each other.
【請求項5】貼り合わせる2枚の基板を対向させ、いづ
れかの基板に設けた接着剤により両基板を貼り合わせる
基板の組立装置において、 真空中で上方の基板を下方の基板に対向させて保持する
と共にその保持を解放して下方の基板上に上方の基板を
落下させる保持開放手段を設けたことを特徴とする基板
の組立装置。
5. An assembling apparatus for a substrate, in which two substrates to be bonded are opposed to each other and both substrates are bonded by an adhesive provided on either one of the substrates, wherein the upper substrate is opposed to the lower substrate and held in a vacuum. And a holding / opening means for releasing the holding and dropping the upper substrate onto the lower substrate.
【請求項6】上記請求項5に記載の基板の組立装置にお
いて、 下方の基板を水平に保持するテーブルを設けたことを特
徴とする基板の組立装置。
6. The board assembling apparatus according to claim 5, further comprising a table for horizontally holding the lower board.
【請求項7】上記請求項5に記載の基板の組立装置にお
いて、 その保持開放手段は、上方の基板の対辺部ないし対角部
を保持するものであり、その保持でできる上方の基板の
撓んだ個所を水平に保持した下方の基板に接触させる手
段を備えていることを特徴とする基板の組立装置。
7. An apparatus for assembling a substrate according to claim 5, wherein said holding and releasing means holds opposite sides or diagonals of the upper substrate, and flexes the upper substrate by holding. A substrate assembling apparatus comprising: means for contacting a lower portion of a substrate with a lower substrate which is held horizontally.
JP35050299A 1999-12-09 1999-12-09 Substrate assembly method and apparatus Expired - Fee Related JP3641709B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP35050299A JP3641709B2 (en) 1999-12-09 1999-12-09 Substrate assembly method and apparatus
SG200007223A SG87915A1 (en) 1999-12-09 2000-12-07 Substrate assembling apparatus
TW089126120A TW571144B (en) 1999-12-09 2000-12-07 Substrate assembling apparatus
KR10-2000-0074503A KR100384253B1 (en) 1999-12-09 2000-12-08 Substrate assembling apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35050299A JP3641709B2 (en) 1999-12-09 1999-12-09 Substrate assembly method and apparatus

Publications (2)

Publication Number Publication Date
JP2001166272A true JP2001166272A (en) 2001-06-22
JP3641709B2 JP3641709B2 (en) 2005-04-27

Family

ID=18410934

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3641709B2 (en)
KR (1) KR100384253B1 (en)
SG (1) SG87915A1 (en)
TW (1) TW571144B (en)

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US6628365B1 (en) 2002-03-23 2003-09-30 Lg.Philips Lcd Co., Ltd. LCD with UV shielding part at dummy sealant region
US6712883B2 (en) 2002-02-25 2004-03-30 Lg.Philips Lcd Co., Ltd. Apparatus and method for deaerating liquid crystal
US6738124B2 (en) 2002-03-07 2004-05-18 Lg. Philips Lcd Co., Ltd. Method for fabricating liquid crystal display panel
US6741322B2 (en) 2002-03-06 2004-05-25 Lg. Philips Lcd Co., Ltd. Production line of liquid crystal display device having shield of UV blocking material
US6741316B2 (en) 2002-03-06 2004-05-25 Lg.Philips Lcd Co., Ltd. Liquid crystal display device and fabricating method thereof
US6741320B2 (en) 2002-02-20 2004-05-25 L.G.Philips Lcd Co., Ltd. Method for cutting liquid crystal display panel
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